| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/30/2004 | US20040187787 Substrate support having temperature controlled substrate support surface |
| 09/30/2004 | US20040187785 Deposition apparatus and deposition method |
| 09/30/2004 | US20040187784 Continuous flow deposition system |
| 09/30/2004 | US20040187783 Thin film forming apparatus and thin film forming method |
| 09/30/2004 | US20040187781 Vacuum chamber assembly |
| 09/30/2004 | US20040187780 Thin film deposition reactor |
| 09/30/2004 | US20040187779 Thin film deposition reactor |
| 09/30/2004 | US20040187778 Process and device for producing a layer of tantalum pentoxide on a carrier material, in particular titanium nitride, and integrated circuit incorporating a layer of tantalum pentoxide |
| 09/30/2004 | US20040187777 CVD apparatus |
| 09/30/2004 | US20040187304 Enhancement of Cu line reliability using thin ALD TaN film to cap the Cu line |
| 09/29/2004 | EP1463108A2 Method for manufacturing buried insulating layer type single crystal silicon carbide substrate and manufacturing device for the same |
| 09/29/2004 | EP1463093A2 Thermal treatment system for semiconductors |
| 09/29/2004 | EP1462543A1 Film-forming method for forming metal oxide on substrate surface |
| 09/29/2004 | EP1462542A1 Chemical vapour deposition |
| 09/29/2004 | EP1462541A1 Method for forming thin film, substrate having transparent electroconductive film and photoelectric conversion device using the substrate |
| 09/29/2004 | EP1462540A1 Method for forming thin film, substrate having thin film formed by the method, and photoelectric conversion device using the substrate |
| 09/29/2004 | EP1462539A1 Processes for manufacture of coated metallic particles and composite material, and installation for carrying out these processes |
| 09/29/2004 | EP1462230A1 Honeycomb structural body forming ferrule, and method of manufacturing the ferrule |
| 09/29/2004 | EP1461820A2 Device for applying an electromagnetic microwave to a plasma container |
| 09/29/2004 | EP1461475A2 Apparatus for the generation and supply of fluorine gas |
| 09/29/2004 | EP1461101A2 Metering valve and pharmaceutical metered dose inhaler and methods thereof |
| 09/29/2004 | EP0913496B1 High-temperature spray coated member and method of production thereof |
| 09/29/2004 | CN1533596A Plasma treatment device |
| 09/29/2004 | CN1533592A Thermal treatment apparats and thermal treatment method |
| 09/29/2004 | CN1533590A Processing apparatus and processing method |
| 09/29/2004 | CN1533588A Method and device for thermally treating substrates |
| 09/29/2004 | CN1533587A 抬升及支撑装置 Lifting and supporting device |
| 09/29/2004 | CN1533447A Gas shower head, film deposition apparatus, and film deposition method |
| 09/29/2004 | CN1533347A Throughput enhan cement for single wafer reactor |
| 09/29/2004 | CN1532951A Treating method of zinc oxide film and method for producing photoelectric element using it |
| 09/29/2004 | CN1532936A Semiconductor device and its producing method |
| 09/29/2004 | CN1532303A Precursor solution for controling MOCVD deposited PCMO component and method |
| 09/29/2004 | CN1532014A Coated cutting blade for processing cast iron |
| 09/29/2004 | CN1168849C Method of passivating CVD chamber |
| 09/29/2004 | CN1168848C Gas injection system for CVD reactors |
| 09/29/2004 | CN1168847C In-situ hot-wire chemical gas-phase deposition process for preparing MgB2 superconductor film |
| 09/28/2004 | US6798068 MOCVD formation of Cu2S |
| 09/28/2004 | US6798036 Temperature measuring method and apparatus in semiconductor processing apparatus, and semiconductor processing method and apparatus |
| 09/28/2004 | US6797646 Method of nitrogen doping of fluorinated silicate glass (FSG) while removing the photoresist layer |
| 09/28/2004 | US6797643 Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power |
| 09/28/2004 | US6797642 Method to improve barrier layer adhesion |
| 09/28/2004 | US6797595 Method of heat-treating nitride compound semiconductor layer and method of producing semiconductor device |
| 09/28/2004 | US6797571 Method of manufacturing semiconductor device |
| 09/28/2004 | US6797560 Method of manufacturing a capacitor having tantalum oxide film as an insulating film |
| 09/28/2004 | US6797558 Methods of forming a capacitor with substantially selective deposite of polysilicon on a substantially crystalline capacitor dielectric layer |
| 09/28/2004 | US6797340 Exposing surface to a borane; depositing nucleation layer by alternately pulsing a tungsten compound and a silane reducing gas |
| 09/28/2004 | US6797337 Method for delivering precursors |
| 09/28/2004 | US6797334 Method for forming gas cluster and method for forming thin film |
| 09/28/2004 | US6797182 To remove oxygen and water; for semiconductors |
| 09/28/2004 | US6797112 Plasma treatment apparatus and method of producing semiconductor device using the apparatus |
| 09/28/2004 | US6797111 Plasma processing apparatus |
| 09/28/2004 | US6797110 Glass, plasma resisting component, component for electromagnetic wave-transparent window and plasma processing apparatus |
| 09/28/2004 | US6797109 Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates |
| 09/28/2004 | US6797108 Apparatus and method for evenly flowing processing gas onto a semiconductor wafer |
| 09/28/2004 | US6797069 Gas driven planetary rotation apparatus and methods for forming silicon carbide layers |
| 09/28/2004 | US6797068 Film forming unit |
| 09/28/2004 | US6796795 Method and apparatus for loading substrate in semiconductor manufacturing apparatus |
| 09/28/2004 | US6796316 Atomic layer deposition (ALD) thin film deposition equipment having cleaning apparatus and cleaning method |
| 09/28/2004 | US6796313 Methods of cleaning vaporization surfaces |
| 09/28/2004 | US6796270 Device for producing PCVD coated glass tubes for the drawing of optical fibers |
| 09/28/2004 | US6796268 Microwave plasma processing system |
| 09/23/2004 | WO2004082011A1 Semiconductor device and method for manufacturing semiconductor device |
| 09/23/2004 | WO2004082010A2 Method of improving interlayer adhesion |
| 09/23/2004 | WO2004082009A1 Device for cleaning cvd device and method of cleaning cvd device |
| 09/23/2004 | WO2004082008A1 Cvd apparatus and method for cleaning cvd apparatus |
| 09/23/2004 | WO2004081994A2 Substrate support lift mechanism |
| 09/23/2004 | WO2004081265A1 Method for forming oxide coating film, oxide coating film and coating film structure |
| 09/23/2004 | WO2004081254A1 Microwave plasma processing device and plasma processing gas supply member |
| 09/23/2004 | WO2004081253A1 Method and apparatus for chemical plasma processing of plastic container |
| 09/23/2004 | WO2004080906A2 Method and system for coating a glass contacting surface with a thermal barrier and lubricous coating |
| 09/23/2004 | WO2004055227A3 Method and device for the cvd coating of workpieces |
| 09/23/2004 | WO2004042354A3 Methods for making metallocene compounds |
| 09/23/2004 | WO2004041832A3 Asymmetric group 8 (viii) metallocene compounds |
| 09/23/2004 | US20040185680 Method and device for thermal treatment of substrates |
| 09/23/2004 | US20040185679 Forming a dielectric layer using porogens |
| 09/23/2004 | US20040185674 Nitrogen-free hard mask over low K dielectric |
| 09/23/2004 | US20040185673 Film formation method and manufacturing method of semiconductor device |
| 09/23/2004 | US20040185670 Processing system and method for treating a substrate |
| 09/23/2004 | US20040185668 Method of fabricating semiconductor device using Plasma-Enhanced CVD |
| 09/23/2004 | US20040185667 Method of continuous processing of thin-film batteries and like devices |
| 09/23/2004 | US20040185636 Method of forming a substrste having a surface comprising at least one of Pt, Pd, Co and Au in at least one of element and alloy forms |
| 09/23/2004 | US20040185635 Semiconductor device and method for fabricating the same |
| 09/23/2004 | US20040185624 Semiconductor device and method for fabricating the same |
| 09/23/2004 | US20040185590 Fingerprint detection device and method of its manufacture, and apparatus for forming a protective film |
| 09/23/2004 | US20040185583 Method of operating a system for chemical oxide removal |
| 09/23/2004 | US20040185310 Battery device with conductive layer, cathode, anode and electrolyte layer for electrical isolation |
| 09/23/2004 | US20040185184 Atomic layer deposition with point of use generated reactive gas species |
| 09/23/2004 | US20040185183 Methods of forming fluorine doped insulating materials |
| 09/23/2004 | US20040185177 Chemical vapor deposition methods of forming barium strontium titanate comprising dielectric layers, including such layers having a varied concentration of barium and strontium within the layer |
| 09/23/2004 | US20040184792 Processing system and method for thermally treating a substrate |
| 09/23/2004 | US20040183453 Plasma processing apparatus |
| 09/23/2004 | US20040182833 Method for manufacturing a substrate with a pre-seasoned plasma processing system |
| 09/23/2004 | US20040182702 Plasma generation using multi-step ionization |
| 09/23/2004 | US20040182600 Method for growing carbon nanotubes, and electronic device having structure of ohmic connection to carbon element cylindrical structure body and production method thereof |
| 09/23/2004 | US20040182515 warp yarns and weft yarns or shutes; machine rolling; papermaking |
| 09/23/2004 | US20040182423 Gas flow of fluorine cleaning gas so as to flow from upstream toward an outlet port in a reaction chamber; flowing protective gas which reacts with the fluorine from vicinity of outlet port |
| 09/23/2004 | US20040182417 Processing system and method for chemically treating a substrate |
| 09/23/2004 | US20040182415 Cleaning method of apparatus for manufacturing semiconductor device |
| 09/23/2004 | US20040182324 Method and apparatus for thermally insulating adjacent temperature controlled processing chambers |
| 09/23/2004 | US20040182323 Method and system for forming thin films |