C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2004
11/03/2004	CN1174116C Carbon film and its forming method
11/03/2004	CN1174115C DLC film, DLC-coated plastic container, and method and apparatus for manufacturing DLC-coated plastic container
11/02/2004	US6813534 Monitoring chamber temperature or energized gas radiation emission, radiation reflection or reflected power level versus selected process parameter
11/02/2004	US6813136 Memory structure with an annealed film
11/02/2004	US6813134 Electrostatic chucking device and manufacturing method thereof
11/02/2004	US6812634 Graphite nanofibers, electron-emitting source and method for preparing the same, display element equipped with the electron-emitting source as well as lithium ion secondary battery
11/02/2004	US6812471 Method of surface texturizing
11/02/2004	US6812165 Manufacturing method of semiconductor integrated circuit device
11/02/2004	US6812162 Rapid deposition of borosilicate glass films
11/02/2004	US6812157 Apparatus for atomic layer chemical vapor deposition
11/02/2004	US6812153 Method for high aspect ratio HDP CVD gapfill
11/02/2004	US6812146 Chemical vapor deposition process for depositing titanium nitride films from an organo-metallic compound
11/02/2004	US6812144 Method for forming metal wiring in a semiconductor device
11/02/2004	US6812135 Adhesion enhancement between CVD dielectric and spin-on low-k silicate films
11/02/2004	US6812127 Method of forming semiconductor device including silicon oxide with fluorine, embedded wiring layer, via holes, and wiring grooves
11/02/2004	US6812043 Method for forming a carbon doped oxide low-k insulating layer
11/02/2004	US6812023 Methods of producing membrane vesicles
11/02/2004	US6811881 Metal oxyanion coated nano substrates
11/02/2004	US6811880 Metal oxyanion coated substrates
11/02/2004	US6811831 Method for depositing silicon nitride
11/02/2004	US6811829 Combination of flash evaporation with plasma enhanced chemical vapor deposition
11/02/2004	US6811814 Feeding a precursor of film into reaction chamber, causing precursor to adsorb onto surface of substrate to form layer thereof, and feeding catalyst into reaction chamber in an amount to substantially convert layer of precurs to thin film
11/02/2004	US6811761 Silicon carbide with high thermal conductivity
11/02/2004	US6811662 Sputtering apparatus and manufacturing method of metal layer/metal compound layer by using thereof
11/02/2004	US6811651 Gas temperature control for a plasma process
11/02/2004	US6811615 Introducing a halogen containing cleaning gas to the process chamber via a section connected to the process chamber; and applying a high power density light beam, which assists dissociation of cleaning gas to acheive cleaning activity
11/02/2004	US6811614 CVD reactor with substrate holder which is rotatably driven and mounted by a gas stream
11/02/2004	US6811610 Method of making enhanced CVD diamond
11/02/2004	US6811580 Inserts for metal cutting purposes
11/02/2004	US6811157 Metallic gasket for vacuum device and method of producing thereof
11/02/2004	US6810897 Switching between gases without accompanying particulate contamination of the treatment substrate caused by repeated operation of a valve
11/02/2004	US6810887 Method for cleaning semiconductor fabrication equipment parts
11/02/2004	US6810886 Chamber cleaning via rapid thermal process during a cleaning period
10/2004
10/28/2004	WO2004093179A1 Method for forming high dielectric film
10/28/2004	WO2004093173A1 Susceptor and vapor growth device
10/28/2004	WO2004093167A2 Substrate support having temperature controlled surface
10/28/2004	WO2004093163A2 Method and apparatus for silicone oxide deposition on large area substrates
10/28/2004	WO2004092672A2 Amorphous carbon layer for heat exchangers
10/28/2004	WO2004092443A1 Microwave plasma processing method
10/28/2004	WO2004092442A1 Electrochemical method for the direct nanostructured deposition of material onto a substrate, and semiconductor component produced according to said method
10/28/2004	WO2004092441A2 Methods for producing silicon nitride films by vapor-phase growth
10/28/2004	WO2004092256A1 Object with a stratified composite material
10/28/2004	WO2004092089A1 Methods of obtaining photoactive coatings and articles made thereby
10/28/2004	WO2004092058A2 Plasma reactor and process for producing lower-energy hydrogen species
10/28/2004	WO2004091842A1 Method for producing multiple layer systems
10/28/2004	WO2004081994A9 Substrate support lift mechanism
10/28/2004	WO2004078873A3 Wear resistant coatings to reduce ice adhesion on air foils
10/28/2004	WO2004070788A3 Method for depositing a low dielectric constant film
10/28/2004	WO2004032200A3 Systems and methods for improved gas delivery
10/28/2004	WO2004025749A3 Diffusion barrier coatings having graded compositions and devices incorporating the same
10/28/2004	US20040215365 Processing system
10/28/2004	US20040215039 Carvone from carveol in presence of organometallic compound
10/28/2004	US20040215030 Precursors for metal containing films
10/28/2004	US20040215029 Novel organometallic iridium compound, process of producing the same, and process of producing thin film
10/28/2004	US20040214451 Method of fabricating oxides with low defect densities
10/28/2004	US20040214446 Nitrogen-free dielectric anti-reflective coating and hardmask
10/28/2004	US20040214437 Atomic layer deposition
10/28/2004	US20040214435 Semiconductor fabricating apparatus
10/28/2004	US20040214413 Semiconductor device manufacturing method and film forming method
10/28/2004	US20040214392 Semiconductor device and manufacturing method thereof
10/28/2004	US20040214050 Cemented carbide with binder phase enriched surface zone
10/28/2004	US20040214026 Internal member for plasma-treating vessel and method of producing the same
10/28/2004	US20040213921 Coating integrated circuits or electronic substrates with fluorosilicate glass (FSG), using high density plasma chemical vapor deposition, to form protective coatings; corrosion resistance
10/28/2004	US20040213920 generate high density plasma even employing a cheap and safe discharge gas such as a nitrogen gas to form a layer with high quality at high speed; using high frequency electric field in which a first high frequency electric field and a second high(er) frequency electric field are superposed
10/28/2004	US20040213908 Deposition methods and apparatus for improved delivery of metastable species
10/28/2004	US20040213907 Methods for depositing polycrystalline films with engineered grain structures
10/28/2004	US20040213906 including catalyzed oxidation; brakes and brake components; water, a nonaqueous polar liquid, or a mixture thereof; phosphoric acid or an acid phosphate salt; an aluminum salt; and at least one additional metal salt
10/28/2004	US20040213721 Prevents formation of oxyfluoride (OF2); controls greenhouse gas pollution; for abating undesired component(s) from a gas stream containing same, such as halocompounds, acid gases, silanes, ammonia, etc., by scrubbing of the effluent gas stream with an aqueous scrubbing medium
10/28/2004	US20040212459 Method for producing a layer with a predefined layer thickness profile
10/28/2004	US20040212114 Method for forming insulation film and apparatus for forming insulation film
10/28/2004	US20040212036 Method of eliminating residual carbon from flowable oxide fill
10/28/2004	US20040212002 Integrated circuits with rhodium-rich structures
10/28/2004	US20040212000 Semiconductor device
10/28/2004	US20040211998 Lanthanide series layered superlattice materials for integrated circuit applications
10/28/2004	US20040211967 Ultraviolet light-emitting device in which p-type semiconductor is used
10/28/2004	US20040211956 Organic electroluminescent device and method of fabricating the same
10/28/2004	US20040211764 Purged heater-susceptor for an ALD/CVD reactor
10/28/2004	US20040211665 Barrier formation using novel sputter-deposition method
10/28/2004	US20040211365 Chemical vapor phase epitaxial device
10/28/2004	US20040211364 Gas port sealing for CVD/CVI furnace hearth plates
10/28/2004	US20040211357 Method of manufacturing a gap-filled structure of a semiconductor device
10/28/2004	US20040211354 Thermostructural composite material bowl
10/28/2004	CA2523994A1 A microinjection apparatus for delivery of macromolecules into a cell and uses thereof
10/28/2004	CA2523008A1 Article with layers of composite material of a first non-metallic layer and a second metallic layer applied to the first layer
10/28/2004	CA2522506A1 Plasma reactor and process for producing lower-energy hydrogen species
10/27/2004	EP1471582A1 Substrate for semiconductor light-emitting element, semiconductor light-emitting element and its fabrication
10/27/2004	EP1471568A1 Precursors for metal containing films
10/27/2004	EP1471567A1 Organometallic iridium compounds, processes for producing the same, and processes for producing thin films
10/27/2004	EP1471541A1 Method of forming transparent conductive film, transparent conductive film, glass substrate having the same and photoelectric transduction unit including the glass substrate
10/27/2004	EP1471166A2 Layer with controlled grain size and morphology for enhanced wear resistance
10/27/2004	EP1471165A2 Coating with controlled grain size and morphology for enhanced wear resistance and toughness
10/27/2004	EP1470738A2 Heating in a vacuum atmosphere in the presence of a plasma
10/27/2004	EP1470264A1 Methods for silicon oxide and oxynitride deposition using single wafer low pressure cvd
10/27/2004	EP1397527B1 Grain oriented electric sheet of metal with an electrically insulating coating
10/27/2004	EP1125324A4 Radical-assisted sequential cvd
10/27/2004	EP1088329B1 Method and apparatus for stabilising a plasma
10/27/2004	EP1032722B1 Low pressure vapor phase deposition of organic thin films
10/27/2004	CN1541403A Low-K metal proelectrolyte semiconductor structure
10/27/2004	CN1541196A Visible-light-responsive photoactive coating, coated article, and method of making same
10/27/2004	CN1540323A Plasma Monitoring method, plasma monitor and plasma treatment appts.

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