| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/21/2005 | US20050158914 Process for manufacturing microelectronic, microoptoelectronic or micromechanical devices |
| 07/21/2005 | US20050158590 A superalloy substrate coated with a ceramic having microgaps between its columnar grains and an atomic layer-deposited inorganic overcoating which conformally fills the plurality of gaps; sintering-resistance; high-temperature heat resistance; noncracking; oxidation/corrosion resistance; stress-relief |
| 07/21/2005 | US20050158589 Self-sharpening cutting tool with hard coating |
| 07/21/2005 | US20050158479 Volatile copper(II) complexes and reducing agents for deposition of copper films by atomic layer deposition |
| 07/21/2005 | US20050158477 Deposition apparatus and a deposition method using medium in a supercritical state |
| 07/21/2005 | US20050158469 Atomic layer deposition exhibiting narrow design rule; high quality, reliability; step coverage on a wafer using a plurality of reactant gases |
| 07/21/2005 | US20050158468 Depositing pyrolitic carbon on carbon substrate by decomposing propane gas at elevated temperature sufficient to pyrolize propane gas at pressure less than 100 mm; friction applications as found in automotive continuous slip service in torque converter clutches, fuel cells; reduced soot |
| 07/21/2005 | US20050158164 Semiconductor manufacturing system and wafer holder for semiconductor manufacturing system |
| 07/21/2005 | US20050156338 Method for maintaining a constant level of fluid in a liquid vapor delivery system |
| 07/21/2005 | US20050156317 Low dielectric constant film produced from silicon compounds comprising silicon-carbon bonds |
| 07/21/2005 | US20050156302 System for manufacturing microelectronic, microoptoelectronic or micromechanical devices |
| 07/21/2005 | US20050156285 Low k and ultra low k SiCOH dielectric films and methods to form the same |
| 07/21/2005 | US20050156256 Method of fabricating lanthanum oxide layer and method of fabricating MOSFET and capacitor using the same |
| 07/21/2005 | US20050156063 Apparatus and method for forming thin film using surface-treated shower plate |
| 07/21/2005 | US20050155854 Method and apparatus for abatement of reaction products from a vacuum processing chamber |
| 07/21/2005 | US20050155711 Plasma processing apparatus and method with controlled biasing functions |
| 07/21/2005 | US20050155710 Load lock chamber with gas-sealing bellows |
| 07/21/2005 | US20050155625 Chamber cleaning method |
| 07/21/2005 | US20050155557 Substrate supporting means having wire and apparatus using the same |
| 07/21/2005 | US20050155556 Method and device for coating substrates |
| 07/21/2005 | US20050155555 Semiconductor manufacturing apparatus |
| 07/21/2005 | US20050155554 Imprint embossing system |
| 07/21/2005 | US20050155553 Rotary type cvd film forming apparatus for mass production and method of forming a cvd film on the internal surface of a plastic container |
| 07/21/2005 | US20050155552 CVD process for forming a thin film |
| 07/21/2005 | US20050155551 Deposition apparatus and related methods including a pulse fluid supplier having a buffer |
| 07/21/2005 | DE10392996T5 Verbesserungen für Duschköpfe Improvements for shower heads |
| 07/21/2005 | DE10360046A1 Kupfer(l)formiatkomplexe Formate complexes of copper (I) |
| 07/21/2005 | DE10358275A1 Vorrichtung und Verfahren zum Reinigen wenigstens einer Prozesskammer zum Beschichten wenigstens eines Substrats Device and method for cleaning at least a process chamber for coating at least one substrate |
| 07/21/2005 | DE102004022932A1 Halbleiterherstellungssystem und Verfahren zum Ausbilden eines Dünnfilms auf einem Wafer unter Verwendung desselben Of the same semiconductor manufacturing system and method for forming a thin film on a wafer using |
| 07/20/2005 | EP1555687A1 Semiconductor device and process for producing the same |
| 07/20/2005 | EP1555333A2 Thermal barrier coating system |
| 07/20/2005 | EP1555065A1 Photocatalyst material and process for producing the same |
| 07/20/2005 | EP1554417A1 Hydride vpe reactor |
| 07/20/2005 | EP1554413A2 Method for producing semi-conducting devices and devices obtained with this method |
| 07/20/2005 | EP1554412A2 Beam plasma source |
| 07/20/2005 | EP1554128A1 In-situ thermal chamber cleaning |
| 07/20/2005 | EP1328982B1 Device enclosures and devices with integrated battery |
| 07/20/2005 | EP1229571B1 Hot plate |
| 07/20/2005 | EP1127366B1 Device for the plasma deposition of a polycrystalline diamond |
| 07/20/2005 | CN1643991A Device and method for forming film for organic EL element using inductive coupling CVD |
| 07/20/2005 | CN1643674A Low temperature dielectric deposition using aminosilane and ozone |
| 07/20/2005 | CN1643673A Metal organic chemical vapor deposition and atomic layer deposition |
| 07/20/2005 | CN1643668A Substrate processing apparatus and substrate processing method, high speed rotary valve, and cleaning method |
| 07/20/2005 | CN1643648A Light source |
| 07/20/2005 | CN1643322A Heat treatment system and formable vertical chamber |
| 07/20/2005 | CN1643179A ALD device and method |
| 07/20/2005 | CN1643178A Low contamination components for semiconductor processing apparatus and methods for making components |
| 07/20/2005 | CN1642964A Copper complexes and process for formatiom of copper-containing thin films by using the same |
| 07/20/2005 | CN1642697A Self-sharpening cutting tool with hard coating |
| 07/20/2005 | CN1642632A Submerged plasma generator, method of generating plasma in liquid and method of decomposing toxic substance with plasma in liquid |
| 07/20/2005 | CN1641843A Semiconductor device and manufacturing method thereof |
| 07/20/2005 | CN1641841A Plasma processing method and apparatus |
| 07/20/2005 | CN1641069A Method for forming protection coating layer by high speed deposition of electric arch plasma |
| 07/20/2005 | CN1641064A 包装材料 Packaging Materials |
| 07/20/2005 | CN1640832A Apparatus and method for manufacturing a preform by plasma chemical vapour deposition |
| 07/20/2005 | CN1211499C Process and equipment for coating silicon carbilde on carbon fiber surface |
| 07/20/2005 | CA2456451A1 Method for manufacturing carbon composites |
| 07/19/2005 | US6919597 Bismuth titanium silicon oxide, bismuth titanium silicon oxide thin film, and method for forming the thin film |
| 07/19/2005 | US6919543 Resistive heaters and uses thereof |
| 07/19/2005 | US6919525 Comprises heat source/sink with high efficiency diamond material interposed between and thermally coupled thereto; for cooling semiconductors |
| 07/19/2005 | US6919468 Asymmetric group 8 (VIII) metallocene compounds |
| 07/19/2005 | US6919281 Method of manufacturing semiconductor device using flexible tube |
| 07/19/2005 | US6919279 Endpoint detection for high density plasma (HDP) processes |
| 07/19/2005 | US6919277 Deliberate semiconductor film variation to compensate for radial processing differences, determine optimal device characteristics, or produce small productions |
| 07/19/2005 | US6919273 Method for forming TiSiN film, diffusion preventive film comprising TiSiN film, semiconductor device and its production method, and apparatus for forming TiSiN film |
| 07/19/2005 | US6919270 Method of manufacturing silicon carbide film |
| 07/19/2005 | US6919263 High-K dielectric gate material uniquely formed |
| 07/19/2005 | US6919243 Methods of forming an integrated circuit capacitor in which a metal preprocessed layer is formed on an electrode thereof |
| 07/19/2005 | US6919114 Container with material coating having barrier effect and method and apparatus for making same |
| 07/19/2005 | US6919107 Method and device for treating surfaces using a glow discharge plasma |
| 07/19/2005 | US6919102 Forming a material layer of metal nitrides or silicides over the wafer, transferring the wafer to a front opening unified pod, repeating until all wafers have been treated and purging a gas into the pod |
| 07/19/2005 | US6919042 Oxidation and fatigue resistant metallic coating |
| 07/19/2005 | US6919001 Disk coating system |
| 07/19/2005 | US6918988 Semiconductor processing device |
| 07/19/2005 | US6918960 CVD of PtRh with good adhesion and morphology |
| 07/19/2005 | US6918676 Object which has optical layers |
| 07/19/2005 | US6918352 Method for producing coated workpieces, uses and installation for the method |
| 07/14/2005 | WO2005064998A1 Plasma processing apparatus |
| 07/14/2005 | WO2005064670A1 A pedestal for an etch processing apparatus |
| 07/14/2005 | WO2005064660A1 Microwave plasma processing method, microwave plasma processing apparatus, and its plasma head |
| 07/14/2005 | WO2005064659A1 Temperature regulating method for substrate treating system and substrate treating system |
| 07/14/2005 | WO2005064651A2 Improved gap-fill techniques |
| 07/14/2005 | WO2005064649A2 Exhaust conditioning system for semiconductor reactor |
| 07/14/2005 | WO2005064041A1 Deposition of titanium nitride film |
| 07/14/2005 | WO2005064040A1 Method for the organised growth of nanostructures |
| 07/14/2005 | WO2005064039A1 Playing field obstacle device |
| 07/14/2005 | WO2005063685A1 Metal compound, material for forming thin film and method for preparing thin film |
| 07/14/2005 | WO2005062762A2 Chemical vapor deposition process using novel precursors |
| 07/14/2005 | WO2005062758A2 Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components |
| 07/14/2005 | WO2005008763B1 Methods of forming deuterated silicon nitride-containing materials |
| 07/14/2005 | US20050154482 Plasma processing method and apparatus |
| 07/14/2005 | US20050153574 Very low dielectric constant plasma-enhanced CVD films |
| 07/14/2005 | US20050153573 Semiconductor device and manufacturing method thereof |
| 07/14/2005 | US20050153572 CVD plasma assisted lower dielectric constant sicoh film |
| 07/14/2005 | US20050153571 Nitridation of high-k dielectric films |
| 07/14/2005 | US20050153462 Method for fabricating semiconductor device and semiconductor device |
| 07/14/2005 | US20050153145 Makes adhesion, printing, coating, or the like on the solid surface easy without directly using a flame treatment |
| 07/14/2005 | US20050153125 High temperature oxidation resistant carbonaceous molding and manufacturing method thereof |
| 07/14/2005 | US20050153073 Chemical vapor deposition; low dielectric constant (k); delivering a gas mixture comprising one or more organosilicon compounds and one or more hydrocarbon compounds having at least one cyclic group to a substrate surface at deposition conditions sufficient to deposit a non-cured film |
| 07/14/2005 | US20050152826 Method and apparatus for the production of carbon nanostructures |