| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 08/31/2004 | US6784049 Method for forming refractory metal oxide layers with tetramethyldisiloxane |
| 08/31/2004 | US6784033 Method for the manufacture of an insulated gate field effect semiconductor device |
| 08/31/2004 | US6784031 Method for forming thin films of semiconductor devices |
| 08/31/2004 | US6783875 Multilayer coating |
| 08/31/2004 | US6783863 Substrate with a surface spray coating of yttrium oxide (Y2O3); resistance to chemical corrosion and plasma erosion by halogen gas |
| 08/31/2004 | US6783856 Metal oxyanion coated porous substrates |
| 08/31/2004 | US6783849 Reacting substrate having a surface-exposed monolayer with a bifunctional reagent that reacts with exposed reactive group, producing coupling layer having exposed reactive group with which reactive group of selected compound can react |
| 08/31/2004 | US6783725 Coated cemented carbide body and method for use |
| 08/31/2004 | US6783630 Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling |
| 08/31/2004 | US6783627 Reactor with remote plasma system and method of processing a semiconductor substrate |
| 08/31/2004 | US6783626 Treatment and evaluation of a substrate processing chamber |
| 08/31/2004 | US6783621 Method of manufacturing a thermostructural composite material bowl, in particular for an installation that produces silicon single crystals |
| 08/31/2004 | US6783590 Method of growing a thin film onto a substrate |
| 08/31/2004 | US6783569 Vacuum vapor deposition; metallization, alloying |
| 08/31/2004 | US6783118 Vaporizing reactant liquids for chemical vapor deposition film processing |
| 08/31/2004 | US6782907 Gas recirculation flow control method and apparatus for use in vacuum system |
| 08/31/2004 | US6782843 Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system |
| 08/26/2004 | WO2004073056A1 Method for cleaning substrate processing apparatus and substrate processing apparatus |
| 08/26/2004 | WO2004073054A1 Cooling device for vacuum treatment device |
| 08/26/2004 | WO2004073051A1 Purged heater-susceptor for an ald/cvd reactor |
| 08/26/2004 | WO2004073049A2 Methods and apparatus for processing semiconductor wafers with plasma processing chambers in a wafer track environment |
| 08/26/2004 | WO2004072959A2 Disk coating system |
| 08/26/2004 | WO2004072323A2 High reflectivity atmospheric pressure furnace for preventing contamination of a work piece |
| 08/26/2004 | WO2004072322A1 Amorphous carbon film forming method and device |
| 08/26/2004 | WO2004050943A3 Method for the treatment of surfaces with plasma in a vacuum and unit for the same |
| 08/26/2004 | WO2004050936A3 Method for cleaning a process chamber |
| 08/26/2004 | WO2004044958A3 Composition and method for low temperature deposition of silicon-containing films |
| 08/26/2004 | WO2004015742A3 High rate deposition in a batch reactor |
| 08/26/2004 | WO2003080887A3 Methods and apparatus for annealing in physical vapor deposition systems |
| 08/26/2004 | WO2003069029A8 A susceptor provided with indentations and an epitaxial reactor which uses the same |
| 08/26/2004 | US20040167922 Database processing system, method, program and program storage device |
| 08/26/2004 | US20040166695 For facilitating the deposition and patterning of organic materials onto substrates utilizing the vapor transport mechanism of carrier gas streams |
| 08/26/2004 | US20040166694 High density plasma chemical vapor deposition process |
| 08/26/2004 | US20040166692 Method for producing hydrogenated silicon oxycarbide films |
| 08/26/2004 | US20040166680 Method of manufacturing semiconductor device |
| 08/26/2004 | US20040166671 Methods for forming ruthenium films with beta-diketone containing ruthenium complexes and method for manufacturing metal-insulator-metal capacitor using the same |
| 08/26/2004 | US20040166665 Method of decreasing the K value in SIOC layer deposited by chemical vapor deposition |
| 08/26/2004 | US20040166628 Methods and apparatus for forming dielectric structures in integrated circuits |
| 08/26/2004 | US20040166596 Manufacturing method of semiconductor device |
| 08/26/2004 | US20040166378 Scratch, corrosion amd heat resistant; colorfast; suitable for salty and acidic foods; alternating layers of chromium nitride alone and with titanium and aluminum |
| 08/26/2004 | US20040166360 Hot press forming method, and a plated steel material therefor and its manufacturing method |
| 08/26/2004 | US20040166355 comprises nickel/aluminum based intermetallics; for promoting heat transfer |
| 08/26/2004 | US20040166240 Method for preparing low dielectric films |
| 08/26/2004 | US20040166239 Packing containers; oxygen barrier; substrates with vapor deposited overcoating; heating; annealing |
| 08/26/2004 | US20040166235 Patterning carbon nanotube film on substrates; bonding to conductive binder |
| 08/26/2004 | US20040165871 Wafer holder for semiconductor manufacturing device and semiconductor manufacturing device in which the holder is installed |
| 08/26/2004 | US20040165870 Delivery of solid chemical precursors |
| 08/26/2004 | US20040165272 Color shifting carbon-containing interference pigments |
| 08/26/2004 | US20040164329 Semiconductor device and method of manufacturing the same |
| 08/26/2004 | US20040164327 Method of horizontally growing carbon nanotubes and field effect transistor using the carbon nanotubes grown by the method |
| 08/26/2004 | US20040164089 Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites |
| 08/26/2004 | US20040163945 Substrate coating region and electrode cleaning region; rotatable electrode positioned in deposition chamber having interior cavitiy with magnet systems disposed |
| 08/26/2004 | US20040163764 Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |
| 08/26/2004 | US20040163762 Plasma treating device and substrate mounting table |
| 08/26/2004 | US20040163677 Heat treatment apparatus and cleaning method of the same |
| 08/26/2004 | US20040163599 Film deposition system and method of fabricating semiconductor device employing the film deposition system |
| 08/26/2004 | US20040163598 Method and apparatus for manufacturing optical fiber preform using MCVD with preheating process |
| 08/26/2004 | US20040163597 Apparatus for fabricating semiconductor devices, heating arrangement, shower head arrangement, method of reducing thermal disturbance during fabrication of a semiconductor device, and method of exchanging heat during fabrication of a semiconductor device |
| 08/26/2004 | US20040163591 Coating agent, plasma-resistant component having coating film formed by the coating agent, plasma processing device provided with the plasma-resistant component |
| 08/26/2004 | US20040163590 In-situ health check of liquid injection vaporizer |
| 08/26/2004 | DE10152707B4 Verfahren zur Herstellung einer Solarzelle A process for producing a solar cell |
| 08/26/2004 | CA2516210A1 Cooling device for vacuum treatment device |
| 08/25/2004 | EP1449930A1 Alloy, process for producing a coating of such an alloy and coated substrate |
| 08/25/2004 | EP1449407A2 Induction heating devices and methods for controllably heating an article |
| 08/25/2004 | EP1449243A1 Method for forming an oxynitride spacer for a metal gate electrode using a pecvd process with a silicon-starving atmosphere |
| 08/25/2004 | EP1449241A1 Lanthanide series layered superlattice materials for integrated circuit applications |
| 08/25/2004 | EP1449240A1 Incorporation of nitrogen into high k dielectric film |
| 08/25/2004 | EP1448807A1 Fluorocarbon-organosilicon copolymers and coatings prepared by hot-filament chemical vapor deposition |
| 08/25/2004 | EP1448805A2 Improved method for coating a support with a material |
| 08/25/2004 | EP1448486A1 Burner for a vapour deposition process |
| 08/25/2004 | EP1448319A1 Source liquid supply apparatus having a cleaning function |
| 08/25/2004 | EP1339625A4 Throughput enhancement for single wafer reactor |
| 08/25/2004 | EP1165860B1 Diamond-coated tool |
| 08/25/2004 | EP1025278A4 Vertically-stacked process reactor and cluster tool system for atomic layer deposition |
| 08/25/2004 | EP1017873A4 Single body injector and deposition chamber |
| 08/25/2004 | EP0996765A4 Substrate processing apparatus having a substrate transport with a front end extension and an internal substrate buffer |
| 08/25/2004 | CN1524291A Metal ion diffusion barrier layers |
| 08/25/2004 | CN1523412A Display device and method for manufacturing the same |
| 08/25/2004 | CN1523132A A method and system for producing thin films |
| 08/25/2004 | CN1163955C Susceptor for semiconductor manufacturing equipment and process for producing the same |
| 08/25/2004 | CN1163942C Large workpiece plasma processor |
| 08/25/2004 | CN1163631C Coated turning insert |
| 08/25/2004 | CN1163628C Wafer processing reactor having gas flow control system and method |
| 08/25/2004 | CN1163311C Aluminium hydrophilic processing technology |
| 08/24/2004 | US6781237 Wiring-inclusive structure and forming method thereof |
| 08/24/2004 | US6781175 Rhodium-rich integrated circuit capacitor electrode |
| 08/24/2004 | US6781164 Semiconductor element |
| 08/24/2004 | US6780790 Semiconductor device and method of manufacturing the same |
| 08/24/2004 | US6780787 Low contamination components for semiconductor processing apparatus and methods for making components |
| 08/24/2004 | US6780752 Metal thin film of semiconductor device and method for forming same |
| 08/24/2004 | US6780704 Conformal thin films over textured capacitor electrodes |
| 08/24/2004 | US6780699 Semiconductor device and method for fabricating the same |
| 08/24/2004 | US6780551 Charged particle processing for forming pattern boundaries at a uniform thickness |
| 08/24/2004 | US6780476 Method of forming a film using chemical vapor deposition |
| 08/24/2004 | US6780465 Method for making thin film and electronic apparatus |
| 08/24/2004 | US6780464 Rotation in gas flow; forming polycrystalline silicon |
| 08/24/2004 | US6780463 Method of forming a MOCVD-TiN thin film |
| 08/24/2004 | US6780462 Pressure gradient CVI/CVD process |
| 08/24/2004 | US6780278 Plasma processing apparatus with reduced parasitic capacity and loss in RF power |
| 08/24/2004 | US6780251 Substrate processing apparatus and method for fabricating semiconductor device |