| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/21/2004 | CN1147007C Process for forming microcrystalline silicon series thin film and apparatus suitable for practicing said process |
| 04/21/2004 | CN1146967C Etching technology for reducing corrosion of metal patterns of coated layer on substrate |
| 04/21/2004 | CN1146675C Super hydrophobic coated substrates |
| 04/20/2004 | US6724086 Hydrogenated oxidized silicon carbon material |
| 04/20/2004 | US6724017 In a two-dimensional or three-dimensional lattice; coulomb blocking devices using quantum dots. |
| 04/20/2004 | US6723665 Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process |
| 04/20/2004 | US6723664 Method and apparatus for depositing a thin film, and semiconductor device having a semiconductor-insulator junction |
| 04/20/2004 | US6723660 Thin-film forming apparatus and thin-film forming method |
| 04/20/2004 | US6723642 Method for forming nitrogen-containing oxide thin film using plasma enhanced atomic layer deposition |
| 04/20/2004 | US6723641 Method of manufacturing semiconductor device and method of determining film formation time, chamber, chemical vapor deposition apparatus and boat thereof, etching apparatus, and film formation process system |
| 04/20/2004 | US6723598 Method for manufacturing aluminum oxide films for use in semiconductor devices |
| 04/20/2004 | US6723595 Thin film deposition method including using atomic layer deposition without purging between introducing the gaseous reactants |
| 04/20/2004 | US6723448 Method of manufacturing honeycomb extrusion die and die manufactured according to this method |
| 04/20/2004 | US6723437 Semiconductor processing component having low surface contaminant concentration |
| 04/20/2004 | US6723421 Semiconductor with coordinatively irregular structures |
| 04/20/2004 | US6723382 Polymer impregnation and pyrolysis |
| 04/20/2004 | US6723381 Organic silicon polymer is infiltrated and charged into gaps in a matrix phase of a formed fiber fabric of silicon carbide |
| 04/20/2004 | US6723202 Worktable device and plasma processing apparatus for semiconductor process |
| 04/20/2004 | US6723201 Microchip fabrication chamber wafer detection |
| 04/20/2004 | US6723186 Method of manufacturing metallic film consisting of giant single crystal grains |
| 04/20/2004 | US6722159 Photocatalytically-activated self-cleaning article and method of making same |
| 04/20/2004 | CA2211705C Diamond |
| 04/15/2004 | WO2004032219A1 Plasma processing system |
| 04/15/2004 | WO2004032214A1 Plasma film forming system |
| 04/15/2004 | WO2004032213A1 High frequency plasma generator and high frequency plasma generating method |
| 04/15/2004 | WO2004032200A2 Systems and methods for improved gas delivery |
| 04/15/2004 | WO2004032196A2 Method of fabricating semiconductor by nitrogen doping of silicon film |
| 04/15/2004 | WO2004031443A1 Method for forming thin film and apparatus therefor |
| 04/15/2004 | WO2004031442A1 Plasma processing system and its substrate processing process, plasma enhanced chemical vapor deposition system and its film deposition process |
| 04/15/2004 | WO2004031441A1 Device for carrying out a plasma-assisted process |
| 04/15/2004 | WO2004031440A1 Method for forming thin film, apparatus for forming thin film, and method for monitoring thin film forming process |
| 04/15/2004 | WO2004031439A2 Method and process reactor for sequential gas phase deposition by means of a process and an auxiliary chamber |
| 04/15/2004 | WO2004031438A1 Internally coated hollow body, coating method and device |
| 04/15/2004 | WO2004031437A1 Coating method and coated element |
| 04/15/2004 | WO2004031418A2 Method for manufacturing products by means of deformation at increased temperatures |
| 04/15/2004 | WO2003095702A3 Method for curing low dielectric constant film by electron beam |
| 04/15/2004 | WO2003017341B1 Methods of forming metal-comprising materials and capacitor electrodes; and capacitor constructions |
| 04/15/2004 | WO2002045871A9 System and method for modulated ion-induced atomic layer deposition (mii-ald) |
| 04/15/2004 | US20040072449 Method of manufacturing semiconductor device using flexible tube |
| 04/15/2004 | US20040072417 Method of manufacturing a semiconductor element |
| 04/15/2004 | US20040071946 Ceramic layered product and method for manufacturing the same |
| 04/15/2004 | US20040071906 Surface modification process |
| 04/15/2004 | US20040071897 Delivering into a plasma generator, a gas to be activated; activating gas to create a volume of reactive species; delivering fraction of reactive species into processing region to react with substrate; maintaining gas in activated state |
| 04/15/2004 | US20040071879 Method of film deposition, and fabrication of structures |
| 04/15/2004 | US20040071878 Surface preparation using plasma for ALD Films |
| 04/15/2004 | US20040071877 Chemical vapour infiltration method for densifying porous substrates having a central passage |
| 04/15/2004 | US20040071876 Method for forming nanocrystalline diamond films for cold electron emission using hot filament reactor |
| 04/15/2004 | US20040071875 Ferroelectric property, and therefore, it can be advantageously used in an electric or electronic device |
| 04/15/2004 | US20040071874 Apparatus and method for single-wafer-processing type CVD |
| 04/15/2004 | US20040071613 Plasma processing apparatus |
| 04/15/2004 | US20040070037 Semiconductor device and method of manufacturing the same |
| 04/15/2004 | US20040069612 Substrate processing apparatus and substrate processing method |
| 04/15/2004 | US20040069610 System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (XFn) compounds for use in cleaning semiconductor processing chambers |
| 04/15/2004 | US20040069410 Cluster tool for E-beam treated films |
| 04/15/2004 | US20040069408 Dual-port end point window for plasma etcher |
| 04/15/2004 | US20040069231 Chemical vapor deposition process and apparatus thereof |
| 04/15/2004 | US20040069230 Thin film formation apparatus and thin film formation method employing the apparatus |
| 04/15/2004 | US20040069227 Processing chamber configured for uniform gas flow |
| 04/15/2004 | US20040069225 Tandem process chamber |
| 04/15/2004 | US20040069224 Cold trap for CVD furnace |
| 04/15/2004 | DE10342548A1 Schnelle Abscheidung von Borsilicatglasfilmen Rapid separation of Borsilicatglasfilmen |
| 04/15/2004 | DE10296448T5 Verfahren zum Abscheiden einer Schicht mit einer verhältnismässig hohen Dielektrizitätskonstante auf ein Substrat A method for depositing a layer with a relatively high dielectric constant onto a substrate |
| 04/15/2004 | DE10243841A1 Producing hollow carbon object by gas phase deposition on metal substrate used in medical and biological technology results in tapered cone including axial cavity running from base to tip |
| 04/14/2004 | EP1408535A2 Heating element CVD system |
| 04/14/2004 | EP1408140A1 A high-density plasma process for depositing a layer of Silicon Nitride |
| 04/14/2004 | EP1408138A1 Coating device |
| 04/14/2004 | EP1406847A1 Visible-light-responsive photoactive coating, coated article and method of making same |
| 04/14/2004 | EP1112391B1 Modulated plasma glow discharge treatments for making superhydrophobic substrates |
| 04/14/2004 | EP1055014A4 Free floating shield and semiconductor processing system |
| 04/14/2004 | EP0963458B1 Process for low temperature cvd using bi-carboxylates |
| 04/14/2004 | EP0934433B1 Method for depositing fluorine doped silicon dioxide films |
| 04/14/2004 | CN1489784A Method of producing electronic device material |
| 04/14/2004 | CN1489782A Method and device for plasma CVD |
| 04/14/2004 | CN1489779A Zirconia toughtened ceramic components and coatings in semiconductor processing equipment and method of manufacturing thereof |
| 04/14/2004 | CN1489644A Susceptorless reactor for growing epitaxial layers by chemical vapor deposition |
| 04/14/2004 | CN1489640A Fullerene coated component of semiconductor processing equipment |
| 04/14/2004 | CN1489610A Production method for copolymer film, copolymer film for med therefrom, and semiconductor device using said copolymer film |
| 04/14/2004 | CN1488777A Mixed gas for galss coating and preparing method thereof |
| 04/14/2004 | CN1146025C Method for forming film |
| 04/14/2004 | CN1145632C Complex compound of element of sub-group IV |
| 04/14/2004 | CN1145630C Method for producing metal-ligand compositions |
| 04/13/2004 | US6721162 Electrostatic chuck having composite dielectric layer and method of manufacture |
| 04/13/2004 | US6720654 Electronic devices with cesium barrier film and process for making same |
| 04/13/2004 | US6720531 Temperature uniformity during chemical vapor deposition |
| 04/13/2004 | US6720275 Methods of fabricating capacitors including Ta2O5 layers in a chamber including changing a Ta2O5 layer to heater separation or chamber pressure |
| 04/13/2004 | US6720262 Method of forming copper interconnections and thin films using chemical vapor deposition with catalyst |
| 04/13/2004 | US6720260 Sequential electron induced chemical vapor deposition |
| 04/13/2004 | US6720259 Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor deposition |
| 04/13/2004 | US6720251 Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing |
| 04/13/2004 | US6720097 Barrier film and method for production thereof |
| 04/13/2004 | US6720095 Coated cemented carbide body and method for use |
| 04/13/2004 | US6720037 Plasma processing method and apparatus |
| 04/13/2004 | US6720035 Method for coating ceramic discs and ceramic disc obtained by said method |
| 04/13/2004 | US6720031 Preparing substrate placing substrate into chemical vapor deposition chamber; heating; introducing water flow in a carrier gas; stopping water flow; starting flow of copper precursor |
| 04/13/2004 | US6720027 Cyclical deposition of a variable content titanium silicon nitride layer |
| 04/13/2004 | US6719909 Band gap plasma mass filter |
| 04/13/2004 | US6719885 Method of reducing stress induced defects in an HDP-CVD process |
| 04/13/2004 | US6719876 Internal electrode type plasma processing apparatus and plasma processing method |
| 04/13/2004 | US6719851 Lid assembly for opening a process chamber lid and uses therefor |
| 04/13/2004 | US6719849 Single-substrate-processing apparatus for semiconductor process |