| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/17/2005 | WO2005015617A1 Semiconductor layer |
| 02/17/2005 | WO2005015613A2 Perimeter partition-valve with protected seals |
| 02/17/2005 | WO2005015575A1 Superconducting wire and its production method |
| 02/17/2005 | WO2005014886A1 Method of coating for diamond electrode |
| 02/17/2005 | WO2005014882A1 Substrate covered with an intermediate coating and a hard carbon coating |
| 02/17/2005 | WO2005014880A1 Method and device for coating or modifying surfaces |
| 02/17/2005 | WO2005014879A1 Hollow nickel shapes by vapor deposition |
| 02/17/2005 | WO2005014878A1 Carrier device for magnetizable substrate |
| 02/17/2005 | WO2004111300A3 Method for processing surfaces of aluminium alloy sheets and strips |
| 02/17/2005 | WO2004106584B1 Method and apparatus for generating a precursor for a semiconductor processing system |
| 02/17/2005 | WO2004105083A3 System and method for forming multi-component dielectric films |
| 02/17/2005 | WO2004104265B1 Cvd coating device |
| 02/17/2005 | WO2004072323B1 High reflectivity atmospheric pressure furnace for preventing contamination of a work piece |
| 02/17/2005 | US20050038276 Alkyl carboxylated silicon precursor for deposition of silicon oxycarbides; high throughput production |
| 02/17/2005 | US20050037627 Method for depositing silicon nitride films and silicon oxynitride films by chemical vapor deposition |
| 02/17/2005 | US20050037626 Semiconductor substrate supporting apparatus |
| 02/17/2005 | US20050037619 Method and apparatus for supporting a semiconductor wafer during processing |
| 02/17/2005 | US20050037616 Method of improving surface planarity |
| 02/17/2005 | US20050037598 Method for producing polycrystalline silicon germanium and suitable for micromachining |
| 02/17/2005 | US20050037597 Semiconductor processing system and method |
| 02/17/2005 | US20050037565 Method of fabricating an oxide collar for a trench capacitor |
| 02/17/2005 | US20050037204 Aligned perpendicular to substrate; chemical vapor deposition; heavy pressure pretreatment improves thermoconductivity; Langmuir-Blodgett process |
| 02/17/2005 | US20050037203 CVD coated cutting tool insert |
| 02/17/2005 | US20050037193 Plasma resistant; corrosion resistance; flame spraying; chemical vapor deposition; compression |
| 02/17/2005 | US20050037154 Method for forming thin film |
| 02/17/2005 | US20050037153 Low dielectric constant (low k) silicon oxycarbide (SiOC) film made via deposition of a mixture of cyclic organosiloxanes and inert gases with given total flow rate ratio of the organosiloxane to inert gas; film has compressive stress |
| 02/17/2005 | US20050037143 illuminating the test pattern with radiation during at least a portion of the imprinting, and monitoring or measuring at least one component of the radiation scattered, reflected or transmitted from the test pattern to monitor or measure at least one parameter of the imprinting |
| 02/17/2005 | US20050036268 Dechucking method and apparatus for workpieces in vacuum processors |
| 02/17/2005 | US20050036267 Clamp for holding and efficiently removing heat from workpieces |
| 02/17/2005 | US20050035458 Metal film semiconductor device and a method for forming the same |
| 02/17/2005 | US20050034979 Method and apparatus for surface processing of a substrate |
| 02/17/2005 | US20050034815 Plasma processor |
| 02/17/2005 | US20050034813 Plasma processing apparatus using active matching |
| 02/17/2005 | US20050034811 Sensor array for measuring plasma characteristics in plasma processing enviroments |
| 02/17/2005 | US20050034675 Susceptor and surface processing method |
| 02/17/2005 | US20050034673 Apparatus having edge frame and method of using the same |
| 02/17/2005 | US20050034671 Deposition apparatus and manufacturing apparatus |
| 02/17/2005 | US20050034670 Multiple elliptical ball plasma apparatus |
| 02/17/2005 | US20050034669 Vapor deposition process and apparatus therefor |
| 02/17/2005 | US20050034667 Method and apparatus for forming silicon-containing insulation film having low dielectric constant |
| 02/17/2005 | US20050034666 Plasma generation using multi-step ionization |
| 02/17/2005 | US20050034665 Apparatus for forming a film by CVD |
| 02/17/2005 | US20050034664 Apparatus for depositing |
| 02/17/2005 | US20050034662 Methods, systems, and apparatus for uniform chemical-vapor depositions |
| 02/17/2005 | US20050034660 Alignment means for chamber closure to reduce wear on surfaces |
| 02/17/2005 | DE10392487T5 Automatisches Ventilsteuersystem für ein mit Plasma arbeitendes chemisches Gasphasenabscheidungssystem sowie chemisches Gasphasenabscheidungssystem zur Abscheidung eines Mehrschichtfilms im Nanomaßstab Automatic valve control system for an operating with plasma chemical vapor deposition system, as well as chemical vapor deposition system for depositing a multi-layer film nanoscale |
| 02/17/2005 | DE10331946A1 Vorrichtung zur Behandlung von Werkstücken Apparatus for treatment of workpieces |
| 02/17/2005 | DE102004010688A1 Bearbeitungsgegenstands-Bearbeitungseinrichtung, Bearbeitungssgegenstands-Bearbeitungsverfahren, Drucksteuerverfahren, Bearbeitungsgegenstands-Transportverfahren, und Transporteinrichtung Processing the article processing device, Bearbeitungssgegenstands processing method, printing control method, article transport processing method, and transport means |
| 02/17/2005 | CA2522078A1 Superconducting wire and its production method |
| 02/16/2005 | EP1507281A1 Arrangement, method and electrode for generating a plasma |
| 02/16/2005 | EP1507025A1 Device and method for forming thin-film, and method of manufacturing electronic component using the device |
| 02/16/2005 | EP1506327A1 Ceramic thin film on various substrates, and process for producing same |
| 02/16/2005 | EP1506206A1 Method of depositing copper on a support |
| 02/16/2005 | EP1506063A2 Atomisation of a precursor into an excitation medium for coating a remote substrate |
| 02/16/2005 | EP1042527B1 Coated cemented carbide cutting tool and method of coating it with diamond |
| 02/16/2005 | CN1582488A Process system and process method |
| 02/16/2005 | CN1582071A Depositing device and its making device |
| 02/16/2005 | CN1580883A Apparatus having edge frame and its using method |
| 02/16/2005 | CN1190111C Processing system with dual ion sources |
| 02/16/2005 | CN1189958C Method for producing electrode for lithium secondary cell |
| 02/16/2005 | CN1189595C Reduced impedance chamber |
| 02/16/2005 | CN1189589C Superthin diamond X-ray without window supporter and its preparing process |
| 02/16/2005 | CN1189392C Technique for preparing ceramic powder of titanium carbide by using plasma chemical gas phase synthesis method |
| 02/16/2005 | CN1189390C Method for synthetizing vertical arrangement high-purity carbon nanometer tube in large-scale on large size substrate using hot CVD method |
| 02/15/2005 | US6855974 Ferroelectric capacitor, process for production thereof and semiconductor device using the same |
| 02/15/2005 | US6855971 Haze-free BST films |
| 02/15/2005 | US6855632 Cu film deposition equipment of semiconductor device |
| 02/15/2005 | US6855621 Method of forming silicon-based thin film, method of forming silicon-based semiconductor layer, and photovoltaic element |
| 02/15/2005 | US6855603 Vertical nano-size transistor using carbon nanotubes and manufacturing method thereof |
| 02/15/2005 | US6855484 Method of forming a silicon carbide layer for use in integrated circuits is provided. The silicon carbide layer is formed by reacting a gas mixture comprising a silicon source, a carbon source, and a nitrogen source in the presence of an |
| 02/15/2005 | US6855413 Oxide coated cutting tool |
| 02/15/2005 | US6855379 Method and device for surface-treating substrates |
| 02/15/2005 | US6855377 Deposited film forming apparatus and deposited film forming method |
| 02/15/2005 | US6855376 Overcoating metal layer; vapor deposition; low density, high strength, toughness, flexibility |
| 02/15/2005 | US6855368 Chemisorbing alternating monolayers of two compounds with a carrier gas to control a quantity of the fluorine atoms associated with the monolayer |
| 02/15/2005 | US6855236 Components for vacuum deposition apparatus and vacuum deposition apparatus therewith, and target apparatus |
| 02/15/2005 | US6855232 Magnetic disk comprising a first carbon overcoat having a high SP3 content and a second carbon overcoat having a low SP3 content |
| 02/15/2005 | US6854602 Hydrogen-selective silica-based membrane |
| 02/15/2005 | US6854309 Gas-barrier synthetic resin vessel, device for producing the same, and article-received gas-barrier synthetic resin vessel |
| 02/10/2005 | WO2005013343A1 Vapor deposition apparatus and vapor deposition method |
| 02/10/2005 | WO2005013334A2 Holder for supporting wafers during semiconductor manufacture |
| 02/10/2005 | WO2005013331A2 Supercritical fluid-assisted deposition of materials on semiconductor substrates |
| 02/10/2005 | WO2005012593A1 Method for deposition of titanium oxide by a plasma source |
| 02/10/2005 | WO2005012592A2 Cvd diamond-coated composite substrate for making same |
| 02/10/2005 | WO2005011902A1 Diamond film coated tool and process for producing the same |
| 02/10/2005 | WO2004094694A3 Collection of unused precursors in ald |
| 02/10/2005 | WO2004094693A3 Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition |
| 02/10/2005 | WO2004079796A3 Atomic layer deposited dielectric layers |
| 02/10/2005 | WO2004064113A3 Cooled deposition baffle in high density plasma semiconductor processing |
| 02/10/2005 | US20050032444 Method of rational large volume CVD production |
| 02/10/2005 | US20050032394 Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers |
| 02/10/2005 | US20050032382 Staggered in-situ deposition and etching of a dielectric layer for HDP CVD |
| 02/10/2005 | US20050032372 Methods for forming a thin film on an integrated circuit device by sequentially providing energies to activate the reactants |
| 02/10/2005 | US20050032366 Methods of forming metal-comprising materials and capacitor electrodes; and capacitor constructions |
| 02/10/2005 | US20050032365 Atomic layer deposition of metal during the formation of a semiconductor device |
| 02/10/2005 | US20050032364 Method of forming tungsten film |
| 02/10/2005 | US20050032360 Systems and methods of forming refractory metal nitride layers using disilazanes |
| 02/10/2005 | US20050032317 Methods of forming material on a substrate, and a method of forming a field effect transistor gate oxide on a substrate |
| 02/10/2005 | US20050031876 Undercoating a substrate; fluidization; durability; photocatalyst |
| 02/10/2005 | US20050031799 Heating, evaporation, vapor deposition a phosphors using an inert gas |