| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/13/2005 | US20050008352 Substrate processing method |
| 01/13/2005 | US20050006801 Gas flow; agglomeration; applying electrostatic, magnetic force to discharging; spinning; drawing |
| 01/13/2005 | US20050006799 Method and apparatus to help promote contact of gas with vaporized material |
| 01/13/2005 | US20050006689 Devices containing platinum-iridium films and methods of preparing such films and devices |
| 01/13/2005 | US20050006674 Semiconductor device and method for manufacturing semiconductor device |
| 01/13/2005 | US20050006665 Carbon containing silicon oxide film having high ashing tolerance and adhesion |
| 01/13/2005 | US20050006556 In situ substrate holder leveling method and apparatus |
| 01/13/2005 | US20050006337 Fixing partition walls to substrate; prevent charging particles from entering pixels; solidification, curing liquid |
| 01/13/2005 | US20050006220 Ionizing a gas; supplying electricity field to activation |
| 01/13/2005 | US20050005892 Piston for internal combustion engine |
| 01/13/2005 | US20050005858 Susceptor with epitaxial growth control devices and epitaxial reactor using the same |
| 01/13/2005 | US20050005855 Plasma enhanced pulsed layer deposition |
| 01/13/2005 | US20050005854 Surface wave plasma treatment apparatus using multi-slot antenna |
| 01/13/2005 | US20050005853 Device for the coating of objects |
| 01/13/2005 | US20050005851 Roll-vortex plasma chemical vapor deposition system |
| 01/13/2005 | US20050005849 Semiconductor processing system |
| 01/13/2005 | US20050005848 Apparatus for forming a film and an electroluminescence device |
| 01/13/2005 | DE10242752B4 Vorrichtung und Verfahren zum automatischen Beschicken einer Vielzahl von Bearbeitungsstationen sowie Beschichtungsanlage mit einer derartigen Vorrichtung Apparatus and method for automatically feeding a plurality of processing stations as well as coating installation with such a device |
| 01/13/2005 | DE102004029911A1 Production of inorganic layers on a substrate comprises using a hot gas stream and a carrier gas stream containing a precursor which is cooler than the hot gas stream |
| 01/13/2005 | CA2529095A1 Aluminum phosphate coatings |
| 01/13/2005 | CA2528839A1 Hydrogen sulfide injection method for phosphor deposition |
| 01/12/2005 | EP1496138A1 Processing system, processing method and mounting member |
| 01/12/2005 | EP1496137A1 Method of rational large volume CVD production |
| 01/12/2005 | EP1495485A2 Remote monitoring system for chemical liquid delivery |
| 01/12/2005 | EP1495169A1 Dislocation reduction in non-polar gallium nitride thin films |
| 01/12/2005 | EP1495168A1 Non-polar a-plane gallium nitride thin films grown by metalorganic chemical vapor deposition |
| 01/12/2005 | EP1495167A1 NON-POLAR (A1,B,In,Ga) QUANTUM WELL AND HETEROSTRUCTURE MATERIALS AND DEVICES |
| 01/12/2005 | EP1495156A2 Deposition methods utilizing phased array microwave excitation, and deposition apparatuses |
| 01/12/2005 | EP1495155A1 Low contamination components for semiconductor processing apparatus and methods for making components |
| 01/12/2005 | EP1097251A4 System and method for reducing particles in epitaxial reactors |
| 01/12/2005 | CN1565046A CVD device with cleaning mechanism using fluorine gas and method of cleaning CVD device with fluorine gas |
| 01/12/2005 | CN1563484A Wedge shaped reaction tube in use for equipment of metal organic chemical vapor deposition |
| 01/12/2005 | CN1563483A Bilayer inlet gas spray nozzle in use for metal-organic chemical vapor deposition device |
| 01/12/2005 | CN1563482A Equipment for fabricating nesa of stannic oxide |
| 01/12/2005 | CN1563481A Method for growth of InN film through In deposition in advance |
| 01/12/2005 | CN1563480A Method for depositing carbon cone of diamond |
| 01/12/2005 | CN1563479A Nano crystallitic film of diamond, and preparation method |
| 01/12/2005 | CN1563478A Preparing thick wall sheet material of carbon/carbon composite material through chemical vapor deposition of thermal gradient |
| 01/12/2005 | CN1563477A Heating unit in use for metal-organic chemical vapor deposition system |
| 01/12/2005 | CN1184673C Method for dipositing high-dielectric constant material on chip using atomic layer diposition method |
| 01/12/2005 | CN1184671C Method and equipment for supplying liquid raw material |
| 01/12/2005 | CN1184353C Method for cleaning gas distributor of chemical gas-phase depositing reaction chamber |
| 01/12/2005 | CN1184348C Method for selectively depositing bismuth based ferroelectric films |
| 01/12/2005 | CN1184142C Techique for preparing ceramic powder of titanium carbide by using plasma chemical gas phase synthesis method |
| 01/12/2005 | CA2473332A1 Method for coating and/or partial extrusion-coating of flexible, elongated products |
| 01/11/2005 | US6841943 Plasma processor with electrode simultaneously responsive to plural frequencies |
| 01/11/2005 | US6841789 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 01/11/2005 | US6841489 Method of manufacturing a semiconductor device and method of forming a film |
| 01/11/2005 | US6841485 Method of manufacturing semiconductor device and manufacturing line thereof |
| 01/11/2005 | US6841265 Easily achieves an ultra-high vacuum in a short time through vacuum evacuation; Useful for semiconductors industrise, for high energy physics and solid surface science |
| 01/11/2005 | US6841203 Method of forming titanium film by CVD |
| 01/11/2005 | US6841141 Fluorine source; Cl2, Br2 or I2 source; processing chamber; and energy source; especially for preparing |
| 01/11/2005 | US6841044 Chemically-enhanced physical vapor deposition |
| 01/11/2005 | US6841006 Mutlistage pressurized vapor deposition; for semiconductors |
| 01/11/2005 | US6840988 Solvated ruthenium precursors for direct liquid injection of ruthenium and ruthenium oxide |
| 01/11/2005 | US6840767 Susceptor pocket profile to improve process performance |
| 01/11/2005 | US6840252 Multiple contents container assembly for ultrapure solvent purging |
| 01/11/2005 | US6840061 Coatings on substrates |
| 01/06/2005 | WO2005002020A2 Apparatus for high-throughput ion beam assisted deposition (ibad) |
| 01/06/2005 | WO2005001925A1 Vacuum processing device operating method |
| 01/06/2005 | WO2005001918A1 Traps for particle entrapment in deposition chambers |
| 01/06/2005 | WO2005001910A1 Apparatus for controlling flow rate of gases used in semiconductor device by differential pressure |
| 01/06/2005 | WO2005000765A2 Dummy wafer and method for manufacture thereof |
| 01/06/2005 | WO2005000440A1 Trapping device, processing system, and method for removing impurities |
| 01/06/2005 | WO2004099463A3 Tool and method for the chemical vapor deposition of a two-phase layer on a substrate member |
| 01/06/2005 | WO2004095530A3 Adjoining adjacent coatings on an element |
| 01/06/2005 | WO2004000003A3 Controlled alignment of catalytically grown nanostructures in a large-scale synthesis process |
| 01/06/2005 | WO2003107404A8 Vapor phase epitaxial apparatus and vapor phase epitaxial method |
| 01/06/2005 | WO2003066516A8 Hydrogen power, plasma, and reactor for lasing, and power conversion |
| 01/06/2005 | US20050005324 Gene promoters isolated from potato and use thereof |
| 01/06/2005 | US20050003680 Methods of forming deuterated silicon nitride-containing materials |
| 01/06/2005 | US20050003663 Integrated circuit having barrier metal surface treatment prior to Cu deposition |
| 01/06/2005 | US20050003662 Methods for forming aluminum containing films utilizing amino aluminum precursors |
| 01/06/2005 | US20050003655 MOCVD process using ozone as a reactant to deposit a metal oxide barrier layer |
| 01/06/2005 | US20050003644 Process for chemical vapor deposition of a nitrogen-doped titanium oxide coating |
| 01/06/2005 | US20050003600 Gas treating device and gas treating method |
| 01/06/2005 | US20050003240 Wear and corrosion resistance; chemical resistance |
| 01/06/2005 | US20050003239 Work piece with a hard film of AICr-containing material, and process for its production |
| 01/06/2005 | US20050003238 Coatings for cutting tools |
| 01/06/2005 | US20050003213 Irradiating with ultraviolet radiation; depressurization |
| 01/06/2005 | US20050003194 Method for making diamond-coated composite materials |
| 01/06/2005 | US20050003124 Silicon oxide barrier coated with protective hydrogenated amorphous carbon film; prevent gas deposition by low pressure plasma |
| 01/06/2005 | US20050003098 Flash evaporation-plasma coating deposition method |
| 01/06/2005 | US20050003089 Method of forming a carbon nano-material layer using a cyclic deposition technique |
| 01/06/2005 | US20050003088 Method of depositing thin film on wafer |
| 01/06/2005 | US20050003075 Volatile copper(II) complexes for deposition of copper films by atomic layer deposition |
| 01/06/2005 | US20050002851 Using metallic catalyst, such as iron or molybdenum, on catalyst support; heating hydrocarbons |
| 01/06/2005 | US20050001527 Plasma processing apparatus |
| 01/06/2005 | US20050001512 Surface acoustic wave device |
| 01/06/2005 | US20050000956 Ceramic Susceptor |
| 01/06/2005 | US20050000937 Temperature control system in an ALD chamber |
| 01/06/2005 | US20050000656 Apparatus for atmospheric pressure reactive atom plasma processing for surface modification |
| 01/06/2005 | US20050000655 Inductive plasma chamber having multi discharge tube bridge |
| 01/06/2005 | US20050000564 Substrate with transparent conductive oxide film, process for its production and photoelectric conversion element |
| 01/06/2005 | US20050000454 Substrate handling system |
| 01/06/2005 | US20050000452 Electromagnetic rotation of platter |
| 01/06/2005 | US20050000451 Clamping jig for semiconductor laser bars |
| 01/06/2005 | US20050000449 Susceptor for epitaxial growth and epitaxial growth method |
| 01/06/2005 | US20050000446 Plasma processing apparatus and plasma processing method |
| 01/06/2005 | US20050000445 Plasma processing device and plasma processing method |