| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/28/2004 | EP1414079A1 Diamond high brightness ultraviolet ray emitting element |
| 04/28/2004 | EP1414061A1 Heat treatment apparatus |
| 04/28/2004 | EP1413648A1 Coated cutting tool |
| 04/28/2004 | EP1413645A1 Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor deposition |
| 04/28/2004 | EP1413644A2 Thin-film deposition device |
| 04/28/2004 | EP1412968A2 Substrate support and method of fabricating the same |
| 04/28/2004 | EP1412552A1 Method for the production of coated substrates |
| 04/28/2004 | EP1412551A2 Method of making a passivated surface |
| 04/28/2004 | EP1412550A2 Support with getter-material for microelectronic, microoptoelectronic or micromechanical device |
| 04/28/2004 | EP1412175A1 Insulating and functionalizing fine metal-containing particles with comformal ultra-thin films |
| 04/28/2004 | EP1412098A2 Encapsulated long life electroluminescent phosphor |
| 04/28/2004 | EP1165856B1 Method of making a multilayer article by arc plasma deposition |
| 04/28/2004 | EP1040175B1 Anti-coking coatings |
| 04/28/2004 | EP1038306B1 Method and device for improving surfaces |
| 04/28/2004 | EP1019562B1 Plasma enhanced chemical deposition with low vapor pressure compounds |
| 04/28/2004 | EP1017510A4 Method and apparatus for gas phase coating complex internal surfaces of hollow articles |
| 04/28/2004 | EP0995342A4 Method for improved cleaning of substrate processing systems |
| 04/28/2004 | EP0975820B1 Hard material coating of a cemented carbide or carbide containing cermet substrate |
| 04/28/2004 | EP0973957A4 Method of making titania-doped fused silica |
| 04/28/2004 | CN1492493A Support device |
| 04/28/2004 | CN1492073A Monophyletic mixture of metal oxygen silicide |
| 04/28/2004 | CN1492072A Surface modifying technology of diamond-like film to titanium-nickel alloy |
| 04/27/2004 | US6728289 Non-planar micro-optical structures |
| 04/27/2004 | US6727654 Plasma processing apparatus |
| 04/27/2004 | US6727456 Deposited film forming method and deposited film forming apparatus |
| 04/27/2004 | US6727194 Wafer batch processing system and method |
| 04/27/2004 | US6727190 Method of forming fluorine doped boron-phosphorous silicate glass (F-BPSG) insulating materials |
| 04/27/2004 | US6727169 Method of making conformal lining layers for damascene metallization |
| 04/27/2004 | US6727164 Method for fabricating a semiconducting nitride film, susceptor tray, and apparatus for fabricating a semiconducting nitride film |
| 04/27/2004 | US6727110 Tetraethoxysilane is used during plasma enhances chemical vapor deposition and a layer having low optical losses in the infra-red region is produced; waveguides |
| 04/27/2004 | US6726987 Coating of a mixed-oxide layer predominantly formed of Al2O3 and containing 0.1 to less-than 3% of TiO2 and 0.01-0.5% of B2O3 homogeneously distributed in Al2O3; especially a cutting insert |
| 04/27/2004 | US6726955 Method of controlling the crystal structure of polycrystalline silicon |
| 04/27/2004 | US6726954 Method and system for forming copper thin film |
| 04/27/2004 | US6726804 RF power delivery for plasma processing using modulated power signal |
| 04/27/2004 | US6726803 Multi-sectional plasma generator with discharge gaps between multiple elements forming a plasma discharge cavity |
| 04/27/2004 | US6726802 Plasma processing apparatus |
| 04/27/2004 | US6726800 Ashing apparatus, ashing methods, and methods for manufacturing semiconductor devices |
| 04/27/2004 | US6726769 Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition |
| 04/22/2004 | WO2004034454A1 Substrate treating appratus |
| 04/22/2004 | WO2004034444A1 Heated substrate support |
| 04/22/2004 | WO2004034443A1 Atomic layer deposition methods and atomic layer deposition tools |
| 04/22/2004 | WO2004033753A1 Method of forming metal oxide film and microwave power source unit for use in the method |
| 04/22/2004 | WO2004033752A2 Two-layer film for next generation damascene barrier application with good oxidation resistance |
| 04/22/2004 | WO2004033750A1 Plasma-assisted micro-scale material deposition |
| 04/22/2004 | WO2003100828A3 Method of depositing an oxide film by chemical vapor deposition |
| 04/22/2004 | WO2003093173A8 Diamond synthesis |
| 04/22/2004 | WO2003060184A3 Method and apparatus for forming silicon containing films |
| 04/22/2004 | WO2003002269A3 Article having a plasmapolymer coating and method for producing the same |
| 04/22/2004 | WO2002080244A9 Improved process for deposition of semiconductor films |
| 04/22/2004 | US20040077184 Apparatuses and methods for depositing an oxide film |
| 04/22/2004 | US20040077183 Titanium tantalum nitride silicide layer |
| 04/22/2004 | US20040077182 Method for forming introgen-containing oxide thin film using plasma enhanced atomic layer deposition |
| 04/22/2004 | US20040077181 Use of phoslon (PNO) for borderless contact fabrication, etch stop/barrier layer for dual damascene fabrication and method of forming phoslon |
| 04/22/2004 | US20040077162 Thermal activation of fluorine for use in a semiconductor chamber |
| 04/22/2004 | US20040077161 Method of depositing a material layer |
| 04/22/2004 | US20040076856 Surface coating of a carbide or a nitride |
| 04/22/2004 | US20040076837 Formed by plasma-enhanced chemical vapor deposition; for architectural hardware (door handles/levers/grips) |
| 04/22/2004 | US20040076836 Comprises silicon oxide barrier coated with protective hydrogenated amorphous carbon film; for preventing gas deposition on polymer substrate by low pressure plasma |
| 04/22/2004 | US20040076767 Method of manufacturing silicon carbide film |
| 04/22/2004 | US20040076763 Apparatus capable of forming a thin film of high quality having a uniform thickness at a high deposition rate at an increased plasma density without increase of plasma potential |
| 04/22/2004 | US20040076755 Method for deposition of inert barrier coating to increase corrosion resistance |
| 04/22/2004 | US20040076751 Sequential chemical vapor deposition |
| 04/22/2004 | US20040076707 Honeycomb structural body forming ferrule, and method of manufacturing the ferrule |
| 04/22/2004 | US20040075130 Methods of forming electronic devices including dielectric layers with different densities of titanium and related structures |
| 04/22/2004 | US20040074609 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode |
| 04/22/2004 | US20040074606 Electrode-built-in susceptor and a manufacturing method therefor |
| 04/22/2004 | US20040074605 Focus ring for semiconductor treatment and plasma treatment device |
| 04/22/2004 | US20040074604 Neutral particle beam processing apparatus |
| 04/22/2004 | US20040074516 The versatile operation of process equipment, and especially semiconductor process chamber clean equipment, from any pressure level ranging from a vacuum to just less than one atmosphere absolute. The system of the present invention |
| 04/22/2004 | US20040074515 Manufacturing a semiconductor device by removing impurities from a substrate in the processing chamber with a plasma of a first gas including hydrogen gas. After the substrate is removed from the processing chamber, the processing chamber |
| 04/22/2004 | US20040074444 Ion beam source with gas introduced directly into deposition/vacuum chamber |
| 04/22/2004 | US20040074438 Novel method to reduce resistivity of atomic layer tungsten chemical vapor depositon |
| 04/22/2004 | US20040074437 Method of growing single crystal Gallium Nitride on silicon substrate |
| 04/22/2004 | US20040074260 Method of making heat treatable coated article with diamond-like carbon (DLC) inclusive layer |
| 04/22/2004 | DE10296935T5 Barrierenverstärkungsprozess für Kupferdurchkontaktierungen(oder Zwischenverbindungen) Barriers amplification process for Kupferdurchkontaktierungen (or intermediates) |
| 04/22/2004 | DE10296662T5 Systeme und Verfahren zum epitaxialen Aufwachsen von Filmen auf ein Halbleitersubstrat Systems and methods for epitaxial growth of films on a semiconductor substrate |
| 04/22/2004 | DE10296556T5 Verfahren und Vorrichtung zum Herstellen eines Zwischenstoffes Method and device for producing an intermediate substance |
| 04/22/2004 | DE10247921A1 Hydride vapor phase epitaxy reactor, to produce pseudo-substrates for electronic components, deposits layers of crystalline substrates from a gas phase with increased growth rates |
| 04/22/2004 | DE10247888A1 Einrichtung zur Erzeugung von Plasmen durch Hochfrequenzentladungen Means for generating plasma by high frequency discharge |
| 04/22/2004 | CA2501211A1 Method of forming a metal oxide film and microwave power source device used in the above method |
| 04/21/2004 | EP1411545A1 Vapor growth method and vapor growth device |
| 04/21/2004 | EP1411539A2 High frequency discharge plasma generating device |
| 04/21/2004 | EP1411153A1 METHOD FOR PREPARING GaN BASED COMPOUND SEMICONDUCTOR CRYSTAL |
| 04/21/2004 | EP1411144A1 METHOD FOR FORMING ULTRA−HIGH STRENGTH ELASTIC DIAMOND LIKE CARBON STRUCTURE |
| 04/21/2004 | EP1411143A1 Process for producing tubular pieces with an internal diamond coating |
| 04/21/2004 | EP1411031A1 Ceramic and method for preparation thereof, and dielectric capacitor, semiconductor and element |
| 04/21/2004 | EP1411028A1 Ceramics film and production method therefor, and ferroelectric capacitor, semiconductor device, other elements |
| 04/21/2004 | EP1410442A1 Electronic component and method for producing an electronic component |
| 04/21/2004 | EP1410433A2 Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices |
| 04/21/2004 | EP1409766A1 Systems and methods for delivering an ultrapure chemical |
| 04/21/2004 | EP1409765A1 Method for cvd of bpsg films |
| 04/21/2004 | EP1409764A1 Method and apparatus for bpsg deposition |
| 04/21/2004 | EP1320636B1 Method and device for depositing especially, organic layers by organic vapor phase deposition |
| 04/21/2004 | EP1054934A4 Alkane/polyamine solvent compositions for liquid delivery cvd |
| 04/21/2004 | EP0968319A4 Multiple vaporizer reagent supply system for chemical vapor deposition utilizing dissimilar precursor compositions |
| 04/21/2004 | CN1491527A Apparatus for generating low temperature plasma at atmospheric pressure |
| 04/21/2004 | CN1491435A Method and apparatus for transferring heat from substrate to chuck |
| 04/21/2004 | CN1491149A Honeycomb structural body forming ferrule, and method of manufacturing ferrule |
| 04/21/2004 | CN1490851A Thin-film shaper and shaping method thereof |
| 04/21/2004 | CN1490268A Fibre-optical prefabricated bar processing apparatus by plasma technology |