Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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07/14/2005 | US20050151544 Sensor array for measuring plasma characteristics in plasma processing environments |
07/14/2005 | US20050151211 Semiconductor device, and method and apparatus for manufacturing the same |
07/14/2005 | US20050150866 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
07/14/2005 | US20050150760 High throughput physical vapor deposition system for material combinatorial studies |
07/14/2005 | US20050150602 Method, arrangement and electrode for generating an atmospheric pressure glow plasma (APG) |
07/14/2005 | US20050150463 Holder for sample materials used in high throughput physical vapor deposition material studies |
07/14/2005 | US20050150462 Lift pin for used in semiconductor manufacturing facilities and method of manufacturing the same |
07/14/2005 | US20050150461 Apparatus of depositing thin film with high uniformity |
07/14/2005 | US20050150460 Insitu post atomic layer deposition destruction of active species |
07/14/2005 | US20050150459 Full glass substrate deposition in plasma enhanced chemical vapor deposition |
07/14/2005 | US20050150458 Reduced volume reactor |
07/14/2005 | US20050150457 Plasma-Assisted Sputter Deposition System |
07/14/2005 | US20050150455 Processing apparatus and processing method |
07/14/2005 | US20050150454 Deposition chamber and method for depositing low dielectric constant films |
07/14/2005 | US20050150453 Bladder-based apparatus and method for dispensing coatings |
07/14/2005 | US20050150452 Process kit design for deposition chamber |
07/14/2005 | US20050150448 Method of processing selected surfaces in a semiconductor process chamber based on a temperature differential between surfaces |
07/14/2005 | DE10357756A1 Production of metal oxynitride layers, used as a dielectric in an electronic component of a semiconductor device, comprises depositing a metal compound on a substrate and reacting with nitrogen oxide and/or dinitrogen monoxide |
07/14/2005 | DE102004059616A1 Fabrication of semiconductor devices by removing by-product from surface of semiconductor device fabrication apparatus, without opening processing chamber, after each time that conductive layer has been formed on metal oxide layer |
07/14/2005 | CA2550334A1 Playing field obstacle device |
07/13/2005 | EP1553208A2 Substrate processing apparatus and cleaning method therefor |
07/13/2005 | EP1552547A2 In-situ formation of metal insulator metal capacitors cross reference to related applications |
07/13/2005 | EP1552034A1 Apparatus and method for depositing an oxide film |
07/13/2005 | EP1551768A1 Process for manufacturing a gallium rich gallium nitride film |
07/13/2005 | EP1448807A4 Fluorocarbon-organosilicon copolymers and coatings prepared by hot-filament chemical vapor deposition |
07/13/2005 | CN1639838A Apparatus and method for thermally isolating a heat chamber |
07/13/2005 | CN1639831A Tunable multi-zone gas injection system |
07/13/2005 | CN1639638A Mask repair with electron beam-induced chemical etching |
07/13/2005 | CN1639393A Group III nitride semiconductor crystal, production method thereof and group III nitride semiconductor epitaxial wafer |
07/13/2005 | CN1639383A Method for forming interconnection metal layer, method for selectively forming metal, apparatus for selectively forming metal, and substrate apparatus |
07/13/2005 | CN1638599A Antenna for generating plasma body and plasma processing apparatus including the same |
07/13/2005 | CN1638061A Method for forming dielectric film |
07/13/2005 | CN1638060A Method for fabricating semiconductor device and semiconductor device |
07/13/2005 | CN1638052A Method of cleaning surface of semiconductor substrate, method of manufacturing thin film, method of manufacturing semiconductor device, and semiconductor device |
07/13/2005 | CN1638043A Method for producing polycrystal silicon thin film and method for producing transistor using the same |
07/13/2005 | CN1638028A Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials |
07/13/2005 | CN1638027A Method for cleaning deposition chambers for high dielectric constant materials |
07/13/2005 | CN1638026A Substrate processing apparatus and cleaning method therefor |
07/13/2005 | CN1638014A Ion beam monitoring arrangement |
07/13/2005 | CN1636657A Surface-coated cermet cutting tool with hard coating layer having excellend chipping resistance |
07/13/2005 | CN1210775C Method suitable for growing zinc sulfide (selenide)-manganese film of broad-band semiconductor |
07/13/2005 | CN1210768C Plasma processing device |
07/13/2005 | CN1210764C CVD method |
07/13/2005 | CN1210445C Thick signal crystal diamond layer, its producing method and gemstones produced from the same layer |
07/13/2005 | CN1210437C Method for preparing vacuum film-coating zinc sulfide |
07/12/2005 | US6917755 Substrate support |
07/12/2005 | US6916944 Bismuth compound, process of producing the same, and process of producing a film |
07/12/2005 | US6916747 Method of manufacturing amorphous metal oxide film and methods of manufacturing capacitance element having amorphous metal oxide film and semiconductor device |
07/12/2005 | US6916709 Non-volatile semiconductor memory device and manufacturing method for the same |
07/12/2005 | US6916704 Multiple deposition of metal layers for the fabrication of an upper capacitor electrode of a trench capacitor |
07/12/2005 | US6916512 Method and device for coating substrates |
07/12/2005 | US6916509 Cylindrical rollers on an arc opposing an electrode, moving a flexible substrate over the rollers, introducing a gas and applying energy |
07/12/2005 | US6916398 Gas delivery apparatus and method for atomic layer deposition |
07/12/2005 | US6916380 System for depositing a layered film |
07/12/2005 | US6916374 Atomic layer deposition methods and atomic layer deposition tools |
07/12/2005 | US6916373 Semiconductor manufacturing method |
07/12/2005 | US6915592 For subliming a solid to provide a gas to a micromachining processing chamber, includes heating a carrier gas flowing in a gas line, flowing the heated carrier gas into a canister containing a solid material and generating a process gas |
07/12/2005 | CA2424507C Ceramic susceptor |
07/07/2005 | WO2005062362A1 Plasma processing apparatus |
07/07/2005 | WO2005062344A1 Method of operating a system for chemical oxide removal |
07/07/2005 | WO2005061759A1 Carrier body and method for coating cutting tools. |
07/07/2005 | WO2005061758A1 Transfer system |
07/07/2005 | WO2005061757A1 Method for producing magnesium fluoride thin film, magnesium fluoride thin film, multilayer film, transparent plastic film, and organic el device |
07/07/2005 | WO2005061756A1 High temperature vacuum evaporation apparatus |
07/07/2005 | WO2005061754A1 Method and apparatus for manufacturing a functional layer consisting of at least two components |
07/07/2005 | WO2005061132A1 Method and device for cleaning at least one process chamber used for coating at least one substrate |
07/07/2005 | WO2005060634A2 Method and system for forming a film of material using plasmon assisted chemical reactions |
07/07/2005 | WO2005060383A2 Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings |
07/07/2005 | WO2005049885A3 Method and apparatus for fabricating a conformal thin film on a substrate |
07/07/2005 | WO2005021833A3 Apparatus for the coating and/or conditioning of substrates |
07/07/2005 | US20050148201 Method for forming a low-k dielectric layer for a semiconductor device |
07/07/2005 | US20050148199 Apparatus for atomic layer deposition |
07/07/2005 | US20050148194 Structure and manufacturing method for nitride-based light-emitting diodes |
07/07/2005 | US20050148177 Method and an apparatus for manufacturing a semiconductor device |
07/07/2005 | US20050148150 Memory element and its method of formation |
07/07/2005 | US20050148143 Deposition method of insulating layers having low dielectric constant of semiconductor device, a thin film transistor substrate using the same and a method of manufacturing the same |
07/07/2005 | US20050148079 Using semiconductor wafers and colorimetric analysis to determine whether oxygen is leaking into a loading chamber of a vertical-type furnace |
07/07/2005 | US20050147852 Chemical and corrosion resist protective coatings; multilayer composite comprising a metal alloy undercoatings, yttrium oxide overcoatings which was formed by spraying under depressurization |
07/07/2005 | US20050147767 Method for coating a support with a material |
07/07/2005 | US20050147765 Method for producing particles with diamond structure |
07/07/2005 | US20050147763 Method and apparatus for uniform deposition onto semiconductor wafers |
07/07/2005 | US20050147754 Zirconium complex useful in a CVD method and a thin film preparation method using the complex |
07/07/2005 | US20050147751 Chemical vapor deposition, while the substrate is within the deposition chamber, emitting reactive purge gas to the chamber to form a reactive gas curtain over the chamber surface and away from the substrate, reacting with adhering deposits on the chamber walls |
07/07/2005 | US20050147750 MEMS passivation with phosphonate surfactants |
07/07/2005 | US20050147749 Atomizer provides an aerosol to the vaporization chamber from individual sources of liquid combined with individual carrier gases for simultaneous or sequential introduction into the vaporization chamber; chemical vapor deposition; simplification and cost reduction of equipment, improved wafer throughput |
07/07/2005 | US20050145972 Tandem thin-film photoelectric transducer and its manufacturing method |
07/07/2005 | US20050145865 Semiconductor light emitting element and method for manufacturing same, integrated semiconductor light-emitting device and method for manufacturing same, image display and method for manufacturing same, and illuminating device and method for manufacturing same |
07/07/2005 | US20050145474 Spinning disk evaporator |
07/07/2005 | US20050145338 Shower head of a wafer treatment apparatus having a gap controller |
07/07/2005 | US20050145337 Apparatus for forming thin layers of materials on micro-device workpieces |
07/07/2005 | US20050145334 Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
07/07/2005 | US20050145333 Processing device and processing method |
07/07/2005 | US20050145181 Method and apparatus for high speed atomic layer deposition |
07/07/2005 | US20050145179 Accessory member for dispensers of alkali metals |
07/07/2005 | US20050145177 Method and apparatus for low temperature silicon nitride deposition |
07/07/2005 | US20050145172 Single reactor, multi-pressure chemical vapor deposition for semiconductor devices |
07/07/2005 | US20050145171 Processing method utilizing an apparatus to be sealed against workpiece |
07/07/2005 | US20050145170 Substrate processing apparatus and cleaning method therefor |
07/07/2005 | US20050144915 [pipe trap] |
07/07/2005 | DE202005004589U1 Mobile electrostatic substrate holder including a dielectric and made from very high purity materials and layers, useful in electronics and semiconductor technology |