| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 07/07/2005 | DE10257628B4 Verfahren zum Beschichten von Hohlkörpern sowie Verwendung des Verfahrens Method of coating hollow bodies, as well as use of the method |
| 07/07/2005 | CA2545700A1 Method and system for forming a film of material using plasmon assisted chemical reactions |
| 07/06/2005 | EP1550738A1 Method and apparatus for atomic layer deposition |
| 07/06/2005 | EP1550640A1 Apparatus and method for manufacturing a preform by plasma chemical vapour deposition |
| 07/06/2005 | EP1550144A1 System for and method of gas cluster ion beam processing |
| 07/06/2005 | EP1549780A2 Substrate processing apparatus and related systems and methods |
| 07/06/2005 | EP1254249A4 Deposited thin films and their use in detection, attachment, and bio-medical applications |
| 07/06/2005 | CN2707775Y Device for preparing transparent conductive SnO2 film |
| 07/06/2005 | CN1636264A Tool for handling wafers and epitaxial growth station |
| 07/06/2005 | CN1636087A Method for manufacturing a free-standing substrate made of monocrystalline semi-conductor material |
| 07/06/2005 | CN1636079A Installation in which an operation is performed requiring control over the atmosphere inside a chamber |
| 07/06/2005 | CN1634942A Stabilized silver sulfonate complex of organo-phosphine, method for synthesizing and use thereof |
| 07/06/2005 | CN1209493C Plasma electroplating |
| 07/06/2005 | CN1209492C Method for coating SIC protection layer on surface of carbon fiber weaved article |
| 07/06/2005 | CN1209488C Heating temperature controller for preparation of film and using method thereof |
| 07/06/2005 | CN1209312C Process for coating glass |
| 07/06/2005 | CN1209283C Carbon base nano tube, its preparation method and application |
| 07/05/2005 | US6914675 Ellipsometric method and control device for making a thin-layered component |
| 07/05/2005 | US6914016 HDP-CVD deposition process for filling high aspect ratio gaps |
| 07/05/2005 | US6914014 Method for curing low dielectric constant film using direct current bias |
| 07/05/2005 | US6914011 Film deposition system and method of fabricating semiconductor device employing the film deposition system |
| 07/05/2005 | US6913996 Method of forming metal wiring and semiconductor manufacturing apparatus for forming metal wiring |
| 07/05/2005 | US6913992 Method of modifying interlayer adhesion |
| 07/05/2005 | US6913963 Method for fabricating capacitor in semiconductor device |
| 07/05/2005 | US6913938 Process control; forming film; semiconductors |
| 07/05/2005 | US6913843 73-93 wt % WC, 4-12 wt % binder phase, and Group IVB and/or VB cubic carbide phase with a binder phase enriched surface zone free of cubic carbide phase; cutting tool inserts with good edge strength and thermal shock resistance |
| 07/05/2005 | US6913827 Nanocoated primary particles and method for their manufacture |
| 07/05/2005 | US6913796 Plasma curing process for porous low-k materials |
| 07/05/2005 | US6913795 Method of making tetrahedral amorphous carbon film including fluorine atoms |
| 07/05/2005 | US6913670 Substrate support having barrier capable of detecting fluid leakage |
| 07/05/2005 | US6913652 Gas flow division in a wafer processing system having multiple chambers |
| 07/05/2005 | US6913029 Multiple contents container assembly for ultrapure solvent purging |
| 06/30/2005 | WO2005059981A1 Vapor growth device and production method for epitaxial wafer |
| 06/30/2005 | WO2005059980A1 Vapor growth device and porduction method for epitaxial wafer |
| 06/30/2005 | WO2005059974A1 Edge flow faceplate for improvement of cvd film properties |
| 06/30/2005 | WO2005059973A2 Controlled growth of gallium nitride nanostructures |
| 06/30/2005 | WO2005059203A1 Transparent high-gas-barrier base and method for producing same |
| 06/30/2005 | WO2005059202A1 Method for forming thin film and base having thin film formed by such method |
| 06/30/2005 | WO2005059201A1 Thermochromic coatings |
| 06/30/2005 | WO2005059200A1 Thermal chemical vapor deposition of silicon nitride |
| 06/30/2005 | WO2005058789A2 Copper (i) formate complexes |
| 06/30/2005 | WO2005028701A3 Methods and apparatus for controlling formation of deposits in a deposition system and deposition systems and methods including the same |
| 06/30/2005 | WO2005024094A3 In-situ-etch-assisted hdp deposition using sif4 and hydrogen |
| 06/30/2005 | WO2005019497A3 Methods of reducing plasma-induced damage for advanced plasma cvd dielectrics |
| 06/30/2005 | WO2005007918A3 Ion beam-assisted high-temperature superconductor (hts) deposition for thick film tape |
| 06/30/2005 | WO2004110737A3 High rate deposition for the formation of high quality optical coatings |
| 06/30/2005 | WO2004108985A3 Methods for forming aluminum containing films utilizing amino aluminum precursors |
| 06/30/2005 | WO2004042798A3 Apparatus and method for treating objects with radicals generated from plasma |
| 06/30/2005 | US20050142978 Method of manufacturing electron-emitting source |
| 06/30/2005 | US20050142895 Gap-fill depositions in the formation of silicon containing dielectric materials |
| 06/30/2005 | US20050142890 Atomic layer deposition apparatus and method |
| 06/30/2005 | US20050142715 Semiconductor device with high dielectric constant insulator and its manufacture |
| 06/30/2005 | US20050142361 Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film |
| 06/30/2005 | US20050142291 Comprises chamber with vacuum exhaust line extending therefrom in which effluent product is deposited over internal walls; semiconductors/integrated circuits |
| 06/30/2005 | US20050142290 Substrate support adapter system |
| 06/30/2005 | US20050142289 Polysulfide thermal vapour source for thin sulfide film deposition |
| 06/30/2005 | US20050142287 Using silicones; surface treatment; controlling pressure of container ; sealing |
| 06/30/2005 | US20050142285 Capable of high-density recording |
| 06/30/2005 | US20050142000 Plasma-based gas treatment system integrated in a vacuum pump |
| 06/30/2005 | US20050139966 Ceramic thin film on various substrates, and process for producing same |
| 06/30/2005 | US20050139965 Capacitor with hafnium, lanthanum and oxygen mixed dielectric and method for fabricating the same |
| 06/30/2005 | US20050139948 Integration of barrier layer and seed layer |
| 06/30/2005 | US20050139578 Thin-film forming apparatus having an automatic cleaning function for cleaning the inside |
| 06/30/2005 | US20050139395 Drill bit with a moissanite (silicon carbide) cutting element |
| 06/30/2005 | US20050139321 Plasma processing apparatus |
| 06/30/2005 | US20050139317 Shielding plate in plasma for uniformity improvement |
| 06/30/2005 | US20050139234 Method of cleaning substrate processing apparatus and computer-readable recording medium |
| 06/30/2005 | US20050139232 Methods for cleaning a chamber of semiconductor device manufacturing equipment |
| 06/30/2005 | US20050139160 Clamshell and small volume chamber with fixed substrate support |
| 06/30/2005 | DE19851579B4 Metallisierter Kunststoff und Verfahren zu dessen Herstellung Metallized plastic and process for its preparation |
| 06/30/2005 | DE10392894T5 Verfahren zur Reinigung eines Substratverarbeitungsapparats und ein Substratverarbeitungsapparat Methods for cleaning a substrate processing apparatus and substrate processing apparatus |
| 06/30/2005 | DE10355679A1 Substratträger-Adapter-System Substrate carrier adapter system |
| 06/30/2005 | DE10353756A1 Schichtmaterial Layer material |
| 06/30/2005 | DE102004012856A1 Semiconductor structure, produced by forming an oxygen diffusion layer on a substrate, followed by a dielectric layer which is thermally oxidised |
| 06/30/2005 | DE10140465B4 Verfahren zur Beschichtung einer Siliziumcarbidfaser A method of coating a silicon carbide |
| 06/29/2005 | EP1548814A2 Method for producing silicon nitride films and process for fabricating semiconductor devices using said method |
| 06/29/2005 | EP1548813A1 Gas supply system and treatment system |
| 06/29/2005 | EP1548809A1 Heat treatment method and heat treatment apparatus |
| 06/29/2005 | EP1548808A1 High frequency plasma generator and high frequency plasma generating method |
| 06/29/2005 | EP1548154A2 Surface-coated cermet cutting tool with hard coating layer having excellend chipping resistance |
| 06/29/2005 | EP1548151A1 Method for forming thin film and apparatus therefor |
| 06/29/2005 | EP1548150A1 Plasma processing system and its substrate processing process, plasma enhanced chemical vapor deposition system and its film deposition process |
| 06/29/2005 | EP1548149A1 Method for forming thin film, apparatus for forming thin film, and method for monitoring thin film forming process |
| 06/29/2005 | EP1547138A1 Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition |
| 06/29/2005 | EP1547131A1 Large-diameter sic wafer and manufacturing method thereof |
| 06/29/2005 | EP1547123A1 Method and arrangement for generating an atmospheric pressure glow discharge plasma (apg) |
| 06/29/2005 | EP1546434A1 Device for carrying out a plasma-assisted process |
| 06/29/2005 | EP1546433A1 Internally coated hollow body, coating method and device |
| 06/29/2005 | EP1546432A1 High throughput deposition apparatus |
| 06/29/2005 | EP1546056A2 Article having nano-scaled structures and a process for making such article |
| 06/29/2005 | EP1335997B1 Method and device for controlling the surface temperatures of substrates in a chemical vapour deposition reactor |
| 06/29/2005 | EP1007762B1 Method and apparatus for detecting the endpoint of a chamber cleaning |
| 06/29/2005 | CN1632912A Gas processing equipment having clearing device |
| 06/29/2005 | CN1632905A Vacuum cathode arc straight tube filter |
| 06/29/2005 | CN1632166A DC electric arc plasma chemical vapor deposition apparatus and diamond coating method |
| 06/29/2005 | CN1632165A Process for preparing diamond covering on sintered-carbide tool |
| 06/29/2005 | CN1632164A Process for reducing particles in low pressure chemical vapor deposition equipment |
| 06/29/2005 | CN1632160A Arc evaporator, method for driving arc evaporator, and ion plating apparatus |
| 06/29/2005 | CN1208816C Method for forming copper wires in semiconductor device |
| 06/29/2005 | CN1208114C Collecting device |