| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/20/2005 | US20050011455 Plasma process apparatus and its processor |
| 01/20/2005 | US20050011453 Plasma processing method and apparatus |
| 01/20/2005 | US20050011451 Impedance matching network with termination of secondary RF frequencies |
| 01/20/2005 | US20050011450 Plasma treatment apparatus, matching box, impedance matching device, and coupler |
| 01/20/2005 | US20050011449 Gas delivery system for deposition processes, and methods of using same |
| 01/20/2005 | US20050011448 Gasification monitor, method for detecting mist, film forming method and film forming apparatus |
| 01/20/2005 | US20050011447 Method and apparatus for delivering process gas to a process chamber |
| 01/20/2005 | US20050011446 Method and apparatus for removing external components from a process chamber without compromising process vacuum |
| 01/20/2005 | US20050011445 Apparatus and method for in-situ cleaning of a throttle valve in a CVD system |
| 01/20/2005 | US20050011444 Vapor deposition systems having separate portions configured for purging using different materials and methods of operating same |
| 01/20/2005 | US20050011442 Plasma processing material reclamation and reuse |
| 01/20/2005 | US20050011441 Processing system, processing method and mounting member |
| 01/20/2005 | US20050011436 Chemical vapor deposition reactor |
| 01/20/2005 | US20050011435 Method for depositing in particular crystalline layers |
| 01/20/2005 | US20050011434 Silicon crystallization using self-assembled monolayers |
| 01/20/2005 | US20050011351 Pressure control apparatus and method of establishing a desired level or pressure within at least one processing chamber |
| 01/20/2005 | DE10338290B3 Container residual contents weighing device for container supplying chemical vapor deposition reactor for semiconductor chip or electronic component manufacture uses weighing cells mounted on platform supporting container |
| 01/20/2005 | DE10328842A1 Beschichtete Halbleiterscheibe und Verfahren und Vorrichtung zur Herstellung der Halbleiterscheibe Coated wafer and method and apparatus for producing the semiconductor wafer |
| 01/20/2005 | DE10322696B3 Plasma-assisted treatment of given substrate surface area, e.g. for structurizing or coating metal, alloy, semiconductor, insulator or dielectric, uses insulator with opening, to form discharge gap, between electrode and substrate |
| 01/19/2005 | EP1498910A2 Method for coating and/or partial overmoulding of flexible long products. |
| 01/19/2005 | EP1498654A1 Device for the treatment of workpieces |
| 01/19/2005 | EP1497849A1 Silicon parts for plasma reaction chambers |
| 01/19/2005 | EP1497481A2 Method and device for depositing thin layers on a substrate in a height-adjustable process chamber |
| 01/19/2005 | EP1497480A1 Thick films of yba sb 2 /sb cu sb 3 /sb o sb 7-y /sb and preparation method thereof |
| 01/19/2005 | EP1497476A1 Process of masking cooling holes of a gas turbine component |
| 01/19/2005 | EP1497226A2 Method for producing nitrides |
| 01/19/2005 | EP1419282B1 Method for producing a fluorescent material layer |
| 01/19/2005 | EP1153155B1 Planetary system workpiece support and method for surface treatment of workpieces |
| 01/19/2005 | EP0801606B1 Method for treating a surface |
| 01/19/2005 | CN2672082Y Heater in hot lamp filament chemical gas phase deposition device |
| 01/19/2005 | CN1568379A Methods for the production of components and ultra high vacuum cvd reactor |
| 01/19/2005 | CN1568376A Method of depositing a material layer |
| 01/19/2005 | CN1566023A Ceramic-metal and ceramic-ceramic light composite material and manufacturing method thereof |
| 01/19/2005 | CN1565710A Apparatus and method for point-of-use treatment of effluent gas streams |
| 01/19/2005 | CN1185694C Method and apparatus for forming film on substrate |
| 01/19/2005 | CN1185693C Method for forming low K value etching barrier and a semiconductor device |
| 01/19/2005 | CN1185365C Method for producing ceramic and apparatus for producing the same, semiconductor device and piezoelectric element |
| 01/19/2005 | CN1185241C Organic metal compound for chemical vapor deposition and its prepn and chemical vapor deposition process of ruthenium film or ruthenium compound film |
| 01/19/2005 | CN1185037C ESRF coolant degassing process |
| 01/18/2005 | US6844627 Metal film semiconductor device and a method for forming the same |
| 01/18/2005 | US6844528 Hot wall rapid thermal processor |
| 01/18/2005 | US6844527 Multi-thermal zone shielding apparatus |
| 01/18/2005 | US6844273 Precleaning method of precleaning a silicon nitride film forming system |
| 01/18/2005 | US6844271 Process of CVD of Hf and Zr containing oxynitride films |
| 01/18/2005 | US6844261 Method of forming ruthenium and ruthenium oxide films on a semiconductor structure |
| 01/18/2005 | US6844260 Insitu post atomic layer deposition destruction of active species |
| 01/18/2005 | US6844234 Semiconductor device and method for manufacturing semiconductor device |
| 01/18/2005 | US6844075 Silicon bonding layer, tantalum or niobium aluminate inter-mediate layer resistant to solid state subsurface reactions and topcoat inert to reactions with silica at high tempera-tures; gas turbine engines, heat exchangers |
| 01/18/2005 | US6844074 Quartz layer; vibrators, oscillators, high frequency filter surface acoustic wave elements, optical waveguides, semicon-ductors; atmospheric pressure vapor phase epitaxial deposited silicate on gallium nitride or zinc oxide buffered substrate |
| 01/18/2005 | US6844070 Low-temperature plasma deposited hydrogenated amorphous germanium carbon abrasion-resistant coatings |
| 01/18/2005 | US6844068 Slidably movable member and method of producing same |
| 01/18/2005 | US6843882 Gas flow control in a wafer processing system having multiple chambers for performing same process |
| 01/18/2005 | US6843881 Detecting chemiluminescent radiation in the cleaning of a substrate processing chamber |
| 01/18/2005 | US6843858 Method of cleaning a semiconductor processing chamber |
| 01/18/2005 | US6843842 Glass coating agent and method for coating glass material using the same |
| 01/18/2005 | US6843830 Abatement system targeting a by-pass effluent stream of a semiconductor process tool |
| 01/18/2005 | US6843809 Vacuum/purge operation of loadlock chamber and method of transferring a wafer using said operation |
| 01/18/2005 | US6843264 Multi-phase pressure control valve for process chamber |
| 01/18/2005 | US6843258 Converting a non-cleaning feed gas to a cleaning gas by heat, microwave, plasma or electric energy activation in a remote location and then delivering it to process chamber for cleaning |
| 01/18/2005 | US6843201 Temperature control for single substrate semiconductor processing reactor |
| 01/13/2005 | WO2005004221A2 Low-k-dielectric material |
| 01/13/2005 | WO2005004219A1 Pressure reduction process device, pressure reduction process method, and pressure regulation valve |
| 01/13/2005 | WO2005004215A1 Substrate processing system |
| 01/13/2005 | WO2005004214A1 Heat treatment apparatus and method of calibrating the apparatus |
| 01/13/2005 | WO2005003406A2 Apparatus and method for chemical source vapor pressure control |
| 01/13/2005 | WO2005003405A2 Method for producing surface-coated nanoscale particles by polymer-coating in the gas phase |
| 01/13/2005 | WO2005003404A2 Composite refractory metal carbide coating on a substrate and method for making thereof |
| 01/13/2005 | WO2005003403A1 Film forming method and film forming device using plasma cvd |
| 01/13/2005 | WO2005003402A2 Hydrogen sulfide injection method for phosphor deposition |
| 01/13/2005 | WO2005002979A2 Canister guard |
| 01/13/2005 | WO2004079814A3 Modulated/composited cvd low-k films with improved mechanical and electrical properties for nanoelectronic devices |
| 01/13/2005 | WO2004070078B1 METHOD OF FORMING A Ta2O5 COMPRISING LAYER |
| 01/13/2005 | WO2004054047A3 Optical uses of diamondoid-containing materials |
| 01/13/2005 | WO2004027112A3 An apparatus for the deposition of high dielectric constant films |
| 01/13/2005 | WO2004008054A9 Variable heater element for low to high temperature ranges |
| 01/13/2005 | WO2004007800A9 Thermal processing apparatus and method for evacuating a process chamber |
| 01/13/2005 | US20050009372 Dielectric material forming methods and enhanced dielectric materials |
| 01/13/2005 | US20050009371 System and method for forming a gate dielectric |
| 01/13/2005 | US20050009370 Composite dielectric forming methods and composite dielectrics |
| 01/13/2005 | US20050009369 Methods of forming a multi-layered structure using an atomic layer deposition process and methods of forming a capacitor of an integrated circuit device |
| 01/13/2005 | US20050009368 Methods of forming a phosphorus doped silicon dioxide comprising layer, and methods of forming trench isolation in the fabrication of integrated circuitry |
| 01/13/2005 | US20050009367 Novel method to increase fluorine stability to improve gap fill ability and reduce k value of fluorine silicate glass (FSG) film |
| 01/13/2005 | US20050009364 Semiconductor processing methods of chemical vapor depositing SiO2 on a substrate |
| 01/13/2005 | US20050009362 Method for forming dielectric thin film and dielectric thin film formed thereby |
| 01/13/2005 | US20050009361 Methods and apparatus for forming a high dielectric film and the dielectric film formed thereby |
| 01/13/2005 | US20050009347 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 01/13/2005 | US20050009336 Metal deposition apparatus used in fabrication of semiconductor devices and methods of forming metal layers using the same |
| 01/13/2005 | US20050009335 Apparatuses for treating pluralities of discrete semiconductor substrates; and methods for treating pluralities of discrete semiconductor substrates |
| 01/13/2005 | US20050009325 Atomic layer deposition of barrier materials |
| 01/13/2005 | US20050009309 Plasma CVD method |
| 01/13/2005 | US20050009266 Systems and methods for forming refractory metal oxide layers |
| 01/13/2005 | US20050009221 Method for manufacturing nitride film including high-resistivity GaN layer and epitaxial substrate manufactured by the method |
| 01/13/2005 | US20050008871 surface treatment with release agents; activation with plasma |
| 01/13/2005 | US20050008799 Solid organometallic compound-filled container and filling method thereof |
| 01/13/2005 | US20050008790 Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology |
| 01/13/2005 | US20050008781 Using organoic metallic compound of titanium, zirconium, hafnium, or lanthanum |
| 01/13/2005 | US20050008780 Vapor deposition of interior hollow surfaces; using organoaluminum compound; process control, uniformity |
| 01/13/2005 | US20050008779 Vapor deposition cycles; pulsation; miniaturized integrated circuits |
| 01/13/2005 | US20050008775 Method of forming dielectric optical thin film |
| 01/13/2005 | US20050008772 System and method of producing thin-film electrolyte |