| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 08/23/2005 | US6933004 Control of stress in metal films by controlling the temperature during film deposition |
| 08/23/2005 | US6932872 Heating apparatus using induction heating |
| 08/23/2005 | US6932871 Multi-station deposition apparatus and method |
| 08/23/2005 | US6932867 Method for growing thin oxide films |
| 08/23/2005 | US6932866 Method for depositing in particular crystalline layers |
| 08/23/2005 | US6932092 power is applied to gas distribution manifold within chamber which comprises parallel plate electrodes |
| 08/23/2005 | CA2165598C Method of producing a gradient layer |
| 08/18/2005 | WO2005076343A1 Substrate holding tool and substrate treating device for treating semiconductor |
| 08/18/2005 | WO2005076338A1 Use of dissolved hafnium alkoxides or zirconium alkoxides as starting materials for hafnium oxide layers and hafnium oxynitride layers or zirconium oxide layers and zirconium oxynitride layers |
| 08/18/2005 | WO2005075701A1 Thin film forming apparatus |
| 08/18/2005 | WO2005075371A1 Method for cleaning a substrate |
| 08/18/2005 | WO2005075341A2 Method for obtaining carbon nanotubes on supports and composites comprising same |
| 08/18/2005 | WO2005074526A2 Dual layer diffusion bonded chemical vapor coating for medical implants |
| 08/18/2005 | WO2005074450A2 Substrate holder having a fluid gap and method of fabricating the substrate holder |
| 08/18/2005 | WO2005049228A3 Glow discharge-generated chemical vapor deposition |
| 08/18/2005 | WO2005044317A3 Method and device for supplying at least one machining station for a workpiece |
| 08/18/2005 | WO2005038081A3 Substrate heater assembly |
| 08/18/2005 | WO2005019497B1 Methods of reducing plasma-induced damage for advanced plasma cvd dielectrics |
| 08/18/2005 | US20050181633 Precursors for depositing silicon-containing films and processes thereof |
| 08/18/2005 | US20050181632 HDP-CVD deposition process for filling high aspect ratio gaps |
| 08/18/2005 | US20050181623 Silicon carbide deposition for use as a low dielectric constant anti-reflective coating |
| 08/18/2005 | US20050181617 Semiconductor processing equipment having improved particle performance |
| 08/18/2005 | US20050181613 Supercritical fluid-assisted deposition of materials on semiconductor substrates |
| 08/18/2005 | US20050181606 Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus |
| 08/18/2005 | US20050181594 Method for forming organic/inorganic hybrid insulation film |
| 08/18/2005 | US20050181586 Vertical CVD apparatus for forming silicon-germanium film |
| 08/18/2005 | US20050181555 Thin films |
| 08/18/2005 | US20050181240 Magnetic disk, method of manufacturing the magnetic disk and method of evaluating the magnetic disk |
| 08/18/2005 | US20050181222 Component comprising a masking layer |
| 08/18/2005 | US20050181198 Microporous membrane with a pore size of 0.05 -1.5 micrometers having diamond-like glass plasma-deposited on its surface and in its pores that improves bulk wetting properties |
| 08/18/2005 | US20050181130 using flame pyrolysis to deposit layers on windows, then coating with etch resistant layers |
| 08/18/2005 | US20050181129 into the processing tools for use in metal organic chemical vapor deposition (MOCVD) and chemical vapor deposition (CVD) processes |
| 08/18/2005 | US20050181128 Films for optical use and methods of making such films |
| 08/18/2005 | US20050180737 Substrate support bushing |
| 08/18/2005 | US20050180014 Films for optical use and methods of making such films |
| 08/18/2005 | US20050179995 Films for optical use and methods of making such films |
| 08/18/2005 | US20050179116 Semiconductor device and a method of manufacture therefor |
| 08/18/2005 | US20050178752 Method and device for correcting pattern film on a semiconductor substrate |
| 08/18/2005 | US20050178656 MOCVD PGO thin films deposited on indium oxide for feram applications |
| 08/18/2005 | US20050178336 Chemical vapor deposition reactor having multiple inlets |
| 08/18/2005 | US20050178334 Susceptor Unit and Apparatus in Which the Susceptor Is Installed |
| 08/18/2005 | US20050178333 System and method of CVD chamber cleaning |
| 08/18/2005 | US20050178332 System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (XFn) compounds for use in cleaning semiconductor processing chambers |
| 08/18/2005 | US20050178331 Electrode assembly and method for producing an electrode plate |
| 08/18/2005 | US20050178329 Formation of photoconductive and photovoltaic films |
| 08/18/2005 | US20050178328 Film forming method and film forming apparatus |
| 08/18/2005 | US20050178327 Pressure gradient CVI/CVD apparatus and method |
| 08/18/2005 | DE10392913T5 Verfahren zur Behandlung der Oberfläche eines Substrats A method for treating the surface of a substrate |
| 08/18/2005 | DE102004060633A1 Halbleiterlegierung mit einer geringen Oberflächenrauheit, und entsprechendes Herstellungsverfahren Semiconductor alloy with a low surface roughness, and manufacturing method thereof |
| 08/18/2005 | DE102004004858A1 Implements for simultaneously coating number of wafers during semiconductor manufacture by deposition from gas phase, i.e. chemical vapour deposition (CVD), or compressing chemical vapour deposition (LPCVD) as well as gas injector |
| 08/18/2005 | DE102004003337A1 Plasmaangeregtes chemisches Gasphasenabscheide-Verfahren, Silizium-Sauerstoff-Stickstoff-haltiges Material und Schicht-Anordnung Plasma enhanced chemical vapor deposition process, silicon-oxygen-nitrogen-containing material and layer arrangement |
| 08/18/2005 | DE102004002678A1 Ventilnadel und Ventil Valve needle and valve |
| 08/17/2005 | EP1564820A1 Boron phosphide semiconductor light-emitting device, method for manufacturing same, and light-emitting diode |
| 08/17/2005 | EP1564794A1 Method and system for making uniform high frequency plasma over larger area in plasma-activated cvd system |
| 08/17/2005 | EP1564791A2 Substrate support bushing |
| 08/17/2005 | EP1564268A2 Method for forming organic/inorganic hybrid insulation |
| 08/17/2005 | EP1563529A2 Silicon-containing layer deposition with silicon compounds |
| 08/17/2005 | EP1563117A2 Atomic layer deposition using metal amidinates |
| 08/17/2005 | EP1100980B1 Processing system and method for chemical vapor deposition |
| 08/17/2005 | EP0950258B1 Method and device for treating a semiconductor surface |
| 08/17/2005 | CN1656600A Method and apparatus for monitoring film deposition in a process chamber |
| 08/17/2005 | CN1656250A Rotary machine for CVD coatings |
| 08/17/2005 | CN1656249A Multistation coating device and method for plasma coating |
| 08/17/2005 | CN1656248A Method and apparatus for preparing vaporized reactants for chemical vapor deposition |
| 08/17/2005 | CN1656247A Device for manufacturing dlc film-coated plastic container |
| 08/17/2005 | CN1656246A Multistation coating device and method for plasma coating |
| 08/17/2005 | CN1656245A Multistation coating device and method for plasma coating |
| 08/17/2005 | CN1655993A DLC film coated plastic container, and device and method for manufacturing the plastic container |
| 08/17/2005 | CN1655362A Dielectric layer for semiconductor device and method of manufacturing the same |
| 08/17/2005 | CN1655341A Forming a plurality of thin-film devices |
| 08/17/2005 | CN1655336A Substrate support bushing |
| 08/17/2005 | CN1655330A Semiconductor device contamination reduction in a fluorinated oxide deposition process |
| 08/17/2005 | CN1655329A Method for forming organic/inorganic hybrid insulation |
| 08/17/2005 | CN1654708A Process for preparing nano composite ultra-hard film material by industrial equipment |
| 08/17/2005 | CN1654707A Organometallic compounds |
| 08/17/2005 | CN1654706A Surface treatment method and surface treatment apparatus |
| 08/17/2005 | CN1654705A Product support for vapour deposition apparatus |
| 08/17/2005 | CN1654187A Improved dispensing package |
| 08/17/2005 | CN1215538C Heat treating method and heat treating device |
| 08/17/2005 | CN1215525C Semiconductor processing equipment having tiled ceramic liner |
| 08/17/2005 | CN1214956C Storage container of liquid high purity substance |
| 08/16/2005 | US6931203 Vaporizer for MOCVD and method of vaporizing raw material solutions for MOCVD |
| 08/16/2005 | US6930061 Plasma processes for depositing low dielectric constant films |
| 08/16/2005 | US6930059 Method for depositing a nanolaminate film by atomic layer deposition |
| 08/16/2005 | US6930058 Method of depositing a silicon dioxide comprising layer doped with at least one of P, B and Ge |
| 08/16/2005 | US6930041 Photo-assisted method for semiconductor fabrication |
| 08/16/2005 | US6930035 Semiconductor device fabrication method |
| 08/16/2005 | US6929991 Reliable semiconductor device and method of manufacturing the same |
| 08/16/2005 | US6929862 Glass having a photocatalytically active titanium oxide coating and has a visible light reflection measured on the coated side of </= 35% |
| 08/16/2005 | US6929851 Coated substrate |
| 08/16/2005 | US6929831 Plasma vapor deposition of silicon nitride; dissociation of nitrogen using hydrogen |
| 08/16/2005 | US6929830 Plasma treatment method and method of manufacturing optical parts using the same |
| 08/16/2005 | US6929825 Method for aluminide coating of gas turbine engine blade |
| 08/16/2005 | US6929700 Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD |
| 08/16/2005 | US6929699 Gas injectors for a vertical furnace used in semiconductor processing |
| 08/16/2005 | US6929690 platelet-shaped substrate comprising an aluminium oxide monocrystal and having a thickness of greater than 250 nm and less than 1 mu m which is completely surrounded by a metal layer; automobile paints, cosmetics |
| 08/14/2005 | CA2506690A1 Apparatus and process for metal carbonyl vapour deposition |
| 08/11/2005 | WO2005074034A1 Semiconductor device |
| 08/11/2005 | WO2005074017A1 A stress-tuned, single-layer silicon nitride film and method of deposition therefore |
| 08/11/2005 | WO2005073428A1 Method of depositing film stacks on a substrate |