Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2004
10/07/2004US20040197474 Method for enhancing deposition rate of chemical vapor deposition films
10/07/2004US20040197470 Organometallic compounds and their use as precursors for forming films and powders of metal or metal derivatives
10/07/2004US20040195960 Coatings with low permeation of gases and vapors
10/07/2004US20040195653 Capacitor structure and film forming method and apparatus
10/07/2004US20040195606 Semiconductor manufacturing process and apparatus for modifying in-film stress of thin films, and product formed thereby
10/07/2004US20040195605 Electronic device with electrode and its manufacture
10/07/2004US20040195088 Application of dense plasmas generated at atmospheric pressure for treating gas effluents
10/07/2004US20040194858 Process for forming a protective coating containing aluminium and zirconium on a metal
10/07/2004US20040194710 Apparatus for vapor deposition
10/07/2004US20040194709 Plasma treatment apparatus
10/07/2004US20040194708 Method of cleaning a cvd device
10/07/2004US20040194706 Method and apparatus for forming a high quality low temperature silicon nitride layer
10/07/2004US20040194703 Organometallic compounds
10/07/2004US20040194702 Thin film-forming apparatus
10/07/2004US20040194701 Method and apparatus for silicon oxide deposition on large area substrates
10/07/2004US20040194691 Method of depositing an inorganic film on an organic polymer
10/07/2004US20040194690 Coloured diamond
10/07/2004US20040194268 Rapid cycle chamber having a top vent with nitrogen purge
10/07/2004DE10325629A1 Verfahren zur Abscheidung von Verbindungen auf einem Substrat mittels metallorganischer Gasphasendeposition A process for the deposition of compounds on a substrate by metal organic vapor phase deposition
10/06/2004EP1465262A2 Zinc oxide film treatment method and method of manufacturing photovoltaic device and utilizing the same
10/06/2004EP1464735A2 Equipment and method for manufacturing silicon carbide single crystal
10/06/2004EP1464727A2 Oxide coated cutting tool
10/06/2004EP1464726A2 CVD method for forming a porous low dielectric constant SiOCH film
10/06/2004EP1464725A2 Germanium compounds suitable for use in vapor deposition processes
10/06/2004EP1464724A2 Organometallic compounds suitable for use in vapor deposition processes
10/06/2004EP1464721A2 Thermal barrier coating system
10/06/2004EP1464647A2 Process for the preparation of group IVA and group VIA compounds
10/06/2004EP1464621A1 HIGHLY PURE ULTRA-FINE SiO sb X /sb POWDER AND METHOD FOR PRODUCTION THEREOF
10/06/2004EP1463849A2 Boron doped diamond
10/06/2004EP1463685A1 Carbon nanotube particulates, compositions and use thereof
10/06/2004EP1144716B1 Cvd process using bi alcoxides
10/06/2004EP0938634A4 Gas panel
10/06/2004CN2646155Y Closed form electron drift type gaseous ion source
10/06/2004CN1535330A Method for production of coated substrates
10/06/2004CN1535329A Liquid distribution unit for dividing liquid current into plurality of partial currents
10/06/2004CN1535328A Method for CVD of BPSG films
10/06/2004CN1535082A Sedimented mask frame component element and its manufacturing method organic electroluminous device manufacturing method
10/06/2004CN1534749A Semiconductor device having epitaxial C49 titanium silicide (TiSi2)layer and its manufacturing method
10/06/2004CN1534741A Method for forming metal oxide-film
10/06/2004CN1534104A Coated knife insertion object
10/06/2004CN1170307C Method for forming low dielectric constant layer on semiconductor wafer
10/06/2004CN1170003C Carbon film and method for formation thereof and article covered with carbon film and method for preparation thereof
10/06/2004CN1170002C Process for copper-metallizing of polyimide substrate
10/06/2004CN1169751C Prep. process for preparing fiber reinforced silica-base composite material for wave penetrating
10/05/2004USRE38613 Method for growing a nitride compound semiconductor
10/05/2004US6800571 CVD plasma assisted low dielectric constant films
10/05/2004US6800570 Method of forming a metal oxide film
10/05/2004US6800568 Methods for the deposition of high-K films and high-K films produced thereby
10/05/2004US6800566 Adjustment of N and K values in a DARC film
10/05/2004US6800559 Method and apparatus for generating H20 to be used in a wet oxidation process to form SiO2 on a silicon surface
10/05/2004US6800552 Deposition of transition metal carbides
10/05/2004US6800542 Method for fabricating ruthenium thin layer
10/05/2004US6800539 Thin film formation method
10/05/2004US6800383 Tungsten carbide alloyed with fluorine
10/05/2004US6800333 Method of depositing in situ a solid film on a substrate
10/05/2004US6800255 A waste recycling the by-product from semiconductor manufacturing process, apparatus comprising a burn/wet scrubber oxidizes and condenses toxic compounds; detoxification, water treatment, pollution control
10/05/2004US6800254 Visual indicator cold trapping system
10/05/2004US6800173 Variable gas conductance control for a process chamber
10/05/2004US6800172 Interfacial structure for semiconductor substrate processing chambers and substrate transfer chambers and for semiconductor substrate processing chambers and accessory attachments, and semiconductor substrate processor
10/05/2004US6800139 Film deposition apparatus and method
10/05/2004US6800134 Chemical vapor deposition methods and atomic layer deposition methods
10/05/2004US6800133 Process for growing a magnesium oxide film on a silicon (100) substrate coated with a cubic silicon carbide butter layer
10/05/2004US6799735 Nozzle plate member for supplying fluids in dispersed manner and manufacturing method of the same
10/05/2004US6799603 Gas flow controller system
09/2004
09/30/2004WO2004084318A1 Semiconductor light-emitting element and method for manufacturing same; integrated semiconductor light-emitting device and method for manufacturing same; image display and method for manufacturing same; and illuminating device and method for manufacturing same
09/30/2004WO2004084291A1 Semiconductor device and method for manufacturing semiconductor device
09/30/2004WO2004084290A1 A nitrogen-free hard mask over low k dielectric
09/30/2004WO2004084280A2 Processing system and method for treating a substrate
09/30/2004WO2004084271A2 Method and apparatus for thermally insulating adjacent temperature controlled processing chambers
09/30/2004WO2004083486A1 Method and apparatus for plasma cdv by use of ultrashort wave
09/30/2004WO2004083485A2 Methods and apparatus for atomic layer deposition
09/30/2004WO2004083484A1 Body having a smooth diamond layer, device and method therefor
09/30/2004WO2004083483A1 A method of repairing a pedestal surface
09/30/2004WO2004083479A2 Alcoholates of rare earth mtals a precursors for metaloxide layers or films
09/30/2004WO2004083337A1 Diamond particle for sintering tool and manufacturing method thereof and sintering tool using the same
09/30/2004WO2004082821A2 Processing system and method for thermally treating a substrate
09/30/2004WO2004082820A2 Processing system and method for chemically treating a substrate
09/30/2004WO2004012277A3 Method and apparatus for forming a thin film on a tape substrate
09/30/2004US20040192151 Methods for severally manufacturing carbon fibers, electron-emitting device, electron source, image display apparatus, light bulb, and secondary battery
09/30/2004US20040192068 Method of using SACVD deposition and corresponding deposition reactor
09/30/2004US20040192048 Ammonia for use in manufacture of GaN-type compound semiconductor and method for manufacturing GaN-type compound semiconductor
09/30/2004US20040192036 Method for forming a metal oxide film
09/30/2004US20040191949 Zinc oxide film treatment method and method of manufacturing photovoltaic device utilizing the same
09/30/2004US20040191545 Electroplating a layer of yttrium onto the surface, then electroplating a second layer of aluminum or zirconium onto the first layer, and annealing the first and second layers to form mixed oxide; corrosion resistance
09/30/2004US20040191544 Thermal barrier coating system
09/30/2004US20040191488 Component, method for coating a component, and powder
09/30/2004US20040191426 chemical vapor deposition by introducing oxygen radicals and organic raw material gases containing metals element into vacuum containers having silicon, to form dielectric layers; semiconductors
09/30/2004US20040191413 Reactor for thin film deposition and method for depositing thin film on wafer using the reactor
09/30/2004US20040191151 Containing silicon or carbon, boron or nitrogen, gallium or aluminum and oxygen; low temperature thin film deposition on silicon substrate
09/30/2004US20040191029 Tool for handling wafers and epitaxial growth station
09/30/2004US20040190215 Electrostatic chuck having dielectric member with stacked layers and manufacture
09/30/2004US20040188866 Vaporizing reactant liquids for chemical vapor deposition film processing
09/30/2004US20040188743 Selectively deposited PGO thin film method for forming same
09/30/2004US20040188691 Substrate for semiconductor light-emitting element, semiconductor light-emitting element and semiconductor light-emitting element fabrication method
09/30/2004US20040188020 Wafer supporter
09/30/2004US20040187968 Reacting aluminum hydrocarbylamine chelate compound precursor to form aluminum nitride or alumina; oxidation, nitriding, vapor deposition
09/30/2004US20040187793 Wafer processing apparatus having dust proof function
09/30/2004US20040187790 Substrate holder
09/30/2004US20040187789 Wafer holder for semiconductor manufacturing device and semiconductor manufacturing device in which it is installed
09/30/2004US20040187788 Gas-cooled clamp for RTP