| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/03/2005 | US20050022742 Chemical vapor deposition processing equipment for use in fabricating a semiconductor device |
| 02/03/2005 | US20050022741 Chemical vapor deposition apparatus and method of forming thin layer using same |
| 02/03/2005 | US20050022740 Plasma processing system and cleaning method for the same |
| 02/03/2005 | US20050022739 Apparatus and method for depositing materials onto microelectronic workpieces |
| 02/03/2005 | US20050022738 Precursor mixtures for use in preparing layers on substrates |
| 02/03/2005 | US20050022737 Semiconductor-processing apparatus provided with susceptor and placing block |
| 02/03/2005 | US20050022735 Delivery system for PECVD powered electrode |
| 02/03/2005 | DE4326211B4 Chemisches Bedampfungsverfahren zum Herstellen einer Konformen Schicht aus Titansilicid auf einem Halbleiterwafer Chemical vapor deposition method for fabricating a conformal layer of titanium silicide on a semiconductor wafer |
| 02/03/2005 | DE202004011153U1 Coating curved substrates, e.g. head lamp surfaces with patterned optical layers, provides coating in one area but not in another, adjacent area |
| 02/03/2005 | DE10318440B3 Elektrochemisches Verfahren zur direkten nanostrukturierbaren Materialabscheidung auf einem Substrat und mit dem Verfahren hergestelltes Halbleiterbauelement An electrochemical process for direct nanostrukturierbaren material deposition on a substrate and by the method of semiconductor component produced |
| 02/03/2005 | CA2532638A1 Silicon crystallization using self-assembled monolayers |
| 02/02/2005 | EP1502969A1 Method and apparatus for the soft deposition of dielectric films using plasma assisted CVD |
| 02/02/2005 | EP1502289A2 Infrared thermopile detector system for semiconductor process monitoring and control |
| 02/02/2005 | EP1502281A2 Light source |
| 02/02/2005 | EP1501964A1 Method and apparatus for preparing vaporized reactants for chemical vapor deposition |
| 02/02/2005 | EP1501963A1 Gas preheater |
| 02/02/2005 | EP1501962A1 A method for modifying a metallic surface |
| 02/02/2005 | CN1575517A Integration of ald tantalum nitride and alpha-phase tantalum for copper metallization application |
| 02/02/2005 | CN1575351A Atmospheric pressure wafer processing reactor having an internal pressure control system and method |
| 02/02/2005 | CN1575348A Hot press forming method, and a plated steel material therefor and its manufacturing method |
| 02/02/2005 | CN1575323A Pigment having metallic lustre |
| 02/02/2005 | CN1574337A Semiconductor device and method of manufacturing the same |
| 02/02/2005 | CN1574270A Processed object processing apparatus, processed object processing method, pressure control method, processed object transfer method, and transfer apparatus |
| 02/02/2005 | CN1574248A Method of manufacturing semiconductor device having nitride film with improved insulating properties |
| 02/02/2005 | CN1574244A Semiconductor manufacturing equipment |
| 02/02/2005 | CN1574232A Vacuum chamber for vacuum processing device |
| 02/02/2005 | CN1574231A Fabrication method of semiconductor integrated circuit device |
| 02/02/2005 | CN1574230A Apparatus for semiconductor device |
| 02/02/2005 | CN1574229A Showerhead assembly and apparatus for manufacturing semiconductor device having the same |
| 02/02/2005 | CN1574208A Cylinder for thermal processing chamber |
| 02/02/2005 | CN1574199A High-density plasma processing apparatus |
| 02/02/2005 | CN1573184A Gas valve assembly and apparatus using the same |
| 02/02/2005 | CN1573177A Piston for internal combustion engine |
| 02/02/2005 | CN1572901A Multistation coating device and method for plasma coating |
| 02/02/2005 | CN1572415A CVD coated cutting tool insert |
| 02/02/2005 | CN1187810C Manufacture method of capacitor for semiconductor device |
| 02/02/2005 | CN1187795C Method for depositing pile layer including titanium and titanium nitride film in single chamber |
| 02/01/2005 | US6850012 Plasma processing apparatus |
| 02/01/2005 | US6849999 Substrate for electron source, electron source and image forming apparatus, and manufacturing method thereof |
| 02/01/2005 | US6849908 Semiconductor device and method of manufacturing the same |
| 02/01/2005 | US6849562 Method of depositing a low k dielectric barrier film for copper damascene application |
| 02/01/2005 | US6849561 Method of forming low-k films |
| 02/01/2005 | US6849560 Method of depositing silicon thin film and silicon thin film solar cell |
| 02/01/2005 | US6849555 Wafer processing apparatus and wafer processing method using the same |
| 02/01/2005 | US6849545 System and method to form a composite film stack utilizing sequential deposition techniques |
| 02/01/2005 | US6849505 Semiconductor device and method for fabricating the same |
| 02/01/2005 | US6849464 Method of fabricating a multilayer dielectric tunnel barrier structure |
| 02/01/2005 | US6849344 Having integral incorporation of a platinum group metal or alloy thereof directly or indirectly attached to a minor surface portion of article |
| 02/01/2005 | US6849334 Optical materials and optical devices |
| 02/01/2005 | US6849307 Method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| 02/01/2005 | US6849300 Method for forming high dielectric layers using atomic layer deposition |
| 02/01/2005 | US6849298 Method for forming diffusion barrier film of semiconductor device |
| 02/01/2005 | US6849297 ZnS:Cu phosphor with a given spectral emittance is coated by reacting trimethylaluminum with a mixture of oxygen and ozone to form a coating that will change the emittance to that desired; moisture resistance |
| 02/01/2005 | US6849241 Device and method for depositing one or more layers on a substrate |
| 02/01/2005 | US6849151 Monitoring substrate processing by detecting reflectively diffracted light |
| 02/01/2005 | US6849134 Minimum volume oven for producing uniform pyrolytic oxide coatings on capacitor anodes |
| 02/01/2005 | US6849133 CVD apparatuses and methods of forming a layer over a semiconductor substrate |
| 02/01/2005 | US6849132 CVD codeposition of A1 and one or more reactive (gettering) elements to form protective aluminide coating |
| 02/01/2005 | US6849131 Truncated dummy plate for process furnace |
| 02/01/2005 | US6849126 Machine for coating hollow bodies |
| 02/01/2005 | US6849123 Plasma processing method and method for manufacturing semiconductor device |
| 02/01/2005 | US6849122 Thin layer metal chemical vapor deposition |
| 02/01/2005 | US6849105 Method and installation for treating effluent gas containing hydrocarbons |
| 01/27/2005 | WO2005008828A1 System and method of producing thin-film electrolyte |
| 01/27/2005 | WO2005008795A1 Nitride semiconductor light emitting device |
| 01/27/2005 | WO2005008763A2 Methods of forming deuterated silicon nitride-containing materials |
| 01/27/2005 | WO2005008746A2 Methods of forming a phosphorus doped silicon dioxide layer |
| 01/27/2005 | WO2005007928A1 Plasma surface processing system and supply device for plasma processing solution therefor |
| 01/27/2005 | WO2005007927A1 Method for forming thin film and base having thin film formed by such method |
| 01/27/2005 | WO2005007926A2 Production of agglomerates from gas phase |
| 01/27/2005 | WO2005007925A1 Method of manufacturing gas barrier film coated plastic container |
| 01/27/2005 | WO2005007918A2 Ion beam-assisted high-temperature superconductor (hts) deposition for thick film tape |
| 01/27/2005 | WO2005007283A2 Apparatus and method for downstream pressure control and sub-atmospheric reactive gas abatement |
| 01/27/2005 | WO2004085328A3 Hydrophilic dlc on substrate with oxygen and/or hot water treatment |
| 01/27/2005 | WO2004083485A3 Methods and apparatus for atomic layer deposition |
| 01/27/2005 | WO2004065650A3 Chemical vapor deposition precursors for deposition of tantalum-based materials |
| 01/27/2005 | US20050020092 Process for producing yttrium oxide thin films |
| 01/27/2005 | US20050020078 Method of planarizing a surface |
| 01/27/2005 | US20050020071 Method and apparatus for cleaning and method and apparatus for etching |
| 01/27/2005 | US20050020067 Chemistry for chemical vapor deposition of titanium containing films |
| 01/27/2005 | US20050020065 Method of forming an oxidation-resistant TiSiN film |
| 01/27/2005 | US20050020060 Process for producing metal thin films by ALD |
| 01/27/2005 | US20050020048 Method of depositing dielectric films |
| 01/27/2005 | US20050020039 Semiconductor integrated circuit device manufacturing method |
| 01/27/2005 | US20050020038 Atmospheric glow discharge with concurrent coating deposition |
| 01/27/2005 | US20050020037 Semiconductor film, semiconductor device and method of their production |
| 01/27/2005 | US20050020035 Method of forming a p-type group II-VI semiconductor crystal layer on a substrate |
| 01/27/2005 | US20050020017 Lanthanide oxide / hafnium oxide dielectric layers |
| 01/27/2005 | US20050019978 Systems and methods for forming tantalum oxide layers and tantalum precursor compounds |
| 01/27/2005 | US20050019969 Method for manufacturing thin film transistor array panel |
| 01/27/2005 | US20050019963 Maintaining a reactor chamber of a chemical vapor deposition system |
| 01/27/2005 | US20050019960 Method and apparatus for forming a ferroelectric layer |
| 01/27/2005 | US20050019614 Cemented carbide, coated cemented carbide member and production processes of the same |
| 01/27/2005 | US20050019593 Outermost layer consisting of platinum and a ceramic barrier layer; platinum catalyzes the hydrocarbon fuel to form particulates of carbonaceous gum suspended within the fuel; gas turbine engine component |
| 01/27/2005 | US20050019577 Method of depositing coating by plasma; device for implementing the method and coating obtained by said method |
| 01/27/2005 | US20050019551 Heat treatment with spraying for deposition or for coatings |
| 01/27/2005 | US20050019504 High rate deposition for the formation of high quality optical coatings |
| 01/27/2005 | US20050019503 Plasma enhanced chemical vapor deposition of a silicon dioxide film impervious to water vapor; improved permselectivity while retaining a predetermined thickness; food, medicine and electronics packaging materials |
| 01/27/2005 | US20050019494 Sequential gas flow oxide deposition technique |
| 01/27/2005 | US20050019493 Method for controlling deposition of dielectric films |