| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/08/2004 | WO2004010469A3 Atomic layer deposition of multi-metallic precursors |
| 07/08/2004 | WO2003023880A8 Thin-film electrochemical devices on fibrous or ribbon-like substrates and method for their manufacture and design |
| 07/08/2004 | WO2002065516A8 Improved process for deposition of semiconductor films |
| 07/08/2004 | US20040133361 Method for CVD process control for enhancing device performance |
| 07/08/2004 | US20040132313 Method for production of a metallic or metal-containing layer |
| 07/08/2004 | US20040132298 Apparatus for fabricating a III-V nitride film |
| 07/08/2004 | US20040131796 Method of fabricating a protective film by use of vacuum ultraviolet rays |
| 07/08/2004 | US20040131773 Separate solution feeds of rare earth, barium and copper tetramethyl heptanedionate solutions; metal orgainc chemical vapor deposition; low cost, rapid, high throughput, simple reagent refill |
| 07/08/2004 | US20040131767 Method for producing a fluorescent material layer |
| 07/08/2004 | US20040130238 Composite material, for the production thereof and its use |
| 07/08/2004 | US20040130031 modifying carborane material to enable it to be deposited by chemical vapor deposition; used as a semiconductor |
| 07/08/2004 | US20040130029 Conformal lining layers for damascene metallization |
| 07/08/2004 | US20040129968 diffusion barrier layer comprising ternary compound elements formed on a substrate comprising ruthenium, titanium and nitrogen; capacitor comprising a bottom electrode formed on oxygen diffusion barrier layer; dielectric layer |
| 07/08/2004 | US20040129671 Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials |
| 07/08/2004 | US20040129385 Pre-loaded plasma reactor apparatus and application thereof |
| 07/08/2004 | US20040129351 Method and system for fabricating three-diemensional microstructure |
| 07/08/2004 | US20040129224 Cooling mechanism with coolant, and treatment device with cooling mechanism |
| 07/08/2004 | US20040129223 Apparatus and method for manufacturing silicon nanodot film for light emission |
| 07/08/2004 | US20040129221 Cooled deposition baffle in high density plasma semiconductor processing |
| 07/08/2004 | US20040129220 Plasma processing method and apparatus |
| 07/08/2004 | US20040129219 Atomic layer deposition apparatus and method |
| 07/08/2004 | US20040129218 Exhaust ring mechanism and plasma processing apparatus using the same |
| 07/08/2004 | US20040129215 Method for depositing especially crystalline layers from the gas phase onto especially crystalline substrates |
| 07/08/2004 | US20040129213 Chemical vapor deposition reactor |
| 07/08/2004 | US20040129212 Apparatus and method for delivery of reactive chemical precursors to the surface to be treated |
| 07/08/2004 | US20040129211 Tunable gas distribution plate assembly |
| 07/08/2004 | US20040129210 Gas nozzle for substrate processing chamber |
| 07/08/2004 | US20040129204 Chemical vapor deposition using organometallic precursors |
| 07/08/2004 | US20040129203 Silicon tube formed of bonded staves |
| 07/08/2004 | DE4417626B4 Einrichtung und Verfahren zum Herstellen eines Halbleiters Apparatus and method for manufacturing a semiconductor |
| 07/08/2004 | DE10358909A1 Plasma-CVD-Vorrichtung sowie Filmherstellverfahren und Verfahren zur Herstellung eines Halbleiterbauteils unter Verwendung derselben Plasma CVD apparatus and Filmherstellverfahren and method for producing a semiconductor device using the same |
| 07/08/2004 | DE10259174A1 Tribologisch beanspruchtes Bauelement und Gasmotor oder Verbrennungsmotor damit Tribologically claimed device and gas engine or engine so |
| 07/08/2004 | DE10258678A1 Process for applying alternating layers e.g. barrier layers onto a plastic bottle by chemical gas phase deposition comprises depositing an organic adhesion promoting layer on a substrate and applying an inorganic barrier layer |
| 07/08/2004 | DE10258560A1 Verfahren und Vorrichtung zum CVD-Beschichten von Werkstücken Method and apparatus for CVD coating of workpieces |
| 07/08/2004 | DE10258282A1 CVD-Beschichtungsverfarhen für ZrBx CyNz-Schichten (x+y+z = 1) sowie beschichtetes Schneidwerkzeug CVD Beschichtungsverfarhen for ZrBx CyNz layers (x + y + z = 1) and coated cutting tool |
| 07/08/2004 | DE10257628A1 Coating process for coating e.g. turbine blades comprises placing a mixture of an organometallic precursor and an inert powder in a hollow body to be coated, and heating to a temperature at which the precursor vaporizes and decomposes |
| 07/07/2004 | EP1435652A1 Silicon monocrystal wafer processing device, and method of manufacturing silicon monocrystal wafer and silicon epitaxial wafer |
| 07/07/2004 | EP1435401A1 Island coated part, method for producing the same, and apparatus comprising the same |
| 07/07/2004 | EP1435106A2 Lifting and supporting device |
| 07/07/2004 | EP1434898A1 Methods for the production of components and ultra high vacuum cvd reactor |
| 07/07/2004 | EP1434897A1 Method and device for depositing a plurality of layers on a substrate |
| 07/07/2004 | EP1434896A2 Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor |
| 07/07/2004 | CN1511339A Ultraviolet ray assisted processing deivce for semiconductor processing |
| 07/07/2004 | CN1511244A Heating medium circulating device and thermal treatment equipment usint the device |
| 07/07/2004 | CN1511198A Method and installation for densification of substrates by means of chemical vapour infiltration |
| 07/07/2004 | CN1510163A Container internal surface chemical vapor depositon coating method |
| 07/07/2004 | CN1510162A Method for depositing metal oxide thin film by MOCVD |
| 07/07/2004 | CN1156604C High density plasma CVD process for making dielectric anti-refletive coatings |
| 07/07/2004 | CN1156603C Large area plasma source |
| 07/07/2004 | CN1156602C Heating method for preparing metal substrate film |
| 07/07/2004 | CN1156598C PCVD plasma impregnation comsite reinforced method for precise vane hot forging die |
| 07/06/2004 | US6759705 Platinum-rhodium stack as an oxygen barrier in an integrated circuit capacitor |
| 07/06/2004 | US6759633 Heat treating device |
| 07/06/2004 | US6759347 Method of forming in-situ SRO HDP-CVD barrier film |
| 07/06/2004 | US6759346 Method of forming dielectric layers |
| 07/06/2004 | US6759344 Method for forming low dielectric constant interlayer insulation film |
| 07/06/2004 | US6759327 Method of depositing low k barrier layers |
| 07/06/2004 | US6759323 Method for filling depressions in a surface of a semiconductor structure, and a semiconductor structure filled in this way |
| 07/06/2004 | US6759253 Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units |
| 07/06/2004 | US6759250 Deposition method for lead germanate ferroelectric structure with multi-layered electrode |
| 07/06/2004 | US6759100 Layer formation method, and substrate with a layer formed by the method |
| 07/06/2004 | US6759081 Filling of the read head gaps with aluminum oxide or aluminum nitride. |
| 07/06/2004 | US6759018 Method for point-of-use treatment of effluent gas streams |
| 07/06/2004 | US6758911 Apparatus and process of improving atomic layer deposition chamber performance |
| 07/06/2004 | US6758909 Gas port sealing for CVD/CVI furnace hearth plates |
| 07/06/2004 | US6758900 Micro three-dimensional structure, production method therefor and production device therefor |
| 07/06/2004 | US6758662 Die for die compacting of powdered material |
| 07/06/2004 | US6758591 Mixing of materials in an integrated circuit manufacturing equipment |
| 07/06/2004 | US6758224 Chemical vapor deposition (cvd); generating active seeds of cleaning gas by applying high-frequency electric power to plasma-generator, feeding the active species into the processing space through holes in the partition plate |
| 07/06/2004 | CA2362214C Method of regulating a high temperature gaseous phase process and use of said method |
| 07/06/2004 | CA2270571C Composite article with adherent cvd diamond coating and method of making |
| 07/06/2004 | CA2240987C Reactor having an array of heating filaments and a filament force regulator |
| 07/01/2004 | WO2004055874A1 Method for producing silicon epitaxial wafer |
| 07/01/2004 | WO2004055873A1 Thin film forming apparatus |
| 07/01/2004 | WO2004055236A1 Cvd process to deposit aluminum oxide coatings |
| 07/01/2004 | WO2004055235A1 Method for chemical vapour deposition (cvd) of zrbxcynz (or x+y+z=1) layers and a cutting tool coated with said layer |
| 07/01/2004 | WO2004055234A1 Method for forming film |
| 07/01/2004 | WO2004055227A2 Method and device for the cvd coating of workpieces |
| 07/01/2004 | WO2004054893A1 Packaging material |
| 07/01/2004 | WO2004035854A3 Method and apparatus for processing substrates |
| 07/01/2004 | WO2004017377A3 Atomic layer deposition of high k metal oxides |
| 07/01/2004 | WO2004001817A9 Transfer chamber for vacuum processing system |
| 07/01/2004 | US20040127732 Methods for making metallocene compounds |
| 07/01/2004 | US20040127697 arylisothiocyanate compounds useful for activating alcohol-containing macromolecules, for example polyethyleneglycols and cellulose, for covalent linkage to amino-groups of biomolecules such as antibodies, enzymes, and proteins |
| 07/01/2004 | US20040127070 Additives to prevent degradation of alkyl-hydrogen siloxanes |
| 07/01/2004 | US20040127069 Deposition of silane and nitrogen in a plasma reactor onto a workkpiece; field-effect transistors |
| 07/01/2004 | US20040127067 Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes |
| 07/01/2004 | US20040127060 Deliberate semiconductor film variation to compensate for radial processing differences, determine optimal device characteristics, or produce small productions |
| 07/01/2004 | US20040127059 Clean gas injector system for reactor chamber |
| 07/01/2004 | US20040127042 Compound crystal and method of manufacturing same |
| 07/01/2004 | US20040127019 Film forming method and film forming apparatus |
| 07/01/2004 | US20040126983 Method for forming capacitor in semiconductor device |
| 07/01/2004 | US20040126980 Method of fabricating capacitor with hafnium |
| 07/01/2004 | US20040126954 Deposition methods with time spaced and time abutting precursor pulses |
| 07/01/2004 | US20040126649 Simple procedure for growing highly-ordered nanofibers by self-catalytic growth |
| 07/01/2004 | US20040126614 Fluoride-containing coating and coated member |
| 07/01/2004 | US20040126596 Plasma-deposited coatings, devices and methods |
| 07/01/2004 | US20040126493 a conductive member is between the electrode and the substrate holder to cover the entire space between them, and electrically connected to both |
| 07/01/2004 | US20040126485 Deposition processes using Group 8 (VIII) metallocene precursors |
| 07/01/2004 | US20040126482 Method and structure for selective surface passivation |