| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/24/2004 | US6779483 Plasma CVD apparatus for large area CVD film |
| 08/24/2004 | US6779482 Plasma deposition device for forming thin film |
| 08/24/2004 | US6779481 Electrical coupling between chamber parts in electronic device processing equipment |
| 08/24/2004 | US6779378 Method of monitoring evaporation rate of source material in a container |
| 08/24/2004 | CA2141536C Abrasion wear resistant coated substrate product |
| 08/19/2004 | WO2004070820A1 Wiring fabricating method |
| 08/19/2004 | WO2004070817A2 Method of eliminating residual carbon from flowable oxide fill material |
| 08/19/2004 | WO2004070814A1 Vacuum treating device with lidded treatment container |
| 08/19/2004 | WO2004070813A1 Plasma processing apparatus and method |
| 08/19/2004 | WO2004070803A1 Heater of chemical vapor deposition apparatus for manufacturing a thin film |
| 08/19/2004 | WO2004070802A1 Treating system and operating method for treating system |
| 08/19/2004 | WO2004070801A1 Fluid control device and heat treatment device |
| 08/19/2004 | WO2004070788A2 Method for depositing a low dielectric constant film |
| 08/19/2004 | WO2004070079A1 Semiconductor processing method for processing substrate to be processed and its apparatus |
| 08/19/2004 | WO2004070078A1 METHOD OF FORMING A Ta2O5 COMPRISING LAYER |
| 08/19/2004 | WO2004070074A2 Nanolayer deposition process |
| 08/19/2004 | WO2004011694A3 Method and apparatus for generating gas to a processing chamber |
| 08/19/2004 | WO2004010463A3 Vaporizer delivery ampoule |
| 08/19/2004 | WO2004001808A8 Method and system for atomic layer removal and atomic layer exchange |
| 08/19/2004 | US20040161946 Method for fluorocarbon film depositing |
| 08/19/2004 | US20040161943 Silicon parts having reduced metallic impurity concentration for plasma reaction chambers |
| 08/19/2004 | US20040161911 Epitaxial and polycrystalline growth of Si1-x-yGexCy and Si1-yCy alloy layers on Si by UHV-CVD |
| 08/19/2004 | US20040161903 Nitrous oxide anneal of TEOS/ozone CVD for improved gapfill |
| 08/19/2004 | US20040161899 Radical oxidation and/or nitridation during metal oxide layer deposition process |
| 08/19/2004 | US20040161892 Methods of forming metal-comprising materials and capacitor electrodes; and capacitor constructions |
| 08/19/2004 | US20040161891 Semiconductor integrated circuit device and method of manufacturing the same |
| 08/19/2004 | US20040161875 Epitaxial and polycrystalline growth of Si1-x-yGexCy and Si1-yCy alloy layers on Si by UHV-CVD |
| 08/19/2004 | US20040161636 Method of depositing thin films for magnetic heads |
| 08/19/2004 | US20040161617 Process for depositing low dielectric constant materials |
| 08/19/2004 | US20040161609 Cubic boron nitride/diamond composite layers |
| 08/19/2004 | US20040161536 Vapor deposition using high pressure gas ; supplying trimethylsilane and oxygen |
| 08/19/2004 | US20040161535 Method of forming silicon carbide films |
| 08/19/2004 | US20040161534 Generating discharging high pressure plasma; applying pulsed voltage |
| 08/19/2004 | US20040161533 Vapor deposition of molybdenum, tungsten rhenium, or alloy thereof; controlling exhaust electroconductivity |
| 08/19/2004 | US20040161528 Corrosion resistant protective coatings |
| 08/19/2004 | US20040161372 Flowing exhaust gas into enclosure; forming film on removable substrate by chemical vapor deposition |
| 08/19/2004 | US20040160672 Color shifting carbon-containing interference pigments |
| 08/19/2004 | US20040160021 Electrostatic chucking device and manufacturing method thereof |
| 08/19/2004 | US20040159854 Thin film device and its fabrication method |
| 08/19/2004 | US20040159638 Clean process for an electron beam source |
| 08/19/2004 | US20040159540 Pulsed electric field system for decontamination of biological agents on a dielectric sheet material |
| 08/19/2004 | US20040159472 Method and apparatus for measurement of weight during CVI/CVD process |
| 08/19/2004 | US20040159401 Vacuum chamber for plasma treatment; imparting mechanical oscillation to the apparatus and detecting oscillation generated |
| 08/19/2004 | US20040159286 Plasma treatment device |
| 08/19/2004 | US20040159285 Gas gate for isolating regions of differing gaseous pressure |
| 08/19/2004 | US20040159005 Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gases |
| 08/19/2004 | DE10305546A1 Internally coated hollow member, has a coating supplied using a gas plasma by pulling the component to be coated through a ring electrode connected to an HF source and direct current source |
| 08/18/2004 | EP1447459A2 A method and system for producing thin films |
| 08/18/2004 | EP1090159A4 Deposition of coatings using an atmospheric pressure plasma jet |
| 08/18/2004 | CN1522462A Method for preparing low dielectric films |
| 08/18/2004 | CN1522457A Chamber components having textured surfaces and method of manufacture |
| 08/18/2004 | CN1522314A Semiconductor or liquid crystal producing device |
| 08/18/2004 | CN1522313A Method for improving nucleation and adhesion of cvd and ald films deposited onto low-dielectric-constant dielectrics |
| 08/18/2004 | CN1522215A Device for manufacturing DLC film coated plastic container, DLC film coated plastic container and manufacturing method thereof |
| 08/18/2004 | CN1521805A Plasma processing device, annular element and plasma processing method |
| 08/18/2004 | CN1521769A Formation of thin film resistors |
| 08/18/2004 | CN1521768A Formation of thin film resistors |
| 08/18/2004 | CN1521172A Organic metal compound and its manufacturing method ,solution materials and thin films containing the same compound |
| 08/18/2004 | CN1162569C Deposition process for low-stress superthick nitrogen silicon compound film |
| 08/18/2004 | CN1162568C Process for preparing selective diamond film |
| 08/17/2004 | US6777880 Particles are exposed in location-selective manner to external adjustment forces and/or plasma conditions are subjected to location-selective change to apply particles onto a substrate surface mask-free and/ or subject it to plasma treatment |
| 08/17/2004 | US6777740 Capacitor for semiconductor memory device and method of manufacturing the same |
| 08/17/2004 | US6777690 Organic film vapor deposition method and a scintillator panel |
| 08/17/2004 | US6777565 Organometallic compounds and their use as precursors for forming films and powders of metal or metal derivatives |
| 08/17/2004 | US6777374 Photocatalysts are semiconductors such as titanium dioxide and are coated onto a substrate by flame aerosol coating |
| 08/17/2004 | US6777353 Process for producing oxide thin films |
| 08/17/2004 | US6777352 Variable flow deposition apparatus and method in semiconductor substrate processing |
| 08/17/2004 | US6777349 Hermetic silicon carbide |
| 08/17/2004 | US6777347 Method to produce porous oxide including forming a precoating oxide and a thermal oxide |
| 08/17/2004 | US6777330 Chemistry for chemical vapor deposition of titanium containing films |
| 08/17/2004 | US6777327 Method of barrier metal surface treatment prior to Cu deposition to improve adhesion and trench filling characteristics |
| 08/17/2004 | US6777308 Method of improving HDP fill process |
| 08/17/2004 | US6777296 Semiconductor device and manufacturing method thereof |
| 08/17/2004 | US6777171 Using gas mixtures; vapor deposition; applying electricity |
| 08/17/2004 | US6777045 Chamber components having textured surfaces and method of manufacture |
| 08/17/2004 | US6777037 Plasma processing method and apparatus |
| 08/17/2004 | US6777030 Ion milling prior to diamond-like carbon (dlc) inclusive coating system) deposition; improves adherence, scratch resistance |
| 08/17/2004 | US6777029 Method for determining product coating rates for fluidized beds |
| 08/17/2004 | US6776875 Semiconductor substrate support assembly having lobed o-rings therein |
| 08/17/2004 | US6776873 Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers |
| 08/17/2004 | US6776851 Oxygen based cleaning operation liberates fluorine from the fluorine containing polymer layer to remove a silicon based residue. an apparatus configured to remove chamber deposits between process operations is also provided. |
| 08/17/2004 | US6776850 Preventative maintenance aided tool for CVD chamber |
| 08/17/2004 | US6776849 Wafer holder with peripheral lift ring |
| 08/17/2004 | US6776848 Motorized chamber lid |
| 08/17/2004 | US6776842 First thin epitaxial deposition, then an anneal; the conditions and duration such that arsenic diffusion length is lower than thickness of the layer, then second epitaxial deposition to desired thickness; avoids autodoping of arsenic |
| 08/17/2004 | US6776819 Gas supplying apparatus and method of testing the same for clogs |
| 08/17/2004 | US6776805 Semiconductor manufacturing apparatus having a moisture measuring device |
| 08/17/2004 | US6776170 Method and apparatus for plasma cleaning of workpieces |
| 08/17/2004 | US6775876 Apparatus having scraping blades attached peripherally about annular mounting member and arranged parallel to longitudinal axis of chamber, reciprocable movement unit for rotating blades circumferentially back and forth along interior surface |
| 08/12/2004 | WO2004068917A1 Plasma processor and plasma processing method |
| 08/12/2004 | WO2004068541A2 Wafer handling apparatus |
| 08/12/2004 | WO2004068530A1 Plasma reactor including helical electrodes |
| 08/12/2004 | WO2004067812A1 Diamond composite substrate and process for producing the same |
| 08/12/2004 | WO2004067800A1 Method and apparatus for cleaning a cvd chamber |
| 08/12/2004 | WO2004067799A1 Susceptor device for semiconductor processing, film forming apparatus, and film forming method |
| 08/12/2004 | WO2004067676A1 Controlled sulfur species deposition process |
| 08/12/2004 | WO2004066944A2 Products for treating and preventing chronic diseases: eliminating the autoimmune triggers that underly chronic disease |
| 08/12/2004 | WO2004057653A3 A method and apparatus for forming a high quality low temperature silicon nitride layer |
| 08/12/2004 | WO2004053947A3 Titanium silicon nitride (tisin) barrier layer for copper diffusion |
| 08/12/2004 | WO2004025697A3 Thermal process station with heated lid |