| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/24/2005 | WO2005017937A2 Sensor array for measuring plasma characteristics in plasma processing enviroments |
| 02/24/2005 | WO2005017228A1 Method and an apparatus for applying a coating on a substrate |
| 02/24/2005 | WO2005006386A3 System and method for inductive coupling of an expanding thermal plasma |
| 02/24/2005 | US20050042889 Bi-layer approach for a hermetic low dielectric constant layer for barrier applications |
| 02/24/2005 | US20050042888 Precursor compositions and processes for MOCVD of barrier materials in semiconductor manufacturing |
| 02/24/2005 | US20050042887 Diffusion barrier |
| 02/24/2005 | US20050042885 Methods of reducing plasma-induced damage for advanced plasma CVD dielectrics |
| 02/24/2005 | US20050042883 Method of forming low-k films |
| 02/24/2005 | US20050042869 Substrate processing method and substrate processing apparatus |
| 02/24/2005 | US20050042863 Sputtering apparatus and manufacturing method of metal layer/metal compound layer by using thereof |
| 02/24/2005 | US20050042858 Method of improving stability in low k barrier layers |
| 02/24/2005 | US20050042800 Production method of sic monitor wafer |
| 02/24/2005 | US20050042568 Boat for heat treatment and vertical heat treatment equipment |
| 02/24/2005 | US20050042482 for steel; suppresses film spalling due to adhesion; layer of a carbide, nitride, carbonitride, boride, boronitride, borocarbonitride, oxide, oxycarbide, oxynitride, or oxycarbonitride; layer of aluminum oxide, zirconium oxide, hafnium oxide; layer of titanium boronitride |
| 02/24/2005 | US20050042465 Thermal CVD synthesis of nanostructures |
| 02/24/2005 | US20050042376 Controlled sulfur species deposition process |
| 02/24/2005 | US20050042374 Methods of depositing materials over substrates, and methods of forming layers over substrates |
| 02/24/2005 | US20050042373 Chemisorption ; contacting cycles |
| 02/24/2005 | US20050042372 Class of volatile compounds for the deposition of thin films of metals and metal compounds |
| 02/24/2005 | US20050042161 Vapor of acetylene and hydrogen in an inert gas other than He gas, is subjected to a suitable amount of energy to fragment some of the acetylene to form a ultrananocrystalline diamond film |
| 02/24/2005 | US20050041710 Semiconductor laser and method for manufacturing the same |
| 02/24/2005 | US20050041365 Haze-free bst films |
| 02/24/2005 | US20050040385 Non-polar (Al,B,In,Ga)N quantum well and heterostructure materials and devices |
| 02/24/2005 | US20050040342 Vessel for pretreatment of elementary analysis, method for analyzing elements, inductively coupled plasma torch and apparatus for elementary analysis |
| 02/24/2005 | US20050040034 Coating method and coating |
| 02/24/2005 | US20050039955 Apparatus for weighing out the remaining quantity of a substance in a storage vessel |
| 02/24/2005 | US20050039815 Gas supply apparatus and gas supply method |
| 02/24/2005 | US20050039794 Method and vessel for the delivery of precursor materials |
| 02/24/2005 | US20050039774 Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substrates |
| 02/24/2005 | US20050039773 Particle removal apparatus and method and plasma processing apparatus |
| 02/24/2005 | US20050039686 Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces |
| 02/24/2005 | US20050039681 Method and apparatus for depositing materials with tunable optical properties and etching characteristics |
| 02/24/2005 | US20050039680 Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers |
| 02/24/2005 | US20050039674 Atomic layer deposition method |
| 02/24/2005 | DE10335470A1 Verfahren und Vorrichtung zur Beschichtung oder Modifizierung von Oberflächen Method and apparatus for coating or modifying surfaces |
| 02/24/2005 | DE10138697B4 Verfahren und Vorrichtung zum Beschichten und Spritzblasen eines dreidimensionalen Körpers Method and apparatus for coating and injection blow molding of a three-dimensional body |
| 02/23/2005 | EP1509067A2 Vessel for pretreatment of elementary analysis, method for analysing elements, inductively coupled plasme torch and apparatus for elementary analysis |
| 02/23/2005 | EP1508631A1 Method and apparatus for the delivery of precursor materials |
| 02/23/2005 | EP1508630A1 Device for manufacturing dlc film-coated plastic container |
| 02/23/2005 | EP1508629A1 Method for removing a composite coating from a ceramic substrate |
| 02/23/2005 | EP1508525A1 Dlc film coated plastic container, and device and method for manufacturing the plastic container |
| 02/23/2005 | EP1507975A1 Methods of handling wind turbine blades and mounting said blades on a wind turbine, system and gripping unit for handling a wind turbine blade |
| 02/23/2005 | EP1507895A1 Rotary machine for cvd coatings |
| 02/23/2005 | EP1507894A1 Coating device comprising a conveying device |
| 02/23/2005 | EP1507893A1 Method and device for the plasma treatment of workpieces |
| 02/23/2005 | EP1507892A2 High-power microwave window |
| 02/23/2005 | EP1507891A1 Method and device for the plasma treatment of work pieces |
| 02/23/2005 | EP1507890A1 Method and device for plasma treating workpieces |
| 02/23/2005 | EP1507889A1 Method and device for plasma treating workpieces |
| 02/23/2005 | EP1507888A2 Plasma-enhanced chemical vapour deposition method for depositing silicon nitride or silicon oxynitride, method for producing one such layer arrangement, and layer arrangement |
| 02/23/2005 | EP1507887A2 Multistation coating device and method for plasma coating |
| 02/23/2005 | EP1507886A1 Method and device for plasma treating workpieces |
| 02/23/2005 | EP1507885A1 Method and device for plasma treatment of work pieces |
| 02/23/2005 | EP1507884A1 Method and device for plasma treating workpieces |
| 02/23/2005 | EP1507883A2 Sputter coating apparatus including ion beam source(s), and corresponding method |
| 02/23/2005 | EP1507881A1 Process of masking cooling holes of a gas turbine component |
| 02/23/2005 | EP1507723A1 Method and device for handling workpieces |
| 02/23/2005 | EP1507625A1 Thermal flux processing by scanning electromagnetic radiation |
| 02/23/2005 | CN1586001A Fluid controlling device and heat treating apparatus |
| 02/23/2005 | CN1585832A Systems and methods for epitaxially depositing films on semiconductor substrates |
| 02/23/2005 | CN1585676A Source liquid supply apparatus having a cleaning function |
| 02/23/2005 | CN1585219A Semiconductor laser and method for manufacturing the same |
| 02/23/2005 | CN1585093A Plasma processing system and cleaning method for the same |
| 02/23/2005 | CN1584353A Sliding member and production process thereof |
| 02/23/2005 | CN1584111A Metal organic source pressure closing ring controlling systems |
| 02/23/2005 | CN1584110A Device and method for manufacturing thin films |
| 02/23/2005 | CN1584109A Shower head, device and method for manufacturing thin films |
| 02/23/2005 | CN1584108A Organometallic compounds |
| 02/22/2005 | US6858923 Post-deposition treatment to enhance properties of Si-O-C low films |
| 02/22/2005 | US6858838 Neutral particle beam processing apparatus |
| 02/22/2005 | US6858697 Providing a neutral to weakly acidic polymerization inhibitor; used in a chemical vapor deposition process for silicon oxides in electronic material fabrication |
| 02/22/2005 | US6858548 Application of carbon doped silicon oxide film to flat panel industry |
| 02/22/2005 | US6858547 System and method for forming a gate dielectric |
| 02/22/2005 | US6858546 Method of depositing rare earth oxide thin films |
| 02/22/2005 | US6858536 Processes to form a metallic film stack |
| 02/22/2005 | US6858446 Plasma monitoring method and semiconductor production apparatus |
| 02/22/2005 | US6858265 Technique for improving chucking reproducibility |
| 02/22/2005 | US6858264 Chemical vapor deposition methods |
| 02/22/2005 | US6858263 Method of manufacturing aperture plate |
| 02/22/2005 | US6858259 Flash evaporating the polymer precursor, discharging the evaporate to form plasma by a glow discharge electrode, cryocondensing plasma polymerization, crosslinking |
| 02/22/2005 | US6858254 Easily loaded and unloaded getter device for reducing evacuation time and contamination in a vacuum chamber and method for use of same |
| 02/22/2005 | US6858251 Lanthanum complex and process for the preparation of a BLT layer using same |
| 02/22/2005 | US6858220 Implantable microfluidic delivery system using ultra-nanocrystalline diamond coating |
| 02/22/2005 | US6858195 Process for forming a low dielectric constant fluorine and carbon-containing silicon oxide dielectric material |
| 02/22/2005 | US6858153 Integrated low K dielectrics and etch stops |
| 02/22/2005 | US6858120 Method and apparatus for the fabrication of ferroelectric films |
| 02/22/2005 | US6858119 Mobile plating system and method |
| 02/22/2005 | US6858116 Sputtering target producing few particles, backing plate or sputtering apparatus and sputtering method producing few particles |
| 02/22/2005 | US6858112 Process depending on plasma discharges sustained by inductive coupling |
| 02/22/2005 | US6858087 Vacuum-processing method using a movable cooling plate during processing |
| 02/22/2005 | US6858085 Two-compartment chamber for sequential processing |
| 02/22/2005 | US6858078 Apparatus and method for diamond production |
| 02/22/2005 | US6858062 Residual gas removing device and method thereof |
| 02/22/2005 | US6857433 Terminating flow of vapor deposition gas to reactor, adding cleaning gas to react with the silicon nitride or oxide substance to form at least one volatile product, removing volatile product |
| 02/22/2005 | US6857388 Cold wall chemical vapor deposition apparatus with a heater control unit |
| 02/22/2005 | US6857387 Multiple frequency plasma chamber with grounding capacitor at cathode |
| 02/22/2005 | CA2296505C Corrosion-resistant multilayer coatings |
| 02/17/2005 | WO2005015622A1 Film forming method |
| 02/17/2005 | WO2005015620A1 Heat-treating apparatus |
| 02/17/2005 | WO2005015619A1 Substrate processing apparatus and method for manufacturing semiconductor device |