| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 10/27/2004 | CN1540033A Chemical vapor deposition installation with integrated diffuser frame |
| 10/27/2004 | CN1540032A Method for preparing composite coat layer of diamond being plated slimline with low roughness in inside surface |
| 10/27/2004 | CN1540031A Technique for plating film of uncrystallized diamond |
| 10/27/2004 | CN1539841A Novel Bi compound, its prepn. method and process for prepn. of films |
| 10/27/2004 | CN1539727A Method for preparing compound power of Nano crystal for metal package |
| 10/27/2004 | CN1539583A Preparation of diamond coat for integral rotary cutting tool made from hard metal alloy |
| 10/27/2004 | CN1173384C Improved ladder boat for supporting waters, and method of processing semiconductor wafers |
| 10/27/2004 | CN1173072C Prepn of solution maghesium source |
| 10/26/2004 | US6809334 Semiconductor integrated circuit device, and method of manufacturing the same |
| 10/26/2004 | US6809212 One pot method to produce an organometallic compound, e.g., a cyclopentadienytrimethylplatinum, from a metal source, an alkylating agent and a hydrocarbon or hetero compound; chemical vapor deposition to form electrical thin film |
| 10/26/2004 | US6809026 Selective deposition of a barrier layer on a metal film |
| 10/26/2004 | US6809022 Method for forming dielectric layers |
| 10/26/2004 | US6808986 Method of forming nanocrystals in a memory device |
| 10/26/2004 | US6808978 Method for fabricating metal electrode with atomic layer deposition (ALD) in semiconductor device |
| 10/26/2004 | US6808977 Method of manufacturing semiconductor device |
| 10/26/2004 | US6808816 Outermost layer consisting of platinum and a ceramic barrier layer; the platinum catalyzing the hydrocarbon fuel to form particulates of carbonaceous gum suspended within the fuel; gas turbine engine component |
| 10/26/2004 | US6808803 Molecular epitaxy method and compositions |
| 10/26/2004 | US6808760 Method for preparing α-dialuminum trioxide nanotemplates |
| 10/26/2004 | US6808759 Plasma processing method and apparatus |
| 10/26/2004 | US6808758 Pulse precursor deposition process for forming layers in semiconductor devices |
| 10/26/2004 | US6808748 Depositing portion of silica glass film over substrate and in trench using high density plasma with simultaneous deposition and sputtering from gas including sources of silicon and oxygen and helium, second portion also including hydrogen |
| 10/26/2004 | US6808743 Growth of ZnO film using single source CVD |
| 10/26/2004 | US6808645 Susceptor and surface processing method |
| 10/26/2004 | US6808606 Method of manufacturing window using ion beam milling of glass substrate(s) |
| 10/26/2004 | US6808605 Forming a layer of autocatalytic metal on the surface of a substrate; forming nanowires on front surface of layer of autocatalytic metal, wherein the substrate is put into an evaporator and the layer of autocatalytic metal is grown |
| 10/26/2004 | US6807971 Top end of the exhaust pipe is split into two vents, one of which is used for discharging exhaust gas for forming silicon dioxide and silicon nitride films and other, which is used to discharge hydrogen fluoride for pipe cleaning |
| 10/26/2004 | CA2356229C A method for fabricating a sic film and a method for fabricating a sic multi-layered film structure |
| 10/26/2004 | CA2274717C Semiconductor having large volume fraction of intermediate range order material |
| 10/21/2004 | WO2004090966A1 Method of forming film and film forming apparatus |
| 10/21/2004 | WO2004090961A1 Shower head structure and treating device |
| 10/21/2004 | WO2004090960A1 Loading table and heat treating apparatus having the loading table |
| 10/21/2004 | WO2004090195A1 Crystalline-si-layer-bearing substrate and its production method, and crystalline si device |
| 10/21/2004 | WO2004090191A1 METHOD FOR PREPARING ALUMINA COATING FILM COMPRISING α-TYPE CRYSTAL STRUCTURE AS PRIMARY CRYSTAL STRUCTURE AND METHOD FOR MANUFACTURING MEMBER COATED WITH LAMINATED COATING FILM |
| 10/21/2004 | WO2004036624A3 Two-step atomic layer deposition of copper layers |
| 10/21/2004 | WO2003005396A8 Method and apparatus for scanned instrument calibration |
| 10/21/2004 | US20040210323 Safety network system, safety slave, and communication method |
| 10/21/2004 | US20040210071 Organometallic compound, its synthesis method, and solution raw material and metal-containing thin film containing the same |
| 10/21/2004 | US20040209484 Method of depositing a silicon dioxide comprising layer doped with at least one of P, B and Ge |
| 10/21/2004 | US20040209465 Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer |
| 10/21/2004 | US20040209447 Method of producing crystalline semiconductor material and method of fabricating semiconductor device |
| 10/21/2004 | US20040209384 Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices |
| 10/21/2004 | US20040209005 film forming by generating a plasma of a silicon compound gas, an oxidizing gas, and a rare gas where the partial pressure of the rare gas such as xenon is specified; making silicon oxide (SiO2) or metal oxide films; making semiconductor device which has a small current leakage |
| 10/21/2004 | US20040208994 Deposition of carbon-and transition metal-containing thin films |
| 10/21/2004 | US20040208228 Temperature gauge and ceramic susceptor in which it is utilized |
| 10/21/2004 | US20040207288 Method of producing lead zirconate titanate-based thin film, dielectric device and dielectric thin film |
| 10/21/2004 | US20040207083 Low dielectric constant layers |
| 10/21/2004 | US20040206804 Traps for particle entrapment in deposition chambers |
| 10/21/2004 | US20040206747 Ceramic heater for semiconductor manufacturing/inspecting apparatus |
| 10/21/2004 | US20040206600 Hard-faced friction mating member |
| 10/21/2004 | US20040206456 Plasma processing apparatus |
| 10/21/2004 | US20040206387 formed via radio frequency magnetron sputtering or chemical vapor deposition; epitaxial growth |
| 10/21/2004 | US20040206306 Deposition station for forming a polysilicon film of low temperature processed polysilicon thin film transistor |
| 10/21/2004 | US20040206305 Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition |
| 10/21/2004 | US20040206297 In situ growth of oxide and silicon layers |
| 10/21/2004 | US20040206237 Abatement system targeting a by-pass effluent stream of a semiconductor process tool |
| 10/21/2004 | DE102004013626A1 Verfahren und Vorrichtung zur Abscheidung dünner Schichten Method and device for depositing thin layers |
| 10/21/2004 | DE102004010498A1 Pumpenkolben und/oder den Pumpenkolben dichtende Elemente, insbesondere Dichtring aus elastomerem Material und Vorrichtung und Verfahren zum Beschichten eines Gegenstandes aus elastomerem Material Pump piston and / or the pump piston sealing elements, especially sealing ring made of elastomeric material, and apparatus and method for coating an article of elastomeric material |
| 10/20/2004 | EP1469508A1 Boat for heat treatment and vertical heat treatment equipment |
| 10/20/2004 | EP1469223A2 Hard-faced friction mating member |
| 10/20/2004 | EP1469101A2 Coated cutting tool insert |
| 10/20/2004 | EP1468128A2 Method for manufacturing a free-standing substrate made of monocrystalline semi-conductor material |
| 10/20/2004 | EP1274875A4 Method and apparatus for providing uniform gas delivery to substrates in cvd and pecvd processes |
| 10/20/2004 | EP1261554B1 Method for fabricating SiON-waveguides |
| 10/20/2004 | EP1204824B1 Conveyor for treating hollow bodies comprising an advanced pressure distribution circuit |
| 10/20/2004 | EP1004132B1 A carbon film for field emission devices |
| 10/20/2004 | CN1539159A Cleaning method of thin tilm forming device |
| 10/20/2004 | CN1539158A Susceptor shaft vacuum pumping |
| 10/20/2004 | CN1539155A Device for coating of objects |
| 10/20/2004 | CN1539027A Rapid cycle chamber having top vent with nitrogen purge |
| 10/20/2004 | CN1538507A Gas distribution system of semiconductor machine table gas reaction chamber and method |
| 10/20/2004 | CN1538505A Method of improving flatness of wafer surface |
| 10/20/2004 | CN1538501A Plasma treatment device and high-frequency power supply device |
| 10/20/2004 | CN1538485A Manufacturing method of electron emission source |
| 10/20/2004 | CN1172360C Method for manufacture of Ta205 capactior using Ta205 film as dielectric film |
| 10/20/2004 | CN1172351C Method and equipment for radiating ion beam, related method and its equipment |
| 10/20/2004 | CN1172143C Thermal resistance coating system and its material |
| 10/20/2004 | CN1172022C Working platform for deposition process |
| 10/19/2004 | US6806443 Ceramic susceptor |
| 10/19/2004 | US6806438 Plasma processing apparatus including a plurality of plasma processing units having reduced variation |
| 10/19/2004 | US6806211 Device and method for processing substrate |
| 10/19/2004 | US6806207 Method of depositing low K films |
| 10/19/2004 | US6806201 Plasma processing apparatus and method using active matching |
| 10/19/2004 | US6806183 Methods for forming capacitors on semiconductor substrates |
| 10/19/2004 | US6806145 Low temperature method of forming a gate stack with a high k layer deposited over an interfacial oxide layer |
| 10/19/2004 | US6806135 Method of manufacturing a semiconductor device using a two-step deposition process |
| 10/19/2004 | US6805998 Method and apparatus for integrated-battery devices |
| 10/19/2004 | US6805968 Steel substrate and a composite oxide film formed on a surface thereof and comprised of silicon oxide-aluminum oxide-chromium oxide and a sintering aid |
| 10/19/2004 | US6805931 Plastic container coated with carbon film |
| 10/19/2004 | US6805907 Method and apparatus for vapor generation and film deposition |
| 10/19/2004 | US6805808 Method for separating chips from diamond wafer |
| 10/19/2004 | US6805779 Plasma generation using multi-step ionization |
| 10/19/2004 | US6805749 Reator block with gas streams emanating from plurality of passageways positioned close to upper and lower surfaces |
| 10/14/2004 | WO2004088732A1 Gas-cooled clamp for rapid thermal processing |
| 10/14/2004 | WO2004088690A1 Foil for negative electrode of capacitor and process for producing the same |
| 10/14/2004 | WO2004087991A1 Thin film forming apparatus and method for forming thin film |
| 10/14/2004 | WO2004087990A1 Plasma cvd method using ultrashort wave and plasma cvd apparatus |
| 10/14/2004 | WO2004087989A1 Chemical vapor deposition film formed by plasma cvd process and method for forming same |
| 10/14/2004 | WO2004087988A1 Method for cvd deposition of a silver film on a substrate |
| 10/14/2004 | WO2004087984A1 Carbon-coated aluminum and method for producing same |
| 10/14/2004 | WO2004086844A2 Multilayer substrate implanted with a low dose |