| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/21/2004 | EP1438444A2 Mechanically and thermodynamically stable amorphous carbon layers for temperature-sensitive surfaces |
| 07/21/2004 | EP1438360A1 Pigment with a metallic lustre |
| 07/21/2004 | EP1438315A2 Improved precursors for chemical vapour deposition |
| 07/21/2004 | EP1358364B1 Method and device for the metered delivery of low volumetric flows |
| 07/21/2004 | EP1315854B1 Apparatus and method for cleaning a bell jar in a barrel epitaxial reactor |
| 07/21/2004 | EP1299572B1 Method for vapour deposition of a film onto a substrate |
| 07/21/2004 | CN1515024A Treatment apparatus and method therefor |
| 07/21/2004 | CN1515018A Plasma processor |
| 07/21/2004 | CN1514888A Semiconductor or liquid crystal mfg. apparatus |
| 07/21/2004 | CN1514039A Cutting fool boron nitride composite coating layer and its preparation method |
| 07/21/2004 | CN1158692C Apparatus for manufacturing semiconductor device and its manufacturing method |
| 07/21/2004 | CN1158405C Device for treating container with microwave plasma |
| 07/21/2004 | CN1158404C Plasma processing system and method |
| 07/21/2004 | CN1158131C Aqueous vapour isolating oil filter capable of preventing oil from returning for lower-pressure chemical gas-phase precipitation system |
| 07/21/2004 | CN1158027C Ornamental stones |
| 07/20/2004 | US6765244 III nitride film and a III nitride multilayer |
| 07/20/2004 | US6764958 Method of depositing dielectric films |
| 07/20/2004 | US6764952 Systems and methods to retard copper diffusion and improve film adhesion for a dielectric barrier on copper |
| 07/20/2004 | US6764926 Method for obtaining high quality InGaAsN semiconductor devices |
| 07/20/2004 | US6764916 Manufacturing method for semiconductor device |
| 07/20/2004 | US6764713 Method of processing a wafer using a compliant wafer chuck |
| 07/20/2004 | US6764579 Solar management coating system including protective DLC |
| 07/20/2004 | US6764546 Apparatus and method for growth of a thin film |
| 07/20/2004 | US6764537 Copper metal precursor |
| 07/20/2004 | US6763700 Trap apparatus |
| 07/20/2004 | CA2114980C Method and apparatus for preparing crystalline thin-films for solid-state lasers |
| 07/15/2004 | WO2004059716A1 A system and method for controlling plasma with an adjustable coupling to ground circuit |
| 07/15/2004 | WO2004059712A1 Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma |
| 07/15/2004 | WO2004059707A2 A method and apparatus for forming a high quality low temperature silicon nitride film |
| 07/15/2004 | WO2004059048A1 Diamond film-forming silicon and its manufacturing method |
| 07/15/2004 | WO2004059047A1 Diamond film-forming silicon and its manufacturing method |
| 07/15/2004 | WO2004059033A2 Blocker plate bypass arrangement to improve clean rate at the edge of a processing chamber |
| 07/15/2004 | WO2004058629A1 Method of manufacturing micro structure, and method of manufacturing mold material |
| 07/15/2004 | WO2003051946A3 Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films |
| 07/15/2004 | WO1999041766A9 Reactor for chemical vapor deposition of titanium |
| 07/15/2004 | US20040138489 Composition and method for low temperature deposition of silicon-containing films |
| 07/15/2004 | US20040137760 Thin film processing method and system |
| 07/15/2004 | US20040137758 Method for curing low dielectric constant film using direct current bias |
| 07/15/2004 | US20040137757 Method and apparatus to improve cracking thresholds and mechanical properties of low-k dielectric material |
| 07/15/2004 | US20040137756 Method of improving stability in low k barrier layers |
| 07/15/2004 | US20040137750 Method and apparatus for removing material from chamber and wafer surfaces by high temperature hydrogen-containing plasma |
| 07/15/2004 | US20040137726 Underlayer film-forming material for copper, method for a forming underlayer film for copper, an underlayer film for copper, and a semiconductor device |
| 07/15/2004 | US20040137663 Method of reducing internal stress in materials |
| 07/15/2004 | US20040137647 Electronic device, production method thereof, and plasma process apparatus |
| 07/15/2004 | US20040137398 Susceptor pocket profile to improve process performance |
| 07/15/2004 | US20040137243 Plasma polymerization with an oxidized cyclic siloxane monomers, oxidized at lower powers with mild oxidants; high mechanical strength, low dielectric K values ; dielectric layer in electronics |
| 07/15/2004 | US20040137230 Cutting tool and process for the formation thereof |
| 07/15/2004 | US20040137207 Magnetic disk comprising a first carbon overcoat having a high SP3 content and a second carbon overcoat having a low SP3 content |
| 07/15/2004 | US20040137169 coating semiconductor wafers by injecting nitrogen and silane gases into chemical reactors, then generating plasma gases by applying radio frequency power to the gases |
| 07/15/2004 | US20040137167 Plasma enhanced pulsed layer deposition |
| 07/15/2004 | US20040137147 improved corrosion resistance within plasma chambers; chemical vapor deposition |
| 07/15/2004 | US20040137146 Forming a thin film structure |
| 07/15/2004 | US20040135271 Liquid vaporizer with positive liquid shut-off |
| 07/15/2004 | US20040135221 Method for producing semi-conducting devices and devices obtained with this method |
| 07/15/2004 | US20040135214 Structure and method for formation of a blocked silicide resistor |
| 07/15/2004 | US20040135186 Semiconductor device and method for manufacturing same |
| 07/15/2004 | US20040135183 Ferroelectric capacitor, process for production thereof and semiconductor device using the same |
| 07/15/2004 | US20040134618 Plasma processing apparatus and focus ring |
| 07/15/2004 | US20040134613 Device and method for plasma processing, and slow-wave plate |
| 07/15/2004 | US20040134611 Plasma process system and plasma process method |
| 07/15/2004 | US20040134431 Diamond film depositing apparatus using microwaves and plasma |
| 07/15/2004 | US20040134429 Film forming method and film forming apparatus |
| 07/15/2004 | US20040134428 Thin-film deposition device |
| 07/15/2004 | US20040134427 Deposition chamber surface enhancement and resulting deposition chambers |
| 07/15/2004 | US20040134426 Observation window of plasma processing apparatus and plasma processing apparatus using the same |
| 07/15/2004 | US20040134352 Silica trap for phosphosilicate glass deposition tool |
| 07/15/2004 | DE10261362A1 Semiconductor substrate holder for epitaxial processes, has structure designed to equalize temperature over substrate placed on or near it |
| 07/15/2004 | DE10260860A1 Silicon germanium micro-mechanical layer comprises upper and lower surfaces and doping material whose concentration varies through layer |
| 07/14/2004 | EP1437768A1 Plasma cleaning gas and plasma cleaning method |
| 07/14/2004 | EP1437763A1 Semiconductor manufacturing apparatus and method for manufacturing semiconductor device |
| 07/14/2004 | EP1437328A1 Method for creating silicon dioxide film |
| 07/14/2004 | EP1436444A1 Method and device for monitoring a cvd process |
| 07/14/2004 | EP1436442A2 Amorphous hydrogenated carbon film |
| 07/14/2004 | EP1049820B9 Method for epitaxial growth on a substrate |
| 07/14/2004 | CN1513210A Method for producing light-emitting device |
| 07/14/2004 | CN1513201A Deposition method, deposition apparatus, insulation film and semiconductor integrated circuit |
| 07/14/2004 | CN1513197A Apparatus and method for improving plasma distribution and performance in inductively coupled plasma |
| 07/14/2004 | CN1512548A Film processing method and film processing system |
| 07/14/2004 | CN1511973A Preheating reaction room |
| 07/14/2004 | CN1511972A Plasma treating device with protective tube |
| 07/14/2004 | CN1511690A Substrate support member for use in FPP manufacturing apparatus |
| 07/14/2004 | CN1157496C Gas distributing system |
| 07/14/2004 | CN1157495C Computer control device for vacuum coating |
| 07/14/2004 | CN1157249C Detergent and washing method for harmful gas |
| 07/13/2004 | US6762435 Reduced dielectric constant |
| 07/13/2004 | US6762420 Organic film vapor deposition method and a scintillator panel |
| 07/13/2004 | US6761772 Workpiece support |
| 07/13/2004 | US6761771 Semiconductor substrate-supporting apparatus |
| 07/13/2004 | US6761770 Sensors measure the pressure within the system and adjusts control units for maintainance |
| 07/13/2004 | US6761750 Cemented carbide with binder phase enriched surface zone |
| 07/13/2004 | US6761128 Plasma treatment apparatus |
| 07/08/2004 | WO2004057935A1 Microwave plasma generating device |
| 07/08/2004 | WO2004057657A1 Method to produce low leakage high k materials in thin film form |
| 07/08/2004 | WO2004057656A1 Substrate processing device and semiconductor device producing method |
| 07/08/2004 | WO2004057655A1 Process for producing compound semiconductor, apparatus therefor, infrared emitting element and infrared receiving element |
| 07/08/2004 | WO2004057653A2 A method and apparatus for forming a high quality low temperature silicon nitride layer |
| 07/08/2004 | WO2004057053A2 Methods for producing coated metal wire |
| 07/08/2004 | WO2004026096A3 Viewing window cleaning apparatus |
| 07/08/2004 | WO2004023525A3 Low temperature deposition of silicon based thin films by single-wafer hot-wall rapid thermal chemical vapor deposition |
| 07/08/2004 | WO2004020691A3 Systems and methods for forming zirconium and/or hafnium-containing layers |