Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/2005
04/14/2005US20050077512 Nitride semiconductors on silicon substrate and method of manufacturing the same
04/14/2005US20050077280 LED heat lamp arrays for CVD heating
04/14/2005DE19520961B4 Verfahren zum Bilden einer ferroelektrischen Schicht A method of forming a ferroelectric layer
04/14/2005DE10342398A1 Schutzschicht für einen Körper sowie Verfahren und Anordnung zur Herstellung von Schutzschichten Protective layer for a body as well as methods and apparatus for the production of protective layers
04/14/2005DE10132882B4 Verfahren zum Ausbilden einer Dünnschicht unter Verwendung einer Atomschichtabscheidung A method for forming a thin film using an atomic layer deposition
04/14/2005CA2540592A1 Polysulfide thermal vapour source for thin sulfide film deposition
04/13/2005EP1523034A2 Method of manufacturing silicon carbide film
04/13/2005EP1522611A1 Diamond composite substrate and process for producing the same
04/13/2005EP1522603A1 Method for coating an object and object
04/13/2005EP1522535A2 Environmental barrier coating
04/13/2005EP1522403A2 Gas barrier film
04/13/2005EP1522090A2 Thermal processing system and configurable vertical chamber
04/13/2005EP1521604A2 Coatings
04/13/2005EP1268879A4 Supplying and exhausting system in plasma polymerizing apparatus
04/13/2005EP1264005A4 Plasma polymerization system and method for plasma polymerization
04/13/2005CN1606634A Method for monitoring the course of a process using a reactive gas containing one or several hydrocarbons
04/13/2005CN1606632A Vaporiser/delivery vessel for volatile/thermally sensitive solid and liquid compounds
04/13/2005CN1606145A Particle sticking prevention apparatus and plasma processing apparatus
04/13/2005CN1606131A Fluid feeding apparatus
04/13/2005CN1605460A Nano-multilayered structures, components and associated methods of manufacture
04/13/2005CN1197131C Plasma etching device using plasma confining device
04/13/2005CN1197125C Method for producing thermal plate and semi-conductor device
04/13/2005CN1197121C Method and apparatus for reducing diffuseness of perfluoro compound in process of semiconductor mfg.
04/13/2005CN1196655C Compositions for coating glass and the coated glass
04/12/2005US6879778 Batch furnace
04/12/2005US6879051 Systems and methods to determine seed layer thickness of trench sidewalls
04/12/2005US6879042 Semiconductor device and method and apparatus for manufacturing the same
04/12/2005US6878921 Photovoltaic device and manufacturing method thereof
04/12/2005US6878625 Method for manufacturing semiconductor device
04/12/2005US6878419 Plasma treatment of porous materials
04/12/2005US6878405 Or a vapor; combination causes a contact angle theta of the layer comprising DLC to decrease by at least 20%.
04/12/2005US6878402 Method and apparatus for improved temperature control in atomic layer deposition
04/12/2005US6878395 Average surface temperature measured optically and level of the gas cushions regulated by varying the individually controlled gas flow producing the cushions; variations lie within a predetermined temperature window.
04/12/2005US6878248 Method of manufacturing an object in a vacuum recipient
04/12/2005US6878234 Plasma processing device and exhaust ring
04/12/2005US6878233 Workpiece holding mechanism
04/12/2005US6878211 Supporting structure for a ceramic susceptor
04/12/2005US6878210 Surface-treating holder having tubular structure and method using the same
04/12/2005US6878207 Gas gate for isolating regions of differing gaseous pressure
04/12/2005US6878206 Lid assembly for a processing system to facilitate sequential deposition techniques
04/12/2005US6877458 Apparatus for forming deposited film
04/07/2005WO2005031841A2 Methods of filling gaps and methods of depositing materials using high density plasma chemical vapor deposition
04/07/2005WO2005031831A1 Vaporizer
04/07/2005WO2005031830A1 Plasma processing device
04/07/2005WO2005031813A2 Method for forming pentacene film
04/07/2005WO2005031803A2 Thermal processing system with cross flow injection system with rotatable injectors
04/07/2005WO2005031233A2 Thermal processing system with cross-flow liner
04/07/2005WO2005031044A1 Susceptor for induction-heated epitaxial reactors
04/07/2005WO2005031042A2 Method and facility for the production of a band on a substrate band
04/07/2005WO2005031033A1 Method of making enhanced cvd diamond
04/07/2005WO2005031032A2 Apparatus for conveying gases to and from a chamber
04/07/2005WO2005031031A1 Metal thin film chip production method and metal thin film chip production device
04/07/2005WO2005008746A3 Methods of forming a phosphorus doped silicon dioxide layer
04/07/2005WO2005006350A3 Apparatus for consecutive deposition of high-temperature superconducting (hts) buffer layers
04/07/2005US20050074984 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby
04/07/2005US20050074983 Substrate processing apparatus and substrate processing method, high speed rotary valve, and cleaning method
04/07/2005US20050074980 Method for forming a ruthenium metal layer
04/07/2005US20050074676 Chromium oxide film serves as etching stopper formed on diamond film serving as transmitter, and absorptive tungsten layer
04/07/2005US20050074554 In situ etch back of low-k dielectric layer of organofluorosilicate glass, organosilicate glass or black diamond; reaction with process gas to form an extra element; nitrogen fluoride (NF3) provides nitrogen and carbon fluoride gas provides carbon; nitriding, carbiding; high speed cleaning; semiconductor
04/07/2005US20050073803 Methods of manufacturing integrated circuit devices that include a metal oxide layer disposed on another layer to protect the other layer from diffusion of impurities and integrated circuit devices manufactured using same
04/07/2005US20050072991 Method of manufacturing insulating layer and semiconductor device including insulating layer, and semiconductor device formed thereby
04/07/2005US20050072498 Chemical vapor deposition production of high density replacements for depleted uranium ballistic materials; environmental and human safety
04/07/2005US20050072361 Multi-layered radiant thermal evaporator and method of use
04/07/2005US20050072360 Submicron size metal deposit apparatus
04/07/2005US20050072359 Mask frame assembly for depositing a thin layer of an organic electroluminescent device and method for depositing a thin layer using the same
04/07/2005US20050072357 Sublimation bed employing carrier gas guidance structures
04/07/2005US20050072356 Easily loaded and unloaded getter device for reducing evacuation time and contamination in a vacuum chamber and method for use of same
04/07/2005DE10342448A1 Korrosionsschutzbeschichtung Anti-corrosion coating
04/07/2005DE10342401A1 Vacuum deposition process for enhancement of hardness of plastic substrate with involves application of layer to change the structure of functional layers applied onto substrate
04/07/2005DE10341020A1 Vorrichtung zum Innenbeschichten von Hohlkörpern An apparatus for coating the inside of hollow bodies
04/07/2005CA2542819A1 Metal thin film chip production method and metal thin film chip production device
04/06/2005EP1521509A2 Method arrangement and electrode for generating an atmospheric pressure glow plasma
04/06/2005EP1521297A1 Plasma processing equipment
04/06/2005EP1521293A1 Submicron size metal deposit apparatus
04/06/2005EP1519914A1 Novel alkaline earth metal complexes and use thereof
04/06/2005EP1294640A4 Method and apparatus for production of high purity silicon
04/06/2005EP1254278B1 Modulator with liquid crystal cell having a layer which influences the orientation of the liquid crystal
04/06/2005EP1155164A4 In situ chemical generator and method
04/06/2005EP1019945B1 Method and device for surface-treating substrates
04/06/2005CN1605116A Apparatus and method for heat treating semiconductor
04/06/2005CN1604270A Particle removal apparatus and method and plasma processing apparatus
04/06/2005CN1603464A Auxiliary grid hot wire chemical vapor deposition process for preparing nano-diamond thin film
04/06/2005CN1603463A Non-linear hot wire structure used for preparing large area uniform thin film
04/06/2005CN1603462A Surface modification method for alloy and intermetallic compound
04/06/2005CN1603455A Thin-film deposition system
04/06/2005CN1603231A Method for controlling growth density of carbon nanometer tube
04/06/2005CN1196383C Microwave plasma processor and processing method thereof
04/06/2005CN1196177C Combination of heating furnace and loading tool of semiconductor substrate and mfg. method of semiconductor device
04/06/2005CN1196173C Device and method for manufacture of liquid crystal display
04/06/2005CN1196168C Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process
04/06/2005CN1196156C Field emission device using improved carbon film
04/06/2005CN1195694C Transparent matrix having at least a silicon nitride or silicon nitride oxide base thin layer and preparation method therefor
04/05/2005US6876442 Method of calibrating and using a semiconductor processing system
04/05/2005US6875708 Method of producing diamond film and diamond film produced thereby
04/05/2005US6875687 Capping layer for extreme low dielectric constant films
04/05/2005US6875677 Method to control the interfacial layer for deposition of high dielectric constant films
04/05/2005US6875558 Integration scheme using self-planarized dielectric layer for shallow trench isolation (STI)
04/05/2005US6875468 Method and device for treating and/or coating a surface of an object
04/05/2005US6875366 Semiconductors
04/05/2005US6875280 Substrate processing apparatus and substrate processing method