| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 06/28/2005 | US6911878 Acoustic wave branching filter having transmitting filter with optimal power handling |
| 06/28/2005 | US6911779 Magnetic mirror plasma source |
| 06/28/2005 | US6911403 Methods of reducing plasma-induced damage for advanced plasma CVD dielectrics |
| 06/28/2005 | US6911401 Method for CVD process control for enhancing device performance |
| 06/28/2005 | US6911391 Integration of titanium and titanium nitride layers |
| 06/28/2005 | US6911234 Flowing coating gas in a gas distribution conduit in a coating chamber, discharging laterally and exhausting spent coating gas in an annular baffle |
| 06/28/2005 | US6911233 Using cleaning gas to remove residues from chemical reactor; uniform thickness |
| 06/28/2005 | US6911129 Combinatorial synthesis of material chips |
| 06/28/2005 | US6911112 Method of and apparatus for performing sequential processes requiring different amounts of time in the manufacturing of semiconductor devices |
| 06/28/2005 | US6911093 Lid liner for chemical vapor deposition chamber |
| 06/28/2005 | US6911092 ALD apparatus and method |
| 06/28/2005 | US6911090 Real-time process control for optical component fabrication |
| 06/28/2005 | US6911065 Method and system for supplying high purity fluid |
| 06/28/2005 | US6910619 Brazing of alumina coated honeycomb and fiber metal |
| 06/28/2005 | US6910441 Pressure regulating system of plasma processing equipment |
| 06/28/2005 | CA2147486C Protective film for articles and method |
| 06/23/2005 | WO2005057630A2 Manufacturable low-temperature silicon carbide deposition technology |
| 06/23/2005 | WO2005056874A1 Arrangement for the thermal processing of silicon wafers in a process chamber |
| 06/23/2005 | WO2005056873A1 Free-standing silicon carbide articles formed by chemical vapor deposition and methods for their manufacture |
| 06/23/2005 | WO2005056872A1 Method of making chemical vapor composites |
| 06/23/2005 | WO2005056869A1 A method for manufacturing diamond coatings |
| 06/23/2005 | WO2005056861A2 Diamond films and methods of making diamond films |
| 06/23/2005 | WO2005056290A1 Novel polymer films and textile laminates containing such polymer films |
| 06/23/2005 | WO2005047213A3 Oxidation inhibition of carbon-carbon composites |
| 06/23/2005 | WO2005043613A9 Substrate holder |
| 06/23/2005 | WO2005033359A3 Atomic layer deposition methods of forming silicon dioxide comprising layers |
| 06/23/2005 | WO2005033357A3 Low-pressure deposition of metal layers from metal-carbonyl precursors |
| 06/23/2005 | WO2004105070A3 Vuv-excited device with blue-emitting phosphor |
| 06/23/2005 | US20050136762 Laminates of a textile material and a polymer film having regions of differing translucency made by selectively compressing regions of the polymer film; breathable and/or waterproof for garments, tents |
| 06/23/2005 | US20050136694 Method and apparatus for forming thin film |
| 06/23/2005 | US20050136693 Thermal processing unit and thermal processing method |
| 06/23/2005 | US20050136690 Defect control in gate dielectrics |
| 06/23/2005 | US20050136689 Systems and methods for forming metal oxides using alcohols |
| 06/23/2005 | US20050136684 Gap-fill techniques |
| 06/23/2005 | US20050136660 Method of forming titanium film by CVD |
| 06/23/2005 | US20050136658 Manufacture of semiconductor device having insulation film of high dielectric constant |
| 06/23/2005 | US20050136657 Film-formation method for semiconductor process |
| 06/23/2005 | US20050136656 Process for depositing composite coating on a surface |
| 06/23/2005 | US20050136591 Method of and apparatus for performing sequential processes requiring different amounts of time in the manufacturing of semiconductor devices |
| 06/23/2005 | US20050136564 Method of laterally growing GaN with indium doping |
| 06/23/2005 | US20050136561 Process for fabricating films of uniform properties on semiconductor devices |
| 06/23/2005 | US20050136240 Very low dielectric constant plasma-enhanced CVD films |
| 06/23/2005 | US20050136188 Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components |
| 06/23/2005 | US20050134407 Transmitting filter including saw resonators |
| 06/23/2005 | US20050133765 Capable of achieving enhanced electroconductive properties as well as retaining stability of the electroconductive properties after heating |
| 06/23/2005 | US20050133578 Dispensing package |
| 06/23/2005 | US20050133166 Tuned potential pedestal for mask etch processing apparatus |
| 06/23/2005 | US20050133165 Apparatus for the prevention of arcing in a CVD-TiN chamber |
| 06/23/2005 | US20050133161 Apparatus and method for depositing materials onto microelectronic workpieces |
| 06/23/2005 | US20050133160 Showerhead electrode assembly for plasma processing apparatuses |
| 06/23/2005 | US20050133159 Systems and methods for epitaxially depositing films on a semiconductor substrate |
| 06/23/2005 | US20050133127 Methods of forming barium strontium titanate layers |
| 06/23/2005 | US20050133059 Performing a plasma process using an oxygen plasma from gases free of nitrogen and fluorine; performing a second plasma process using argon; performing a third plasma process using fluorine |
| 06/23/2005 | US20050132961 Catalytic CVD equipment, method for catalytic CVD, and method for manufacturing semiconductor device |
| 06/23/2005 | US20050132959 Gas supply method in a CVD coating system for precursors with a low vapor pressure |
| 06/23/2005 | US20050132957 Carrier body and method |
| 06/23/2005 | US20050132954 Method and device for the temperature control of surface temperatures of substrates in a CVD reactor |
| 06/23/2005 | US20050132952 Semiconductor alloy with low surface roughness, and method of making the same |
| 06/23/2005 | US20050132717 Gas turbine part provided with a protective coating, and a method of making a protective coating on a superalloy metal substrate |
| 06/23/2005 | DE102004056717A1 Spritzgießdüse mit verschleißbeständiger Spitze, die eine diamantartige Beschichtung aufweist Injection molding nozzle with wear-resistant tip having a diamond-like coating |
| 06/23/2005 | DE102004020157A1 Capacitor for semiconductor devices, has lower electrode, upper electrode, and dielectric layer with portion formed by alloying hafnium oxide and aluminum oxide together |
| 06/23/2005 | DE10008829B4 Verfahren zum Entfernen von adsorbierten Molekülen aus einer Kammer A method for removing adsorbed molecules from a chamber |
| 06/23/2005 | CA2548782A1 Diamond films and methods of making diamond films |
| 06/22/2005 | EP1544904A1 Substrate processing apparatus |
| 06/22/2005 | EP1544903A1 Substrate processing apparatus |
| 06/22/2005 | EP1544320A2 Passivated end surfaces |
| 06/22/2005 | EP1543939A2 Method for manufacturing a dispensing package and the dispensing package |
| 06/22/2005 | EP1543537A1 Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition |
| 06/22/2005 | EP1543177A1 Vapor deposition of tungsten nitride |
| 06/22/2005 | EP1543080A2 Method of coating a surface with an organic film |
| 06/22/2005 | EP1325177B1 Method for depositing, in particular, crystalline layers, a gas inlet element, and device for carrying out said method |
| 06/22/2005 | CN1630941A Method of calibrating and using a semiconductor processing system |
| 06/22/2005 | CN1630935A Vapor phase epitaxy device |
| 06/22/2005 | CN1630934A Manufacturing apparatus and method for a semiconductor device, and cleaning method for a semiconductor manufacturing device |
| 06/22/2005 | CN1630925A Device for applying electromagnetic microwave radiation in a plasma cavity |
| 06/22/2005 | CN1630047A Method and apparatus for fabricating semiconductor device |
| 06/22/2005 | CN1630030A Plasma processing device and semiconductor mfg. device |
| 06/22/2005 | CN1629211A Method of modifying solid surface and product obtained |
| 06/22/2005 | CN1207939C Multi-zone resistance heater |
| 06/22/2005 | CN1207761C Gas projector and etching device comprising said projector |
| 06/22/2005 | CN1207435C Surface treatment holder and holding frame, and method and equipment therefor |
| 06/22/2005 | CN1207434C Surface treatment source |
| 06/22/2005 | CN1207188C Method for preparing onion-like fullerene by CVD |
| 06/22/2005 | CN1207173C Plastic container for liquid with diamond-like carbon film formed on inner surface |
| 06/21/2005 | US6909839 Delivery systems for efficient vaporization of precursor source material |
| 06/21/2005 | US6908866 Epitaxial and polycrystalline growth of Si1-x-yGexCy and Si1-yCy alloy layers on Si by UHV-CVD |
| 06/21/2005 | US6908862 HDP-CVD dep/etch/dep process for improved deposition into high aspect ratio features |
| 06/21/2005 | US6908838 Method and device for treating semiconductor substrates |
| 06/21/2005 | US6908782 High carrier concentration p-type transparent conducting oxide films |
| 06/21/2005 | US6908639 Mixed composition interface layer and method of forming |
| 06/21/2005 | US6908499 Cold trap for CVD furnace |
| 06/21/2005 | US6907924 Thermally conductive chuck for vacuum processor |
| 06/21/2005 | US6907841 Apparatus and method for synthesizing spherical diamond powder by using chemical vapor deposition method |
| 06/21/2005 | CA2205189C Method of manufacturing bi-layered ferroelectric thin film |
| 06/16/2005 | WO2005055298A1 Plasma processing apparatus and multi-chamber system |
| 06/16/2005 | WO2005055297A1 Semiconductor processing unit |
| 06/16/2005 | WO2005054540A1 A layered structure |
| 06/16/2005 | WO2005054539A1 A layered structure |
| 06/16/2005 | WO2005054537A2 System and method for forming multi-component films |
| 06/16/2005 | WO2005053828A2 Systems and methods for manufacture of carbon nanotubes |