| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 12/14/2004 | US6830631 Removing water, desorption by feeding second polar gas molecules, inert gas, nitrogen, or ammonia; processing semiconductor and microelectronics |
| 12/14/2004 | US6830624 Blocker plate by-pass for remote plasma clean |
| 12/14/2004 | US6830622 Corrosion resistant component of semiconductor processing equipment such as a plasma chamber |
| 12/14/2004 | US6830007 Apparatus and method for forming low dielectric constant film |
| 12/09/2004 | WO2004106584A1 Method and apparatus for generating a precursor for a semiconductor processing system |
| 12/09/2004 | WO2004106583A1 Precursor solution used for the cvd method and use thereof in the production of thin films |
| 12/09/2004 | WO2004106008A2 Substrate handling system |
| 12/09/2004 | WO2004105972A1 Cleaning a component of a process chamber |
| 12/09/2004 | WO2004078406A3 One piece shim |
| 12/09/2004 | WO2004072323A3 High reflectivity atmospheric pressure furnace for preventing contamination of a work piece |
| 12/09/2004 | WO2004064407A3 Tunable gas distribution plate assembly |
| 12/09/2004 | WO2004033752A3 Two-layer film for next generation damascene barrier application with good oxidation resistance |
| 12/09/2004 | WO2004027816A3 A method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| 12/09/2004 | WO2003106011A3 A method for producing organometallic compounds |
| 12/09/2004 | US20040248404 Reactive preclean prior to metallization for sub-quarter micron application |
| 12/09/2004 | US20040248393 Method of manufacturing semiconductor device and the semiconductor device |
| 12/09/2004 | US20040248391 Lifting and supporting device |
| 12/09/2004 | US20040248361 Methods of forming MIM type capacitor structures using low temperature plasma processing |
| 12/09/2004 | US20040248345 [method of fabricating a polysilicon thin film] |
| 12/09/2004 | US20040247949 multilayer; high strength; bonding strength; adhesion layer includes amorphous carbon nitride; plasma polymerizable organic film and vapor deposition inorganic film; electronics; stress resistance; waterproofing; oxidation resistance |
| 12/09/2004 | US20040247948 Plasma vapor deposition; protective coatings for plastic substrate |
| 12/09/2004 | US20040247947 comprises sapphire single crystal substrate and contoured/flat underfilm; usable for semiconductor films constituting light-emitting diode or high velocity integrated circuit chip |
| 12/09/2004 | US20040247926 Aluminum oxide coated honeycomb for S2S and S3S sealing system with extended oxidation life |
| 12/09/2004 | US20040247911 Chemical vapor deposition mixture of a cyclopentadienyl complex, which is easily recycled, and a beta-diketonato organometallic, which has high adhesiveness to silicon dioxide; semiconductors |
| 12/09/2004 | US20040247905 Reacting copper complex and reducing agents; vapor deposition |
| 12/09/2004 | US20040247799 Plasma enhanced chemical vapor deposition apparatus |
| 12/09/2004 | US20040247788 Bulk tungsten deposition by positioning and exposing substrate surface to a diborane soak; nucleation by alternately pulsing tungsten compound borane, diborane, silane, and/or dichlorosilane; cyclical, chemical, or physical vapor deposition |
| 12/09/2004 | US20040247787 Effluent pressure control for use in a processing system |
| 12/09/2004 | US20040247786 Metallization; forming plurality of openings contiguous substrate; forming second metal layer by oblique evaporation; seeding amorphous silicon; crystallization; chemical vapor deposition; controlling grain size and distribution; reducing interfaces in channel of thin film transistors |
| 12/09/2004 | US20040247780 Ion beam-assisted high-temperature superconductor (HTS) deposition for thick film tape |
| 12/09/2004 | US20040247779 Threading substrate strands through reactor;mixing yttrium-barium-copper oxide superconducting precursor vapor with inert gas, nitrous oxide, and oxygen; energizing diatomic oxygen to form monoatomic oxygen and excite precursors to high energy state; microwave plasma injection; continuous translation |
| 12/09/2004 | US20040247522 inverted population of hydrogen, formed from a novel catalytic reaction of hydrogen atoms to form lower-energy hydrogen; laser light may be converted to electricity |
| 12/09/2004 | US20040245935 Plasma-processing apparatus |
| 12/09/2004 | US20040245322 Brazing of alumina coated honeycomb and fiber metal |
| 12/09/2004 | US20040245097 Adaptable processing element for a processing system and a method of making the same |
| 12/09/2004 | US20040245091 Etching, depositing cycles using hydrogen and helium gases; reducing sputtering; high density plasma vapor deposition |
| 12/09/2004 | US20040245089 Roughening exposure surfaces to improve adhesion; belt sanding; vapor deposition, etching |
| 12/09/2004 | US20040244695 Holder for Use in Semiconductor or Liquid-Crystal Manufacturing Device and Semiconductor or Liquid-Crystal Manufacturing Device in Which the Holder Is Installed |
| 12/09/2004 | US20040244690 Surface treatment system and method thereof |
| 12/09/2004 | US20040244689 Method for reducing physisorption during atomic layer deposition |
| 12/09/2004 | US20040244688 Plasma processing apparatus |
| 12/09/2004 | US20040244686 Surface treatment system, surface treatment method and product produced by surface treatment method |
| 12/09/2004 | US20040244640 platelet-shaped substrate comprising an aluminium oxide monocrystal and having a thickness of greater than 250 nm and less than 1 mu m which is completely surrounded by a metal layer; automobile paints, cosmetics |
| 12/09/2004 | US20040244384 Heating medium circulating device and thermal, treatment equipment using the device |
| 12/09/2004 | DE19502862B4 Sensor auf FET-Basis FET-based sensor |
| 12/09/2004 | DE10323085A1 CVD-Beschichtungsvorrichtung CVD coating apparatus |
| 12/08/2004 | EP1484788A1 High-frequency power supply structure and plasma cvd device using the same |
| 12/08/2004 | EP1484434A1 Method for removing titanium based coating film or oxide of titanium |
| 12/08/2004 | EP1484429A1 Semiconductor or liquid crystal producing device |
| 12/08/2004 | EP1484293A1 Method for forming transparent thin film, transparent thin film formed by the method and transparent substrate with transparent thin film |
| 12/08/2004 | EP1483784A2 Method for forming thin film layers by simultaneous doping and sintering |
| 12/08/2004 | EP1483782A1 Production method of sic monitor wafer |
| 12/08/2004 | EP1483428A1 Diamond electrode |
| 12/08/2004 | EP1483426A1 Apparatus and method for applying diamond-like carbon coatings |
| 12/08/2004 | EP1483222A2 Components with bearing or wear-resistant surfaces |
| 12/08/2004 | EP1483113A1 Method of making window unit including diamond-like carbon (dlc) coating |
| 12/08/2004 | CN2661702Y External heat gradient vapor deposition furnace for manufacturing charcoal brake disk of airplane |
| 12/08/2004 | CN1553969A Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical |
| 12/08/2004 | CN1553968A Method and apparatus for deposition of boron-phosphorus silicate glass |
| 12/08/2004 | CN1552943A Rapid process for producing multilayer barrier coatings |
| 12/08/2004 | CN1552653A Self-cleaning glass of nanometer composite membrane with multifunctional two-photon |
| 12/08/2004 | CN1179402C Production technology of semiconductor device |
| 12/08/2004 | CN1179067C Depositing gamma-aluminium oxide by steam deposition method |
| 12/08/2004 | CN1179066C Gate switch equipment of continuous polymerization system using plasma |
| 12/08/2004 | CN1178732C Auto-switching gas delivery system utilizing sub-atmospheric pressure gas supply vessels |
| 12/07/2004 | US6828256 Methods for forming metal-containing films using metal complexes with chelating O- and/or N-donor ligands |
| 12/07/2004 | US6828254 Plasma enhanced chemical vapor deposition apparatus and method for forming nitride layer using the same |
| 12/07/2004 | US6828246 Gas delivering device |
| 12/07/2004 | US6828243 Apparatus and method for plasma treatment |
| 12/07/2004 | US6828241 Efficient cleaning by secondary in-situ activation of etch precursor from remote plasma source |
| 12/07/2004 | US6828235 Semiconductor manufacturing method, substrate processing method, and semiconductor manufacturing apparatus |
| 12/07/2004 | US6828218 Method of forming a thin film using atomic layer deposition |
| 12/07/2004 | US6828182 Epitaxial thin film forming method |
| 12/07/2004 | US6827987 Plasma enhanced chemical vapor deposition (PECVD); by depositing a conductive layer onto a top surface of a susceptor support plate within a deposition chamber to dissipate electrostatic charge on bottom of the substrate |
| 12/07/2004 | US6827982 Binder-enriched silicalite adhesion layer and apparatus for fabricating the same |
| 12/07/2004 | US6827978 Deposition of tungsten films |
| 12/07/2004 | US6827977 Method of making window unit including diamond-like carbon (DLC) coating |
| 12/07/2004 | US6827975 Method of coating cutting tools |
| 12/07/2004 | US6827974 For preparing vaporized reactants for chemical vapor deposition with a magnetically driven, seal-less motor |
| 12/07/2004 | US6827972 Heterogeneous structure from amorphous carbon material with a polymer tendency applied as a coating on a substrate of polymer material |
| 12/07/2004 | US6827871 Ruthenium and ruthenium dioxide removal method and material |
| 12/07/2004 | US6827815 Showerhead assembly for a processing chamber |
| 12/07/2004 | US6827796 High strength alloys and methods for making same |
| 12/07/2004 | US6827789 Isolation chamber arrangement for serial processing of semiconductor wafers for the electronic industry |
| 12/07/2004 | US6827788 Substrate processing device and through-chamber |
| 12/07/2004 | US6827787 Conveyor device and film formation apparatus for a flexible substrate |
| 12/02/2004 | WO2004105149A1 Barrier films for plastic substrates fabricated by atomic layer deposition |
| 12/02/2004 | WO2004105115A1 Cvd method for forming silicon nitride film |
| 12/02/2004 | WO2004105114A1 Method of forming fluorinated carbon film |
| 12/02/2004 | WO2004105083A2 System and method for forming multi-component dielectric films |
| 12/02/2004 | WO2004105079A1 Device for area-based surface treatment of an article by electric dielectric barrier discharge |
| 12/02/2004 | WO2004105070A2 Vuv-excited device with blue-emitting phosphor |
| 12/02/2004 | WO2004104275A1 Electromagnetic rotation of platter |
| 12/02/2004 | WO2004104265A1 Cvd coating device |
| 12/02/2004 | WO2004104131A2 A method to encapsulate phosphor via chemical vapor deposition |
| 12/02/2004 | WO2004092441A3 Methods for producing silicon nitride films by vapor-phase growth |
| 12/02/2004 | WO2004077912A3 One piece shim |
| 12/02/2004 | WO2004072959A3 Disk coating system |
| 12/02/2004 | WO2004068541A3 Wafer handling apparatus |
| 12/02/2004 | WO2004051702A3 Apparatus for treating surfaces of a substrate with atmospheric pressure plasma |