| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/02/2005 | US20050118365 Plastic containers coated on the inner surface and process for production thereof |
| 06/02/2005 | US20050118354 propelling plasma products of oxygen and metal towards the substrate;electrically biasing a control grid of a dopant source (e.g., Li or Mg)between the plasma chamber and the substrate the control grid to control a rate of depositionespecially forming a ZnO ferroelectric film |
| 06/02/2005 | US20050118349 Process of making a multilayer structure vapor deposition a layer of metal on substrate and detaching |
| 06/02/2005 | US20050118336 Method for the deposition of silicon nitride |
| 06/02/2005 | US20050118335 Method of forming thin ruthenium-containing layer |
| 06/02/2005 | US20050118334 Multistage process for multilayer forming of alloy diffusion coating on article with vapor or vacuum deposition on surface for protection of surface using nickel, aluminum |
| 06/02/2005 | US20050118085 Fluorination and defluorination treatment of semiconductor production off gas to create working fluid; environmentally friendly |
| 06/02/2005 | US20050118002 Load-lock technique |
| 06/02/2005 | US20050118001 Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections |
| 06/02/2005 | US20050116637 Organic electroluminescence display panel and fabrication method thereof |
| 06/02/2005 | US20050116347 Deposition of fluorosilsesquioxane films |
| 06/02/2005 | US20050116266 Method of producing insulator thin film, insulator thin film, method of manufacturing semiconductor device, and semiconductor device |
| 06/02/2005 | US20050116226 Formation of high-mobility silicon-germanium structures by low-energy plasma enhanced chemical vapor deposition |
| 06/02/2005 | US20050116064 Reactors having gas distributors and methods for depositing materials onto micro-device workpieces |
| 06/02/2005 | US20050115830 Film forming apparatus |
| 06/02/2005 | US20050115675 Lid assembly for a processing system to facilitate sequential deposition techniques |
| 06/02/2005 | US20050115505 Delivery of solid chemical precursors |
| 06/02/2005 | US20050115504 Method and apparatus for forming thin films, method for manufacturing solar cell, and solar cell |
| 06/02/2005 | US20050115502 System and method for feedforward control in thin film coating processes |
| 06/02/2005 | US20050115501 Processing device and method of maintaining the device |
| 06/02/2005 | DE4321639B4 Plasmaunterstützte, chemische Vakuumbeschichtungsanlage Plasma-enhanced chemical vacuum coating system |
| 06/02/2005 | DE202004020371U1 Gegenstand mit einem Schichtenverbund An article comprising a layer composite |
| 06/02/2005 | CA2546230A1 Antimicrobial composite material |
| 06/02/2005 | CA2546081A1 Method for depositing silicon carbide and ceramic films |
| 06/02/2005 | CA2537075A1 Glow discharge-generated chemical vapor deposition |
| 06/01/2005 | EP1536462A1 Oxide film forming method and oxide film forming apparatus |
| 06/01/2005 | EP1536041A2 Coated cermet cutting tool with a chipping resistant, hard coating layer |
| 06/01/2005 | EP1536035A2 Method for cleaning deposition chambers for high dielectric constant materials |
| 06/01/2005 | EP1535321A2 Low termperature deposition of silicon oxides and oxynitrides |
| 06/01/2005 | EP1535320A2 Atomic layer deposition of high k metal silicates |
| 06/01/2005 | EP1535319A2 Atomic layer deposition of high k metal oxides |
| 06/01/2005 | EP1535314A2 High rate deposition at low pressures in a small batch reactor |
| 06/01/2005 | EP1535303A1 Gas tube end cap for a microwave plasma generator |
| 06/01/2005 | EP1535302A2 Accessory member for dispensers of alkali metals |
| 06/01/2005 | EP1534876A2 Method of forming a coating on a plastic glazing |
| 06/01/2005 | EP1534875A1 Systems and methods for forming metal oxides using alcohols |
| 06/01/2005 | EP1534874A2 Continuous chemical vapor deposition process and process furnace |
| 06/01/2005 | EP0682580B2 Cemented carbide with binder phase enriched surface zone and enhanced edge toughness behaviour |
| 06/01/2005 | CN1622225A Material for forming insulation film and film-forming method with the use of the material |
| 06/01/2005 | CN1204618C Method for forming metal wires in semiconductor device |
| 06/01/2005 | CN1204608C Method for forming layer of tungsten silicate |
| 06/01/2005 | CN1204607C Method for depositing diffusion barrier |
| 06/01/2005 | CN1204283C Coated cutting tool with iron-nickel based binder phase |
| 05/31/2005 | US6900580 Self-oriented bundles of carbon nanotubes and method of making same |
| 05/31/2005 | US6900455 Multilayer dielectric tunnel barrier used in magnetic tunnel junction devices, and its method of fabrication |
| 05/31/2005 | US6900413 Hot wall rapid thermal processor |
| 05/31/2005 | US6900144 Film-forming surface reforming method and semiconductor device manufacturing method |
| 05/31/2005 | US6900130 Method for locally heating a region in a semiconductor substrate |
| 05/31/2005 | US6900129 CVD of tantalum and tantalum nitride films from tantalum halide precursors |
| 05/31/2005 | US6900115 Deposition over mixed substrates |
| 05/31/2005 | US6900107 Devices containing platinum-iridium films and methods of preparing such films and devices |
| 05/31/2005 | US6900070 Dislocation reduction in non-polar gallium nitride thin films |
| 05/31/2005 | US6900000 Depositing an antireflective compound in a layer on said substrate surface by chemical vapor deposition; and applying a photoresist layer to said antireflective compound layer to yield the circuit precursor. |
| 05/31/2005 | US6899858 Vapor deposition; cooling hafnium tetrachloride; adding fuming nitric acid, heating; refluxing |
| 05/31/2005 | US6899787 Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system |
| 05/31/2005 | US6899767 Method of cleaning processing chamber of semiconductor processing apparatus |
| 05/31/2005 | US6899766 Vacuum chamber for plasma treatment; imparting mechanical oscillation to the apparatus and detecting oscillation generated |
| 05/31/2005 | US6899764 Chemical vapor deposition reactor and process chamber for said reactor |
| 05/31/2005 | US6899763 Lid cooling mechanism and method for optimized deposition of low-K dielectric using TR methylsilane-ozone based processes |
| 05/31/2005 | US6899750 Method and apparatus for cleaning a gas |
| 05/31/2005 | US6899507 Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections |
| 05/31/2005 | US6899054 Device for hybrid plasma processing |
| 05/26/2005 | WO2005048332A1 Method for manufacturing compound semiconductor epitaxial substrate |
| 05/26/2005 | WO2005048297A2 Nanostructures including a metal |
| 05/26/2005 | WO2005047564A2 Method of improving post-develop photoresist profile on a deposited dielectric film |
| 05/26/2005 | WO2005047563A1 Methods of depositing materials over substrates and methods of forming layers over substrates |
| 05/26/2005 | WO2005047562A1 Apparatus for preparing or storing food |
| 05/26/2005 | WO2005047561A1 Cvd tantalum compounds for fet gate electrodes |
| 05/26/2005 | WO2005047369A2 Fine particle hard molded bodies for abrasion-resistant polymer matrices |
| 05/26/2005 | WO2005047213A2 Oxidation inhibition of carbon-carbon composites |
| 05/26/2005 | WO2005047177A1 Device and method for patterning structures on a substrate |
| 05/26/2005 | WO2005046305A2 Method of producing nanostructure tips |
| 05/26/2005 | WO2005031803A9 Thermal processing system with cross flow injection system with rotatable injectors |
| 05/26/2005 | WO2005026299A3 Lubricated part having partial hard coating allowing reduced amounts of antiwear additive |
| 05/26/2005 | WO2005012592A3 Cvd diamond-coated composite substrate for making same |
| 05/26/2005 | WO2003100119A8 Method and device for plasma treatment of work pieces |
| 05/26/2005 | US20050112907 Gas-assisted rapid thermal processing |
| 05/26/2005 | US20050112901 Removal of transition metal ternary and/or quaternary barrier materials from a substrate |
| 05/26/2005 | US20050112890 CVD apparatuses and methods of forming a layer over a semiconductor substrate |
| 05/26/2005 | US20050112889 Semiconductor device manufacturing method and manufacturing line thereof |
| 05/26/2005 | US20050112876 Method to form a robust TiCI4 based CVD TiN film |
| 05/26/2005 | US20050112874 Process for producing metal oxide films at low temperatures |
| 05/26/2005 | US20050112806 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby |
| 05/26/2005 | US20050112791 Method and apparatus for fabricating commercially feasible and structurally robust nanotube-based nanomechanical devices |
| 05/26/2005 | US20050112377 suitable as the core material for particularly silent low-loss transformers; including an electrically insulating coating made of an amorphous carbon-hydrogen network |
| 05/26/2005 | US20050112292 Depositing low melting point linear or cyclic siloxane; oxidation to silicon dioxide; solvent extraction; surface treatment |
| 05/26/2005 | US20050112282 Vapor deposition of silicon dioxide nanolaminates |
| 05/26/2005 | US20050112231 Injection molding nozzle with wear-resistant tip having diamond-type coating |
| 05/26/2005 | US20050112051 Systems and methods for producing single-walled carbon nanotubes (SWNTS) on a substrate |
| 05/26/2005 | US20050112048 Using catalyst; exposure substrate to metal vapors and carbon containing compound; carbonization |
| 05/26/2005 | US20050110115 Capacitor with hafnium oxide and aluminum oxide alloyed dielectric layer and method for fabricating the same |
| 05/26/2005 | US20050110101 Semiconductor apparatus and method of manufacturing the semiconductor apparatus |
| 05/26/2005 | US20050110069 Hafnium oxide and aluminium oxide alloyed dielectric layer and method for fabricating the same |
| 05/26/2005 | US20050109462 Apparatus for generating inductively-coupled plasma and antenna coil structure thereof for generating inductive electric fields |
| 05/26/2005 | US20050109461 Chamber cleaning via rapid thermal process during a cleaning period |
| 05/26/2005 | US20050109460 Adjustable gas distribution system |
| 05/26/2005 | US20050109419 Gas supplying method and system |
| 05/26/2005 | US20050109374 Source liquid supply apparatus having a cleaning function |
| 05/26/2005 | US20050109282 Method for manufacturing diamond coatings |
| 05/26/2005 | US20050109280 Rapid thermal chemical vapor deposition apparatus and method |