| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/18/2005 | EP1531187A2 Coated cutting tool insert for machining of cast irons |
| 05/18/2005 | EP1531131A1 Transport packing and method for producing a transport packing |
| 05/18/2005 | EP1028797B1 Getter-based gas purifier, its uses in a semiconductor manufacturing system and in a method of making an integrated circuit device and a method of protecting a getter column |
| 05/18/2005 | CN1618123A Lanthanide series layered superlattice materials for integrated circuit applications |
| 05/18/2005 | CN1618120A Vertical heat treatment device |
| 05/18/2005 | CN1618117A Susceptor, vapor phase growth device, device and method of manufacturing epitaxial wafer, and epitaxial wafer |
| 05/18/2005 | CN1617949A Method for depositing inorganic/organic films |
| 05/18/2005 | CN1617948A Volatile copper(II) complexes for deposition of copper films by atomic layer deposition |
| 05/18/2005 | CN1617319A Wafer base |
| 05/18/2005 | CN1617309A Flat panel display manufacturing apparatus |
| 05/18/2005 | CN1616708A Diamond cone tip and its making method |
| 05/18/2005 | CN1616368A Protective layer for a body, and process and arrangement for producing protective layers |
| 05/18/2005 | CN1616169A Hard coated layer with good anti-tipping property surface coated with metal ceramic made cutting tool |
| 05/18/2005 | CN1202282C High temp.-resisting plasma cavity resonator |
| 05/17/2005 | US6894369 Semiconductor device having a high-dielectric gate insulation film and fabrication process thereof |
| 05/17/2005 | US6894306 Field emission device having a covering comprising aluminum nitride |
| 05/17/2005 | US6893986 Method of reducing internal stress in materials |
| 05/17/2005 | US6893983 Method for depositing a very high phosphorus doped silicon oxide film |
| 05/17/2005 | US6893965 Method of producing semiconductor device |
| 05/17/2005 | US6893964 Cleaning method for substrate treatment device and substrate treatment device |
| 05/17/2005 | US6893963 Method for forming a titanium nitride layer |
| 05/17/2005 | US6893953 Fabrication process of a semiconductor device including a CVD process of a metal film |
| 05/17/2005 | US6893749 SiC-formed material |
| 05/17/2005 | US6893720 Object coated with carbon film and method of manufacturing the same |
| 05/17/2005 | US6893507 Self-centering wafer support system |
| 05/17/2005 | US6893506 Comprises exposing semiconductor substrates to vacuum maintained by non-roughing pumps |
| 05/17/2005 | US6893500 Method of constructing optical filters by atomic layer control for next generation dense wavelength division multiplexer |
| 05/17/2005 | US6892762 Manifolded fluid delivery system |
| 05/17/2005 | US6892669 CVD apparatus |
| 05/12/2005 | WO2005043648A2 Synergetic sp-sp2-sp3 carbon materials and deposition methods thereof |
| 05/12/2005 | WO2005043623A2 Method for forming a dielectric on a metallic layer and capacitor assembly |
| 05/12/2005 | WO2005043613A1 Substrate holder |
| 05/12/2005 | WO2005042800A1 Organic metal chemical vapor deposition apparatus |
| 05/12/2005 | WO2005042799A1 Methods of producing carbon layers on titanium metal |
| 05/12/2005 | WO2005042160A2 Reaction system for growing a thin film |
| 05/12/2005 | WO2005026409A3 Replaceable plate expanded thermal plasma apparatus and method |
| 05/12/2005 | WO2005008763A3 Methods of forming deuterated silicon nitride-containing materials |
| 05/12/2005 | WO2005002020A3 Apparatus for high-throughput ion beam assisted deposition (ibad) |
| 05/12/2005 | WO2004108978A3 Ultraviolet (uv) and plasma assisted metalorganic chemical vapor deposition (mocvd) system |
| 05/12/2005 | US20050101155 Ramp temperature techniques for improved mean wafer before clean |
| 05/12/2005 | US20050101154 Plasma treatment to enhance adhesion and to minimize oxidation of carbon-containing layers |
| 05/12/2005 | US20050101150 Methods of enhancing selectivity of etching silicon dioxide relative to one or more organic substances; and plasma reaction chambers |
| 05/12/2005 | US20050101132 Copper interconnect structure having stuffed diffusion barrier |
| 05/12/2005 | US20050101131 Devices containing zirconium-platinum-containing materials and methods for preparing such materials and devices |
| 05/12/2005 | US20050101082 Composite material, wafer holding member and method for manufacturing the same |
| 05/12/2005 | US20050100748 Ultra-hard low friction coating based on AlMgB14 for reduced wear of MEMS and other tribological components and system |
| 05/12/2005 | US20050100736 Method for manufacturing a nanostructure in-situ, and in-situ manufactured nanostructure devices |
| 05/12/2005 | US20050100701 Hard carbon coating on substrate; multilayer; lubrication |
| 05/12/2005 | US20050100683 Method of improving post-develop photoresist profile on a deposited dielectric film |
| 05/12/2005 | US20050100670 Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition |
| 05/12/2005 | US20050100669 Method and apparatus for fabricating a conformal thin film on a substrate |
| 05/12/2005 | US20050100668 Method for increasing the mobility of vapor-deposited pentacene |
| 05/12/2005 | US20050100667 forming a nebulized aerosol from solubilized polymer solution and directing the nebulized aerosol toward the substrate to dry into a uniform polymer coating with an antireflective surface |
| 05/12/2005 | US20050099111 Method for the preparation of graphite nanofibers and emitter and display elements comprising the nanofibers |
| 05/12/2005 | US20050098906 Source gas flow control and CVD using same |
| 05/12/2005 | US20050098856 Low dielectric constant fluorine and carbon-containing silicon oxide dielectric material characterized by improved resistance to oxidation |
| 05/12/2005 | US20050098812 Semiconductor device having a capacitor and method for the manufacture thereof |
| 05/12/2005 | US20050098742 System and method for performing SIMOX implants using an ion shower |
| 05/12/2005 | US20050098120 Susceptor device |
| 05/12/2005 | US20050098119 Method and device for vacuum-coating a substrate |
| 05/12/2005 | US20050098117 Segmented resonant antenna for radio frequency inductively coupled plasmas |
| 05/12/2005 | US20050098116 Matching unit for semiconductor plasma processing apparatus |
| 05/12/2005 | US20050098115 Atmospheric substrate processing apparatus for depositing multiple layers on a substrate |
| 05/12/2005 | US20050098114 Vapor deposition apparatus |
| 05/12/2005 | US20050098111 Apparatus for single-wafer-processing type CVD |
| 05/12/2005 | US20050098109 Precoat film forming method, idling method of film forming device, loading table structure, film forming device and film forming method |
| 05/12/2005 | US20050098108 Gas delivery device for improved deposition of dielectric material |
| 05/12/2005 | US20050098107 Thermal processing system with cross-flow liner |
| 05/12/2005 | US20050098105 Chemical vapor deposition apparatus and methods |
| 05/12/2005 | US20050098093 Method of fabricating an epitaxial silicon-germanium layer and an integrated semiconductor device comprising an epitaxial arsenic in-situ doped silicon-germanium layer |
| 05/12/2005 | US20050098061 contains a deposition promoter selected from copper compound, thallium compound, and lead compound; pH of 3 to 7.5; complexing agent as stabilizer suppresses the precipitation of copper ions; deposit on semiconductor, high speed |
| 05/12/2005 | DE3825399C5 PVD- oder Plasma- CVD-Beschichtung PVD or Plasma CVD |
| 05/12/2005 | DE19922665B4 Verfahren zur Herstellung von einer extrem glatten feinkristallinen Diamantschicht auf dreidimensionalen Grundkörpern und deren Verwendung A process for producing an extremely smooth finely crystalline diamond film on three dimensional primitives and their use |
| 05/12/2005 | DE10130308B4 Kornorientiertes Elektroblech mit einer elektrisch isolierenden Beschichtung A grain-oriented electrical steel sheet with an electrically insulating coating |
| 05/12/2005 | CA2542146A1 High capacitance electrode and methods of producing same |
| 05/12/2005 | CA2542085A1 Methods of producing carbon layers on titanium metal |
| 05/11/2005 | EP1529855A2 Diffusion system |
| 05/11/2005 | EP1529854A1 Cleaning gas mixture for an apparatus and cleaning method |
| 05/11/2005 | EP1529125A2 Method and apparatus for providing gas to a processing chamber |
| 05/11/2005 | EP1528956A1 Method and apparatus for manufacturing a catalyst |
| 05/11/2005 | EP1415321B1 Device for the coating of objects |
| 05/11/2005 | EP1123423A4 High rate silicon deposition method at low pressures |
| 05/11/2005 | CN1615540A Formation of high-mobility silicon-germanium structures by low-energy plasma enhanced chemical vapor deposition |
| 05/11/2005 | CN1615537A Chemical reactor templates: sacrificial layer fabrication and template use |
| 05/11/2005 | CN1615271A Highly pure ultra-fine SiOx powder and method for production thereof |
| 05/11/2005 | CN1614739A Processing apparatus and method |
| 05/11/2005 | CN1614092A Cleaning gas and cleaning method |
| 05/11/2005 | CN1614091A Preparation for amorphous carbon thin-film hydrophobic material with rear surface fluorating process |
| 05/11/2005 | CN1614086A Surface activated plasma CVD system |
| 05/11/2005 | CN1614085A Wiring repair apparatus |
| 05/11/2005 | CN1614084A One-dimensional phthalocyanine compound nanometer thin film and preparation thereof |
| 05/11/2005 | CN1614083A Preparation of nanometer thin film |
| 05/11/2005 | CN1201416C Plate display and its protecting layer forming process |
| 05/11/2005 | CN1201397C Semiconductor storage having ruthenium pole and its mfg. method |
| 05/11/2005 | CN1201370C Apparatus for improving plasma distribution and performance in inductively coupled plasma |
| 05/11/2005 | CN1200855C Plastic container for dry solid food |
| 05/10/2005 | US6891269 Having barrier layer and metal growth promoting layer of titanium nitride containing oxygen at lower concentration than barrier layer jointly as ground layer; reduces incubation time for forming embedded copper interconnection layer |
| 05/10/2005 | US6891131 Thermal processing system |
| 05/10/2005 | US6890986 Substantially pure bulk pyrocarbon and methods of preparation |
| 05/10/2005 | US6890869 Low-dielectric silicon nitride film and method of forming the same, semiconductor device and fabrication process thereof |