| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 08/05/2004 | US20040149387 Inductively coupled antenna and plasma processing apparatus using the same |
| 08/05/2004 | US20040149386 Plasma processing device and method of cleaning the same |
| 08/05/2004 | US20040149330 Stacked photovoltaic device |
| 08/05/2004 | US20040149227 Substrate heating device and method of purging the device |
| 08/05/2004 | US20040149225 Process and apparatus for depositing plasma coating onto a container |
| 08/05/2004 | US20040149224 Gas tube end cap for a microwave plasma generator |
| 08/05/2004 | US20040149221 Plasma processor |
| 08/05/2004 | US20040149220 Methods and apparatus for forming precursors |
| 08/05/2004 | US20040149216 Plasma processing apparatus |
| 08/05/2004 | US20040149215 Ultraviolet ray assisted processing device for semiconductor processing |
| 08/05/2004 | US20040149213 Micromachines for delivering precursors and gases for film deposition |
| 08/05/2004 | US20040149212 Reaction chamber for depositing thin film |
| 08/05/2004 | US20040149211 Systems including heated shower heads for thin film deposition and related methods |
| 08/05/2004 | US20040149209 Process and apparatus for the production of carbon nanotubes |
| 08/05/2004 | US20040149208 Particle control device and particle control method for vacuum processing apparatus |
| 08/05/2004 | DE19833718B4 Verfahren zur Verringerung der Partikelabgabe und Partikelaufnahme einer Waferauflage A method for reducing the particle charge and particle absorption of a wafer support |
| 08/05/2004 | DE19751785B4 Verfahren zum Behandeln eines Halbleiter-Wafers A method for treating a semiconductor wafer |
| 08/05/2004 | DE10303413B3 Production of structured ceramic layers on surfaces of relief arranged vertically to substrate surface comprises preparing semiconductor substrate with relief on its surface, filling the relief with lacquer and further processing |
| 08/05/2004 | CA2512648A1 Methods of making carbon nanotube films, layers, fabrics, ribbons, elements and articles |
| 08/05/2004 | CA2512387A1 Methods of using thin metal layers to make carbon nanotube films, layers, fabrics, ribbons, elements and articles |
| 08/04/2004 | EP1443545A2 Method of making a haze free, lead rich pzt film |
| 08/04/2004 | EP1443543A1 Thermal treating apparatus |
| 08/04/2004 | EP1443527A1 SUBSTRATE WITH TRANSPARENT CONDUCTIVE OXIDE FILM AND PRODUCTION METHOD THEREFOR, AND PHOTOELECTRIC CONVERSION ELEMENT |
| 08/04/2004 | EP1442860A1 Honeycomb structural body forming ferrule and method of manufacturing the ferrule |
| 08/04/2004 | EP1442788A2 Screening inorganic materials for catalysis |
| 08/04/2004 | EP1442154A1 Method for producing a continuous coating at the surface of a component |
| 08/04/2004 | EP1183406B1 Sequential chemical vapor deposition |
| 08/04/2004 | EP0977907B1 Combination antiabrasion layer |
| 08/04/2004 | CN2630257Y Superhigh vacuum chemical vapour deposition apparatus |
| 08/04/2004 | CN1518758A Rhodium-riched oxygen barriers |
| 08/04/2004 | CN1518757A Smooth multipart substrate support member for CVD |
| 08/04/2004 | CN1518109A Semiconductor suitable for forming semiconductor film coating such as platinum and its manufacturing method |
| 08/04/2004 | CN1518076A Forebody for depositing silicon film and its method |
| 08/04/2004 | CN1518075A Organic insulating film, its manufacturing method, semiconductor device using the organic insulating film and its manufacturing method |
| 08/04/2004 | CN1518073A 等离子体处理装置及聚焦环 The plasma processing apparatus and the focus ring |
| 08/04/2004 | CN1517450A Insertion piece with hard metal coating |
| 08/04/2004 | CN1517447A Raw material composition for CVD and its manufacturing method and chemical gas-phase evaporation plating method of iridium or iridium compound film |
| 08/04/2004 | CN1160767C Vapor deposition routes to nanoporous silica |
| 08/04/2004 | CN1160483C Method for manufacturing thin film, and deposition apparatus |
| 08/04/2004 | CN1160482C Double sintered diffuser |
| 08/04/2004 | CN1160481C Metal organic chemical vapor deposition apparatus and deposition method |
| 08/04/2004 | CN1160480C Apparatus for simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
| 08/04/2004 | CN1160479C Plasma enhanced chemical processing reactor and method |
| 08/04/2004 | CN1160478C Vacuum film growth apparatus |
| 08/04/2004 | CN1160423C Interference pigments having blue mass tone |
| 08/04/2004 | CN1160186C Nano-scale composition, compound structure, its manufacturing and application |
| 08/03/2004 | US6772072 Method and apparatus for monitoring solid precursor delivery |
| 08/03/2004 | US6772045 System for determining dry cleaning timing, method for determining dry cleaning timing, dry cleaning method, and method for manufacturing semiconductor device |
| 08/03/2004 | US6771868 Use of deuterated gases for the vapor deposition of thin films for low-loss optical devices and waveguides |
| 08/03/2004 | US6770914 III nitride semiconductor substrate for ELO |
| 08/03/2004 | US6770575 Method for improving thermal stability of fluorinated amorphous carbon low dielectric constant materials |
| 08/03/2004 | US6770573 Method for fabricating an ultralow dielectric constant material |
| 08/03/2004 | US6770561 Method for depositing metal film through chemical vapor deposition process |
| 08/03/2004 | US6770556 Method of depositing a low dielectric with organo silane |
| 08/03/2004 | US6770399 Composite material for anode of lithium secondary battery, and lithium secondary battery |
| 08/03/2004 | US6770379 Susceptor for semiconductor manufacturing equipment and process for producing the same |
| 08/03/2004 | US6770332 Method for forming film by plasma |
| 08/03/2004 | US6770165 Apparatus for plasma treatment |
| 08/03/2004 | US6770146 Method and system for rotating a semiconductor wafer in processing chambers |
| 08/03/2004 | US6770145 Low-pressure CVD apparatus and method of manufacturing a thin film |
| 08/03/2004 | US6770144 High speed vapor deposition of dielectric; dry etching patterning |
| 08/03/2004 | US6769629 Gas injector adapted for ALD process |
| 08/03/2004 | US6769439 Used in semiconductor manufacturing, a plate-shaped protector made of dielectric and having similar electrical properties as the deposited film; removing thin film deposited on inner face of vacuum vessel |
| 08/03/2004 | CA2289039C Packaging material |
| 08/03/2004 | CA2109236C Coated filaments |
| 07/29/2004 | WO2004064407A2 Tunable gas distribution plate assembly |
| 07/29/2004 | WO2004064147A2 Integration of ald/cvd barriers with porous low k materials |
| 07/29/2004 | WO2004064136A1 A method of improving stability in low k barrier layers |
| 07/29/2004 | WO2004064113A2 Cooled deposition baffle in high density plasma semiconductor processing |
| 07/29/2004 | WO2004063430A1 High-speed diamond growth using a microwave plasma in pulsed mode |
| 07/29/2004 | WO2004063422A2 Method for curing low dielectric constant film using direct current bias |
| 07/29/2004 | WO2004063421A2 Deposition chamber surface enhancement and resulting deposition chambers |
| 07/29/2004 | WO2004063418A1 Member of apparatus for plasma treatment, member of treating apparatus, apparatus for plasma treatment, treating apparatus and method of plasma treatment |
| 07/29/2004 | WO2004063417A2 Method to improve cracking thresholds and mechanical properties of low-k dielectric material |
| 07/29/2004 | WO2004063416A2 Apparatus and method for solution plasma spraying |
| 07/29/2004 | WO2004062341A2 Method and apparatus for layer by layer deposition of thin films |
| 07/29/2004 | WO2004041397A3 Preparation of asymmetric membranes using hot-filament chemical vapor deposition |
| 07/29/2004 | WO2004024981A3 Precursor material delivery system for atomic layer deposition |
| 07/29/2004 | WO2003097891A3 High-power microwave window |
| 07/29/2004 | WO2003060184A9 Method and apparatus for forming silicon containing films |
| 07/29/2004 | US20040147736 Activated polyethylene glycol compounds |
| 07/29/2004 | US20040147191 Anti-ballistic fabric or other substrate |
| 07/29/2004 | US20040147138 Method for forming metal-containing films using metal complexes with chelating o- and/or n-donor ligands |
| 07/29/2004 | US20040147137 Method for fabricating semiconductor devices |
| 07/29/2004 | US20040147115 Two-step formation of etch stop layer |
| 07/29/2004 | US20040147109 Low dielectric constant film produced from silicon compounds comprising silicon-carbon bond |
| 07/29/2004 | US20040147103 Technique for high efficiency metaloganic chemical vapor deposition |
| 07/29/2004 | US20040147101 Surface preparation prior to deposition |
| 07/29/2004 | US20040147098 Method for forming, by CVD, nanostructures of semi-conductor material of homogeneous and controlled size on dielectric material |
| 07/29/2004 | US20040147086 Methods and apparatus for forming rhodium-containing layers |
| 07/29/2004 | US20040147052 System and method for increasing nitrogen incorporation into a semiconductor material layer using an additional element |
| 07/29/2004 | US20040146720 Glass plate having electroconductive film formed thereon |
| 07/29/2004 | US20040146667 Manufacturing device for dlc film coated plastic container, dlc film coated plastic container, and method of manufacturing the dlc film coated plastic container |
| 07/29/2004 | US20040146666 Moisture and gas barrier plastic container with partition plates, and device for method manufacturing the plastic container |
| 07/29/2004 | US20040146661 Hydrogen assisted hdp-cvd deposition process for aggressive gap-fill technology |
| 07/29/2004 | US20040146655 Using tris/tert-butyloxy/silanol ; cyclic process |
| 07/29/2004 | US20040146644 Precursors for depositing silicon containing films and processes thereof |
| 07/29/2004 | US20040146643 In interior of chemical reactor used for vapor deposition; depositing a silicide |
| 07/29/2004 | US20040146448 Connecting vessel with phosphorus pentoxide to vessel with hafnium tetrachloride; cooling with liquid nitrogen; dropping fuming nitric acid into first vessel to produce nitrogen pentoxide; heating, disconnecting, refluxing; pumping, sublimation |
| 07/29/2004 | US20040146378 Pressurized chamber; door with opening; suppression of air flow eliminates contamination; clean box |