| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/11/2005 | WO2005073427A2 Method for the production of an ultra barrier layer system |
| 08/11/2005 | WO2005073295A1 Flexible fluid transfer tube |
| 08/11/2005 | WO2005072946A1 Transparent conductive oxide films having enhanced electron concentration/mobility and method of making same |
| 08/11/2005 | WO2005072302A2 Method for depositing high-quality microcrystalline semiconductor materials |
| 08/11/2005 | WO2005057630A3 Manufacturable low-temperature silicon carbide deposition technology |
| 08/11/2005 | WO2005031813A3 Method for forming pentacene film |
| 08/11/2005 | WO2005026401B1 Method and device for depositing layers using non-continuous injection |
| 08/11/2005 | WO2004010473A3 Bubbler for substrate processing |
| 08/11/2005 | US20050177273 Material supply system in semiconductor device manufacturing plant |
| 08/11/2005 | US20050176263 Process for producing materials for electronic device |
| 08/11/2005 | US20050176261 Film formation method and apparatus for semiconductor process |
| 08/11/2005 | US20050176252 Two-stage load for processing both sides of a wafer |
| 08/11/2005 | US20050176249 Controlled growth of gallium nitride nanostructures |
| 08/11/2005 | US20050176240 Cyclical deposition of tungsten nitride for metal oxide gate electrode |
| 08/11/2005 | US20050176223 Substrate processing method |
| 08/11/2005 | US20050176221 Plasma CVD apparatus |
| 08/11/2005 | US20050176216 Ultra low dielectric constant thin film |
| 08/11/2005 | US20050176182 Forming a plurality of thin-film devices |
| 08/11/2005 | US20050175839 Tetrahedral amorphous carbon film and method of making same |
| 08/11/2005 | US20050175789 Depositing a metal containing film on a substrate without forming an interfacial oxide layer between them |
| 08/11/2005 | US20050175770 Fabricating an electrode for use in organic electronic devices |
| 08/11/2005 | US20050173715 Nitride semiconductor devices and method of their manufacture |
| 08/11/2005 | US20050173705 Fabrication method of semiconductor device and semiconductor device |
| 08/11/2005 | US20050173698 Multilayer dielectric tunnel barrier used in magnetic tunnel junction devices, and its method of fabrication |
| 08/11/2005 | US20050173569 Gas distribution showerhead for semiconductor processing |
| 08/11/2005 | US20050173386 Light irradiation heat treatment method and light irradiation heat treatment apparatus |
| 08/11/2005 | US20050173069 Plasma generating apparatus and plasma processing apparatus |
| 08/11/2005 | US20050173068 Gas delivery apparatus and method for atomic layer deposition |
| 08/11/2005 | US20050172984 Cleaning of chamber components |
| 08/11/2005 | US20050172905 Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support |
| 08/11/2005 | US20050172904 Plasma processing apparatus and plasma processing method |
| 08/11/2005 | US20050172902 PCVD apparatus and method of manufacturing a preform |
| 08/11/2005 | US20050172900 Coating apparatuses and jigs thereof |
| 08/11/2005 | US20050172899 Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus |
| 08/11/2005 | US20050172898 Web coating apparatus with a vacuum chamber and a coating cylinder |
| 08/11/2005 | US20050172897 Barrier layer process and arrangement |
| 08/11/2005 | US20050172895 MOCVD apparatus and MOCVD method |
| 08/11/2005 | US20050172888 Method of producing crystalline semiconductor material and method of fabricating semiconductor device |
| 08/11/2005 | DE102004022933A1 Wafer holder for semiconductor manufacturing system, has holder body with lifter disengaged from and coupled to body so that lower portion of wafer is supported by dual boat and to lift wafer from wafer body when wafer is loaded or unloaded |
| 08/11/2005 | DE10134866B4 Verfahren zum horizontalen Wachsenlassen von Kohlenstoff-Nanoröhren und Feldeffekttransistor, der die durch das Verfahren gewachsenen Kohlenstoff-Nanoröhren verwendet Method for horizontally growing carbon nanotubes and field effect transistor using the grown by the method of carbon nanotubes |
| 08/10/2005 | EP1562224A1 Gas driven planetary rotation apparatus and methods of using the same |
| 08/10/2005 | EP1562220A1 Integrated power modules for plasma processing systems |
| 08/10/2005 | EP1561842A2 Apparatus and method for atomic layer deposition |
| 08/10/2005 | EP1561841A2 Cleaning CVD Chambers following deposition of porogen-containing materials |
| 08/10/2005 | EP1561840A1 Method of forming metal oxide film and microwave power source unit for use in the method |
| 08/10/2005 | EP1561837A1 Strip coating installation with a vacuum chamber and a coating cylinder |
| 08/10/2005 | EP1561239A2 Atomic layer deposition methods |
| 08/10/2005 | EP1560945A2 Method and apparatus for providing and integrating a general metal delivery source (gmds) with atomic layer deposition (ald) |
| 08/10/2005 | EP1560944A1 Apparatus for vacuum treating two dimensionally extended substrates and method for manufacturing such substrates |
| 08/10/2005 | CN2716285Y Precursor automatic feeding device for chemical vapor codeposition and infiltration |
| 08/10/2005 | CN2716284Y Device for treating tail gas from chemical vapor codeposition and infiltration |
| 08/10/2005 | CN1653591A Process and system for heating semiconductor substrates in a processing chamber containing a susceptor |
| 08/10/2005 | CN1653589A Silicon parts for plasma reaction chambers |
| 08/10/2005 | CN1653588A Infrared thermopile detector system for semiconductor process monitoring and control |
| 08/10/2005 | CN1653580A Apparatus and methods for minimizing arcing in a plasma processing chamber |
| 08/10/2005 | CN1653207A Laser drilled surfaces for substrate processing chambers |
| 08/10/2005 | CN1652661A Plasma generating apparatus and plasma processing apparatus |
| 08/10/2005 | CN1652650A Vapor deposition mask and organic el display device manufacturing method |
| 08/10/2005 | CN1652319A Plasma enhanced ALD of tantalum nitride and bilayer |
| 08/10/2005 | CN1652301A Chemical vapor deposition apparatus and film deposition method |
| 08/10/2005 | CN1651602A Carbon / carbon composite material heat gradient chemical gaseous phase permeation process temperature automatic controller |
| 08/10/2005 | CN1651601A Strip coating installation with a vacuum chamber and a coating cylinder |
| 08/10/2005 | CN1651599A Component for vacuum film deposition system, vacuum film deposition system using the same and target device |
| 08/10/2005 | CN1651159A Cleaning CVD chambers following deposition of porogen-containing materials |
| 08/10/2005 | CN1214450C Manufacturing method of semiconductor device |
| 08/10/2005 | CN1214447C Chemical vapour-phase deposition device and chemical vapour-phase deposition method |
| 08/10/2005 | CN1214444C Cleaning gas for semiconductor production equipment |
| 08/10/2005 | CN1214129C Parts for vacuum film-forming device and vacuum film-forming device using the same and board device thereof |
| 08/09/2005 | US6927179 Methods and apparatus for forming a high dielectric film and the dielectric film formed thereby |
| 08/09/2005 | US6927178 Nitrogen-free dielectric anti-reflective coating and hardmask |
| 08/09/2005 | US6927165 Method and apparatus for processing substrates and method for manufacturing a semiconductor device |
| 08/09/2005 | US6927155 Process for producing semiconductor layers based on III-V nitride semiconductors |
| 08/09/2005 | US6926935 Proximity deposition |
| 08/09/2005 | US6926934 Method and apparatus for deposited film |
| 08/09/2005 | US6926933 Vacuum ultraviolet rays chemical vapor deposition on semiconductor device |
| 08/09/2005 | US6926932 in the production of the polysilicon film transistor by forming amorphous silicon by plasma enhanced chemical vapor deposition, and then a plasma surface treatment transforms a portion of the amorphous silicon layer into a superficial oxide layer |
| 08/09/2005 | US6926928 Metal-organic chemical vapor deposition (MOCVD); for use with aircraft |
| 08/09/2005 | US6926926 Silicon carbide deposited by high density plasma chemical-vapor deposition with bias |
| 08/09/2005 | US6926925 Corrosion resistance; protective coatings; vapor deposition, vapor diffusion; then separation |
| 08/09/2005 | US6926920 Chemical vapor deposition (CVD) calibration method providing enhanced uniformity |
| 08/09/2005 | US6926798 Apparatus for supercritical processing of a workpiece |
| 08/09/2005 | US6926775 Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces |
| 08/09/2005 | US6926774 Piezoelectric vaporizer |
| 08/09/2005 | US6926572 Flat panel display device and method of forming passivation film in the flat panel display device |
| 08/09/2005 | US6925731 Thin film forming apparatus cleaning method |
| 08/04/2005 | WO2005071761A1 PRODUCTION METHOD FOR SILICON SOLAR CELLS COMPRISING µC-SILICON LAYERS |
| 08/04/2005 | WO2005071752A1 Gradient deposition of low-k cvd materials |
| 08/04/2005 | WO2005071740A2 Limited thermal budget formation of pre-metal dielectric layers |
| 08/04/2005 | WO2005071739A2 Plasma-excited chemical vapor deposition method, silicon/oxygen/nitrogen-containing material and layered assembly |
| 08/04/2005 | WO2005071723A1 Method for manufacturing semiconductor device and substrate processing system |
| 08/04/2005 | WO2005071137A1 Process kit design for deposition chamber |
| 08/04/2005 | WO2005070107A2 High throughput physical vapor deposition system for material combinatorial studies |
| 08/04/2005 | WO2005059973A3 Controlled growth of gallium nitride nanostructures |
| 08/04/2005 | WO2005040453A3 Control of carbon nanotube diameter using cvd or pecvd growth |
| 08/04/2005 | WO2005006362A3 Methods for the control of flatness and electron mobility of diamond coated silicon and structures formed thereby |
| 08/04/2005 | WO2004097897A3 Methods for depositing polycrystalline films with engineered grain structures |
| 08/04/2005 | US20050170668 Plasma chemical vapor deposition system and method for coating both sides of substrate |
| 08/04/2005 | US20050170667 Nanolaminate film atomic layer deposition method |
| 08/04/2005 | US20050170665 Method of forming a high dielectric film |
| 08/04/2005 | US20050170651 Semiconductor manufacturing apparatus |