| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/12/2004 | US20040157472 Deposition method, deposition apparatus, insulating film and semiconductor integrated circuit |
| 08/12/2004 | US20040157430 Methods and apparatus for processing semiconductor wafers with plasma processing chambers in a wafer track environment |
| 08/12/2004 | US20040157347 Device and method for monitoring process exhaust gas, semiconductor manufacturing device, and system and method for controlling semiconductor manufacturing device |
| 08/12/2004 | US20040157183 Heating system, method for heating a deposition or oxidation reactor, and reactor including the heating system |
| 08/12/2004 | US20040157061 Antireflection film made of a CVD SiO2 film containing a fluoro and/or alkyl modifier |
| 08/12/2004 | US20040157006 Method of producing a magnetic disk |
| 08/12/2004 | US20040157005 Method of plasma enhanced chemical vapor deposition of diamond using methanol-based solutions |
| 08/12/2004 | US20040156987 Ultra low dielectric materials based on hybrid system of linear silicon precursor and organic porogen by plasma-enhanced chemical vapor deposition (PECVD) |
| 08/12/2004 | US20040155829 Slot aray antenna and plasma processing apparatus |
| 08/12/2004 | US20040155592 Magnetic mirror plasma source |
| 08/12/2004 | US20040155585 Gas discharge panel and its production method |
| 08/12/2004 | US20040155573 Diamond high brightness ultraviolet ray emitting element |
| 08/12/2004 | US20040155340 Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device |
| 08/12/2004 | US20040155279 Semiconductor device and method and system for fabricating the same |
| 08/12/2004 | US20040155278 Semiconductor device, apparatus and method for manufacturing the same |
| 08/12/2004 | US20040155271 Reliable semiconductor device and method of manufacturing the same |
| 08/12/2004 | US20040155236 Photoelectronic conversion device-use substrate |
| 08/12/2004 | US20040154746 Apparatus and method for producing a semiconductor device including a byproduct control system |
| 08/12/2004 | US20040154745 Method of processing PFC and apparatus for processing PFC |
| 08/12/2004 | US20040154704 Forming intermetallics, alloy, ceramic or composite |
| 08/12/2004 | US20040154543 Wafer holder for semiconductor manufacturing device and semiconductor manufacturing device in which it is installed |
| 08/12/2004 | US20040154541 Method and apparatus for sequential plasma treatment |
| 08/12/2004 | US20040154540 Plasma processing unit and high-frequency electric power supplying unit |
| 08/12/2004 | US20040154538 Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces |
| 08/12/2004 | CA2512395A1 Controlled sulfur species deposition process |
| 08/11/2004 | EP1445786A2 Gas discharge panel and its production method |
| 08/11/2004 | EP1445346A1 Aluminide coating of gas turbine engine blade |
| 08/11/2004 | EP1445345A1 Aluminide coating of gas turbine engine blade |
| 08/11/2004 | EP1444717A2 Tunable multi-zone gas injection system |
| 08/11/2004 | EP1444390A2 Apparatus and method for diamond production |
| 08/11/2004 | EP1444380A2 Gas delivery apparatus for atomic layer deposition |
| 08/11/2004 | EP1444379A1 Atomic layer deposition apparatus and process |
| 08/11/2004 | EP1042783B1 Focus rings |
| 08/11/2004 | EP0989211B1 Process for obtaining diamond layers by gaseous-phase synthesis |
| 08/11/2004 | CN1520604A Electrode member for plasma treating appts., plasma treating appts. and plasma treating method |
| 08/11/2004 | CN1519905A Method for detecting deposition temperature |
| 08/11/2004 | CN1519891A Method of mfg. iron silicide and photoelectric energy converter |
| 08/11/2004 | CN1519889A Cleaning method for mfg. appts. of semiconductor device |
| 08/11/2004 | CN1519581A 闪烁体面板 The scintillator panel |
| 08/11/2004 | CN1519214A Superbardness fire resisting glass as well as preparing method and special equipment |
| 08/11/2004 | CN1519196A Method for preparing film of tube of directed nano carbon on soft base |
| 08/11/2004 | CN1161827C Method for producing silicon oxide film, method for making semiconductor device, semiconductor device, display, and infrared irradiating device |
| 08/11/2004 | CN1161821C Plasma polymerizing apparatus having electrode with lot of uniform edges |
| 08/11/2004 | CN1161820C Method and apparatus for manufacturing semiconductor layers, and manufacture of photoltaic solar cell |
| 08/10/2004 | US6774570 Applying radio frequency wave of first frequency to discharge space to ignite radio frequency discharge of process gas, applying another radio frequency wave of different frequency to discharge space with time lag after igniting discharge |
| 08/10/2004 | US6774418 Low dielectric silicon oxynitride spacer films and devices incorporating such films |
| 08/10/2004 | US6774060 Methods and apparatus for thermally processing wafers |
| 08/10/2004 | US6774038 Organometal complex and method of depositing a metal silicate thin layer using same |
| 08/10/2004 | US6774019 Incorporation of an impurity into a thin film |
| 08/10/2004 | US6774018 Barrier coatings produced by atmospheric glow discharge |
| 08/10/2004 | US6774005 Method for fabricating a metal carbide layer and method for fabricating a trench capacitor containing a metal carbide |
| 08/10/2004 | US6773980 Methods of forming a field emission device |
| 08/10/2004 | US6773813 Particles with vapor deposition coating |
| 08/10/2004 | US6773762 Plasma treatment method |
| 08/10/2004 | US6773751 Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof |
| 08/10/2004 | US6773750 Chemical vapor deposition method and related material |
| 08/10/2004 | US6773749 This configuration eliminates the long prior art gas supply line that was between the gas manifold and the point of use; eliminates the requirement to evacuate and/or purge the long prior art gas supply line |
| 08/10/2004 | US6773687 Exhaust apparatus for process apparatus and method of removing impurity gas |
| 08/10/2004 | US6773617 Method and apparatus for restricting process fluid flow within a showerhead assembly |
| 08/10/2004 | US6773544 Magnetic barrier for plasma in chamber exhaust |
| 08/10/2004 | US6773508 Single crystal silicon carbide thin film fabrication method and fabrication apparatus of the same |
| 08/10/2004 | US6773507 Apparatus and method for fast-cycle atomic layer deposition |
| 08/10/2004 | US6773506 Method for producing thin film |
| 08/10/2004 | US6773495 Solutions of metal-comprising materials |
| 08/10/2004 | US6772827 Suspended gas distribution manifold for plasma chamber |
| 08/10/2004 | US6772710 From bis(trimethylsilyl)methane and oxygen retaining gas and hydrogen |
| 08/05/2004 | WO2004066377A1 Method of cvd for forming silicon nitride film on substrate |
| 08/05/2004 | WO2004066376A1 Dielectric film forming method |
| 08/05/2004 | WO2004066374A1 Fluorine-free plasma curing process for porous low-k-materials |
| 08/05/2004 | WO2004066365A2 Cleaning of cvd chambers using remote source with cxfyoz based chemistry |
| 08/05/2004 | WO2004065658A1 Method and apparatus for removing material from chamber and wafer surfaces by high temperature hydrogen-containing plasma |
| 08/05/2004 | WO2004065657A1 Methods of making carbon nanotube films, layers, fabrics, ribbons, elements and articles |
| 08/05/2004 | WO2004065655A1 Methods of using thin metal layers to make carbon nanotube films, layers, fabrics, ribbons, elements and articles |
| 08/05/2004 | WO2004065654A1 Component for film forming device and method of washing the component |
| 08/05/2004 | WO2004065650A2 Chemical vapor deposition precursors for deposition of tantalum-based materials |
| 08/05/2004 | WO2004065294A2 Systems and methods for producing single-walled carbon nanotubes (swnts) on a substrate |
| 08/05/2004 | WO2004057053A3 Methods for producing coated metal wire |
| 08/05/2004 | WO2004044039A3 Process and apparatus for depositing plasma coating onto a container |
| 08/05/2004 | WO2004007318A3 Loadport apparatus and method for use thereof |
| 08/05/2004 | WO2003010354A3 Reactive polymer coatings |
| 08/05/2004 | US20040152342 Method of eliminating residual carbon from flowable oxide fill |
| 08/05/2004 | US20040152341 HDP-CVD deposition process for filling high aspect ratio gaps |
| 08/05/2004 | US20040152339 Method of fabricating semiconductor device |
| 08/05/2004 | US20040152338 Method for depositing a low dielectric constant film |
| 08/05/2004 | US20040152334 Organic insulating film, manufacturing method thereof, semiconductor device using such organic insulating film and manufacturing method thereof |
| 08/05/2004 | US20040152304 Insitu post atomic layer deposition destruction of active species |
| 08/05/2004 | US20040152300 Method for forming metal wiring in a semiconductor device |
| 08/05/2004 | US20040152287 Deposition of a silicon film |
| 08/05/2004 | US20040152254 Method of forming a Ta2O5 comprising layer |
| 08/05/2004 | US20040152219 Method and device for depositing layers |
| 08/05/2004 | US20040152214 Method of making a haze free, lead rich PZT film |
| 08/05/2004 | US20040151845 Hybrid process; vapor deposition; atomic layer deposition; purging; cyclic process; thin films; controlling substrate temperature |
| 08/05/2004 | US20040151836 Aluminide coating of gas turbine engine blade |
| 08/05/2004 | US20040151834 Aluminide coating of gas turbine engine blade |
| 08/05/2004 | US20040151656 Modular molecular halogen gas generation system |
| 08/05/2004 | US20040151221 Surface emitting semiconductor laser and method of fabricating the same |
| 08/05/2004 | US20040150312 Carbon nanotube particulate electron emitters |
| 08/05/2004 | US20040150021 Semiconductor device suitable for forming conductive film such as platinum with good coverage, and its manufacture |
| 08/05/2004 | US20040149741 Plasma processing apparatus |
| 08/05/2004 | US20040149574 Penning discharge plasma source |