| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/01/2004 | US20040124549 Liquid vapor delivery system and method of maintaining a constant level of fluid therein |
| 07/01/2004 | US20040124531 Copper diffusion barriers |
| 07/01/2004 | US20040124348 Controlling surface chemistry on solid substrates |
| 07/01/2004 | US20040124131 Precursor material delivery system for atomic layer deposition |
| 07/01/2004 | US20040123953 Apparatus and method for thermally isolating a heat chamber |
| 07/01/2004 | US20040123952 FPD fabricating apparatus |
| 07/01/2004 | US20040123879 Reacting a metal with one gas; forming oxides; decompsoition with second gas |
| 07/01/2004 | US20040123806 Chemical vapor deposition apparatus and method |
| 07/01/2004 | US20040123805 Vacuum treatment method and vacuum treatment device |
| 07/01/2004 | US20040123803 Shower head gas injection apparatus with secondary high pressure pulsed gas injection |
| 07/01/2004 | US20040123801 Apparatus and method for synthesizing spherical diamond powder by using chemical vapor deposition method |
| 07/01/2004 | US20040123800 Showerheads |
| 07/01/2004 | US20040123735 Method and system for supplying high purity fluid |
| 06/30/2004 | EP1434278A1 Apparatus and method for manufacturing silicon nanodot film for light emission |
| 06/30/2004 | EP1433874A2 Method for metal oxide thin film deposition via MOCVD |
| 06/30/2004 | EP1433740A1 Method for the closure of openings in a film |
| 06/30/2004 | EP1433192A1 Method and device for producing a plasma |
| 06/30/2004 | EP1432844A1 Apparatus for inverted cvd |
| 06/30/2004 | EP1432843A1 Method for making carbon doped oxide film |
| 06/30/2004 | EP1432842A2 Method of depositing cvd and ald films onto low-dielectric-constant dielectrics |
| 06/30/2004 | EP1432529A2 Article having a plasmapolymer coating and method for producing the same |
| 06/30/2004 | CN1509497A Semiconductor integrated circuit device and producing method thereof |
| 06/30/2004 | CN1509496A 等离子体处理装置 The plasma processing apparatus |
| 06/30/2004 | CN1508915A Surface-emitting type semiconductor laser and its manufacturing method |
| 06/30/2004 | CN1508852A Constant pressure control method for process reaction chamber and pressure regulating valve thereof |
| 06/30/2004 | CN1508284A Method for growing epitaxial chip of nitride LED structure by MOCVD |
| 06/30/2004 | CN1508283A Device for supplying gas for epitaxial growth |
| 06/30/2004 | CN1156022C Photovoltaic element and method of and apparatus for manufacturing the same |
| 06/30/2004 | CN1155607C Di (cyclopentadienyl) ruthenium derivative preparation method and meethod for preparing ruthemium or ruthenium compound film |
| 06/29/2004 | US6756674 Low dielectric constant silicon oxide-based dielectric layer for integrated circuit structures having improved compatibility with via filler materials, and method of making same |
| 06/29/2004 | US6756611 Nitride semiconductor growth method, nitride semiconductor substrate, and nitride semiconductor device |
| 06/29/2004 | US6756323 Method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device |
| 06/29/2004 | US6756318 Vapor deposiiton, purging cycles |
| 06/29/2004 | US6756293 Combined gate cap or digit line and spacer deposition using HDP |
| 06/29/2004 | US6756285 Multilayer structure with controlled internal stresses and making same |
| 06/29/2004 | US6756235 Metal oxide film formation method and apparatus |
| 06/29/2004 | US6756122 Process for the production of improved boron coatings |
| 06/29/2004 | US6756111 Coated hard alloy |
| 06/29/2004 | US6756088 Heating a fixture to a temperature greater than its temperature during normal deposition and then passing one or more gases through fixture to form a coating on it; improved evenness and adhesion of the fixutre coating |
| 06/29/2004 | US6756086 Method for the fabrication of a diamond semiconductor |
| 06/29/2004 | US6756085 Ultraviolet curing processes for advanced low-k materials |
| 06/29/2004 | US6756082 Thermal barrier coating resistant to sintering |
| 06/29/2004 | US6755934 Dry gas is jetted into a chamber provided with a lid for opening and closing the chamber, inner pressure of which is reduced, to blow up particles staying in the chamber and discharged through the duct while counting blown particles |
| 06/29/2004 | US6755151 Hot-filament chemical vapor deposition chamber and process with multiple gas inlets |
| 06/24/2004 | WO2004054047A2 Optical uses of diamondoid-containing materials |
| 06/24/2004 | WO2004053997A1 Method for forming a dielectric stack |
| 06/24/2004 | WO2004053947A2 Titanium silicon nitride (tisin) barrier layer for copper diffusion |
| 06/24/2004 | WO2004053190A1 Method and apparatus for treating a substrate |
| 06/24/2004 | WO2004053189A1 Support system for a treatment apparatus |
| 06/24/2004 | WO2004053188A1 Susceptor system |
| 06/24/2004 | WO2004053187A1 Susceptor system________________________ |
| 06/24/2004 | WO2004053178A1 Composite metal product and method for the manufacturing of such a product |
| 06/24/2004 | WO2004039731A3 Nanostructures produced by phase-separation during growth of (iii-v)1-x(iv2)x alloys |
| 06/24/2004 | WO2004036631A3 Silicon-containing layer deposition with silicon compounds |
| 06/24/2004 | WO2004009867A8 Zirconium complex used for the cvd method and preparation method of a thin film using thereof |
| 06/24/2004 | WO2003058680A3 Supercritical fluid-assisted deposition of materials on semiconductor substrates |
| 06/24/2004 | WO1999064780A9 Chemical delivery system having purge system utilizing multiple purge techniques |
| 06/24/2004 | US20040121620 Surface preparation prior to deposition |
| 06/24/2004 | US20040121616 Method for bottomless deposition of barrier layers in integrated circuit metallization schemes |
| 06/24/2004 | US20040121610 Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma |
| 06/24/2004 | US20040121596 Source alternating MOCVD processes to deposit tungsten nitride thin films as barrier layers for MOCVD copper interconnects |
| 06/24/2004 | US20040121566 Method to produce low leakage high K materials in thin film form |
| 06/24/2004 | US20040121539 Non-volatile semiconductor memory device and manufacturing method for the same |
| 06/24/2004 | US20040121494 Infrared thermopile detector system for semiconductor process monitoring and control |
| 06/24/2004 | US20040121243 Damage-resistant coatings for EUV lithography components |
| 06/24/2004 | US20040121167 generating plasma stream with expanding thermal plasma generator, providing first reactant and at least one second reactant into plasma stream extending to substrate, forming hybrid organic-inorganic film; windshield uv radiation coatings |
| 06/24/2004 | US20040121164 generating plasma stream with expanding thermal plasma generator, providing first reactant comprising titanium and second reactant comprising oxygen into plasma stream extending to substrate and forming titanium oxide coat; vehicle windows, lenses |
| 06/24/2004 | US20040121086 Shortening the time required for depositing thin films by flowing gas inside the chamber to heat the substrate through heat exchange with the gas, then evacuating the chamber; for plasma enhanced chemical vapor deposition |
| 06/24/2004 | US20040121085 Method and apparatus for forming a high quality low temperature silicon nitride film |
| 06/24/2004 | US20040121074 Method for metal oxide thin film deposition via MOCVD |
| 06/24/2004 | US20040121073 Particles have an ultrathin, conformal coating made using atomic layer deposition; useful as fillers for electronic packaging, sintering aid for ceramics or cermets, as supported catalysts, in drug delivery with magnetic field, as explosive |
| 06/24/2004 | US20040120095 Electrostatic chuck support mechanism, support stand device and plasma processing equipment |
| 06/24/2004 | US20040119145 Method for depositing a very high phosphorus doped silicon oxide film |
| 06/24/2004 | US20040119067 Gallium nitride materials and methods |
| 06/24/2004 | US20040118834 Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method |
| 06/24/2004 | US20040118697 Metal deposition process with pre-cleaning before electrochemical deposition |
| 06/24/2004 | US20040118520 better resistance to water penetration; formed by the lamination of a plurality of rubber layers and reinforcing layer of yarns, which is used in automobiles and the like |
| 06/24/2004 | US20040118519 Blocker plate bypass design to improve clean rate at the edge of the chamber |
| 06/24/2004 | US20040118464 Multi - phase pressure control valve for process chamber |
| 06/24/2004 | US20040118346 Deposited-film formation apparatus, and deposited-film formation process |
| 06/24/2004 | US20040118345 Flexibly suspended gas distribution manifold for plasma chamber |
| 06/24/2004 | US20040118344 System and method for controlling plasma with an adjustable coupling to ground circuit |
| 06/24/2004 | US20040118343 Vacuum chamber load lock purging method and apparatus |
| 06/24/2004 | US20040118342 Bypass gas feed system and method to improve reactant gas flow and film deposition |
| 06/24/2004 | US20040117968 Very low moisture o-ring and method for preparing the same |
| 06/24/2004 | DE10256827A1 Production of a coated plastic substrate used in the production of optical components, comprises preparing a carrier foil, forming a decorated carrier foil, and forming a decorated plastic molded part by applying a functional layer |
| 06/24/2004 | DE10219556B4 Kapillarvorrichtung, Verfahren zu deren Herstellung und eine Verwendung einer Kapillarvorrichtung Capillary, to processes for their preparation, and a use of a capillary |
| 06/24/2004 | CA2508740A1 Optical uses of diamondoid-containing materials |
| 06/23/2004 | EP1432018A1 Single source mixtures of metal siloxides |
| 06/23/2004 | EP1432014A2 vacuum chamber purging method and apparatus |
| 06/23/2004 | EP1430516A2 Tool for handling wafers and epitaxial growth station |
| 06/23/2004 | EP1430064A1 Methods of synthesizing ruthenium and osmium compounds |
| 06/23/2004 | CN1507652A Coating agent, plasma-resistant component having coating film fomed by the coating agent, plasma processing device provided with the plasma-resistant component |
| 06/23/2004 | CN1507503A Processing system, processing method and mounting member |
| 06/23/2004 | CN1507502A Duo-step plasma cleaning of chamber residues |
| 06/23/2004 | CN1507015A Method for producing low-dielectric constant material and chemical vapour phase deposition (CVD) |
| 06/23/2004 | CN1507011A Photovoltage element and producing method and equipment thereof |
| 06/23/2004 | CN1506207A Plate display producing apparatus |
| 06/23/2004 | CN1154533C Vapor generating method and apparatus using same |
| 06/22/2004 | US6753610 Semiconductor device having multilayer interconnection structure and method of making the same |