| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 04/28/2005 | WO2005038929A1 Method for manufacturing semiconductor device |
| 04/28/2005 | WO2005038928A1 Method for manufacturing transistor |
| 04/28/2005 | WO2005038255A2 Evacuation apparatus |
| 04/28/2005 | WO2005038081A2 Substrate heater assembly |
| 04/28/2005 | WO2005038080A1 Nozzle with nanosized heater, method for manufacturing same, and method for forming fine thin film |
| 04/28/2005 | WO2005038072A1 Method for coating a component and component |
| 04/28/2005 | WO2005037847A1 Tantalum amide complexes for depositing tantalum-containing films, and method of making same |
| 04/28/2005 | WO2005010971A3 Ultaviolet curing processes for advanced low-k materials |
| 04/28/2005 | WO2005007926A3 Production of agglomerates from gas phase |
| 04/28/2005 | WO2004104131A3 A method to encapsulate phosphor via chemical vapor deposition |
| 04/28/2005 | US20050090923 Method for monitoring a batch system |
| 04/28/2005 | US20050090679 Ruthenium compounds, process for their preparation, and ruthenium-containing thin films made by using the compounds |
| 04/28/2005 | US20050090123 Thin film forming apparatus cleaning method |
| 04/28/2005 | US20050090036 Ultra low dielectric constant thin film |
| 04/28/2005 | US20050089693 Glass substrate and method of manufacturing the same |
| 04/28/2005 | US20050089686 Low-temperature plasma deposited hydrogenated amorphous germanium carbon abrasion-resistant coatings |
| 04/28/2005 | US20050089648 Making a hard carbon protective film of a magnetic recording medium for example; generating a plasma between first and second electrodes by applying an electromagnetic energy which is combined with plural frequencies to the first electrode, and activating a material gas by the plasma |
| 04/28/2005 | US20050089647 Method of manufacturing water-repelling film |
| 04/28/2005 | US20050089634 Method for depositing metallic nitride series thin film |
| 04/28/2005 | US20050089632 Producing bismuth-containing ferroelectric or superconducting films by the Atomic Layer Deposition where a silylamido ligand is used as a source material for the bismuth; e.g. tris(bis(trimethylsilyl)amido)bismuth(III) |
| 04/28/2005 | US20050089467 Process control during (plasma enhanced) chemical vapor deposition independent of the catalyst particle size by controlling the residence time of reactive gases in the reactor |
| 04/28/2005 | US20050089463 Etching and planarizing a substrate by irradiation with a focused ion beam, decomposing and depositing an organic gas into a columnar electrode, and then attaching the nanotubes to the electrode; maintained electroconductivity between nanotubes and electrodes |
| 04/28/2005 | US20050089293 HDP-CVD film for uppercladding application in optical waveguides |
| 04/28/2005 | US20050087873 Method and structure for selective surface passivation |
| 04/28/2005 | US20050087510 Method for avoiding polysilicon film over etch abnormal |
| 04/28/2005 | US20050087305 Plasma processing apparatus and method |
| 04/28/2005 | US20050087302 Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes |
| 04/28/2005 | US20050087299 Semiconductor device fabricating system and semiconductor device fabricating method |
| 04/28/2005 | US20050087296 Processor |
| 04/28/2005 | US20050087140 Remote plasma apparatus for processing substrate with two types of gases |
| 04/28/2005 | US20050087139 Antenna for use in producing plasma and plasma processing apparatus comprising the same |
| 04/28/2005 | US20050087138 Semiconductor device manufacturing apparatus and semiconductor device manufacturing method |
| 04/28/2005 | US20050087136 Particle sticking prevention apparatus and plasma processing apparatus |
| 04/28/2005 | US20050087135 Fluid feeding apparatus |
| 04/28/2005 | US20050087134 Methods, systems, and apparatus for uniform chemical-vapor depositions |
| 04/28/2005 | US20050087132 Methods and apparatus for the production of optical filters |
| 04/28/2005 | US20050087130 Apparatus and methods for plasma vapor deposition processes |
| 04/28/2005 | US20050087123 Low nitrogen concentration carbonaceous material and manufacturing method thereof |
| 04/27/2005 | EP1526111A1 Nano-multilayered structures, components and associated methods of manufacture |
| 04/27/2005 | EP1525627A2 Method and apparatus for superconductor material on a tape substrate |
| 04/27/2005 | EP1525610A1 Method for the vertical structuring of substrates in semiconductor process technology by means of non-conforming deposition |
| 04/27/2005 | EP1525337A2 Sublimation system employing carrier gas |
| 04/27/2005 | EP1525336A2 Titania coatings by plasma cvd at atmospheric pressure |
| 04/27/2005 | EP1525169A1 Apparatus and method for measuring the weight of an optical fiber preform during a chemical deposition process for forming the preform |
| 04/27/2005 | EP1525137A1 Automatic refill system for ultra pure or contamination sensitive chemicals |
| 04/27/2005 | EP1404890B1 Source chemical container assembly |
| 04/27/2005 | EP1343926B1 Method for depositing especially crystalline layers |
| 04/27/2005 | EP1230421B1 Method of modifying source chemicals in an ald process |
| 04/27/2005 | CN2695450Y Device for preparing zinc oxide whiskers array material |
| 04/27/2005 | CN1611095A Induction heating devices and methods for controllably heating an article |
| 04/27/2005 | CN1610768A Emissivity-change-free pumping plate kit in a single wafer chamber |
| 04/27/2005 | CN1610767A Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor |
| 04/27/2005 | CN1610765A Improved method for coating a support with a material |
| 04/27/2005 | CN1610573A Generation, distribution, and use of molecular fluorine within a fabrication facility |
| 04/27/2005 | CN1610076A Method for forming ferroelectric film and semiconductor device |
| 04/27/2005 | CN1609270A PECVD deposition low-tension SiN thin film technology |
| 04/27/2005 | CN1199248C Reinforcing deposition control of manufacturing device in semiconductor wafer |
| 04/27/2005 | CN1199237C Semiconductor device manufacture method |
| 04/27/2005 | CN1199236C Method and apparatus for thermally processing wafers |
| 04/27/2005 | CN1198957C Protective coating by high rate arc plasma deposition |
| 04/27/2005 | CN1198898C Method for coating electroluminescent phosphor |
| 04/26/2005 | US6885452 Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use |
| 04/26/2005 | US6884913 Method for preparation of alpha, beta-unsaturated cyclic ketones by dehydrogenation of secondary allylic cyclic alcohols |
| 04/26/2005 | US6884902 Organometallic iridium compound, process of producing the same, and process of producing thin film |
| 04/26/2005 | US6884901 Reacting an organometallic compound with a cyclopentadiene compound |
| 04/26/2005 | US6884738 Manufacturing method of semiconductor device and substrate processing apparatus |
| 04/26/2005 | US6884737 Method and apparatus for precursor delivery utilizing the melting point depression of solid deposition precursors in the presence of supercritical fluids |
| 04/26/2005 | US6884719 Substrate is subjected to one or more reaction cycles of an organometallic gas precursor and an oxidizing gas to the heated substrate such as semiconductor wafer |
| 04/26/2005 | US6884718 Semiconductor manufacturing process and apparatus for modifying in-film stress of thin films, and product formed thereby |
| 04/26/2005 | US6884691 Method of forming a substrate having a surface comprising at least one of Pt, Pd, Co and Au in at least one of elemental and alloy forms |
| 04/26/2005 | US6884685 Radical oxidation and/or nitridation during metal oxide layer deposition process |
| 04/26/2005 | US6884675 Semiconductor capacitors having tantalum oxide layers and methods for manufacturing the same |
| 04/26/2005 | US6884659 Thin interface layer to improve copper etch stop |
| 04/26/2005 | US6884516 Internal member for plasma-treating vessel and method of producing the same |
| 04/26/2005 | US6884502 Aluminum oxide coated honeycomb for S2S and S3S sealing system with extended oxidation life |
| 04/26/2005 | US6884496 Method for increasing compression stress or reducing internal tension stress of a CVD, PCVD or PVD layer and cutting insert for machining |
| 04/26/2005 | US6884475 Chemical vapor deposition method for depositing a high k dielectric film |
| 04/26/2005 | US6884466 Using tungsten carbonyl compound in vapor phase |
| 04/26/2005 | US6884465 Vapor depositing a dielectric film on a substrate by an atomic layer deposition comprising alternately providing a gaseous metal compound and an oxygen source other than water to the reaction chamber at a temperature <190 degrees C. |
| 04/26/2005 | US6884464 Methods for forming silicon comprising films using hexachlorodisilane in a single-wafer deposion chamber |
| 04/26/2005 | US6884463 CVD process for forming a thin film |
| 04/26/2005 | US6884319 Susceptor of apparatus for manufacturing semiconductor device |
| 04/26/2005 | US6884318 Plasma processing system and surface processing method |
| 04/26/2005 | US6884297 Thin film deposition reactor |
| 04/26/2005 | US6884296 Reactors having gas distributors and methods for depositing materials onto micro-device workpieces |
| 04/26/2005 | US6884290 Electrically conductive polycrystalline diamond and particulate metal based electrodes |
| 04/26/2005 | US6884066 Thermal process station with heated lid |
| 04/26/2005 | US6883733 Tapered post, showerhead design to improve mixing on dual plenum showerheads |
| 04/21/2005 | WO2005036607A2 System and method for feedforward control in thin film coating processes |
| 04/21/2005 | WO2005036593A2 Deposition of silicon-containing films from hexachlorodisilane |
| 04/21/2005 | WO2005036224A1 Fabrication of semiconductor metamaterials |
| 04/21/2005 | WO2005035826A1 Plasma cvd film-forming apparatus |
| 04/21/2005 | WO2005035825A1 Cvd film-forming device and method of manufacturing cvd film coating plastic container |
| 04/21/2005 | WO2005035824A1 Amorphous boron nitride thin film and method for producing same, multilayer film, transparent plastic film, and organic el device |
| 04/21/2005 | WO2005035823A1 METAL COMPLEX HAVING β-DIKETONATO LIGAND AND METHOD FOR PRODUCING METAL-CONTAINING THIN FILM |
| 04/21/2005 | WO2005035820A1 Vapour deposition method |
| 04/21/2005 | WO2005035818A2 Diamond coated article and method of its production |
| 04/21/2005 | WO2005035455A1 Synthesis of germanium sulphide and related compounds |
| 04/21/2005 | WO2005034791A1 A drill bit with a moissanite (silicon carbide) cutting element |
| 04/21/2005 | WO2005020317A3 Ruthenium layer formation for copper film deposition |