| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/06/2005 | US20050000443 Apparatus for processing a substrate using plasma |
| 01/06/2005 | US20050000442 Upper electrode and plasma processing apparatus |
| 01/06/2005 | US20050000441 Process and device for depositing in particular crystalline layers on in particular crystalline substrates |
| 01/06/2005 | US20050000440 Plasma processing apparatus including a plurality of plasma processing units having reduced variation |
| 01/06/2005 | US20050000439 Flowing coating gas in a gas distribution conduit in a coating chamber, discharging laterally and exhausting spent coating gas in an annular baffle |
| 01/06/2005 | US20050000438 Apparatus and method for fabrication of nanostructures using multiple prongs of radiating energy |
| 01/06/2005 | US20050000437 Apparatus and method for fabrication of nanostructures using decoupled heating of constituents |
| 01/06/2005 | US20050000436 Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor |
| 01/06/2005 | US20050000435 Reactor for producing reactive intermediates for low dielectric constant polymer thin films |
| 01/06/2005 | US20050000434 Reactor for producing reactive intermediates for low dielectric constant polymer thin films |
| 01/06/2005 | US20050000433 Gas supplying apparatus and method of testing the same for clogs |
| 01/06/2005 | US20050000432 Suspended gas distribution manifold for plasma chamber |
| 01/06/2005 | US20050000431 Method of modifying source chemicals in an ALD process |
| 01/06/2005 | US20050000430 Showerhead assembly and apparatus for manufacturing semiconductor device having the same |
| 01/06/2005 | US20050000429 Spiral gas flow plasma reactor |
| 01/06/2005 | US20050000428 Method and apparatus for vaporizing and delivering reactant |
| 01/06/2005 | US20050000427 Gas supplying apparatus for atomic layer deposition |
| 01/06/2005 | US20050000426 Methods and apparatus for depositing a thin film on a substrate |
| 01/06/2005 | US20050000425 Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings |
| 01/06/2005 | US20050000423 Film forming device |
| 01/06/2005 | US20050000412 Silicon carbide with high thermal conductivity |
| 01/05/2005 | EP1494269A1 VAPOR PHASE GROWTH METHOD FOR Al-CONTAINING III-V GROUP COMPOUND SEMICONDUCTOR, AND METHOD AND DEVICE FOR PRODUCING Al-CONTAINING III-V GROUP COMPOUND SEMICONDUCTOR |
| 01/05/2005 | EP1493845A1 CVD coated cutting tool insert |
| 01/05/2005 | EP1493839A1 Plasma cvd film forming apparatus and method for manufacturing cvd film coating plastic container |
| 01/05/2005 | EP1493311A1 Gel and powder making |
| 01/05/2005 | EP1493175A1 Gas driven planetary rotation apparatus and methods for forming silicon carbide layers |
| 01/05/2005 | EP1493172A1 An atmospheric pressure plasma assembly |
| 01/05/2005 | EP1492901A1 Source gas delivery |
| 01/05/2005 | EP1492900A1 Component comprising a masking layer |
| 01/05/2005 | EP1492899A1 Method for coating a component |
| 01/05/2005 | EP1492724A1 Microfluidic devices with new inner surfaces |
| 01/05/2005 | EP1187945B1 Method for the plasma-supported reactive deposition of a material |
| 01/05/2005 | EP1038307A4 Surface modification of semiconductors using electromagnetic radiation |
| 01/05/2005 | CN1183578C Semiconductor making method and semiconductor making apparatus |
| 01/05/2005 | CN1183049C Method for preparing pre-formed articles with precisive distribution of refractive index by chemical gas phase deposition |
| 01/04/2005 | US6839505 Delivery of solid chemical precursors |
| 01/04/2005 | US6838645 Heater assembly for manufacturing a semiconductor device |
| 01/04/2005 | US6838573 Copper CVD precursors with enhanced adhesion properties |
| 01/04/2005 | US6838393 Method for producing semiconductor including forming a layer containing at least silicon carbide and forming a second layer containing at least silicon oxygen carbide |
| 01/04/2005 | US6838380 Fabrication of high resistivity structures using focused ion beams |
| 01/04/2005 | US6838327 Method for manufacturing semiconductor device having insulating film with N—H bond |
| 01/04/2005 | US6838308 Semiconductor polysilicon component and method of manufacture thereof |
| 01/04/2005 | US6838293 Method for controlling deposition of dielectric films |
| 01/04/2005 | US6838197 Silica layers and antireflection film using same |
| 01/04/2005 | US6838174 Skin-contact portion of the object to be in contact with the human's skin when used is coated with a carbon film that suppresses irritation of the human's skin; used to prevent bedsores and irritation from eyeglasses |
| 01/04/2005 | US6838127 Method and apparatus for forming an HSG-Si layer on a wafer |
| 01/04/2005 | US6838126 Method for forming I-carbon film |
| 01/04/2005 | US6838125 Method of film deposition using activated precursor gases |
| 01/04/2005 | US6838124 Deposition of fluorosilsesquioxane films |
| 01/04/2005 | US6838122 A substrate is positioned within a reactor, barium and strontium are provided within the reactor by flowing metal organic precursors, then titanium is porvided, an oxidizer is flowed to reactor to deposit barium strontium titinate |
| 01/04/2005 | US6838114 Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces |
| 01/04/2005 | US6838011 Method of processing PFC and apparatus for processing PFC |
| 01/04/2005 | US6837966 Method and apparatus for an improved baffle plate in a plasma processing system |
| 01/04/2005 | US6837952 Method for making a bowl in thermostructural composite material |
| 01/04/2005 | US6837944 Cleaning and drying method and apparatus |
| 01/04/2005 | US6837940 Film-forming device with a substrate rotating mechanism |
| 01/04/2005 | US6837939 Thermal physical vapor deposition source using pellets of organic material for making OLED displays |
| 01/04/2005 | US6837938 Apparatus associatable with a deposition chamber to enhance uniformity of properties of material layers formed on semiconductor substrates therein |
| 01/04/2005 | US6837937 Plasma processing apparatus |
| 01/04/2005 | US6837935 Microwave plasma film-forming apparatus for forming diamond film |
| 01/04/2005 | US6837483 Gate valve assembly |
| 01/04/2005 | US6837251 Multiple contents container assembly for ultrapure solvent purging |
| 01/04/2005 | US6837250 Selecting PFC(perfluorocarbon) gas mixture having ratio of perfluoroethane(C2H6) and carbon tetrachloride (CCl4), providing the first PFC gas mixture as the influent gas to the CVD chamber to create a CVD chamber effluent gas of second gas |
| 12/30/2004 | US20040266218 Methods for forming a gap filling layer using high density plasma |
| 12/30/2004 | US20040266217 Method of forming high dielectric film using atomic layer deposition and method of manufacturing capacitor having the high dielectric film |
| 12/30/2004 | US20040266181 Coated semiconductor wafer, and process and device for producing the semiconductor wafer |
| 12/30/2004 | US20040266175 Methods and apparatus for forming barrier layers in high aspect ratio vias |
| 12/30/2004 | US20040266169 Semiconductor device fabrication method |
| 12/30/2004 | US20040266157 Process for producing semiconductor layers based on III-V nitride semiconductors |
| 12/30/2004 | US20040266143 Method of forming semiconductor device |
| 12/30/2004 | US20040266142 Method and device for the production of thin epiatctic semiconductor layers |
| 12/30/2004 | US20040266123 Electron beam treatment of SixNy films |
| 12/30/2004 | US20040266055 Methods for the control of flatness and electron mobility of diamond coated silicon and structures formed thereby |
| 12/30/2004 | US20040266034 Method for forming ferroelectric film and semiconductor device |
| 12/30/2004 | US20040266011 In-situ analysis method for atomic layer deposition process |
| 12/30/2004 | US20040265649 Coated high temperature superconducting tapes, articles, and processes for forming same |
| 12/30/2004 | US20040265648 Coated cutting tool insert for machining of cast irons |
| 12/30/2004 | US20040265640 Energy gradient ion beam deposition of carbon overcoats on rigid disk media for magnetic recordings |
| 12/30/2004 | US20040265600 Material for forming copper undercoat films |
| 12/30/2004 | US20040265541 Cutting tool insert of cemented carbide, cermet or ceramic coated with a medium temperature chemical vapor deposited-Ti(C,N)-layer composed of equiaxed grains with grain size of 50-300 nm and having a length-to-width ratio (L/W)<3. |
| 12/30/2004 | US20040265195 Gas injector for use in semiconductor fabricating apparatus |
| 12/30/2004 | US20040264044 Composite coating device and method of forming overcoat on magnetic head using the same |
| 12/30/2004 | US20040263819 Airtight processing apparatus, airtight processing method, and electron beam processing apparatus |
| 12/30/2004 | US20040263083 System and method for inductive coupling of an expanding thermal plasma |
| 12/30/2004 | US20040262761 Metal thin film of semiconductor device and method for forming same |
| 12/30/2004 | US20040262708 Semiconductor device and method of fabricating the same |
| 12/30/2004 | US20040262613 Silicon nitride film, a semiconductor device, a display device and a method for manufacturing a silicon nitride film |
| 12/30/2004 | US20040262254 Processed object processing apparatus, processed object processing method, pressure control method, processed object transfer method, and transfer apparatus |
| 12/30/2004 | US20040261896 Canister guard |
| 12/30/2004 | US20040261815 Three-step chamber cleaning process for deposition tools |
| 12/30/2004 | US20040261722 Multi-thermal zone shielding apparatus |
| 12/30/2004 | US20040261721 Substrate support having dynamic temperature control |
| 12/30/2004 | US20040261720 High-density plasma processing apparatus |
| 12/30/2004 | US20040261719 Proximity deposition |
| 12/30/2004 | US20040261716 Deposition film forming apparatus and deposition film forming method |
| 12/30/2004 | US20040261714 Plasma processing apparatus |
| 12/30/2004 | US20040261713 Monitoring system for plasma deposition facility |
| 12/30/2004 | US20040261712 Plasma processing apparatus |
| 12/30/2004 | US20040261711 Apparatus and system for, and method of supplying process gas in semiconductor device manufacturing equipment |
| 12/30/2004 | US20040261710 Processing apparatus, transferring apparatus, and transferring method |