| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/10/2005 | US6890862 Processes for vacuum treating workpieces, and corresponding process equipment |
| 05/10/2005 | US6890861 Semiconductor processing equipment having improved particle performance |
| 05/10/2005 | US6890853 Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module |
| 05/10/2005 | US6890850 Method of depositing dielectric materials in damascene applications |
| 05/10/2005 | US6890656 High rate deposition of titanium dioxide |
| 05/10/2005 | US6890655 Diamond coated cutting tool and method for making the same |
| 05/10/2005 | US6890639 Reacting a mixture comprising an oxidizable siloxane and an oxidizable compound with a tertiarybutyl, tertiarybutoxy, furfuryl, furfuryloxy, or neopentyl group that decomposes to gases that leave voids when the material is annealed |
| 05/10/2005 | US6890632 Multilayer; cemented carbides, alumina; inserts; wear resistance, high strength |
| 05/10/2005 | US6890597 HDP-CVD uniformity control |
| 05/10/2005 | US6890596 Vapor deposition including chemical (that may be plasma enhanced) and atomic layer; reactive purge gas forms a curtain over the chamber surface and reacts with material adhering to the surface |
| 05/10/2005 | US6890403 Apparatus and process for controlling the temperature of a substrate in a plasma reactor |
| 05/10/2005 | US6890387 Method and device for correcting pattern film on a semiconductor substrate |
| 05/10/2005 | US6890386 Modular injector and exhaust assembly |
| 05/10/2005 | US6889864 Source chemical container assembly |
| 05/06/2005 | WO2005041285A1 Shower head and film-forming device using the same |
| 05/06/2005 | WO2005040461A1 Method and system for selectively coating metal surfaces |
| 05/06/2005 | WO2005040454A1 Surface treatment method and device |
| 05/06/2005 | WO2005040453A2 Control of carbon nanotube diameter using cvd or pecvd growth |
| 05/06/2005 | WO2005028702A3 Precursor delivery system |
| 05/06/2005 | WO2004113585A3 Atomic layer deposition of barrier materials |
| 05/06/2005 | WO2004111296A3 Stress reduction of sioc low k film by addition of alkylenes to omcts based processes |
| 05/05/2005 | US20050096238 Using fluorocarbon and oxygen with nitrogen trifluoride, fluorine, nitrogen oxide and inert gases; etching resistance; semiconductors |
| 05/05/2005 | US20050095859 Precursor delivery system with rate control |
| 05/05/2005 | US20050095850 Method of manufacturing amorphous metal oxide film and methods of manufacturing capacitance element having amorphous metal oxide film and semiconductor device |
| 05/05/2005 | US20050095826 Heat-processing method and apparatus for semiconductor process |
| 05/05/2005 | US20050095787 Structure and method for formation of a bipolar resistor |
| 05/05/2005 | US20050095770 Cvd method and device for forming silicon-containing insulation film |
| 05/05/2005 | US20050095443 Plasma enhanced ALD of tantalum nitride and bilayer |
| 05/05/2005 | US20050095429 Vapor deposition on dissolvable substrate, then placing in non-etching solution; for use as radiation transparent windows for electromagnetic radiation |
| 05/05/2005 | US20050095361 Material for forming insulation film and film-forming method with the use of the material |
| 05/05/2005 | US20050094349 Electrostatic chuck assembly having disassembling device |
| 05/05/2005 | US20050093418 Light source |
| 05/05/2005 | US20050093024 Semiconductor device and method for manufacturing the same |
| 05/05/2005 | US20050092732 Susceptor for deposition process equipment and method of fabricating a heater therein |
| 05/05/2005 | US20050092439 Low/high temperature substrate holder to reduce edge rolloff and backside damage |
| 05/05/2005 | US20050092437 Plasma processing equipment |
| 05/05/2005 | US20050092250 Gas phase growth system, method of operating the system, and vaporizer for the system |
| 05/05/2005 | US20050092249 Atomic layer deposition reactor |
| 05/05/2005 | US20050092248 Chemical vapor deposition unit |
| 05/05/2005 | US20050092247 Gas mixer and manifold assembly for ALD reactor |
| 05/05/2005 | US20050092246 Device for depositing thin layers with a wireless detection of process parameters |
| 05/05/2005 | US20050092245 Plasma chemical vapor deposition apparatus having an improved nozzle configuration |
| 05/05/2005 | US20050092244 Diffusion system |
| 05/05/2005 | US20050092243 Processing apparatus and method |
| 05/05/2005 | US20050092242 Staggered ribs on process chamber to reduce thermal effects |
| 05/05/2005 | US20050092241 Appliance having a container including a nanostructured material for hydrogen storage |
| 05/05/2005 | US20050092240 Gas for plasma reaction, process for producing the same, and use |
| 05/04/2005 | EP1528590A2 Method for producing a nitride semiconductor crystal layer, nitride semiconductor crystal layer and substrate for producing the same |
| 05/04/2005 | EP1528125A2 Coated cutting insert for rough turning |
| 05/04/2005 | EP1528122A1 Chemical vapor deposition unit |
| 05/04/2005 | EP1528121A2 Silicon carbide-coated carbonaceous material |
| 05/04/2005 | EP1528118A2 Gas turbine component with a protective coating and process for its manufacture |
| 05/04/2005 | EP1527207A1 Pyrrolyl complexes of copper for copper metal deposition |
| 05/04/2005 | EP1444379B1 Atomic layer deposition apparatus and process |
| 05/04/2005 | EP1415014B1 Method for making diamond-coated composite materials |
| 05/04/2005 | EP1159465A4 Processing chamber for atomic layer deposition processes |
| 05/04/2005 | CN2697108Y Vapor density adjustable and controllable liquid evaporator |
| 05/04/2005 | CN1613279A Plasma process apparatus and its processor |
| 05/04/2005 | CN1613143A Gas for plasma reaction, process for producing the same, and use |
| 05/04/2005 | CN1613142A 半导体集成电路器件的制造方法 The method of manufacturing a semiconductor integrated circuit device |
| 05/04/2005 | CN1612956A Coloured diamond |
| 05/04/2005 | CN1612955A Boron doped diamond |
| 05/04/2005 | CN1612311A Composite material and chip holding component and making method thereof |
| 05/04/2005 | CN1612296A 扩散系统 Diffusion System |
| 05/04/2005 | CN1612288A Lining heating device and multi-chamber lining treatment system |
| 05/04/2005 | CN1611995A Susceptor for deposition process equipment and method of fabricating a heater therein |
| 05/04/2005 | CN1611637A Chemical vapor deposition unit |
| 05/04/2005 | CN1611636A Method and apparatus for the delivery of precursor materials |
| 05/04/2005 | CN1611635A Silicon carbide-coated carbonaceous material and carbonaceous material to be coated with silicon carbide |
| 05/04/2005 | CN1611633A Electrode stand structure for continuous surface treating apparatus |
| 05/04/2005 | CN1611313A Coated cutting insert for rough turning |
| 05/04/2005 | CN1200135C Method for preparing film by using atom layer deposition |
| 05/04/2005 | CN1199853C Metal catalyst for low-temp. thermochemical gas-phase precipitation synthesis of carbon nanotubes and synthetic method of carbon nanotubes using the same |
| 05/03/2005 | US6889004 Thermal processing system and thermal processing method |
| 05/03/2005 | US6888313 Impedance matching network with termination of secondary RF frequencies |
| 05/03/2005 | US6888188 Capacitor constructions comprising perovskite-type dielectric materials and having different degrees of crystallinity within the perovskite-type dielectric materials |
| 05/03/2005 | US6888040 Method and apparatus for abatement of reaction products from a vacuum processing chamber |
| 05/03/2005 | US6887803 Gas-assisted rapid thermal processing |
| 05/03/2005 | US6887797 Apparatus and method for forming an oxynitride insulating layer on a semiconductor wafer |
| 05/03/2005 | US6887794 Pre-cleaning method of substrate for semiconductor device |
| 05/03/2005 | US6887775 Process and apparatus for epitaxially coating a semiconductor wafer and epitaxially coated semiconductor wafer |
| 05/03/2005 | US6887736 Method of forming a p-type group II-VI semiconductor crystal layer on a substrate |
| 05/03/2005 | US6887727 System and method for increasing nitrogen incorporation into a semiconductor material layer using an additional element |
| 05/03/2005 | US6887721 Method of purging CVD apparatus and method for judging maintenance of times of semiconductor production apparatuses |
| 05/03/2005 | US6887578 Condensation copolymerization to form a polyethersiloxane biocompatible coatings for medical implants; gas phase polymerization |
| 05/03/2005 | US6887562 Surface coating of a carbide or a nitride |
| 05/03/2005 | US6887523 Method for metal oxide thin film deposition via MOCVD |
| 05/03/2005 | US6887522 Forming a first copper film on a predetermined surface of a substrate by chemical vapor deposition and forming a second copper film on the first copper film by an electrolytic copper plating using the first copper film as an electrode |
| 05/03/2005 | US6887521 Controlling the gas flow and supplying in vapor deposition of thin film on semiconductor, forming microelectronics; materials handling of gas, filling, displacing, dispensing, pressurization, discharging |
| 05/03/2005 | US6887514 Method of depositing optical films |
| 05/03/2005 | US6887511 Pretreating a surface of a current collector by plasma or ion irradiation; depositing thin film of active material that is alloyable with lithium; forming a negative electrode from electrode; assembling negative electrode, a positive electrode |
| 05/03/2005 | US6887437 Housing connected to silicon wafer with etched pores with catalyst covering |
| 05/03/2005 | US6887346 Spinning disk evaporator |
| 05/03/2005 | US6887341 Plasma processing apparatus for spatial control of dissociation and ionization |
| 05/03/2005 | US6887339 RF power supply with integrated matching network |
| 05/03/2005 | US6887317 Reduced friction lift pin |
| 05/03/2005 | US6887315 Vacuum plate having a symmetrical air-load block |
| 05/03/2005 | US6886573 Plasma cleaning gas with lower global warming potential than SF6 |
| 05/03/2005 | US6886491 Plasma chemical vapor deposition apparatus |
| 05/03/2005 | US6886240 Apparatus for producing thin-film electrolyte |