| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/09/2005 | WO2005003405A3 Method for producing surface-coated nanoscale particles by polymer-coating in the gas phase |
| 06/09/2005 | WO2004093167A3 Substrate support having temperature controlled surface |
| 06/09/2005 | WO2004078406B1 One piece shim |
| 06/09/2005 | US20050124242 Laminates of a textile material and a polymer film having regions of differing translucency made by selectively compressing regions of the polymer film; breathable and/or waterproof for garments, tents |
| 06/09/2005 | US20050124175 Lanthanide oxide/zirconium oxide atomic layer deposited nanolaminate gate dielectrics |
| 06/09/2005 | US20050124171 Method of forming trench isolation in the fabrication of integrated circuitry |
| 06/09/2005 | US20050124169 Truncated dummy plate for process furnace |
| 06/09/2005 | US20050124166 In situ application of etch back for improved deposition into high-aspect-ratio features |
| 06/09/2005 | US20050124151 Novel method to deposit carbon doped SiO2 films with improved film quality |
| 06/09/2005 | US20050124121 Anneal of high-k dielectric using NH3 and an oxidizer |
| 06/09/2005 | US20050124109 Top surface roughness reduction of high-k dielectric materials using plasma based processes |
| 06/09/2005 | US20050123713 Articles formed by chemical vapor deposition and methods for their manufacture |
| 06/09/2005 | US20050123692 Method and apparatus for carrying out chemical vapor deposition |
| 06/09/2005 | US20050123690 Chemisorbtion to form a monolayer on substrate within the deposition chamber from gaseous precursor; contacting with remote plasma oxygen or ozone and with remote plasma nitrogen; oxidation; forming porous silica, alumina, tin oxide, indium oxide and/or indium tin oxide from precursors |
| 06/09/2005 | US20050123288 Gas injection head, method for manufacturing the same, semiconductor manufacturing device with the gas injection head and anti-corrosion product |
| 06/09/2005 | US20050122189 Cast diamond tools and formation thereof by chemical vapor deposition |
| 06/09/2005 | US20050121423 Heating in a vacuum atmosphere in the presence of a plasma |
| 06/09/2005 | US20050121145 Thermal processing system with cross flow injection system with rotatable injectors |
| 06/09/2005 | US20050121142 Thermal processing apparatus and a thermal processing method |
| 06/09/2005 | US20050121088 Semiconductor processing reactive precursor valve assembly |
| 06/09/2005 | US20050121070 Method for forming thin film, substrate having transparent electroconductive film and photoelectric conversion device using the substrate |
| 06/09/2005 | US20050120962 Substrate supporting table, method for producing same, and processing system |
| 06/09/2005 | US20050120961 Rapid thermal processing system, method for manufacuturing the same, and method for adjusting temperature |
| 06/09/2005 | US20050120960 Substrate holder for plasma processing |
| 06/09/2005 | US20050120959 Vacuum deposition device and pretreatment method for vacuum deposition |
| 06/09/2005 | US20050120958 Reactor |
| 06/09/2005 | US20050120956 Plasma processing apparatus |
| 06/09/2005 | US20050120955 Film forming apparatus |
| 06/09/2005 | US20050120954 Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces |
| 06/09/2005 | US20050120805 Method and apparatus for substrate temperature control |
| 06/09/2005 | DE19502103B4 Verfahren zur Herstellung von Verpackungen und Verwendung derselben zum Füllgutabfüllen A process for the manufacture of packages and using the same for Füllgutabfüllen |
| 06/09/2005 | DE10352627A1 Feinteilige harte Formkörper für abrasionsstabile Polymermatrizen Finely divided hard molded body for abrasion-resistant polymer matrices |
| 06/09/2005 | DE10350752A1 Verfahren zum Ausbilden eines Dielektrikums auf einer kupferhaltigen Metallisierung und Kondensatoranordnung A method for forming a dielectric on a copper-containing metallization and capacitor assembly |
| 06/08/2005 | EP1538656A1 System for plasma treatment of gases in a vacuum pump |
| 06/08/2005 | EP1538236A2 Substrate support |
| 06/08/2005 | EP1538235A1 Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials |
| 06/08/2005 | EP1538234A2 Method of modifying solid surface and product obtained |
| 06/08/2005 | EP1537253A1 Device and method for treating workpieces |
| 06/08/2005 | EP1257684A4 Method and apparatus for chemical vapor deposition of polysilicon |
| 06/08/2005 | EP1135792A4 Method for manufacturing carbon nanotubes as functional elements of mems devices |
| 06/08/2005 | CN1625921A Heating in a vacuum atmosphere in the presence of a plasma |
| 06/08/2005 | CN1625799A Deposition method of insulating layers having low dielectric constant of semiconductor device |
| 06/08/2005 | CN1625535A Method for coating the quartz burner of an HID lamp |
| 06/08/2005 | CN1624924A Manufacturing method of semiconductor device |
| 06/08/2005 | CN1624883A Novel method to deposit carbon doped sio2 films and manufacturing method of metal intercontact |
| 06/08/2005 | CN1624194A Atomic layer deposition process and apparatus |
| 06/08/2005 | CN1204981C Container with material coating having barrier effect and method and apparatus for making same |
| 06/08/2005 | CN1204956C Effluent gas steam treatment system having utility of oxidation treatment of semiconductor manufacturing effluent gases |
| 06/08/2005 | CN1204954C Gas cabinet assembly comprising sorbent-based gas storage and delivery system |
| 06/07/2005 | US6903512 Half mirror film producing method and optical element comprising a half mirror film |
| 06/07/2005 | US6903462 Chemical vapor deposition of titanium |
| 06/07/2005 | US6903398 Semiconductor device and method for manufacturing same |
| 06/07/2005 | US6903365 Electronic device using carbon element linear structure and production method thereof |
| 06/07/2005 | US6903031 In-situ-etch-assisted HDP deposition using SiF4 and hydrogen |
| 06/07/2005 | US6903030 System and method for heat treating semiconductor |
| 06/07/2005 | US6903025 Method of purging semiconductor manufacturing apparatus and method of manufacturing semiconductor device |
| 06/07/2005 | US6903010 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer |
| 06/07/2005 | US6902989 Method for manufacturing gallium nitride (GaN) based single crystalline substrate that include separating from a growth substrate |
| 06/07/2005 | US6902983 Method for manufacturing semiconductor device and capacitor |
| 06/07/2005 | US6902814 Quartz glass parts, ceramic parts and process of producing those |
| 06/07/2005 | US6902808 Diamond coated article bonded to a body |
| 06/07/2005 | US6902773 For thin-film diamond-like carbon mechanical/corrosion protection layer formed by low energy magnetron sputtering |
| 06/07/2005 | US6902764 For chipforming machining; refractories; microstructure; chemical vapor deposition |
| 06/07/2005 | US6902763 Method for depositing nanolaminate thin films on sensitive surfaces |
| 06/07/2005 | US6902682 Method and apparatus for electrostatically maintaining substrate flatness |
| 06/07/2005 | US6902646 Sensor array for measuring plasma characteristics in plasma processing environments |
| 06/07/2005 | US6902629 Method for cleaning a process chamber |
| 06/07/2005 | US6902624 Massively parallel atomic layer deposition/chemical vapor deposition system |
| 06/07/2005 | US6902623 Reactor having a movable shutter |
| 06/07/2005 | US6902622 Systems and methods for epitaxially depositing films on a semiconductor substrate |
| 06/07/2005 | US6902620 Atomic layer deposition systems and methods |
| 06/07/2005 | US6901659 Method of manufacturing electron-emitting device using ink-jet discharge device |
| 06/07/2005 | CA2196888C Plastic container coated with carbon film |
| 06/02/2005 | WO2005050726A1 Plasma processing method and plasma processing apparatus |
| 06/02/2005 | WO2005050725A1 Method for manufacturing semiconductor device and substrate processing apparatus |
| 06/02/2005 | WO2005050723A1 Plasma film-forming apparatus and plasma film-forming method |
| 06/02/2005 | WO2005050715A2 Nitridation of high-k dielectric films |
| 06/02/2005 | WO2005050705A2 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon |
| 06/02/2005 | WO2005050675A1 Transparent base with transparent conductive film, method for producing same, and photoelectric converter comprising such base |
| 06/02/2005 | WO2005049886A2 Plasma thin-film deposition method |
| 06/02/2005 | WO2005049885A2 Method and apparatus for fabricating a conformal thin film on a substrate |
| 06/02/2005 | WO2005049884A2 Method for depositing silicon carbide and ceramic films |
| 06/02/2005 | WO2005049699A2 Applications of a coating material |
| 06/02/2005 | WO2005049240A1 Exhaust gas treatment |
| 06/02/2005 | WO2005049228A2 Glow discharge-generated chemical vapor deposition |
| 06/02/2005 | WO2005048708A1 Antimicrobial composite material |
| 06/02/2005 | WO2005004221A3 Low-k-dielectric material |
| 06/02/2005 | WO2004086451A3 Plasma generation using multi-step ionization |
| 06/02/2005 | US20050118837 Method to form ultra high quality silicon-containing compound layers |
| 06/02/2005 | US20050118834 Film forming method |
| 06/02/2005 | US20050118814 Method for depositing silicon nitride layer of semiconductor device |
| 06/02/2005 | US20050118810 Method of cleaning surface of semiconductor substrate, method of manufacturing thin film, method of manufacturing semiconductor device, and semiconductor device |
| 06/02/2005 | US20050118807 Ald deposition of ruthenium |
| 06/02/2005 | US20050118804 Formation of boride barrier layers using chemisorption techniques |
| 06/02/2005 | US20050118762 Manufacturing method of semiconductor device |
| 06/02/2005 | US20050118737 Shower head structure for processing semiconductor |
| 06/02/2005 | US20050118428 Rapid process for the production of multilayer barrier layers |
| 06/02/2005 | US20050118427 Method for depositing inorganic/organic films |
| 06/02/2005 | US20050118426 Slidably movable member and method of producing same |
| 06/02/2005 | US20050118411 Optical materials and optical devices |