Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2004
12/30/2004US20040261706 Method of growing a thin film onto a substrate
12/30/2004US20040261705 Mass flow controller and gas supplying apparatus having the same
12/30/2004US20040261704 Method and device for monitoring a CVD-process
12/30/2004US20040261703 Apparatus and method for controlled application of reactive vapors to produce thin films and coatings
12/30/2004US20040261702 Mechanically and thermodynamically stable amorphous carbon layers for temperature-sensitive surfaces
12/30/2004DE10326734A1 Milling cutter tool with synthetic diamond layer 1 to 500 micron thick, containing milling edge, which comprises structured profile by dry chemical etching with diminishing layer thickness
12/30/2004DE10323453A1 Plasma coating of plastic pipe, e.g. for lining drinking water pipe, involves moving the pipe relative to plasma zone to obtain gradient in coating
12/30/2004DE10258678B4 Schnelles Verfahren zur Herstellung von Multilayer-Barriereschichten Rapid method for the production of multi-layer barrier layers
12/29/2004WO2004114385A1 Evaporation method and evaporator
12/29/2004WO2004114377A1 Heat treatment apparatus
12/29/2004WO2004114366A2 Hdp-cvd multistep gapfill process
12/29/2004WO2004113586A1 Coating for a mechanical part, comprising at least one hydrogenated amorphous carbon, and method of depositing one such coating
12/29/2004WO2004113585A2 Atomic layer deposition of barrier materials
12/29/2004WO2004113584A1 Method dor producing coated metal wire
12/29/2004WO2004082008A8 Cvd apparatus and method for cleaning cvd apparatus
12/29/2004WO2004080906A3 Method and system for coating a glass contacting surface with a thermal barrier and lubricous coating
12/29/2004EP1492160A1 Vaporizer, various devices using the same, and vaporizing method
12/29/2004EP1492159A1 Method of depositing cvd thin film
12/29/2004EP1491655A2 Stabilizers to inhibit the polymerization of substituted cyclotetrasiloxane
12/29/2004EP1491654A1 Proximity CVD deposition
12/29/2004EP1491255A1 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
12/29/2004EP1490896A1 Method of forming nanocrystals
12/29/2004EP1490529A1 Vapor deposition of silicon dioxide nanolaminates
12/29/2004EP1218558B1 Coated milling insert
12/29/2004CN2666931Y Apparatus for growing metal organic compound vapour phase deposit of zinc oxide crystal film
12/29/2004CN2666929Y Radio frequency electric power leading-in apparatus
12/29/2004CN2666928Y Apparatus for chemical gas phase depositing diamond film by plasma heat wire method
12/29/2004CN1559079A Heating system and method of reactor for heating atmosphere
12/29/2004CN1559077A Procedure and device for the production of a plasma
12/29/2004CN1558001A Substrate holder
12/29/2004CN1182597C Controlled conversion of metal oxyfluorides into superconducting oxides
12/29/2004CN1182273C Method for growing ZnO film by solid source chemical gas-phase deposition
12/28/2004US6835995 Low dielectric constant material for integrated circuit fabrication
12/28/2004US6835980 Semiconductor device with novel film composition
12/28/2004US6835975 DRAM circuitry having storage capacitors which include capacitor dielectric regions comprising aluminum nitride
12/28/2004US6835919 Uniform radial distribution of radicals emanating from a plasma source is improved; for chemical vapor deposition
12/28/2004US6835674 Methods for treating pluralities of discrete semiconductor substrates
12/28/2004US6835671 Method of making an integrated circuit using an EUV mask formed by atomic layer deposition
12/28/2004US6835669 Film forming method, semiconductor device and semiconductor device manufacturing method
12/28/2004US6835663 Hardmask of amorphous carbon-hydrogen (a-C:H) layers with tunable etch resistivity
12/28/2004US6835658 Method of fabricating capacitor with hafnium
12/28/2004US6835613 Method of producing an integrated circuit with a carbon nanotube
12/28/2004US6835523 Introducing an optical disk having a surface protected by a protective hard carbon film having thickness of 500 A or less, irradiating a semiconductor laser light on the disk through such hard carbon coating
12/28/2004US6835446 Surface-coated carbide alloy cutting tool
12/28/2004US6835425 Layer-forming method using plasma state reactive gas
12/28/2004US6835417 Method and device for depositing thin layers via ALD/CVD processes in combination with rapid thermal processes
12/28/2004US6835416 Apparatus for growing thin films
12/28/2004US6835414 Low energy plasma discharges; generation high frequency electromagnetic radiation in container
12/28/2004US6835278 Plasma is ignited from gases fed into a chamber that is located remotely from the processing chamber; activated species are introduced into the processing chamber via a dedicated inlet port, increasing conductance; efficiency
12/28/2004US6835275 Reducing deposition of process residues on a surface in a chamber
12/28/2004US6835221 Exhaust gas filtration device and auxiliary filtration device
12/28/2004US6834848 Atomizer
12/28/2004CA2128188C Gas producing apparatus and method and apparatus for manufacturing optical waveguide and optical fiber preform
12/23/2004WO2004112118A1 A method of fault detection in manufaturing equipment
12/23/2004WO2004112114A1 Process for depositing film, process for fabricating semiconductor device, semiconductor device and system for depositing film
12/23/2004WO2004112092A2 Adjustable gas distribution system
12/23/2004WO2004111300A2 Method for processing surfaces of aluminium alloy sheets and strips
12/23/2004WO2004111297A1 Treatment gas supply mechanism, film-forming device, and film-forming method
12/23/2004WO2004111296A2 Stress reduction of sioc low k film by addition of alkylenes to omcts based processes
12/23/2004WO2004110737A2 High rate deposition for the formation of high quality optical coatings
12/23/2004WO2004093163A3 Method and apparatus for silicone oxide deposition on large area substrates
12/23/2004WO2004092672A3 Amorphous carbon layer for heat exchangers
12/23/2004WO2004070817A3 Method of eliminating residual carbon from flowable oxide fill material
12/23/2004WO2004063417A3 Method to improve cracking thresholds and mechanical properties of low-k dielectric material
12/23/2004WO2004063416A3 Apparatus and method for solution plasma spraying
12/23/2004WO2004044963B1 Atomic layer deposition methods
12/23/2004WO2003097532A8 Process for manufacturing a gallium rich gallium nitride film
12/23/2004US20040260109 Method for preparing bis(cyclopentadienly)ruthenium and bis(cyclopentadienyl)ruthenium prepared by the method
12/23/2004US20040259385 Method of forming insulating film improved in electric insulating property
12/23/2004US20040259383 Method of forming a metal oxide film
12/23/2004US20040259275 Method of forming ferroelectric film
12/23/2004US20040258926 coating substrates with layer of crystal structure carbon, zirconium, multilayer coating comprising silver and/or nickel chromium alloys, then heat treating in an atmosphere including oxygen, for times sufficient for bending and/or tempering; carbiding; windshields; protective coatings
12/23/2004US20040258918 Diamond films and methods of making diamond films
12/23/2004US20040258851 Apparatus for high-throughput ion beam-assisted deposition (IBAD)
12/23/2004US20040258840 [method of stabilizing material layer]
12/23/2004US20040258547 Pump piston and/or elements sealing the pump piston, in particular a sealing ring of elastomeric material, and a device and method for coating an object of elastomeric material
12/23/2004US20040256351 Integration of ALD/CVD barriers with porous low k materials
12/23/2004US20040255868 Plasma etch resistant coating and process
12/23/2004US20040255864 ICP antenna and plasma generating apparatus using the same
12/23/2004US20040255863 Plasma process apparatus
12/23/2004US20040255862 Reactor for producing reactive intermediates for low dielectric constant polymer thin films
12/23/2004US20040255860 Rapid thermal processing apparatus and methods
12/23/2004US20040255859 Method and apparatus for delivering precursors
12/23/2004US20040255858 Gas valve assembly and apparatus using the same
12/23/2004US20040255856 Method and device for depositing a plurality of layers on a substrate
12/23/2004US20040255855 Metalorganic chemical vapor deposition (MOCVD) process and apparatus to produce multi-layer high-temperature superconducting (HTS) coated tape
12/23/2004US20040255854 Cvd apparatus and method of cleaning the cvd apparatus
12/23/2004US20040255843 Susceptor gaseous phase growing device, device and method for manufacturing epitaxial wafer, and epitaxial wafer
12/23/2004US20040255751 Musical instrument strings with polymer treated surface
12/23/2004CA2528702A1 Method for processing surfaces of aluminium alloy sheets and strips
12/22/2004EP1489651A1 Substrate processing device and substrate processing method, fast rotary valves, cleaning method
12/22/2004EP1489646A1 Cvd apparatus and method of cleaning the cvd apparatus
12/22/2004EP1489645A1 Cvd apparatus and method of cleaning the cvd apparatus
12/22/2004EP1489197A1 Method of manufacturing semiconductor device
12/22/2004EP1488443A1 Device for confinement of a plasma within a volume
12/22/2004EP1488023A1 Method for coating a substrate and device for carrying out the method
12/22/2004EP1488022A1 Method of forming a diamond coating on an iron-based substrate and use of such an iron-based substrate for hosting a cvd diamond coating
12/22/2004EP1487619A1 Self-sharpening cutting tool with hard coating
12/22/2004EP1487531A2 Coated microfluidic delivery system
12/22/2004EP1412552B1 Method for the production of coated substrates