| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 07/28/2005 | US20050163928 Subjecting gallium chloride gas generated through the circulation of hydrogen chloride gas over metallic gallium to vapor phase deposition through the reaction with ammonia gas; moving exhaust gas through piping made of a grounded electroconductive corrosion-resistant material |
| 07/28/2005 | US20050163927 Forming a silicon nitride film |
| 07/28/2005 | US20050162805 Holding mechanism of object to be processed |
| 07/28/2005 | US20050161818 Semiconductor manufacturing apparatus for modifying in-film stress of thin films, and product formed thereby |
| 07/28/2005 | US20050161321 Apparatus for the generation and supply of fluorine gas |
| 07/28/2005 | US20050161158 Exhaust conditioning system for semiconductor reactor |
| 07/28/2005 | US20050161077 Apparatus for manufacturing photovoltaic elements |
| 07/28/2005 | US20050161060 Including a proton donor (e.g., a hydrogen plasma step) to react with the porogen, then reacting with a fluorine donor, the plasma enhanced chemical vapor deposition (PECVD) chamber is more effectively cleaned following a porous interlayer dielectric (ILD) deposition |
| 07/28/2005 | US20050160992 Substrate gripping apparatus |
| 07/28/2005 | US20050160991 Barrel type susceptor |
| 07/28/2005 | US20050160988 Semiconductor-producing apparatus |
| 07/28/2005 | US20050160987 Plasma processing apparatus |
| 07/28/2005 | US20050160986 Electron cyclotron resonance equipment with variable flare angle of horn antenna |
| 07/28/2005 | US20050160984 Method and apparatus for ALD on a rotary susceptor |
| 07/28/2005 | US20050160983 ALD apparatus and method |
| 07/28/2005 | US20050160982 Plasma enhanced semicondutor deposition apparatus |
| 07/28/2005 | US20050160981 Systems and methods for forming zirconium and/or hafnium-containing layers |
| 07/28/2005 | US20050160979 Method and apparatus for applying a polycrystalline film to a substrate |
| 07/28/2005 | US20050160971 Method for manufacturing silicon epitaxial wafer |
| 07/28/2005 | US20050160969 Apparatus and method for diamond production |
| 07/28/2005 | US20050160968 Diamond composite substrate and process for producing the same |
| 07/28/2005 | US20050160910 Method and system for supplying high purity fluid |
| 07/28/2005 | DE10359371A1 Passivierte Endoberflächen Passivated end surfaces |
| 07/28/2005 | DE102004041641A1 Stabilisierte Cyclosiloxane zur Verwendung als Vorläufer für Dünnfilme mit niedriger dielektrischer Konstante Stabilized cyclosiloxanes for use as precursors for thin films with low dielectric constant |
| 07/27/2005 | EP1557873A1 Heat treating system and heat treating method |
| 07/27/2005 | EP1557872A1 Plasma chemical vapor deposition method and plasma chemical vapor deposition device |
| 07/27/2005 | EP1557871A1 Thin film forming apparatus and thin film forming method and thin film forming system |
| 07/27/2005 | EP1557868A1 Light irradiation heat treatment method and light irradiation heat treatment apparatus |
| 07/27/2005 | EP1557698A2 Anti-reflection coated article |
| 07/27/2005 | EP1557479A1 Substrate having multilayer film and method for manufacturing the same |
| 07/27/2005 | EP1556886A1 Atomic layer deposition methods and atomic layer deposition tools |
| 07/27/2005 | EP1556527A2 Deposition processes using group 8 (viii) metallocene precursors |
| 07/27/2005 | EP1556395A2 Methods for making metallocene compounds |
| 07/27/2005 | EP1556394A2 Asymmetric group 8 (viii) metallocene compounds |
| 07/27/2005 | CN1647592A Gel and powder making |
| 07/27/2005 | CN1647256A Plasma processing device and baffle plate thereof |
| 07/27/2005 | CN1647252A Window type probe, plasma monitoring device, and plasma processing device |
| 07/27/2005 | CN1647251A Vapor phase growth method for Al-containing III-V group compound semiconductor, and method and device for producing Al-containing III-V group compound semiconductor |
| 07/27/2005 | CN1647244A Gas driven planetary rotation apparatus and methods for forming silicon carbide layers |
| 07/27/2005 | CN1646727A Plasma CVD film forming apparatus and method for manufacturing CVD film coating plastic container |
| 07/27/2005 | CN1646726A Vapor deposition method of low dielectric insulating film, thin film transistor using the same and preparation method thereof |
| 07/27/2005 | CN1646725A Device and method for forming thin-film, and method of manufacturing electronic component using the device |
| 07/27/2005 | CN1646720A Thermal insulation layer system |
| 07/27/2005 | CN1646439A Instrument and method for weighing pre-formed part during chemically depositing optical fiber pre-formed part |
| 07/27/2005 | CN1646422A Method for producing nitrides and their uses as fluorescent marks and leds |
| 07/27/2005 | CN1646382A Plastic containers coated on the inner surface and process for production thereof |
| 07/27/2005 | CN1645608A Low k and ultra low k SiCOH dielectric films and methods to form the same |
| 07/27/2005 | CN1645575A Light irradiation heat treatment method and light irradiation heat treatment apparatus |
| 07/27/2005 | CN1645569A Method of forming Si-containing thin film from organic compound with Si-Si bonds |
| 07/27/2005 | CN1644924A Vacuum exhaust system and monitoring and controlling method thereof |
| 07/27/2005 | CN1644756A Apparatus for atomic layer deposition |
| 07/27/2005 | CN1644755A Method of reducing stress in coatings produced by physical vapour deposition |
| 07/27/2005 | CN1644754A Low-pressure metal organic chemical vapour phase depositing apparatus for zinc oxide and process thereof |
| 07/27/2005 | CN1644753A Method of forming low dielectric constant interlayer dielectric film |
| 07/27/2005 | CN1644496A Ceramics and production method therefor, and ferroelectric capacitor, semiconductor device, other elements |
| 07/27/2005 | CN1644251A Chamber cleaning method |
| 07/27/2005 | CN1212665C Electron device with electrode and its manufacture |
| 07/26/2005 | US6922522 Heat treatment apparatus, calibration method for temperature measuring system of the apparatus, and heat treatment system |
| 07/26/2005 | US6922325 Electrostatic attraction mechanism, surface processing method and surface processing device |
| 07/26/2005 | US6921728 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds |
| 07/26/2005 | US6921722 Coating, modification and etching of substrate surface with particle beam irradiation of the same |
| 07/26/2005 | US6921710 Technique for high efficiency metalorganic chemical vapor deposition |
| 07/26/2005 | US6921707 Low temperature metal oxide coating formation |
| 07/26/2005 | US6921702 Atomic layer deposited nanolaminates of HfO2/ZrO2 films as gate dielectrics |
| 07/26/2005 | US6921556 Method of film deposition using single-wafer-processing type CVD |
| 07/26/2005 | US6921555 Method and system for sequential processing in a two-compartment chamber |
| 07/26/2005 | US6921554 Substrate processing method |
| 07/26/2005 | US6921437 Gas distribution system |
| 07/26/2005 | US6921251 Aluminide or chromide coating of turbine engine rotor component |
| 07/26/2005 | US6921062 Vaporizer delivery ampoule |
| 07/26/2005 | US6920915 A cooling stage for holding a semiconductor substrate thereon that is provided with a plurality of circular grooves concentrically formed in a top surface of the stage and a plurality of linear grooves formed in radial directions |
| 07/21/2005 | WO2005067023A1 Substrate processing apparatus |
| 07/21/2005 | WO2005067022A1 Shower plate, plasma processing system, and process for producing product |
| 07/21/2005 | WO2005067017A1 Vaporizer for cvd, solution voporizing cvd system and voporization method for cvd |
| 07/21/2005 | WO2005067016A1 Vaporizer for cvd, solution voporizing cvd system and voporization method for cvd |
| 07/21/2005 | WO2005067015A1 Film forming device and film forming method |
| 07/21/2005 | WO2005066387A1 Method for cleaning film-forming apparatuses |
| 07/21/2005 | WO2005066386A2 A method and apparatus for forming a high quality low temperature silicon nitride layer |
| 07/21/2005 | WO2005066266A1 Polypropylene modification for improved adhesion of polypropylene-based multilayer packaging film structure to vacuum deposited aluminum |
| 07/21/2005 | WO2005065425A2 Localized synthesis and self-assembly of nanostructures |
| 07/21/2005 | WO2005065186A2 Showerhead electrode assembly for plasma processing apparatuses |
| 07/21/2005 | WO2005049699A3 Applications of a coating material |
| 07/21/2005 | WO2005043623A3 Method for forming a dielectric on a metallic layer and capacitor assembly |
| 07/21/2005 | WO2005035818A3 Diamond coated article and method of its production |
| 07/21/2005 | WO2005033358A3 Method for depositing a conductive material on a substrate, and semiconductor contact device |
| 07/21/2005 | WO2005021454A3 Heat treatable coated article with diamond-like carbon (dlc) coating |
| 07/21/2005 | WO2005015613A3 Perimeter partition-valve with protected seals |
| 07/21/2005 | WO2005010938A3 Impedance matching network with termination of secondary rf frequencies |
| 07/21/2005 | US20050159899 Device and method for monitoring process exhaust gas, semiconductor manufacturing device, and system and method for controlling semiconductor manufacturing device |
| 07/21/2005 | US20050159250 Playing field obstacle device |
| 07/21/2005 | US20050159018 Atomic layer deposition methods, and methods of forming materials over semiconductor substrates |
| 07/21/2005 | US20050159017 Nitrogenous compositions for forming silicon nitride layers and methods of forming silicon nitride layers using the same |
| 07/21/2005 | US20050159015 Method for forming interlayer insulation film |
| 07/21/2005 | US20050159012 Semiconductor interconnect structure |
| 07/21/2005 | US20050159010 Plasma processing apparatus |
| 07/21/2005 | US20050158998 Atomic layer deposition methods, and methods of forming materials over semiconductor substrates |
| 07/21/2005 | US20050158997 Preheating of chemical vapor deposition precursors |
| 07/21/2005 | US20050158991 Metal plating using seed film |
| 07/21/2005 | US20050158983 Method for producing silicon nitride films and process for fabricating semiconductor devices using said method |
| 07/21/2005 | US20050158924 Polycrystalline Silicon Layer With Nano-grain Structure and Method of Manufacture |