| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/10/2005 | US20050031797 Method and apparatus for forming hard carbon film |
| 02/10/2005 | US20050031785 Contacting a seeded substrate with gas mixture containing inert gas with methane, hydrogen, acetylene, fullerene, anthracene in presence of microwaves |
| 02/10/2005 | US20050031727 Honeycomb structural body forming ferrule and method of manufacturing the ferrule |
| 02/10/2005 | US20050031495 A liquid chemical storage canister, a pressurized gas source that feeds a pressurized gas into the storage canister, a vaporizer used to vaporize the liquid chemical supplied from the storage canister, a delivery line that connects the storage canister to the vaporizer, a liquid mass controller |
| 02/10/2005 | US20050029954 Plasma processing apparatus and method |
| 02/10/2005 | US20050029613 Transparent conductive film and its manufacturing method, and photoelectric transducer comprising it |
| 02/10/2005 | US20050029604 Atomic layer deposited Zr-Sn-Ti-O films using TiI4 |
| 02/10/2005 | US20050029571 Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by same |
| 02/10/2005 | US20050029570 Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by same |
| 02/10/2005 | US20050029547 Lanthanide oxide / hafnium oxide dielectric layers |
| 02/10/2005 | US20050028958 Hollow nickel shapes by vapor deposition |
| 02/10/2005 | US20050028935 Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems |
| 02/10/2005 | US20050028927 Supercritical fluid technology for cleaning processing chambers and systems |
| 02/10/2005 | US20050028841 Pneumatic valve; supplyin gpressurized gas; purging, cleaning, reuse of solvent |
| 02/10/2005 | US20050028838 Cleaning tantalum-containing deposits from process chamber components |
| 02/10/2005 | US20050028739 Semiconductor Manufacturing Apparatus |
| 02/10/2005 | US20050028738 Thermal treating apparatus |
| 02/10/2005 | US20050028737 Installation and method for vacuum treatment or powder production |
| 02/10/2005 | US20050028736 Gas temperature control for a plasma process |
| 02/10/2005 | US20050028735 Source gas delivery |
| 02/10/2005 | US20050028734 Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces |
| 02/10/2005 | US20050028733 Systems and methods of forming refractory metal nitride layers using disilazanes |
| 02/10/2005 | US20050028732 Chemical vapor deposition method |
| 02/10/2005 | DE19600946B4 Verfahren zur Verbesserung der Qualität einer Titannitridschicht, die Kohlenstoff und Sauerstoff enthält Includes methods for improving the quality of a titanium nitride layer, the carbon and oxygen |
| 02/10/2005 | CA2574816A1 Supercritical fluid-assisted deposition of materials on semiconductor substrates |
| 02/10/2005 | CA2534525A1 Ring plasma jet method and apparatus for making an optical fiber preform |
| 02/09/2005 | EP1505322A1 Sliding member and production process thereof |
| 02/09/2005 | EP1505174A1 Manufacturing method of silicon thin film solar cell |
| 02/09/2005 | EP1505173A1 Shower head, device and method for manufacturing thin films |
| 02/09/2005 | EP1505172A2 Device and method for manufacturing thin films |
| 02/09/2005 | EP1504813A1 Submerged plasma generator, method of generating plasma in liquid and method of decomposing toxic substance with plasma in liquid |
| 02/09/2005 | EP1504200A1 Slide element and method for production of said slide element |
| 02/09/2005 | EP1504138A2 Method for using low dielectric constant film by electron beam |
| 02/09/2005 | EP1461101A4 Metering valve and pharmaceutical metered dose inhaler and methods thereof |
| 02/09/2005 | CN1579011A Cvd apparatus and method of cleaning the cvd apparatus |
| 02/09/2005 | CN1579010A CVD apparatus and method of cleaning the CVD apparatus |
| 02/09/2005 | CN1579006A 处理系统 Processing System |
| 02/09/2005 | CN1577898A Manufacturing method of silicon thin film solar cell |
| 02/09/2005 | CN1577767A Silicon nitride film, a semiconductor device, a display device and a method for manufacturing a silicon nitride film |
| 02/09/2005 | CN1577745A Solid organometallic compound-filled container and filling method thereof |
| 02/09/2005 | CN1577744A Coated semiconductor wafer, and process and device for producing the semiconductor wafer |
| 02/09/2005 | CN1576392A Surface wave plasma treatment apparatus using multi-slot antenna |
| 02/09/2005 | CN1576391A Gas injector for use in semiconductor fabricating apparatus |
| 02/09/2005 | CN1576390A Mechanical enhancer additives for low dielectric films |
| 02/09/2005 | CN1188546C Method for reducing metal contamination during semiconductor processing in reactor having metal components |
| 02/09/2005 | CN1188541C Electric arc evaporimeter, method for driving electric arc evaporimeter and ion electroplating equipment |
| 02/09/2005 | CN1188361C Fibre-optical prefabricated bar processing apparartus by plasma technology |
| 02/08/2005 | US6853953 Method for characterizing the performance of an electrostatic chuck |
| 02/08/2005 | US6853876 Distributed control system architecture and method for a material transport system |
| 02/08/2005 | US6853142 Methods and apparatus for generating high-density plasma |
| 02/08/2005 | US6853043 Nitrogen-free antireflective coating for use with photolithographic patterning |
| 02/08/2005 | US6853032 Structure and method for formation of a blocked silicide resistor |
| 02/08/2005 | US6853021 Oriented ferroelectric thin-film device and method for manufacturing the same |
| 02/08/2005 | US6852651 Semiconductor device and method of manufacturing the same |
| 02/08/2005 | US6852650 Insulation film on semiconductor substrate and method for forming same |
| 02/08/2005 | US6852635 Method for bottomless deposition of barrier layers in integrated circuit metallization schemes |
| 02/08/2005 | US6852601 Heat treatment method that includes a low negative pressure |
| 02/08/2005 | US6852593 Haze-free BST films |
| 02/08/2005 | US6852551 Method of forming a ferroelectric film and fabrication process of a semiconductor device having a ferroelectric film |
| 02/08/2005 | US6852373 Method for depositing a silicon-containing dielectric material on copper |
| 02/08/2005 | US6852361 Vapor deposiiton of composite oxide from organometallic compound; antideposit protective coatings |
| 02/08/2005 | US6852253 Thickness of substrate subject to growth made larger than or equal to 200 mu m and curvature thereof made smaller than or equal to 0.03 cm-1, curvature caused by difference in thermal expansion coefficients of the base and substrate |
| 02/08/2005 | US6852242 Cleaning of multicompositional etchant residues |
| 02/08/2005 | US6852194 Increasing the number of films to be deposited and decreasing the thickness thereof. |
| 02/08/2005 | US6852168 Reactor for depositing thin film on wafer |
| 02/08/2005 | US6852167 Methods, systems, and apparatus for uniform chemical-vapor depositions |
| 02/08/2005 | US6852139 System and method of producing thin-film electrolyte |
| 02/08/2005 | US6851939 For forming deposition film of high quality on which adhesion force between a substrate and a metal film |
| 02/08/2005 | US6851384 Remote plasma apparatus for processing substrate with two types of gases |
| 02/08/2005 | US6851168 Collar removing clamp for HDP chamber |
| 02/08/2005 | CA2437343A1 Hollow nickel shapes by vapour deposition |
| 02/08/2005 | CA2138709C Alumina coated cutting tool |
| 02/03/2005 | WO2005010971A2 Ultaviolet curing processes for advanced low-k materials |
| 02/03/2005 | WO2005010969A1 Gas reaction system and semiconductor processing apparatus |
| 02/03/2005 | WO2005010964A2 Silicon crystallization using self-assembled monolayers |
| 02/03/2005 | WO2005010948A2 Cleaning process and apparatus for silicate materials |
| 02/03/2005 | WO2005010941A2 Ethyleneoxide-silane and bridged silane precursors for forming low k films |
| 02/03/2005 | WO2005010938A2 Impedance matching network with termination of secondary rf frequencies |
| 02/03/2005 | WO2005010232A1 Method of manufacturing vacuum plasma treated workpieces and system for vacuum plasma treating workpieces |
| 02/03/2005 | WO2005010230A1 Delivery systems for efficient vaporization of precursor source material |
| 02/03/2005 | WO2005010227A2 Chemical vapor deposition reactor |
| 02/03/2005 | WO2004095086A3 Conformal coatings for micro-optical elements |
| 02/03/2005 | US20050026459 Method of forming uniform ultra-thin oxynitride layers |
| 02/03/2005 | US20050026447 Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling |
| 02/03/2005 | US20050026434 Method of improving the wafer-to-wafer thickness uniformity of silicon nitride layers |
| 02/03/2005 | US20050026404 Method and apparatus for non-aggressive plasma-enhanced vapor deposition of dielectric films |
| 02/03/2005 | US20050025973 CVD diamond-coated composite substrate containing a carbide-forming material and ceramic phases and method for making same |
| 02/03/2005 | US20050025959 Hard pellicle and fabrication thereof |
| 02/03/2005 | US20050025906 Method for improving film uniformity in plasma enhanced chemical vapor deposition system |
| 02/03/2005 | US20050025887 Hydrogen sulfide injection method for phosphor deposition |
| 02/03/2005 | US20050025885 From a nitrogen source precursor and a specific silicon source precursor that may be an aminosilane with at least one diamine ligand, a halogenated aminosilane, a silazane, a saturated or unsaturated silyl alkyl or an azidosilane, and at a temperature up to 550 degrees C. |
| 02/03/2005 | US20050023694 Integrated low k dielectrics and etch stops |
| 02/03/2005 | US20050023625 Atomic layer deposited HfSiON dielectric films |
| 02/03/2005 | US20050023624 Atomic layer-deposited HfAlO3 films for gate dielectrics |
| 02/03/2005 | US20050023584 Atomic layer deposition and conversion |
| 02/03/2005 | US20050022935 Apparatus for improved low pressure inductively coupled high density plasma reactor |
| 02/03/2005 | US20050022864 Manufacturing method of silicon thin film solar cell |
| 02/03/2005 | US20050022747 Apparatus for synthesis of layers, coatings or films |
| 02/03/2005 | US20050022746 Holder for supporting wafers during semiconductor manufacture |
| 02/03/2005 | US20050022744 Susceptor for Semiconductor Manufacturing Equipment, and Semiconductor Manufacturing Equipment in Which the Susceptor Is Installed |