| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/16/2005 | WO2005033351A3 Protection of metallic surfaces against thermally-induced wrinkling (rumpling) in particular in gas turbines |
| 06/16/2005 | WO2004081994A3 Substrate support lift mechanism |
| 06/16/2005 | WO2001090434A3 Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece |
| 06/16/2005 | US20050130440 Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD) |
| 06/16/2005 | US20050130427 Method of forming thin film for improved productivity |
| 06/16/2005 | US20050130416 Method for forming thin film, substrate having thin film formed by the method, and photoelectric conversion device using the substrate |
| 06/16/2005 | US20050130404 Methods and apparatus for e-beam treatment used to fabricate integrated circuit devices |
| 06/16/2005 | US20050130382 Method and apparatus for fabricating semiconductor device |
| 06/16/2005 | US20050130364 Structure and method for ultra-small grain size polysilicon |
| 06/16/2005 | US20050130328 Method of making a haze free, lead rich PZT film |
| 06/16/2005 | US20050130326 Method for fabricating capacitor in semiconductor device |
| 06/16/2005 | US20050129987 Cemented carbide of tungsten carbide, cobalt and carbides of metals from the groups IVb, Vb and VIb with a binder phase that is highly alloyed with cobalt; and a coating including alumina |
| 06/16/2005 | US20050129966 Chemical vapor deposition process using novel precursors |
| 06/16/2005 | US20050129927 Transparent thin film and method for production thereof |
| 06/16/2005 | US20050129620 Treating an elastomeric substrate in an alcohol and an alkaline bath with ultrasonic energy, rinsing, drying; seals and gaskets for pharmaceutical inhalation devices, metered dose inhalers |
| 06/16/2005 | US20050128267 Method of manufacturing electronic device, electron source substrate, and image forming apparatus, and apparatus for manufacturing electronic device and electron source substrate |
| 06/16/2005 | US20050127844 High-frequency power supply structure and plasma cvd device using the same |
| 06/16/2005 | US20050127812 Electron source producing apparatus and method |
| 06/16/2005 | US20050126712 Plasma processing method |
| 06/16/2005 | US20050126586 Method of cleaning semiconductor device fabrication apparatus |
| 06/16/2005 | US20050126585 Method of removing residual contaminants from an environment |
| 06/16/2005 | US20050126497 Platform assembly and method |
| 06/16/2005 | US20050126496 Wafer carrier for growing GaN wafers |
| 06/16/2005 | US20050126494 Process and apparatus for depositing a ceramic coating |
| 06/16/2005 | US20050126491 System for deposition of inert barrier coating to increase corrosion resistance |
| 06/16/2005 | US20050126490 Substrate temperature control apparatus |
| 06/16/2005 | US20050126489 Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition |
| 06/16/2005 | US20050126488 Plasma processing apparatus and evacuation ring |
| 06/16/2005 | US20050126487 Surface treatment apparatus |
| 06/16/2005 | US20050126486 Chemical vapor deposition; during the stabilizer feeding stage, a stabilizer for the organometallic complex is fed in a gaseous state during normal operation of the vaporizer, but the stabilizer feeding stage is executed when the vaporizer is not vaporizing the organometallic complex |
| 06/16/2005 | US20050126485 Component having an interior surface coated with a thin film inert corrosion resistant barrier |
| 06/16/2005 | US20050126484 Edge flow faceplate for improvement of CVD film properties |
| 06/16/2005 | US20050126483 Arrangement for depositing atomic layers on substrates |
| 06/16/2005 | US20050126482 Forming thin film on semiconductor wafer |
| 06/16/2005 | DE10392595T5 Verfahren und System zum Erwärmen von Halbleitersubstraten in einer Behandlungskammer, welche eine Aufnahme enthält A method and system for heating semiconductor substrates in a treatment chamber containing a receptacle |
| 06/16/2005 | DE10351467A1 Gegenstand mit leicht reinigbarer Oberfläche und Verfahren zu seiner Herstellung Subject to easily cleanable surface and method for its manufacture |
| 06/15/2005 | EP1542264A1 Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gas |
| 06/15/2005 | EP1541714A1 Method for repairing components using environmental bond coatings and resultant repaired components |
| 06/15/2005 | EP1541709A1 Arrangement for the control of the flow rate of cleaning agents in a recirculation dispositive |
| 06/15/2005 | EP1540750A2 Diffusion barrier coatings having graded compositions and devices incorporating the same |
| 06/15/2005 | EP1540714A2 Barrier coatings produced by atmospheric glow discharge |
| 06/15/2005 | EP1540708A2 Batch furnace |
| 06/15/2005 | EP1540695A2 A method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| 06/15/2005 | EP1540259A2 Thermal process station with heated lid |
| 06/15/2005 | EP1540258A1 Variable heater element for low to high temperature ranges |
| 06/15/2005 | EP1540035A2 An apparatus for the deposition of high dielectric constant films |
| 06/15/2005 | EP1540034A2 Method for energy-assisted atomic layer depositon and removal |
| 06/15/2005 | EP1540033A1 Method for preparation of aluminum oxide thin film |
| 06/15/2005 | EP1539336A2 Vaporizer delivery ampoule |
| 06/15/2005 | EP1427868B1 Vaporizer |
| 06/15/2005 | CN1628371A Vapor phase epitaxial apparatus and vapor phase epitaxial method |
| 06/15/2005 | CN1628368A Reactor assembly and processing method |
| 06/15/2005 | CN1628187A Corona-generated chemical vapor deposition on a substrate |
| 06/15/2005 | CN1628186A Method for modifying surface of solid material, surface-modified solid material and device for modifying surface of solid material |
| 06/15/2005 | CN1627499A Method for fabricating capacitor in semiconductor device |
| 06/15/2005 | CN1627494A Rapid thermal processing system, method for manufacturing the same, and method for adjusting temperature |
| 06/15/2005 | CN1627476A Structure and method for ultra-small grain size polysilicon |
| 06/15/2005 | CN1626698A Chemical vapor deposition equipment |
| 06/15/2005 | CN1206736C Semiconductor device and complementary semiconductor device |
| 06/15/2005 | CN1206705C Adapter and method for preventing back flow of gas |
| 06/15/2005 | CN1206704C Method for orming film of semiconductor device |
| 06/15/2005 | CN1206387C Cleaning plasma method for continuous high molecular membrane evaporation coating device |
| 06/14/2005 | US6906295 Scratch, corrosion amd heat resistant; colorfast; suitable for salty and acidic foods; alternating layers of chromium nitride alone and with titanium and aluminum |
| 06/14/2005 | US6906008 Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers |
| 06/14/2005 | US6905982 Method of manufacturing a semiconductor integrated circuit device |
| 06/14/2005 | US6905981 Low-k dielectric materials and processes |
| 06/14/2005 | US6905978 Method of forming interlayer insulation film |
| 06/14/2005 | US6905972 Semiconductor device and method for manufacturing the same |
| 06/14/2005 | US6905965 Reactive preclean prior to metallization for sub-quarter micron application |
| 06/14/2005 | US6905963 Fabrication of B-doped silicon film by LPCVD method using BCI3 and SiH4 gases |
| 06/14/2005 | US6905940 Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill |
| 06/14/2005 | US6905939 Process for forming silicon oxide material |
| 06/14/2005 | US6905909 Ultra low dielectric constant thin film |
| 06/14/2005 | US6905773 Corrosion-resistant coatings and methods of manufacturing the same |
| 06/14/2005 | US6905769 Gas barrier film |
| 06/14/2005 | US6905737 High density plasma generator; vapor deposition |
| 06/14/2005 | US6905736 Focusing ion beams; vapor deposition using organometallic compound |
| 06/14/2005 | US6905730 Aluminide coating of turbine engine component |
| 06/14/2005 | US6905549 Vertical type semiconductor device producing apparatus |
| 06/14/2005 | US6905548 Device for the deposition of crystalline layers on crystalline substrates |
| 06/14/2005 | US6905547 Method and apparatus for flexible atomic layer deposition |
| 06/14/2005 | US6905543 Methods of forming tungsten nucleation layer |
| 06/14/2005 | US6905541 Method and apparatus of generating PDMAT precursor |
| 06/14/2005 | US6905107 Inflatable slit/gate valve |
| 06/14/2005 | US6905079 Shower head structure and cleaning method thereof |
| 06/14/2005 | CA2432944C Joined structure of dissimilar metallic materials |
| 06/14/2005 | CA2271736C Decorative stone |
| 06/09/2005 | WO2005053016A1 Substrate treatment apparatus, substrate holding device, and semiconductor device manufacturing method |
| 06/09/2005 | WO2005053009A1 Porous insulating film, method for producing same, and semiconductor device using porous insulating film |
| 06/09/2005 | WO2005053008A1 Method for forming insulating film, system for forming insulating film, and method for manufacturing semiconductor device |
| 06/09/2005 | WO2005052998A2 Gas distribution showerhead featuring exhaust apertures |
| 06/09/2005 | WO2005052179A2 Method of making carbon nanotube arrays, and thermal interfaces using same |
| 06/09/2005 | WO2005051842A2 Elongated nano-structures and related devices |
| 06/09/2005 | WO2005051525A1 Permeation barrier coating or layer with modulated properties and methods of making the same |
| 06/09/2005 | WO2005029538A3 A plasma generating apparatus and an alignment process for liquid crystal displays using the apparatus |
| 06/09/2005 | WO2005028702B1 Precursor delivery system |
| 06/09/2005 | WO2005026401A3 Method and device for depositing layers using non-continuous injection |
| 06/09/2005 | WO2005024891A3 Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates |
| 06/09/2005 | WO2005017937A3 Sensor array for measuring plasma characteristics in plasma processing enviroments |
| 06/09/2005 | WO2005010227A3 Chemical vapor deposition reactor |