| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/04/2005 | US20050170645 Metal plating using seed film |
| 08/04/2005 | US20050170617 Film formation method and apparatus for semiconductor process |
| 08/04/2005 | US20050170566 Thin film structure, capacitor, and methods for forming the same |
| 08/04/2005 | US20050170553 Apparatus for controlled alignment of catalytically grown nanostructures |
| 08/04/2005 | US20050170539 Substrate for semiconductor light-emitting element, semiconductor light-emitting element and semiconductor light-emitting element fabrication method |
| 08/04/2005 | US20050170196 Substrate having catalyst layer thereon and method of cleaning reaction chamber using the same |
| 08/04/2005 | US20050170163 Enhanced alumina layer produced by CVD |
| 08/04/2005 | US20050170104 Producing thinner films with precisely controlled stress; plasma enhanced chemical vapor deposition employing both high and low radio frequency power input sources |
| 08/04/2005 | US20050170092 Alkaline earth metal complexes and their use |
| 08/04/2005 | US20050170090 By setting the ratio between the amount of the barrier gas supplied from first and second barrier gas supply ports and ratio between amounts of barrier gas and raw material gas enables to form a thin film without particles adhesion on the substrate |
| 08/04/2005 | US20050170089 Systems and methods for synthesis of extended length nanostructures |
| 08/04/2005 | US20050170088 Hermetically seal surgical implant to make diffusion tight; use chemical vapor deposition chamber at low pressure, high temperature with a halogen or a hydrohalide gas; polish part between multiple exposures to reactant gas in chamber |
| 08/04/2005 | US20050169440 Method and system for selecting speech or DTMF interfaces or a mixture of both |
| 08/04/2005 | US20050168152 Termination of secondary frequencies in RF power delivery |
| 08/04/2005 | US20050167768 Manufacture of semiconductor device having insulation film of high dielectric constant |
| 08/04/2005 | US20050167715 Substrate for electronic devices, manufacturing method therefor, and electronic device |
| 08/04/2005 | US20050167686 Nitride semiconductor thin film and method for growing the same |
| 08/04/2005 | US20050167651 Controlled alignment catalytically grown nanostructures |
| 08/04/2005 | US20050167398 Vacuum processing apparatus and control method therefor |
| 08/04/2005 | US20050167393 Cleaning process and apparatus for silicate materials |
| 08/04/2005 | US20050167052 Plasma processing device and baffle plate thereof |
| 08/04/2005 | US20050167049 Vacuum processing apparatus and control method therefor |
| 08/04/2005 | US20050166850 Combinatorial synthesis of material chips |
| 08/04/2005 | US20050166849 Apparatus and methods for preventing rotational slippage between a vertical shaft and a support structure for a semiconductor wafer holder |
| 08/04/2005 | US20050166847 Solid source precursor delivery system |
| 08/04/2005 | US20050166844 High reflectivity atmospheric pressure furnace for preventing contamination of a work piece |
| 08/04/2005 | US20050166843 Apparatus for fabricating a conformal thin film on a substrate |
| 08/04/2005 | US20050166842 Vapor deposition mask and organic EL display device manufacturing method |
| 08/04/2005 | US20050166836 Vapor-phase epitaxial apparatus and vapor phase epitaxial method |
| 08/04/2005 | US20050166835 Vapor phase growth method for al-containing III-V group compound semiconductor, and method and device for producing al-containing IIl-V group compound semiconductor |
| 08/04/2005 | DE10392519T5 System zur Abscheidung eines Films auf einem Substrat unter Verwendung eines Gas-Precursors mit niedrigem Dampfdruck A system for depositing a film on a substrate using a gas precursor with a low vapor pressure |
| 08/04/2005 | DE10323453B4 Verfahren zur Erzeugung von Gradientenschichten im Inneren von polymeren Rohren und Vorrichtung zu dessen Durchführung A method for generating gradient in the interior of polymeric tubes and device for its implementation |
| 08/04/2005 | DE102005001916A1 Aufdruckprägesystem Print embossing system |
| 08/04/2005 | DE102004001391A1 Deposition of a layer of organometallic and/or metal-halogen compounds on a complex profile component by chemical gas phase deposition useful for corrosion protection and heat insulation, e.g. of gas turbine blades |
| 08/03/2005 | EP1560280A1 Thin film multilayer body, electronic device using such thin film multilayer body, actuator, and method for manufacturing actuator |
| 08/03/2005 | EP1560259A2 Nitride semiconductor thin film and method for growing the same |
| 08/03/2005 | EP1560252A2 Deposition apparatus |
| 08/03/2005 | EP1559809A2 Apparatus and method for coating substrate |
| 08/03/2005 | EP1559128A1 Methods and apparatus for generating high-density plasma |
| 08/03/2005 | EP1558784A2 Two-layer film for next generation damascene barrier application with good oxidation resistance |
| 08/03/2005 | EP1558783A2 Two-step atomic layer deposition of copper layers |
| 08/03/2005 | EP1280617A4 Deposited thin films and their use in separation and sarcrificial layer applications |
| 08/03/2005 | EP1264004B1 Method and device for coating substrates |
| 08/03/2005 | CN1650400A Material supply system in semiconductor device manufacturing plant |
| 08/03/2005 | CN1650045A Film forming apparatus |
| 08/03/2005 | CN1650044A Vapor deposition of silicon dioxide nanolaminates |
| 08/03/2005 | CN1650043A Methods for silicon oxide and oxynitride deposition using single wafer low pressure CVD |
| 08/03/2005 | CN1650042A Gas preheater |
| 08/03/2005 | CN1649090A Nitride semiconductor thin film and method for growing the same |
| 08/03/2005 | CN1648725A Substrate supporting means having wire and apparatus using the same |
| 08/03/2005 | CN1648286A TiN-TiAIN series hard nano structure multilayer coating layer |
| 08/03/2005 | CN1648284A Method for preparing functional gradient material using metal organic chemical vapor-phase deposition method |
| 08/03/2005 | CN1648283A Plasma chemical vapor deposition system and method for coating both sides of substrate |
| 08/03/2005 | CN1648282A Plasma enhanced semicondutor deposition apparatus |
| 08/03/2005 | CN1648102A Anti-plasma member, its producing method and method for forming heat spraying coating |
| 08/03/2005 | CN1213167C Gas blocking preventing device of plasma continuous coating device |
| 08/03/2005 | CN1213166C Continuous evaporation coating device of plasma with magnet |
| 08/03/2005 | CN1213165C Process for depositing composite anti-corrosion layer and hydrophilic layer using plasma technology |
| 08/03/2005 | CN1213164C Waste gas filter of plasma depositing coating system |
| 08/03/2005 | CN1213161C 包装材料 Packaging Materials |
| 08/02/2005 | US6924968 Haze-free BST films |
| 08/02/2005 | US6924462 Pedestal for flat panel display applications |
| 08/02/2005 | US6924454 mixing tubes using a superhard material, i.e. PCD (polycrystalline diamond) or electrically conductive PCBN (polycrystalline cubic boron nitride), in high pressure abrasive water jet systems and methods for producing same |
| 08/02/2005 | US6924231 Single wafer processing method and system for processing semiconductor |
| 08/02/2005 | US6924230 Method for forming a conductive layer |
| 08/02/2005 | US6924223 Method of forming a metal layer using an intermittent precursor gas flow process |
| 08/02/2005 | US6924212 Method for forming a semiconductor |
| 08/02/2005 | US6924195 Methods of forming metal-comprising materials and capacitor electrodes; and capacitor constructions |
| 08/02/2005 | US6924164 Method of continuous processing of thin-film batteries and like devices |
| 08/02/2005 | US6924012 Vapor deposition; molecular beam epitaxial |
| 08/02/2005 | US6924004 generating aerosol cloud of particles, accelerating the particles into the expansion chamber, creating a collimated beam by passing partilcles through the aerodynamic focusing lenses and into a deposition chamber, then impacting with substrate |
| 08/02/2005 | US6924002 comprises nickel/aluminum based intermetallics; for promoting heat transfer |
| 08/02/2005 | US6924001 diamond-like carbon (DLC) films |
| 08/02/2005 | US6923869 Device for deposition with chamber cleaner and method for cleaning the chamber |
| 08/02/2005 | US6923189 Cleaning of CVD chambers using remote source with cxfyoz based chemistry |
| 07/28/2005 | WO2005069701A1 Plasma processing apparatus |
| 07/28/2005 | WO2005069360A1 Treatment device |
| 07/28/2005 | WO2005069359A1 Substrate treating device and method of manufacturing semiconductor device |
| 07/28/2005 | WO2005069358A1 Film-forming method |
| 07/28/2005 | WO2005069356A1 Process for producing monocrystal thin film and monocrystal thin film device |
| 07/28/2005 | WO2005068825A1 Valve needle, and valve |
| 07/28/2005 | WO2005068682A2 High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition |
| 07/28/2005 | WO2005068681A2 Cleaning tantalum-containing deposits from process chamber components |
| 07/28/2005 | WO2005067634A2 Advanced multi-pressure worpiece processing |
| 07/28/2005 | WO2005067578A2 Method and apparatus for the chemical vapor deposition of materials |
| 07/28/2005 | WO2005067423A2 Disposition source using pellets for making oleds |
| 07/28/2005 | WO2005046305A3 Method of producing nanostructure tips |
| 07/28/2005 | WO2005034196A9 Atomic layer deposition of hafnium-based high-k dielectric |
| 07/28/2005 | WO2005031032A3 Apparatus for conveying gases to and from a chamber |
| 07/28/2005 | WO2005026408A3 Methods of treating components of a deposition apparatus to form particle traps, and such components having particle traps thereon |
| 07/28/2005 | WO2004079764A3 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions |
| 07/28/2005 | US20050164521 Zr-Sn-Ti-O films |
| 07/28/2005 | US20050164517 In-situ-etch-assisted HDP deposition using SiF4 |
| 07/28/2005 | US20050164487 Formation of a tantalum-nitride layer |
| 07/28/2005 | US20050164474 Method for depositing high-quality microcrystalline semiconductor materials |
| 07/28/2005 | US20050164464 Process for vertically patterning substrates in semiconductor process technology by means of inconformal deposition |
| 07/28/2005 | US20050164042 During high-speed intermittent cutting of steel, cast iron, wear resistance |
| 07/28/2005 | US20050163985 Synergetic SP-SP2-SP3 carbon materials and deposition methods thereof |
| 07/28/2005 | US20050163939 High intensity-discharge lamps; applying amorphous thin layers of TiOx and SiOx by plasma impulse chemical vapor deposition at high power density and increased substrate temperatures using small growth rates to form interference layer less than 1200 nm thick and a minimized UV-active defective spot rate |
| 07/28/2005 | US20050163929 Washing effluent gas with an oil that absorbs contained tars; the oil is continuously taken from a tank to be injected into the effluent stream and returned loaded with tars to the tank; the level of oil in the tank provides information used to modify temperature, pressure and/or flow rate |