| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/15/2004 | US6749764 Plasma processing comprising three rotational motions of an article being processed |
| 06/15/2004 | US6749717 Device for in-situ cleaning of an inductively-coupled plasma chambers |
| 06/15/2004 | US6749687 In situ growth of oxide and silicon layers |
| 06/15/2004 | US6749671 Abatement of effluents from chemical vapor deposition processes using organometallic source reagents |
| 06/15/2004 | US6748959 Carbon layer forming method |
| 06/10/2004 | WO2004049422A1 Insulating film material containing organic silane or organic siloxane compound, method for producing same, and semiconductor device |
| 06/10/2004 | WO2004049421A1 Method for cleaning substrate processing chamber |
| 06/10/2004 | WO2004049420A1 Plasma processing apparatus and method |
| 06/10/2004 | WO2004049413A1 Apparatus for depositing thin film on wafer |
| 06/10/2004 | WO2004049411A1 Method for producing semiconductor substrate and method for fabricating field effect transistor and semiconductor substrate and field effect transistor |
| 06/10/2004 | WO2004049405A1 Backside heating chamber for emissivity independent thermal processes |
| 06/10/2004 | WO2004049369A2 Patterned granulized catalyst layer suitable for electron-emitting device, and associated fabrication method |
| 06/10/2004 | WO2004049358A2 Multifunctional particulate material, fluid, and composition |
| 06/10/2004 | WO2004048639A2 Method and apparatus for controlling a deposition process |
| 06/10/2004 | WO2004048638A1 Diamond material compounded of chemical vapor deposition diamond and polycrystalline-diamond, and the use of the same |
| 06/10/2004 | WO2004048637A1 Mocvd formation of cu2s |
| 06/10/2004 | WO2004048263A1 Carbon nanotube particulates, compositions and use thereof |
| 06/10/2004 | WO2004032196A3 Method of fabricating semiconductor by nitrogen doping of silicon film |
| 06/10/2004 | WO2004027838A3 Fast gas exchange for thermal conductivity modulation |
| 06/10/2004 | WO2004013901A3 Batch furnace |
| 06/10/2004 | WO2004007353A3 Continuous chemical vapor deposition process and process furnace |
| 06/10/2004 | WO2003060184A8 Method and apparatus for forming silicon containing films |
| 06/10/2004 | US20040110391 Atomic layer deposited Zr-Sn-Ti-O films |
| 06/10/2004 | US20040110348 Atomic layer deposited Zr-Sn-Ti-O films using TiI4 |
| 06/10/2004 | US20040110098 Exposing a first side of a first plastic layer of the optical disc to non-reactive ions;applying an adhesive material to the optical disc;securing a second layer to the first plastic layer |
| 06/10/2004 | US20040110040 Coated cemented carbide body and method for use |
| 06/10/2004 | US20040109940 Method of producing negative electrode for lithium secondary cell |
| 06/10/2004 | US20040109815 Substrate overcoated with nanparticle alloy catalyst; low temperature annealing |
| 06/10/2004 | US20040109328 Optical uses of diamondoid-containing materials |
| 06/10/2004 | US20040108470 Neutral particle beam processing apparatus |
| 06/10/2004 | US20040108314 Heating apparatus which has electrostatic adsorption function, and method for producing it |
| 06/10/2004 | US20040108308 Ceramic heater having a resistant heater element |
| 06/10/2004 | US20040108301 Linear drive system for use in a plasma processing system |
| 06/10/2004 | US20040108300 Semiconductor processing device |
| 06/10/2004 | US20040108066 Temperature measuring method and plasma processing apparatus |
| 06/10/2004 | US20040107911 Substrate support member for use in FPD manufacturing apparatus |
| 06/10/2004 | US20040107910 Plasma processing apparatus and plasma processing method |
| 06/10/2004 | US20040107897 Atomic layer deposition apparatus and method for preventing generation of solids in exhaust path |
| 06/10/2004 | US20040107895 Quartz thin film |
| 06/09/2004 | EP1427005A1 Process and device for making a tantalum pentoxide layer on a carrier material particularly titanium nitride and integreted circuit incorporating a tantalum pentoxide layer |
| 06/09/2004 | EP1426463A1 Process for atomic layer deposition of metal films |
| 06/09/2004 | EP1426328A2 Method for manufacturing of uniformly sized and controled semi-conductor nano structures by CVD process on dieletric |
| 06/09/2004 | EP1425784A1 Method for the production of iii-v- nitride-conductor-based semiconductor layers |
| 06/09/2004 | EP1425615A2 Use of deuterated gases for the vapor deposition of thin films for low-loss optical devices and waveguides |
| 06/09/2004 | EP1425435A2 Metal nitride deposition by ald using gettering reactant |
| 06/09/2004 | EP1425434A1 Method for coating oxidizable materials with oxide-containing layers |
| 06/09/2004 | EP1425433A1 Protective shield and system for gas distribution |
| 06/09/2004 | EP1425432A2 Atmospheric pressure wafer processing reactor having an internal pressure control system and method |
| 06/09/2004 | EP1425162A2 Optical materials and optical devices |
| 06/09/2004 | EP1425110A1 A method of depositing an inorganic film on an organic polymer |
| 06/09/2004 | EP0918586B1 Tool, especially for machining |
| 06/09/2004 | DE10254427A1 Device for coating a substrate used e.g. in biomedical applications has an additional unit for introducing a gas without layer-forming substances into the space of the gas discharge zone facing away from the substrate |
| 06/09/2004 | CN1503857A Process and device for deposition of at least partially crystalline silicium layer on substrate |
| 06/09/2004 | CN1503344A Method for forming aluminium lead wire |
| 06/09/2004 | CN1503326A Method for increasing atom layer deposition rate |
| 06/09/2004 | CN1503277A Formation of thin film resistors |
| 06/09/2004 | CN1503276A Formation of thin film resistors |
| 06/09/2004 | CN1502553A Carbon nano transistor array and grwoth method thereof |
| 06/09/2004 | CN1153283C Method for preparing substrate material of silicon structure on insulating layer using alumina as buried layer |
| 06/09/2004 | CN1153265C Apparatus for forming thin film using microwave and method therefor |
| 06/09/2004 | CN1152979C Coated body, its method of production and its use |
| 06/08/2004 | US6747302 FeRAM having BLT ferroelectric layer and method for forming the same |
| 06/08/2004 | US6747239 Plasma processing apparatus and method |
| 06/08/2004 | US6746957 Manufacture of semiconductor device with copper wiring |
| 06/08/2004 | US6746941 Semiconductor wafer and production method therefor |
| 06/08/2004 | US6746940 Integrated structure comprising a patterned feature substantially of single grain polysilicon |
| 06/08/2004 | US6746931 Capacitor for semiconductor memory device and method of manufacturing the same |
| 06/08/2004 | US6746908 Temperature controlling method, thermal treating apparatus, and method of manufacturing semiconductor device |
| 06/08/2004 | US6746769 Plastic container having a carbon-treated internal surface |
| 06/08/2004 | US6746727 Metal to ILD adhesion improvement by reactive sputtering |
| 06/08/2004 | US6746726 Method for forming film |
| 06/08/2004 | US6746709 Method for manufacture of a solar cell |
| 06/08/2004 | US6746540 Wafer support plate assembly having recessed upper pad and vacuum processing apparatus comprising the same |
| 06/08/2004 | US6745717 Method and apparatus for preparing nitride semiconductor surfaces |
| 06/03/2004 | WO2004047188A1 Boron phosphide semiconductor light-emitting device, method for manufacturing same, and light-emitting diode |
| 06/03/2004 | WO2004047158A1 Plasma processing apparatus and plasma processing method |
| 06/03/2004 | WO2004047157A1 Plasma processing apparatus and plasma processing method |
| 06/03/2004 | WO2004046417A2 Atomic layer deposition using metal amidinates |
| 06/03/2004 | WO2004046416A1 Apparatus for vacuum treating two dimensionally extended substrates and method for manufacturing such substrates |
| 06/03/2004 | WO2004010467A3 Low temperature dielectric deposition using aminosilane and ozone |
| 06/03/2004 | WO2004008827A3 Atomic layer deposition of high k dielectric films |
| 06/03/2004 | WO2004008491A3 Thermal processing system and configurable vertical chamber |
| 06/03/2004 | WO2003095695A3 Sputter coating apparatus including ion beam source(s), and corresponding method |
| 06/03/2004 | WO2002067302A8 Rhodium-rich oxygen barriers |
| 06/03/2004 | US20040107020 Fabrication system and fabrication method |
| 06/03/2004 | US20040106302 Method for forming PE-TEOS layer of semiconductor integrated circuit device |
| 06/03/2004 | US20040106285 Method of manufacturing a semiconductor structure comprising clusters and/or nanocrystal of silicon and a semiconductor structure of this kind |
| 06/03/2004 | US20040106269 Novel hot-filament chemical vapor deposition chamber and process with multiple gas inlets |
| 06/03/2004 | US20040106016 Coated cutting tool |
| 06/03/2004 | US20040105980 exhibiting one or more properties, such as magnetic, thermal, optical, electrical, biological, chemical, lubrication, and rheological; core particles of specified average particle size with a plurality of coatings |
| 06/03/2004 | US20040105935 repeated purging; for integrated ciruits/semiconductor wafers |
| 06/03/2004 | US20040105934 Ruthenium layer formation for copper film deposition |
| 06/03/2004 | US20040104392 Production method for light emitting element abstract: |
| 06/03/2004 | US20040103845 Filtered cathodic arc deposition method and apparatus |
| 06/03/2004 | US20040103844 [gas distributing system for delivering plasma gas to a wafer reaction chamber] |
| 06/03/2004 | DE69818076T2 Vorrichtung zur förderung von chemischen wirkstoffen Apparatus for promotion of chemical active ingredients |
| 06/03/2004 | DE10338731A1 Verfahren zur Herstellung einer (RO)(R'O)(R''O)M=O-Verbindung, dünnschichtbildendes Material, Dünnschicht und Halbleiterelement A process for producing a (RO) (R'O) (R''O) M = O compound thin film forming material, and thin-film semiconductor element |
| 06/03/2004 | DE10253513A1 Device for treating workpieces, especially hollow bodies, comprises treatment unit for receiving the workpieces, fluid supply unit which supplies fluid to the treatment unit and fluid control unit for controlling the fluid supply |
| 06/03/2004 | DE10253512A1 Device for treating workpieces, especially hollow bodies, comprises treatment unit for receiving the workpieces, fluid supply unit which supplies fluid to the treatment unit and fluid control unit for controlling the fluid supply |
| 06/02/2004 | EP1424724A1 Chemical vapor phase epitaxial device |