C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2004
11/09/2004	US6815350 Method for forming a thin film using an atomic layer deposition (ALD) process
11/09/2004	US6815332 Method for forming integrated dielectric layers
11/09/2004	US6815294 Vertical nano-size transistor using carbon nanotubes and manufacturing method thereof
11/09/2004	US6815225 Method for forming capacitor of nonvolatile semiconductor memory device
11/09/2004	US6815077 Low temperature, low-resistivity heavily doped p-type polysilicon deposition
11/09/2004	US6815072 Method to solve particle performance of FSG layer by using UFU season film for FSG process
11/09/2004	US6815052 Filled diamond foam material and method for forming same
11/09/2004	US6815014 Corona-generated chemical vapor deposition on a substrate
11/09/2004	US6815007 Method to solve IMD-FSG particle and increase Cp yield by using a new tougher UFUN season film
11/09/2004	US6814839 Interference layer system
11/09/2004	US6814837 Controlled gas supply line apparatus and process for infilm and onfilm defect reduction
11/09/2004	US6814814 Cleaning residues from surfaces in a chamber by sputtering sacrificial substrates
11/09/2004	US6814813 Chemical vapor deposition apparatus
11/09/2004	US6814812 Double acting cold trap
11/09/2004	US6814811 Semiconductor wafer and vapor phase growth apparatus
11/09/2004	US6814572 Heat treating method and heat treating device
11/09/2004	US6814130 Forming thin nucleation enhancer layer on interface surface of ceramic mold, growing diamond layer on enhancer layer using vapor deposition such that working surface directly contacts enhancer layer and receives configuration from surface
11/09/2004	US6814087 Accelerated plasma clean
11/04/2004	WO2004095568A1 Device for applying semiconductor treatment to treatment subject substrate
11/04/2004	WO2004095563A1 Surface modification method and surface modification apparatus for interlayer insulating film
11/04/2004	WO2004095555A1 Method for cleaning heat treatment apparatus
11/04/2004	WO2004095530A2 Adjoining adjacent coatings on an element
11/04/2004	WO2004095086A2 Conformal coatings for micro-optical elements
11/04/2004	WO2004094695A2 Transient enhanced atomic layer deposition
11/04/2004	WO2004094694A2 Collection of unused precursors in ald
11/04/2004	WO2004094693A2 Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition
11/04/2004	WO2004094692A1 Continuous flow atomic layer deposition system
11/04/2004	WO2004094691A1 Method for hafnium nitride deposition
11/04/2004	WO2004094689A2 Volatile copper(i) complexes for deposition of copper films by atomic layer deposition
11/04/2004	WO2004084271A3 Method and apparatus for thermally insulating adjacent temperature controlled processing chambers
11/04/2004	WO2004082821A3 Processing system and method for thermally treating a substrate
11/04/2004	WO2004082820A3 Processing system and method for chemically treating a substrate
11/04/2004	WO2004073049A3 Methods and apparatus for processing semiconductor wafers with plasma processing chambers in a wafer track environment
11/04/2004	WO2004066365A3 Cleaning of cvd chambers using remote source with cxfyoz based chemistry
11/04/2004	WO2004060810A3 Method and system for supplying high purity fluid
11/04/2004	WO2004035858A3 Atomic layer deposition of noble metals
11/04/2004	WO2004031439A3 Method and process reactor for sequential gas phase deposition by means of a process and an auxiliary chamber
11/04/2004	WO2004011695A3 Sublimation system employing carrier gas
11/04/2004	US20040219802 Method of fabricating dielectric layer
11/04/2004	US20040219784 Methods for forming atomic layers and thin films including tantalum nitride and devices including the same
11/04/2004	US20040219746 Systems and methods for forming metal oxide layers
11/04/2004	US20040219369 Diffusion barrier layers and methods comprising same for depositing metal films by CVD or ALD processes
11/04/2004	US20040219362 Components with bearing or wear-resistant surfaces
11/04/2004	US20040219304 Amorphous hydrogenated carbon film
11/04/2004	US20040219294 DLC coating system and process and apparatus for making coating system
11/04/2004	US20040219085 Purging chemical vapor deposition hazardous wastes; single apparatus for silicon hydride and perfluorocarbons; reduced carbon monoxide generation; producing silicon dioxide, carbon dioxide and ammonium fluoride safe disposal materials
11/04/2004	US20040217699 Organic light emitting full color display panel
11/04/2004	US20040217410 Enhanced atomic layer deposition
11/04/2004	US20040217354 Display device and manufacturing method thereof
11/04/2004	US20040217217 Gas supplying apparatus
11/04/2004	US20040216998 Cover ring and shield supporting a wafer ring in a plasma reactor
11/04/2004	US20040216844 Blocker plate by-pass for remote plasma clean
11/04/2004	US20040216769 Method of cleaning a plasma processing apparatus
11/04/2004	US20040216768 For semiconductor and flat panel display manufacturing; converting a hydrogen fluoride feed gas to fluorine cleaning gas; separating HF from F2 by cryogenic condensation; activating F2 then pumping to CVD chamber; minimal pollution
11/04/2004	US20040216678 Wafer Holder for Semiconductor Manufacturing Equipment and Semiconductor Manufacturing Equipment in Which It Is Installed
11/04/2004	US20040216675 Deposited film forming method and apparatus
11/04/2004	US20040216672 Processing apparatus and processing method
11/04/2004	US20040216671 Chemical vapor deposition apparatuses
11/04/2004	US20040216670 Process for the ALD coating of substrates and apparatus suitable for carrying out the process
11/04/2004	US20040216669 Vaporizer
11/04/2004	US20040216668 Showerhead assembly and ALD methods
11/04/2004	US20040216667 Internal member of a plasma processing vessel
11/04/2004	US20040216666 Device for supplying a process chamber with fluid media
11/04/2004	US20040216665 Method and apparatus for depositing thin films on a surface
11/04/2004	DE10317208A1 Plasmadepositionsverfahren Plasma deposition process
11/03/2004	EP1473761A1 Method for depositing metal films
11/03/2004	EP1473606A1 Safety network system, safety slave, and communication method
11/03/2004	EP1473384A1 Vaporizer
11/03/2004	EP1473383A2 Method for producing polycrystalline silicon germanium and suitable for micromachining
11/03/2004	EP1473381A1 Method for preventing the deposition of contaminating particles on the surface of a microcomponent, Storage device for a microcomponent and thin film deposition device
11/03/2004	EP1473380A2 Metal barrier film production apparatus, metal barrier film production method, metal film production method, and metal film production apparatus
11/03/2004	EP1473379A2 Metal barrier film production apparatus, metal barrier film production method, metal film production method, and metal film production apparatus
11/03/2004	EP1473101A1 Surface-coated cutting tool
11/03/2004	EP1472719A2 Reactor assembly and processing method
11/03/2004	EP1472387A1 Corona-generated chemical vapor deposition on a substrate
11/03/2004	EP1472195A1 Method for coating the quartz burner of an hid lamp
11/03/2004	EP1212476B1 Dielectric films and methods of forming same
11/03/2004	EP1194611B1 Installation and method for vacuum treatment or the production of powder
11/03/2004	CN2652948Y Device for preparing crystal carbon nitride film
11/03/2004	CN1543665A Methods of forming metal-comprising materials and capacitor electrodes; and capacitor constructions
11/03/2004	CN1543516A Surface treatment system and method
11/03/2004	CN1543515A Application of dense plasmas generated at atmospheric pressure for treating gas effluents
11/03/2004	CN1543514A Coatings with low permeation of gases and vapors
11/03/2004	CN1543513A Surface treatment system and method thereof
11/03/2004	CN1543512A Surface treatment system and method
11/03/2004	CN1543272A Deposition method and device for organic electroluminescent protective film
11/03/2004	CN1542939A 基片支撑件 A substrate support member
11/03/2004	CN1542918A Vaporizer
11/03/2004	CN1542917A Method for growing p type zinc oxide crystal film by real-time nitrogen doping
11/03/2004	CN1542916A Method for preparing p type crystal film
11/03/2004	CN1542915A p-Zn1-XMgXO crystal film and method for making same
11/03/2004	CN1542907A Substrate processing apparatus
11/03/2004	CN1542171A Metal organic compound vapor deposition device for the growth of zinc oxide semiconductor film
11/03/2004	CN1542162A Double heater in situ chemical vapor deposition one step process for preparing magnesium boride superconducting film
11/03/2004	CN1541960A Die assembly for producing optical glass products and manufacturing method thereof
11/03/2004	CN1541959A Die assembly for producing optical glass products and manufacturing method thereof
11/03/2004	CN1541958A Die assembly for producing optical glass products and manufacturing method thereof
11/03/2004	CN1174471C Method of eliminating edge effect in chemical vapor deposition of metal
11/03/2004	CN1174470C Transverse epitaxial growth process of high-quality gallium nitride film
11/03/2004	CN1174117C Plasma treatment of thermal CVD tan films from tantalum halide precursors

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