| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/08/2004 | EP1027473A4 Mini-batch process chamber |
| 09/08/2004 | EP0958401B1 Apparatus and method for high density plasma chemical vapor deposition or etching |
| 09/08/2004 | CN1527366A Mechanical performace to improve compact and porous organic silicate material by ultraviolet radiation |
| 09/08/2004 | CN1527361A N and In codoping process in preparing hole type zinc oxide film |
| 09/08/2004 | CN1526853A Low-pressure chemical gas phase vapour connecting apparatus and thin film producing method |
| 09/08/2004 | CN1165969C Plasma processing device |
| 09/08/2004 | CN1165492C Method and device for spaying of material |
| 09/07/2004 | US6787861 Non-crystalline oxides for use in microelectronic, optical, and other applications |
| 09/07/2004 | US6787483 Gap fill for high aspect ratio structures |
| 09/07/2004 | US6787481 Method for manufacturing semiconductor device |
| 09/07/2004 | US6787477 Methods of forming dielectric layers and methods of forming capacitors |
| 09/07/2004 | US6787463 Chemical vapor deposition methods, and atomic layer deposition method |
| 09/07/2004 | US6787373 Method of replacing at least a portion of semiconductor substrate deposition process kit hardware, and method of depositing materials over a plurality of semiconductor substrates |
| 09/07/2004 | US6787200 Method and device for electronic cyclotronic resonance plasma deposit of carbon nanofibre layers in fabric form and resulting fabric layers |
| 09/07/2004 | US6787194 Method and apparatus for pulsed detonation coating of internal surfaces of small diameter tubes and the like |
| 09/07/2004 | US6787186 Method of controlled chemical vapor deposition of a metal oxide ceramic layer |
| 09/07/2004 | US6787185 Overcoating semiconductor substrates; vapor deposition |
| 09/07/2004 | US6787181 Dissolving trimethylbismuth and a metal compound in a solvent; forming mist with carrier gas; vaporizing; applying vapor onto integrated circuit substrate to produce thin film superlattice material; completing the fabrication of integrated ciruit |
| 09/07/2004 | US6787053 Carbonyl fluoride, fluoroformate and oxygen gas mixtures antideposit agents for silicon; low global warming |
| 09/07/2004 | US6787012 Apparatus for the synthesis of layers, coatings or films |
| 09/07/2004 | US6786997 Plasma processing apparatus |
| 09/07/2004 | US6786973 Method for depositing in particular crystalline layers, gas-admission element and device for carrying out the method |
| 09/07/2004 | US6786936 Methods, complexes, and systems for forming metal-containing films on semiconductor structures |
| 09/07/2004 | US6786222 Method for removing particles from a semiconductor processing tool |
| 09/07/2004 | US6786176 Diamond film depositing apparatus and method thereof |
| 09/07/2004 | US6786175 Showerhead electrode design for semiconductor processing reactor |
| 09/06/2004 | CA2459474A1 Method for preparing membrane eletrode assemblies |
| 09/02/2004 | WO2004075609A2 Pulsed electric field system for decontamination of biological agents on a dielectric sheet material |
| 09/02/2004 | WO2004075296A1 Method for manufacturing ferroelectric capacitor |
| 09/02/2004 | WO2004075279A1 Organic thin-film transistor device and method for manufacturing same |
| 09/02/2004 | WO2004075272A1 Substrate-processing apparatus and method of producing semiconductor device |
| 09/02/2004 | WO2004075271A1 Carburetor, method of vaporizing material solution, and method of washing carburetor |
| 09/02/2004 | WO2004075258A2 Method for depositing a low-k material having a controlled thickness range |
| 09/02/2004 | WO2004074545A1 Film-forming apparatus component and method for cleaning same |
| 09/02/2004 | WO2004074543A1 Method for forming film |
| 09/02/2004 | WO2004074538A2 Foodware with multilayer stick resistant ceramic coating and method of making |
| 09/02/2004 | WO2004073893A2 Gas gate for isolating regions of differing gaseous pressure |
| 09/02/2004 | WO2004073850A1 Gas feeding apparatus |
| 09/02/2004 | WO2004073849A2 Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gases |
| 09/02/2004 | WO2004064147A3 Integration of ald/cvd barriers with porous low k materials |
| 09/02/2004 | WO2004059707A3 A method and apparatus for forming a high quality low temperature silicon nitride film |
| 09/02/2004 | WO2004059033A3 Blocker plate bypass arrangement to improve clean rate at the edge of a processing chamber |
| 09/02/2004 | WO2004041753A3 Deposition processes using group 8 (viii) metallocene precursors |
| 09/02/2004 | US20040171858 Asymmetric Group 8 (VIII) metallocene compounds |
| 09/02/2004 | US20040171280 Atomic layer deposition of nanolaminate film |
| 09/02/2004 | US20040171253 Method for preparing gan based compound semiconductor crystal |
| 09/02/2004 | US20040171210 Fabrication method for semiconductor integrated devices |
| 09/02/2004 | US20040170761 Adjusting the temperature of solutions for metal deposition of thin films |
| 09/02/2004 | US20040170760 Forming a dielectric layer using a hydrocarbon-containing precursor |
| 09/02/2004 | US20040170407 Substrate support |
| 09/02/2004 | US20040170403 Apparatus and method for vaporizing solid precursor for CVD or atomic layer deposition |
| 09/02/2004 | US20040170402 Delivery of solid chemical precursors |
| 09/02/2004 | US20040169259 Ultra thin TCS (SiCl4) cell nitride for DRAM capacitor with DCS (SiH2CI2) interface seeding layer |
| 09/02/2004 | US20040169184 Boron phosphide-based semiconductor light-emitting device, production method thereof and light-emitting diode |
| 09/02/2004 | US20040169010 Using water vapor to removal impurities; etching titanium nitride film using photoresist as masking; using oxygen, nitrogen as ashing gases; then water |
| 09/02/2004 | US20040168769 Plasma processing equipment and plasma processing method |
| 09/02/2004 | US20040168768 Aftertreatment plasma processing; closing valve; ejecting cleaning gas through holes of showder plate; applying microwaves |
| 09/02/2004 | US20040168766 Monitoring, controlling gas supply ; evacuated enclosure; controlling circulation ratio |
| 09/02/2004 | US20040168712 Method for cleaning semiconductor manufacturing system |
| 09/02/2004 | US20040168642 Film deposition system |
| 09/02/2004 | US20040168641 Apparatus for manufacturing semiconductor or liquid crystal |
| 09/02/2004 | US20040168638 System and method for heat treating semiconductor |
| 09/02/2004 | US20040168637 Filtered cathodic arc deposition method and apparatus |
| 09/02/2004 | US20040168633 Substrate processing apparatus and substrate processing method |
| 09/02/2004 | US20040168631 Plasma processing apparatus having protection members |
| 09/02/2004 | US20040168627 Atomic layer deposition of oxide film |
| 09/02/2004 | US20040168612 Coal tar and hydrocarbon mixture pitch and the preparation and use thereof |
| 09/02/2004 | CA2513911A1 Foodware with multilayer stick resistant ceramic coating and method of making |
| 09/01/2004 | EP1453082A1 GAS FOR PLASMA REACTION, PROCESS FOR PRODUCING THE SAME, AND USE |
| 09/01/2004 | EP1453079A2 Outer tube made of silicon carbide and thermal treatment system for semiconductors |
| 09/01/2004 | EP1452626A1 Mixer, and device and method for manufacturing thin film |
| 09/01/2004 | EP1452625A2 Method of cleaning a cvd reaction chamber |
| 09/01/2004 | EP1452624A2 Process and apparatus for batch and continuous densification by chemical vapor infiltration (CVI) |
| 09/01/2004 | EP1452623A1 Precursor solution and method for controlling the composition of MOCVD deposited PCMO |
| 09/01/2004 | EP1452221A1 Gas supplying method and system |
| 09/01/2004 | EP1451861A1 Apparatus and method for reactive atom plasma processing for material deposition |
| 09/01/2004 | EP1451858A1 Interconnects with improved barrier layer adhesion |
| 09/01/2004 | EP1451387A1 Chemical vapor deposition reactor |
| 09/01/2004 | EP1451386A1 Chemical vapor deposition vaporizer |
| 09/01/2004 | EP1451385A1 Cyclical deposition of refractory metal silicon nitride |
| 09/01/2004 | EP1451384A2 Coating method and coating |
| 09/01/2004 | EP1451118A2 Buffing diamond-like carbon (dlc) to improve scratch resistance |
| 09/01/2004 | EP1450934A2 Method and installation for treating flue gas containing hydrocarbons |
| 09/01/2004 | EP0870072B1 Gas injection system for semiconductor processing |
| 09/01/2004 | CN1526160A Gaseous phase growing device |
| 09/01/2004 | CN1526159A 等离子体清洗气体和等离子体清洁方法 Plasma cleaning gas and plasma cleaning method |
| 09/01/2004 | CN1526158A Susceptor for epitaxial growth and epitaxial growth method |
| 09/01/2004 | CN1525903A Cutting member with dual profile tip |
| 09/01/2004 | CN1525531A Method for making oxide neck strap of a channel capacitor |
| 09/01/2004 | CN1524653A Cermet cutting tool with hard blade-turning preventing surface coating layer |
| 09/01/2004 | CN1164792C Gas trapping equipment of chemical gas-phase deposition system |
| 08/31/2004 | US6785115 Electrostatic chuck and substrate processing apparatus |
| 08/31/2004 | US6784504 Methods for forming rough ruthenium-containing layers and structures/methods using same |
| 08/31/2004 | US6784445 Apparatus for monitoring intentional or unavoidable layer depositions and method |
| 08/31/2004 | US6784123 Insulation film on semiconductor substrate and method for forming same |
| 08/31/2004 | US6784122 Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers |
| 08/31/2004 | US6784119 Method of decreasing the K value in SIOC layer deposited by chemical vapor deposition |
| 08/31/2004 | US6784118 Method for vaporization of liquid organic feedstock and method for growth of insulation film |
| 08/31/2004 | US6784096 Methods and apparatus for forming barrier layers in high aspect ratio vias |
| 08/31/2004 | US6784083 Method for reducing physisorption during atomic layer deposition |