| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 09/23/2004 | US20040182322 Wafer holder for semiconductor manufacturing device and semiconductor manufacturing device in which it is installed |
| 09/23/2004 | US20040182320 Method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| 09/23/2004 | US20040182319 Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes |
| 09/23/2004 | US20040182316 Processing equipment and processing method |
| 09/23/2004 | US20040182313 Method of forming a ferroelectric film and fabrication process of a semiconductor device having a ferroelectric film |
| 09/23/2004 | US20040182310 CVD device with substrate holder with differential temperature control |
| 09/23/2004 | US20040182309 Low temperature deposition of silicon based thin films by single-wafer hot-wall rapid thermal chemical vapor deposition |
| 09/23/2004 | US20040182308 Thick single crystal diamond layer method for making it and gemstones produced from the layer |
| 09/22/2004 | EP1460679A1 Susceptor, gaseous phase growing device, device and method for manufacturing epitaxial wafer, and epitaxial wafer |
| 09/22/2004 | EP1460678A1 Method and apparatus for cleaning and method and apparatus for etching |
| 09/22/2004 | EP1460147A1 Plasma jet chemical vapor deposition system having a plurality of distribution heads |
| 09/22/2004 | EP1460146A1 Plasma jet chemical vapor deposition system having a plurality of distribution heads |
| 09/22/2004 | EP1459369A2 Selective deposition of a barrier layer on a dielectric material |
| 09/22/2004 | EP1459361A2 Layered structures |
| 09/22/2004 | EP1458904A1 Process for tungsten deposition by pulsed gas flow cvd |
| 09/22/2004 | EP1458903A1 Method for depositing silicon nitride films and silicon oxynitride films by chemical vapor deposition |
| 09/22/2004 | EP1458902A1 Method and installation for densifying porous substrate by gas-phase chemical infiltration |
| 09/22/2004 | EP1458730A1 Hexakis (monohydrocarbylamino) disilanes and method for the preparation thereof |
| 09/22/2004 | EP1458466A1 High flow rate bubbler system and method |
| 09/22/2004 | EP1109947A4 Hardcoats for flat panel display substrates |
| 09/22/2004 | EP1089874A4 LOW $g(k) DIELECTRIC INORGANIC/ORGANIC HYBRID FILMS AND METHOD OF MAKING |
| 09/22/2004 | EP0950124B1 Flash evaporator |
| 09/22/2004 | EP0748259B1 Highly abrasion-resistant, flexible coatings for soft substrates |
| 09/22/2004 | CN1531837A Resistive heaters and uses thereof |
| 09/22/2004 | CN1531753A Carburetor, various types of devices using carburetor, and method of vaporization |
| 09/22/2004 | CN1531743A Heat treating apparatus and heat-treating method |
| 09/22/2004 | CN1531741A Diffuser and rapid cycle chamber |
| 09/22/2004 | CN1531606A Apparatus for exhaust white powder elimination in substrate processing |
| 09/22/2004 | CN1531512A Chemical vapor deposition of antimony-doped metal oxide |
| 09/22/2004 | CN1531480A Multilayered optical structures |
| 09/22/2004 | CN1531479A 层压体 Laminate |
| 09/22/2004 | CN1531033A Method for forming strong dielectric membrane |
| 09/22/2004 | CN1531032A Manufacturing method for high dielectric constant oxidation film, capacitor therewith and manufacturing method thereof |
| 09/22/2004 | CN1531019A Producing method for X-ray mask and semiconductor device |
| 09/22/2004 | CN1530460A Light cover patterning method for chemical gas phase deposition by focusing ion beam |
| 09/22/2004 | CN1168144C Capacitor of semiconductor storage element and its producing method |
| 09/22/2004 | CN1168131C Method of forming copper wiring in semiconductor device |
| 09/22/2004 | CN1168130C Method of forming copper wiring in semicoductor device |
| 09/22/2004 | CN1168118C Film forming apparatus and method of forming crystalline silicon film |
| 09/22/2004 | CN1167829C Method for metallizing surface of solid polymer substrate and the product obtd. |
| 09/22/2004 | CN1167828C Method for preparing P-type zinc oxide film |
| 09/22/2004 | CN1167827C Method for preparing wire drawing mold with diamond composite coating |
| 09/22/2004 | CN1167826C Method for uniform heat-field array method for growing diamond film tubes |
| 09/22/2004 | CN1167497C Device and method for point of use treatment of effluent gas streams |
| 09/22/2004 | CN1167368C Decorative stone |
| 09/21/2004 | US6795796 Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level |
| 09/21/2004 | US6795636 Radiation-transmissive films on glass articles |
| 09/21/2004 | US6794311 Method and apparatus for treating low k dielectric layers to reduce diffusion |
| 09/21/2004 | US6794310 Method and apparatus for determining temperature of a semiconductor wafer during fabrication thereof |
| 09/21/2004 | US6794308 Method for reducing by-product deposition in wafer processing equipment |
| 09/21/2004 | US6794290 Method of chemical modification of structure topography |
| 09/21/2004 | US6794287 Process for growing metal or metal carbide thin films utilizing boron-containing reducing agents |
| 09/21/2004 | US6794284 Systems and methods for forming refractory metal nitride layers using disilazanes |
| 09/21/2004 | US6794275 Process for forming a silicon-based film on a substrate using a temperature gradient across the substrate axis |
| 09/21/2004 | US6794220 Organic thin-film semiconductor element and manufacturing method for the same |
| 09/21/2004 | US6794204 Semiconductor manufacturing method and semiconductor manufacturing apparatus |
| 09/21/2004 | US6794198 MOCVD selective deposition of c-axis oriented Pb5Ge3O11 thin films on high-k gate oxides |
| 09/21/2004 | US6794196 Deposited thin films and their use in detection, attachment and bio-medical applications |
| 09/21/2004 | US6794052 Polymer arrays from the combinatorial synthesis of novel materials |
| 09/21/2004 | US6794014 Gemstone |
| 09/21/2004 | US6793981 Process for producing laminated film, and reflection reducing film |
| 09/21/2004 | US6793978 Method and device for coating at least one wiper-blade element |
| 09/21/2004 | US6793975 Fine atomizing, vaporization; powder coating |
| 09/21/2004 | US6793969 Method of forming an oxidation-resistant TiSiN film |
| 09/21/2004 | US6793966 Chemical vapor deposition apparatus and method |
| 09/21/2004 | US6793965 Clog resistant injection valve |
| 09/21/2004 | US6793849 N-type droping of nanocrystalline diamond films with nitrogen and electrodes made therefrom |
| 09/21/2004 | US6793766 Apparatus having platforms positioned for precise centering of semiconductor wafers during processing |
| 09/21/2004 | US6793734 Heating furnace and semiconductor wafer-holding jig assembly and process of manufacturing semiconductor devices |
| 09/21/2004 | US6793733 Gas distribution showerhead |
| 09/21/2004 | CA2217643C Chemical vapour infiltration method with variable infiltration parameters |
| 09/16/2004 | WO2004079814A2 Modulated/composited cvd low-k films with improved mechanical and electrical properties for nanoelectronic devices |
| 09/16/2004 | WO2004079813A1 Substrate processor and method of manufacturing device |
| 09/16/2004 | WO2004079811A1 Plasma processing apparatus and method |
| 09/16/2004 | WO2004079806A1 Vaporizer, film forming apparatus including the same, method of vaporization and method of forming film |
| 09/16/2004 | WO2004079803A1 Nitride semiconductor device and method for manufacturing same |
| 09/16/2004 | WO2004079796A2 Atomic layer deposited dielectric layers |
| 09/16/2004 | WO2004079764A2 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions |
| 09/16/2004 | WO2004079043A2 Susceptor apparatus for inverted type mocvd reactor |
| 09/16/2004 | WO2004079042A1 Method of forming thin film, thin film forming apparatus, program and computer-readable information recording medium |
| 09/16/2004 | WO2004079041A1 Method for coating a substrate |
| 09/16/2004 | WO2004079031A2 Chemical vapor deposition of silicon on to substrates |
| 09/16/2004 | WO2004078873A2 Wear resistant coatings to reduce ice adhesion on air foils |
| 09/16/2004 | WO2004078406A2 One piece shim |
| 09/16/2004 | WO2004078348A1 Catalyst structure particularly for the production of field emission flat screens |
| 09/16/2004 | WO2004077912A2 One piece shim |
| 09/16/2004 | WO2004030020A3 Upper electrode plate with deposition shield in a plasma processing system |
| 09/16/2004 | WO2004030013A3 Baffle plate in a plasma processing system |
| 09/16/2004 | US20040180557 Method for forming silicon dioxide film using siloxane |
| 09/16/2004 | US20040180553 Method of depositing ALD thin films on wafer |
| 09/16/2004 | US20040180543 Semiconductor device with epitaxial C49-titanium silicide (TiSi2) layer and method for fabricating the same |
| 09/16/2004 | US20040180536 Method for manufature of semiconductor intergrated circuit device |
| 09/16/2004 | US20040180493 Semiconductor capacitors having tantalum oxide layers and methods for manufacturing the same |
| 09/16/2004 | US20040180241 Coated cemented carbide insert |
| 09/16/2004 | US20040180210 Article having a plasmapolymer coating and method for producing the same |
| 09/16/2004 | US20040180205 Boron doped diamond |
| 09/16/2004 | US20040180158 Chamber having components with textured surfaces and method of manufacture |
| 09/16/2004 | US20040178176 Apparatus and method for cleaning a bell jar in a barrel epitaxial reactor |
| 09/16/2004 | US20040178175 Atomic layer deposition for high temperature superconductor material synthesis |
| 09/16/2004 | US20040177926 Method and apparatus for processing substrates and method for manufacturing a semiconductor device |