| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/02/2004 | EP1424614A2 Flow control of process gas in semiconductor manufacturing |
| 06/02/2004 | EP1424405A2 Method and apparatus for fabricating coated substrates |
| 06/02/2004 | EP1423558A2 Susceptor with epitaxial growth control devices and epitaxial reactor using the same |
| 06/02/2004 | EP1423480A1 Cubic boron nitride composition, coating and articles made therefrom, methods of making and using said composition, coating and articles |
| 06/02/2004 | EP1423259A1 Free-standing (al, ga, in)n and parting method for forming same |
| 06/02/2004 | EP0975435A4 Modular coating fixture |
| 06/02/2004 | EP0552375B1 Method of forming a semiconductor film with a chemical vapor deposition apparatus |
| 06/02/2004 | CN1502121A Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method |
| 06/02/2004 | CN1501895A Photo-induced hydrophilic article and method of making same |
| 06/02/2004 | CN1501751A 有机电致发光器件及其制造方法 Organic electroluminescent device and manufacturing method |
| 06/02/2004 | CN1501513A Stacked photovoltaic device |
| 06/02/2004 | CN1501455A Method of fabricating semiconductor device |
| 06/02/2004 | CN1501452A Plasma machining apparatus |
| 06/02/2004 | CN1501440A Semiconductor manufacturing apparatus enabling inspection of mass flow controller maintaining connection thereto |
| 06/02/2004 | CN1501438A Method for manufacturing lead straight pattern layer by silicon dioxide |
| 06/02/2004 | CN1501435A Gas injection apparatus for semiconductor processing system |
| 06/02/2004 | CN1500909A Raw material for chemical gas phase growth and manufacturing method for thin film using the raw material |
| 06/02/2004 | CN1500582A 被覆切削工具 Coated cutting tool |
| 06/01/2004 | US6745096 Maintenance method and system for plasma processing apparatus etching and apparatus |
| 06/01/2004 | US6744559 Color shifting carbon-containing interference pigments and foils |
| 06/01/2004 | US6744098 Transistor devices |
| 06/01/2004 | US6744085 Electronic device with electrode and its manufacture |
| 06/01/2004 | US6743934 Such as bis(6-methyl-2,4-heptanedionate)(1,5-cyclooctadiene) ruthenium |
| 06/01/2004 | US6743933 Process of forming thin film and precursor for chemical vapor deposition |
| 06/01/2004 | US6743739 Fabrication method for semiconductor integrated devices |
| 06/01/2004 | US6743738 Dopant precursors and processes |
| 06/01/2004 | US6743737 Forming integrated circuits; plasma vapor deposition |
| 06/01/2004 | US6743736 Reactive gaseous deposition precursor feed apparatus |
| 06/01/2004 | US6743718 Process for producing barrier film and barrier film thus produced |
| 06/01/2004 | US6743714 Low temperature integrated metallization process and apparatus |
| 06/01/2004 | US6743700 Semiconductor film, semiconductor device and method of their production |
| 06/01/2004 | US6743531 Oxide superconducting conductor and its production method |
| 06/01/2004 | US6743524 Barrier layer for an article and method of making said barrier layer by expanding thermal plasma |
| 06/01/2004 | US6743475 Process for producing aluminum oxide films at low temperatures |
| 06/01/2004 | US6743474 High purity and low porosity, which may be more effective as barrier layers. |
| 06/01/2004 | US6743473 Semiconductor devices, method for depositing metal and metal nitride layers by chemical vapor deposition of a precursor, cyclopentaidenely complex |
| 06/01/2004 | US6743340 Posiitoning in vacuum; magnetron sputtering ferromagnetic material on wafer |
| 06/01/2004 | US6743328 Grounded centering ring for inhibiting polymer build-up on the diaphragm of a manometer |
| 06/01/2004 | CA2290514C A method of coating edges with diamond-like carbon |
| 05/27/2004 | WO2004045248A2 Barrier coatings and methods in discharge lamps |
| 05/27/2004 | WO2004044970A1 Substrate processing device |
| 05/27/2004 | WO2004044969A1 Valve unit and heat treatment system |
| 05/27/2004 | WO2004044963A2 Atomic layer deposition methods |
| 05/27/2004 | WO2004044958A2 Composition and method for low temperature deposition of silicon-containing films |
| 05/27/2004 | WO2004044957A2 Method and apparatus for providing and integrating a general metal delivery source (gmds) with atomic layer deposition (ald) |
| 05/27/2004 | WO2004044039A2 Process and apparatus for depositing plasma coating onto a container |
| 05/27/2004 | WO2004043691A1 Extremely strain tolerant thermal protection coating and related method and apparatus thereof |
| 05/27/2004 | WO2004038783A3 Pecvd of organosilicate thin films |
| 05/27/2004 | WO2004029325A9 High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and a plasma reactor for carrying out said method |
| 05/27/2004 | WO2004009861A8 Method to form ultra high quality silicon-containing compound layers |
| 05/27/2004 | WO2004009299B1 Loading and unloading device for a coating unit |
| 05/27/2004 | WO2004008493A3 Method and apparatus for supporting semiconductor wafers |
| 05/27/2004 | WO2004007793A3 Method and apparatus for providing gas to a processing chamber |
| 05/27/2004 | WO2004001808A3 Method and system for atomic layer removal and atomic layer exchange |
| 05/27/2004 | WO2003087431B1 Deposition methods utilizing phased array microwave excitation, and deposition apparatuses |
| 05/27/2004 | WO2003076184A9 Method of making window unit including diamond-like carbon (dlc) coating |
| 05/27/2004 | WO2003016240A3 Components with bearing or wear-resistant surfaces |
| 05/27/2004 | WO2002101784B1 Plasma processor |
| 05/27/2004 | US20040102040 Film depositon on a semiconductor wafer |
| 05/27/2004 | US20040102038 MOCVD formation of Cu2S |
| 05/27/2004 | US20040101636 Plasma enhanced chemical vapor deposition; for production of optical lenses |
| 05/27/2004 | US20040101633 Chemical vapor deposition; low dielectric constant (k) |
| 05/27/2004 | US20040101632 Plasma enhanced chemical vapor deposition; for production of integrated circuits |
| 05/27/2004 | US20040101622 Comprises spraying ozone and inert gases, purging the ozone, then spraying trimethylaluminum; atomic layer deposition |
| 05/27/2004 | US20040101468 Using metal substrate, catalyst |
| 05/27/2004 | US20040101460 Air pollution control during semiconductor forming; removal trace elements; circulating polishing scrubbers |
| 05/27/2004 | US20040099899 High K dielectric material and method of making a high K dielectric material |
| 05/27/2004 | US20040099378 Gas injection apparatus for semiconductor processing system |
| 05/27/2004 | US20040099282 Monitoring and decomposition of deposits in enclosures used for chemical vapor deposition of semiconductors, using gas generators, radiation measuring instruments and analysis apparatus |
| 05/27/2004 | US20040099281 Method for cleaning plasma enhanced chemical vapor deposition chamber using very high frequency energy |
| 05/27/2004 | US20040099220 [laser annealing apparatus and application of the same] |
| 05/27/2004 | US20040099219 Semiconductor manufacturing system |
| 05/27/2004 | US20040099215 Chamber for constructing a film on a semiconductor wafer |
| 05/27/2004 | US20040099214 Production device for dlc film-coated plastic container and production method therefor |
| 05/27/2004 | US20040099213 Spatially programmable microelectronics process equipment using segmented gas injection showerhead with exhaust gas recirculation |
| 05/27/2004 | DE10352606A1 Device for producing a semiconductor component comprises a chamber containing an inner structure, a reaction gas feed unit for introducing reaction gas into the inner chamber, a cathode and anode for plasma discharge and a heater |
| 05/27/2004 | DE10296988T5 Bearbeitungsvorrichtung und -verfahren Processing apparatus and method |
| 05/26/2004 | EP1422762A1 PHOTOELECTRIC CONVERSION DEVICE−USE SUBSTRATE |
| 05/26/2004 | EP1422761A1 Glass plate having electroconductive film formed thereon |
| 05/26/2004 | EP1422749A1 Purging method for semiconductor production device and production method for semiconductor device |
| 05/26/2004 | EP1422747A1 APPARATUS AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND METHOD FOR CLEANING SEMICONDUCTOR PRODUCING APPARATUS |
| 05/26/2004 | EP1422743A1 Treatment system |
| 05/26/2004 | EP1422317A1 Gas treating device and gas treating method |
| 05/26/2004 | EP1422316A1 Method for cleaning reaction container and film deposition system |
| 05/26/2004 | EP1422315A1 Metallic material equipped with a protective layer realised through silicon oxides |
| 05/26/2004 | EP1422314A1 Dispositive and process to clean process chambers and vacuum lines |
| 05/26/2004 | EP1421630A2 Method of depositing an oxide layer on a substrate and a photovoltaic cell using said substrate |
| 05/26/2004 | EP1421607A2 Improved process for deposition of semiconductor films |
| 05/26/2004 | EP1421606A1 Plasma enhanced atomic layer deposition (peald) equipment and method of forming a conducting thin film using the same thereof |
| 05/26/2004 | EP1421599A2 Suspended gas distribution manifold for plasma chamber |
| 05/26/2004 | EP1421414A1 Optically coated article and method for its preparation |
| 05/26/2004 | EP1421227A2 Device for reactive plasma treatment of substrates and method for the use thereof |
| 05/26/2004 | EP1421226A1 Method for the deposition of silicon nitride |
| 05/26/2004 | EP1275129A4 E-beam/microwave gas jet pecvd method and apparatus for depositing and/or surface modification of thin film materials |
| 05/26/2004 | EP0988407B1 Method for producing coated workpieces, which are coated with an epitactic layer |
| 05/26/2004 | CN2617779Y Chemical gas phase depositing devices |
| 05/26/2004 | CN1500370A Device and control method for micro wave plasma processing |
| 05/26/2004 | CN1499586A Manufacturing method for continuous forming oxide/nitride/oxide insulation layer by using single wafer type reactor of chemical vapor deposition |
| 05/26/2004 | CN1499575A Island projection-modified part, method for producing same, and appts. comprising same |
| 05/25/2004 | US6740977 Insulating layers in semiconductor devices having a multi-layer nanolaminate structure of SiNx thin film and BN thin film and methods for forming the same |