Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2005
03/16/2005EP1515362A1 Plasma processing system, plasma processing method, plasma film deposition system, and plasma film deposition method
03/16/2005EP1514851A1 Protective coating for a body as well as process and plant unit for preparing protective coatings
03/16/2005EP1353693B1 Pharmaceutical combination containing a 4-quinazolineamine and paclitaxel, carboplatin or vinorelbine for the treatment of cancer
03/16/2005EP1264002B1 Gas supply device for precursors with a low vapor pressure
03/16/2005EP1088331B1 Cleaning process end point determination using throttle valve position
03/16/2005EP1017876B1 Gas injection system for plasma processing apparatus
03/16/2005CN1596462A Processing apparatus and gas discharge suppressing member
03/16/2005CN1596459A Method of forming nanocrystals
03/16/2005CN1596325A Apparatus for inverted CVD
03/16/2005CN1596324A Method for depositing silicon nitride films and silicon oxynitride films by chemical vapor deposition technology
03/16/2005CN1596229A Photoactive coating, coated article, and method of making same
03/16/2005CN1193436C Method for forming films
03/16/2005CN1193430C Vertical nanometer size transistor using carbon monometer tube and manufacturing method thereof
03/16/2005CN1193114C Air Supplying and exhausting system in plasma polymerizing apparatus
03/16/2005CN1192815C Method and device for processing PFC
03/15/2005US6868312 Method for real-time control of the fabrication of a thin-film structure by ellipsometric measurement
03/15/2005US6867152 Properties of a silica thin film produced by a rapid vapor deposition (RVD) process
03/15/2005US6867090 Semiconductor device and method of manufacturing thereof
03/15/2005US6867086 Multi-step deposition and etch back gap fill process
03/15/2005US6867054 Method of manufacturing a semiconductor device
03/15/2005US6866921 Chromium-containing cemented carbide body having a surface zone of binder enrichment
03/15/2005US6866900 Methods which increase ratio of processed wafers to plasma reaction chamber internal sidewall cleanings while maintaining low particle counts on wafers; sequentially processing, plasma-enhanced deposition of material on wafer
03/15/2005US6866890 Method of forming a dielectric film
03/15/2005US6866882 Method of forming a thin film
03/15/2005US6866747 Plasma processing apparatus
03/15/2005US6866746 Clamshell and small volume chamber with fixed substrate support
03/15/2005US6866745 Semiconductor manufacturing apparatus
03/15/2005US6866744 Semiconductor processing apparatus and a diagnosis method therefor
03/15/2005US6866721 Apparatus and method for photo-induced process
03/15/2005US6866595 Playing field obstacle device
03/15/2005CA2338314C Semiconductor thin film and thin film device
03/13/2005CA2479698A1 Protective layer for a body, and process and arrangement for producing protective layers
03/10/2005WO2005022655A1 Algainn based optical device and fabrication method thereof
03/10/2005WO2005022619A1 Method for forming silicon thin-film on flexible metal substrate
03/10/2005WO2005022618A1 Method for depositing thin film on wafer
03/10/2005WO2005022578A1 sp3 BONDING BORON NITRIDE THIN FILM HAVING SELF-FORMING SURFACE SHAPE BEING ADVANTAGEOUS IN EXHIBITING PROPERTY OF EMITTING ELECTRIC FIELD ELECTRONS, METHOD FOR PREPARATION THEREOF AND USE THEREOF
03/10/2005WO2005021842A2 High-purity crystal growth
03/10/2005WO2005021833A2 Apparatus for the coating and/or conditioning of substrates
03/10/2005WO2005021832A2 Method and appartus for depositing materials with tunable properties
03/10/2005WO2005021831A1 Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
03/10/2005WO2005021829A1 Device for coating the inside of hollow bodies
03/10/2005WO2005021454A2 Heat treatable coated article with diamond-like carbon (dlc) coating
03/10/2005WO2004094695A3 Transient enhanced atomic layer deposition
03/10/2005WO2004046417A3 Atomic layer deposition using metal amidinates
03/10/2005WO2004040630A8 Method for manufacturing semiconductor device and substrate processing system
03/10/2005US20050054213 Methods of depositing a silicon dioxide comprising layer in the fabrication of integrated circuitry, and methods of forming trench isolation in the fabrication of integrated circuitry
03/10/2005US20050054198 Apparatus of chemical vapor deposition
03/10/2005US20050054165 Atomic layer deposited ZrAlxOy dielectric layers
03/10/2005US20050054156 Capacitor and fabrication method using ultra-high vacuum cvd of silicon nitride
03/10/2005US20050053890 Thermal treatment system for semiconductors
03/10/2005US20050053799 Thermal barrier coating utilizing a dispersion strengthened metallic bond coat
03/10/2005US20050053754 Method for treating an optical disc layer to improve adhesion properties
03/10/2005US20050053722 Method for forming a titanium nitride layer
03/10/2005US20050053467 Aluminide or chromide coating of turbine engine rotor component
03/10/2005US20050051828 Methods of forming metal thin films, lanthanum oxide films, and high dielectric films for semiconductor devices using atomic layer deposition
03/10/2005US20050051824 Semiconductor device having a thin film capacitor and method for fabricating the same
03/10/2005US20050051421 Sputtering a beam of second particles between the contamination source and the micro-component, at least a part of which second particles has an opposite polarity from that of the first particles, so as to drag the first particles away from the micro-component to a collecting element
03/10/2005US20050051269 Vacuum enclosure; plasma discharging; supplying signals; cleaning using fluorine gas
03/10/2005US20050051234 Purgeable container for low vapor pressure chemicals
03/10/2005US20050051102 Apparatus for processing substrate in chamber and maintenance method therefor
03/10/2005US20050051100 Variable gas conductance control for a process chamber
03/10/2005US20050051099 Susceptor provided with indentations and an epitaxial reactor which uses the same
03/10/2005US20050051098 Plasma processing apparatus
03/10/2005US20050051097 Covering assembly for crucible used for evaporation of raw materials
03/10/2005US20050051095 Plasma process device
03/10/2005US20050051094 Replaceable plate expanded thermal plasma apparatus and method
03/10/2005US20050051093 Vacuum processing apparatus
03/10/2005US20050051092 Vacuum processing apparatus
03/10/2005US20050051091 Vacuum processing apparatus
03/10/2005US20050051090 Surface treatment system and method
03/10/2005US20050051089 Plasma processing apparatus
03/10/2005US20050051088 Apparatus for treating workpieces
03/10/2005US20050051087 Primer tank with nozzle assembly
03/10/2005US20050051086 Apparatus for the efficient coating of substrates
03/10/2005US20050050708 Embedded fastener apparatus and method for preventing particle contamination
03/09/2005EP1512839A2 Aluminide or chromide coating of turbine engine rotor component
03/09/2005EP1512772A1 Method and apparatus for production of metal film
03/09/2005EP1512771A1 Method and apparatus for production of metal film
03/09/2005EP1512770A1 Method and apparatus for production of metal film
03/09/2005EP1512769A1 Method and apparatus for production of metal film
03/09/2005EP1512164A1 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a mutli-part electrode
03/09/2005EP1511957A1 Connector for expandable downhole tubulars
03/09/2005EP1511881A1 Surface treatment system and method
03/09/2005EP1511880A1 Surface treatment system and method thereof
03/09/2005EP1451384B1 Coating method and coating
03/09/2005EP1218573B1 Method and device for depositing materials with a large electronic energy gap and high binding energy
03/09/2005EP1121333A4 Creating silica soot with a plug-free system
03/09/2005EP1029108B1 Cemented carbide body with high wear resistance and extra tough behaviour
03/09/2005CN2684373Y Heat treatment vessel and longitudinal heat treatment equipment
03/09/2005CN1592959A Method for forming an oxynitride spacer for a metal gate electrode using a PECVD process with a silicon-starving atmosphere
03/09/2005CN1592798A Cleaning gas for semiconductor production equipment and cleaning method using the gas
03/09/2005CN1592750A Hexakis (monohydrocarbylamino) disilanes and method for the preparation thereof
03/09/2005CN1592674A Honeycomb structural body forming ferrule, and method of manufacturing ferrule
03/09/2005CN1592672A Ultrasonic cutting tool coated with diamond CVD
03/09/2005CN1591932A Negative electrode for non-aqueous electrolyte secondary battery, production method thereof and non-aqueous electrolyte secondary battery
03/09/2005CN1591797A Semiconductor device and its conductive structure forming process
03/09/2005CN1590585A Apparatus for weighing out the remaining quantity of a substance in a storage vessel
03/09/2005CN1590584A New type diamondlike film sedimentation technology
03/09/2005CN1590583A Solid organometallic compound-filled container and filling method thereof
03/09/2005CN1590582A Method of lowering residual fluorind in sedimentation reaction chamber cavity body
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