| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 03/09/2005 | CN1590390A Stabilizers to inhibit the polymerization of substituted cyclotetrasiloxane |
| 03/09/2005 | CN1192417C Method and apparatus for supercritical processing of multiple workpieces |
| 03/09/2005 | CN1192416C Processing device and method for semiconductor workpiece |
| 03/09/2005 | CN1192294C Method of regulating high temperature gaseous phase process and use of said method |
| 03/09/2005 | CN1192067C Method for priming on aluminium material and primer |
| 03/08/2005 | US6864521 Method to control silver concentration in a resistance variable memory element |
| 03/08/2005 | US6864201 Preparation and screening of crystalline zeolite and hydrothermally-synthesized materials |
| 03/08/2005 | US6863942 Free-standing and aligned carbon nanotubes and synthesis thereof |
| 03/08/2005 | US6863938 Filled diamond foam material and method for forming same |
| 03/08/2005 | US6863926 Corrosive-resistant coating over aluminum substrates for use in plasma deposition and etch environments |
| 03/08/2005 | US6863925 Method for vapor phase aluminiding including a modifying element |
| 03/08/2005 | US6863835 Magnetic barrier for plasma in chamber exhaust |
| 03/08/2005 | US6863784 Linear drive system for use in a plasma processing system |
| 03/08/2005 | US6863772 Dual-port end point window for plasma etcher |
| 03/08/2005 | US6863735 Epitaxial growth furnace |
| 03/08/2005 | US6863733 Apparatus for fabricating thin-film semiconductor device |
| 03/08/2005 | US6863732 Heat treatment system and method |
| 03/08/2005 | US6863731 System for deposition of inert barrier coating to increase corrosion resistance |
| 03/08/2005 | US6863727 Method of depositing transition metal nitride thin films |
| 03/08/2005 | US6863726 Vapor phase growth method of oxide dielectric film |
| 03/08/2005 | US6863725 Method of forming a Ta2O5 comprising layer |
| 03/08/2005 | US6863077 Method and apparatus for enhanced chamber cleaning |
| 03/08/2005 | US6863021 Method and apparatus for providing and integrating a general metal delivery source (GMDS) with atomic layer deposition (ALD) |
| 03/08/2005 | US6863020 Segmented electrode apparatus for plasma processing |
| 03/08/2005 | US6863019 Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas |
| 03/03/2005 | WO2005020317A2 Ruthenium layer formation for copper film deposition |
| 03/03/2005 | WO2005020311A1 Process for producing oxide thin film and production apparatus therefor |
| 03/03/2005 | WO2005020310A1 Stress reduction of sioc low k films |
| 03/03/2005 | WO2005020304A1 Apparatus for forming thin film |
| 03/03/2005 | WO2005020303A1 Disperser for carburetor, carburetor for mocvd using the disperser for carburetor, and carrier gas vaporizing method |
| 03/03/2005 | WO2005020302A1 Disperser for carburetor, carburetor for mocvd using the disperser for carburetor, rod used for the disperser for carburetor or the carburetor for mocvd, carrier gas dispersing method, and carrier gas vaporizing method |
| 03/03/2005 | WO2005019497A2 Methods of reducing plasma-induced damage for advanced plasma cvd dielectrics |
| 03/03/2005 | WO2005019496A1 Alkyl push flow for vertical flow rotating disk reactors |
| 03/03/2005 | WO2005019491A2 Thermal cvd synthesis of nanostructures |
| 03/03/2005 | WO2005019234A1 Rare earth metal complex, material for thin-film formation, and process for producing thin film |
| 03/03/2005 | WO2005000765A3 Dummy wafer and method for manufacture thereof |
| 03/03/2005 | WO2004074538A8 Foodware with multilayer stick resistant ceramic coating and method of making |
| 03/03/2005 | US20050048801 In-situ-etch-assisted HDP deposition using SiF4 and hydrogen |
| 03/03/2005 | US20050048799 Film forming material, film forming method, and film |
| 03/03/2005 | US20050048797 Method of forming thin film |
| 03/03/2005 | US20050048796 Forming method and a forming apparatus of nanocrystalline silicon structure |
| 03/03/2005 | US20050048745 Deposition over mixed substrates |
| 03/03/2005 | US20050048728 Semiconductor device and manufacturing method therefor |
| 03/03/2005 | US20050048369 A current collector and an active material such as silicon monoxide deposited on the surface of current collector by vapor depostion; free of binder; high capacity, long cycle life and excellent safety, capable of maintaining excellent cycle characteristic even when charging/discharging are repeated |
| 03/03/2005 | US20050048322 Magnetic recording medium and method of fabricating the same |
| 03/03/2005 | US20050048284 Heat treatable coated article with diamond-like carbon (DLC) coating |
| 03/03/2005 | US20050048222 forming an amorphous carbon layers on substrates and depositing silicon dioxide from tetraethyl silicate by plasma enhanced chemical vapor deposition; antireflective layers |
| 03/03/2005 | US20050048205 Method of producing thin film or powder array using liquid source misted chemical deposition process |
| 03/03/2005 | US20050048204 Reacting tetrakis(ethylamino)silane, tris(ethylamino)silane, tris(isopropylamino)silane, ammonia, hydrazine, alkylhydrazine, azide, nitric oxide, nitrogen dioxide, nitrous oxide, oxygen, ozone, hydrogen peroxide, and/or water; oxidation, nitriding |
| 03/03/2005 | US20050047927 Process modules for transport polymerization of low epsilon thin films |
| 03/03/2005 | US20050045970 Semiconductor device and method for manufacturing the same |
| 03/03/2005 | US20050045967 Method for manufacturing semiconductor device and semiconductor device |
| 03/03/2005 | US20050045618 Ceramic heater and ceramic joined article |
| 03/03/2005 | US20050045616 Substrate heating apparatus and multi-chamber substrate processing system |
| 03/03/2005 | US20050045593 Silicon parts having reduced metallic impurity concentration for plasma reaction chambers |
| 03/03/2005 | US20050045592 ultra-nanocrystalline diamond coated microchip drug delivery substrate that is impermeably sealed and inert for implantation in a living body |
| 03/03/2005 | US20050045468 Method for depositing a thin film adhesion layer |
| 03/03/2005 | US20050045223 Fabricating thin films for solid state storage devices without annealing; low cost, efficient energy conversion |
| 03/03/2005 | US20050045213 Deposition tool cleaning process having a moving plasma zone |
| 03/03/2005 | US20050045209 Customizing and optimizing for individual conditions; reducing subsurface damage |
| 03/03/2005 | US20050045105 Holder for multiple substrates and chamber with the same |
| 03/03/2005 | US20050045102 Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces |
| 03/03/2005 | US20050045101 Thin-film deposition system |
| 03/03/2005 | US20050045100 Reactors, systems with reaction chambers, and methods for depositing materials onto micro-device workpieces |
| 03/03/2005 | US20050045099 Methods and devices to reduce defects in dielectric stack structures |
| 03/03/2005 | DE10335099A1 Verfahren zum Verbessern der Dickengleichförmigkeit von Siliziumnitridschichten für mehrere Halbleiterscheiben A method for improving the thickness uniformity of silicon nitride layers for multiple semiconductor wafers |
| 03/03/2005 | DE10332921A1 Treating surface of components with low pressure plasma comprises using vacuum chamber having opening which is closed before evacuation, introduction and ionization of process gas |
| 03/02/2005 | EP1511100A2 Negative electrode for non-aqueous electrolyte secondary battery, production method thereof and non-aqueous electrolyte secondary battery |
| 03/02/2005 | EP1511077A2 Substrate support |
| 03/02/2005 | EP1511069A1 Heater module for semiconductor production system |
| 03/02/2005 | EP1510596A2 Purification, analysis and deposition of titanium amides |
| 03/02/2005 | EP1510595A1 Method and device for cleaning raw material gas introduction tube used in cvd film forming apparatus |
| 03/02/2005 | EP1510593A1 Process for coating a component, component and powder |
| 03/02/2005 | EP1510592A1 Method for coating an object and object |
| 03/02/2005 | EP1509942A2 Apparatus and methods for minimizing arcing in a plasma processing chamber |
| 03/02/2005 | EP1509635A2 Preparation of asymmetric membranes using hot-filament chemical vapor deposition |
| 03/02/2005 | EP1509634A1 Surface treatment system, surface treatment method and product produced by surface treatment method |
| 03/02/2005 | EP1509633A1 Apparatus and method for high rate uniform coating, including non-line of sight |
| 03/02/2005 | CN1587438A Low temperature insert layer in gallium nitride film grown through hydride gas phase epitaxy |
| 03/02/2005 | CN1191622C Method for mfg. semiconductor device |
| 03/02/2005 | CN1191614C Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition |
| 03/02/2005 | CN1191389C Method and device for coating substrates |
| 03/01/2005 | US6861693 Continuous good step coverage CVD platinum metal deposition |
| 03/01/2005 | US6861643 Generating a highly directional and highly dense neutral particle beam from a high-density plasma by neutralizing an ion beam generated by the ion extracting portion; etching of electrical thin films; semiconductors |
| 03/01/2005 | US6861373 Vacuum processing method and semiconductor device manufacturing method in which high-frequency powers having mutually different frequencies are applied to at least one electrode |
| 03/01/2005 | US6861355 Metal plating using seed film |
| 03/01/2005 | US6861351 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer |
| 03/01/2005 | US6861340 Method of heat-treating nitride compound semiconductor layer and method of producing semiconductor device |
| 03/01/2005 | US6861321 Method of loading a wafer onto a wafer holder to reduce thermal shock |
| 03/01/2005 | US6861122 Ceramic member with fine protrusions on surface and method of producing the same |
| 03/01/2005 | US6861105 Vaporizing chromium hexacaronyl then introducing chromium formed into vapor deposition apparatus; comprises chromium metal-/oxide-/nitride-/ and/or carbide- layer |
| 03/01/2005 | US6861094 Methods for forming thin layers of materials on micro-device workpieces |
| 03/01/2005 | US6860937 Method for preparing zinc oxide semi-conductor material |
| 03/01/2005 | US6860138 Real-time detection mechanism with self-calibrated steps for the hardware baseline to detect the malfunction of liquid vaporization system in AMAT TEOS-based Dxz chamber |
| 03/01/2005 | US6860075 Device for surface treatment and/or coating and/or producing construction elements, in particular, flat construction elements of glass, glass alloys or metals, by a continuous process |
| 02/24/2005 | WO2005017990A1 Method for forming film, method for manufacturing semiconductor device, semiconductor device and substrate treatment system |
| 02/24/2005 | WO2005017987A1 Substrate treatment appratus and method of manufacturing semiconductor device |
| 02/24/2005 | WO2005017986A1 Silicon carbide epitaxial wafer, method for producing such wafer, and semiconductor device formed on such wafer |
| 02/24/2005 | WO2005017985A1 Gas-supply assembly, in particular for a cvd process reactor for growing an epitaxial layer |
| 02/24/2005 | WO2005017950A2 Organoiridium compound, process for producing the same, and process for producing film |