| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/26/2005 | US20050109279 Surface wave excitation plasma CVD system |
| 05/26/2005 | US20050109278 Method to locally protect extreme ultraviolet multilayer blanks used for lithography |
| 05/26/2005 | US20050109277 Method for controlled application of reactive vapors to produce thin films and coatings |
| 05/26/2005 | US20050109276 Thermal chemical vapor deposition of silicon nitride using BTBAS bis(tertiary-butylamino silane) in a single wafer chamber |
| 05/26/2005 | US20050109275 Reactor chamber |
| 05/26/2005 | US20050108892 Reacting a boron compound with a dielectric substrate to give a volatile product and a boron-containing by-product, and then reacting a fluorine compound with the boron-containing by-product to form the volatile product, and then removing the volatile product from the atomic layer deposition reactor |
| 05/25/2005 | EP1533836A1 Method for manufacturing silicon epitaxial wafer |
| 05/25/2005 | EP1533835A1 Vaporizer, various apparatuses including the same and method of vaporization |
| 05/25/2005 | EP1533834A1 Vapor phase epitaxial apparatus and vapor phase epitaxial method |
| 05/25/2005 | EP1533833A1 Vapor phase epitaxy device |
| 05/25/2005 | EP1533396A2 Method for repairing coated components using NiAl bond coats |
| 05/25/2005 | EP1532664A2 Wafer batch processing system and method |
| 05/25/2005 | EP1532660A2 Method of loading a wafer onto a wafer holder to reduce thermal shock |
| 05/25/2005 | EP1532292A1 Atomic deposition layer methods |
| 05/25/2005 | EP1532291A2 Systems and methods for forming metal oxides using metal organo-amines and metal organo-oxides |
| 05/25/2005 | EP1532290A2 Systems and methods for forming zirconium and/or hafnium-containing layers |
| 05/25/2005 | EP1532289A2 Zirconium complex used for the cvd method and preparation method of a thin film using thereof |
| 05/25/2005 | EP1532286A1 Component protected against corrosion and method for the production thereof and device for carrying out said method |
| 05/25/2005 | EP1531924A1 Hydrogen-selective silica-based membrane |
| 05/25/2005 | EP1203244B1 Method for making an anti-reflection coated article |
| 05/25/2005 | EP0972092B1 Multipurpose processing chamber for chemical vapor deposition processes |
| 05/25/2005 | EP0906636B1 Highly tetrahedral amorphous carbon films and methods and ion-beam source for their production |
| 05/25/2005 | DE10351330A1 Verfahren und Vorrichtung zur Versorgung mindestens einer Bearbeitungsstation für ein Werkstück Method and apparatus for supplying at least one processing station for a workpiece, |
| 05/25/2005 | DE10348734A1 Verfahren und System zum selektiven Beschichten von Metalloberflächen Method and system for selective coating of metal surfaces |
| 05/25/2005 | DE10341806A1 Verfahren zur Herstellung einer epitaktischen Silizium-Germanium Schicht und integriertes Halbleiterbauelement mit einer epitaktischen mit Arsen in-situ dotierten Silizium-Germanium Schicht A process for producing an epitaxial silicon-germanium layer and integrated semiconductor device with an epitaxial doped with arsenic in-situ silicon-germanium layer |
| 05/25/2005 | CN1620722A Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices |
| 05/25/2005 | CN1620721A Selective deposition of a barrier layer on a dielectric material |
| 05/25/2005 | CN1620717A Cleaning method of substrate treating apparatus, and substrate treating apparatus |
| 05/25/2005 | CN1620522A Process chamber component having electroplated yttrium containing coating |
| 05/25/2005 | CN1620349A Surface-coated cutting tool |
| 05/25/2005 | CN1619820A Hafnium oxide and aluminium oxide alloyed dielectric layer and method for fabricating the same |
| 05/25/2005 | CN1619819A Capacitor with hafnium oxide and aluminum oxide alloyed dielectric layer and method for fabricating the same |
| 05/25/2005 | CN1619780A Teater |
| 05/25/2005 | CN1619008A Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 05/25/2005 | CN1618733A Preparation method of carbon nano-pipe |
| 05/25/2005 | CN1618682A Purgeable container for low vapor pressure chemicals |
| 05/25/2005 | CN1203534C Reduced degradation of metal oxide ceramic due to diffusion of mobile matter therefrom |
| 05/24/2005 | US6897560 Ultraviolet-transparent conductive film and process for producing the same |
| 05/24/2005 | US6897559 Silicon-based thin film forming apparatus, silicon-based thin film forming method and semiconductor element |
| 05/24/2005 | US6897551 Support for microelectronic, microoptoelectronic or micromechanical devices |
| 05/24/2005 | US6897163 Method for depositing a low dielectric constant film |
| 05/24/2005 | US6897161 Removing deposits from silicon electrode plates includes radiating ultrasonic waves toward a surface of the plate having openings of the plurality of gas nozzles from a horn connected to an ultrasonic vibrator |
| 05/24/2005 | US6897160 Methods for forming rough ruthenium-containing layers and structures/methods using same |
| 05/24/2005 | US6897157 Method of repairing an opaque defect on a mask with electron beam-induced chemical etching |
| 05/24/2005 | US6897149 Method of producing electronic device material |
| 05/24/2005 | US6897146 System architecture of semiconductor manufacturing equipment |
| 05/24/2005 | US6897138 Method and apparatus for producing group III nitride compound semiconductor |
| 05/24/2005 | US6897129 Fabrication method of semiconductor device and semiconductor device |
| 05/24/2005 | US6897119 Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition |
| 05/24/2005 | US6896929 Susceptor shaft vacuum pumping |
| 05/24/2005 | US6896765 Method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| 05/24/2005 | US6896764 Vacuum processing apparatus and control method thereof |
| 05/24/2005 | US6896738 Induction heating devices and methods for controllably heating an article |
| 05/24/2005 | US6896737 Gas delivery device for improved deposition of dielectric material |
| 05/19/2005 | WO2005045916A1 Method for processing substrate |
| 05/19/2005 | WO2005044907A2 Flame resistant |
| 05/19/2005 | WO2005044749A2 Object with easily cleaned surfaces and method for production thereof |
| 05/19/2005 | WO2005044748A1 Object comprising a surface that is easy to clean, and method for the production thereof |
| 05/19/2005 | WO2005044317A2 Method and device for supplying at least one machining station for a workpiece |
| 05/19/2005 | WO2005021829B1 Device for coating the inside of hollow bodies |
| 05/19/2005 | US20050107627 Hexakis(monohydrocarbylamino) disilanes and method for the preparation thereof |
| 05/19/2005 | US20050107283 Volatile copper (II) complexes and reducing agents for deposition of copper films by atomic layer deposition |
| 05/19/2005 | US20050106884 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon |
| 05/19/2005 | US20050106881 Wafer reuse techniques |
| 05/19/2005 | US20050106877 Method for depositing nanolaminate thin films on sensitive surfaces |
| 05/19/2005 | US20050106876 Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing |
| 05/19/2005 | US20050106864 Process and device for depositing semiconductor layers |
| 05/19/2005 | US20050106798 Semiconductor device and method for fabricating the same |
| 05/19/2005 | US20050106763 Real-time detection mechanism with self-calibrated steps for the hardware baseline to detect the malfunction of liquid vaporization system in AMAT TEOS-based Dxz Chamber |
| 05/19/2005 | US20050106524 Heat treatment device and heat treatment method |
| 05/19/2005 | US20050106423 Carbonceous substrate such as graphite, coated by silicon carbide with reduced nitrogen and boron imputities; used as tools or jigs for the production of epitaxial layers of SiC semiconductors |
| 05/19/2005 | US20050106332 Oxidation and fatigue resistant metallic coating |
| 05/19/2005 | US20050106331 Introducing reactive gas containing a carbon compound into reaction chamber wherein reactive gas is converted into plasma by resonance using microwaves and the magnetic field, placing substrate in reaction chamber, and depositing film having amorphous structure on the substrate |
| 05/19/2005 | US20050106320 Silicon carbide and other films and method of deposition |
| 05/19/2005 | US20050106319 Process and device for depositing thin layers on a substrate in a process chamber of adjustable height |
| 05/19/2005 | US20050106318 Crack and residue free conformal deposited silicon oxide with predictable and uniform etching characteristics |
| 05/19/2005 | US20050106315 Method for repairing components using environmental bond coatings and resultant repaired components |
| 05/19/2005 | US20050106314 Bonding performance between the protective coating and the lubricating film is improved by adding a gas selected from carbon dioxide (CO2), nitrogen oxide (NO2), and/or nitrous oxide (N2O) when making the diamond-like carbon protective film by chemical vapor deposition or ion beam method; reliability |
| 05/19/2005 | US20050105038 Thin film multilayer body, electronic device and actuator using the thin film multilayer body, and method of manufacturing the actuator |
| 05/19/2005 | US20050104142 CVD tantalum compounds for FET get electrodes |
| 05/19/2005 | US20050104082 Nitride semiconductor substrate and its production method |
| 05/19/2005 | US20050104056 Electronic device using carbon element linear structure and production method thereof |
| 05/19/2005 | US20050103275 Plasma processing apparatus, ring member and plasma processing method |
| 05/19/2005 | US20050103274 Reliability assessment system and method |
| 05/19/2005 | US20050103273 Vacuum evaporation crucible and phosphor sheet manufacturing apparatus using the same |
| 05/19/2005 | US20050103272 Material processing system and method |
| 05/19/2005 | US20050103269 Method and apparatus for providing and integrating a general metal delivery source (GMDS) with atomic layer deposition (ALD) |
| 05/19/2005 | US20050103268 Method and apparatus for an improved baffle plate in a plasma processing system |
| 05/19/2005 | US20050103267 Flat panel display manufacturing apparatus |
| 05/19/2005 | US20050103266 Accelerated plasma clean |
| 05/19/2005 | US20050103265 Gas distribution showerhead featuring exhaust apertures |
| 05/19/2005 | US20050103264 Atomic layer deposition process and apparatus |
| 05/19/2005 | US20050103261 Epitaxially coated semiconductor wafer |
| 05/19/2005 | DE10345393A1 Verfahren zur Abscheidung eines leitfähigen Materials auf einem Substrat und Halbleiterkontaktvorrichtung A process for depositing a conductive material on a substrate and semiconductor contact device |
| 05/19/2005 | DE10217277B4 Verfahren zur metallischen Innenbeschichtung von Hohlkörpern, insbesondere von Strahlrohrelementen A process for internal coating of metallic hollow bodies, in particular jet pipe elements |
| 05/19/2005 | CA2541500A1 Flame resistant |
| 05/18/2005 | EP1531490A1 Window type probe, plasma monitoring device, and plasma processing device |
| 05/18/2005 | EP1531191A2 Atomic layer deposition process and apparatus |
| 05/18/2005 | EP1531190A1 Method of treating a gas output from a processing chamber |
| 05/18/2005 | EP1531189A1 A vapor deposition apparatus |