Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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08/30/2005 | US6936906 atomic layer deposition barrier chamber for depositing a barrier layer comprising tantalum nitride; |
08/30/2005 | US6936863 Boron phosphide-based semiconductor light-emitting device, production method thereof and light-emitting diode |
08/30/2005 | US6936551 Methods and apparatus for E-beam treatment used to fabricate integrated circuit devices |
08/30/2005 | US6936549 Chemical vapor deposition using organometallic precursors |
08/30/2005 | US6936548 Method for depositing silicon nitride films and silicon oxynitride films by chemical vapor deposition |
08/30/2005 | US6936547 Gas delivery system for deposition processes, and methods of using same |
08/30/2005 | US6936538 Method and apparatus for depositing tungsten after surface treatment to improve film characteristics |
08/30/2005 | US6936537 Methods for forming low-k dielectric films |
08/30/2005 | US6936535 Copper interconnect structure having stuffed diffusion barrier |
08/30/2005 | US6936310 Plasma processing method |
08/30/2005 | US6936309 Depositing a low dielectric constant film comprising silicon, carbon, and hydrogen; treating the deposited film with a plasma of helium, hydrogen, or a mixture thereof at conditions sufficient to increase the hardness of film |
08/30/2005 | US6936299 Determined in situ during coating process using a sensor which has an electrical property which, as a result of the coating process, changes in a manner which is representative of the layer thickness |
08/30/2005 | US6936114 providing a steam source that produces steam at a greater pressure than atmospheric pressure, directing steam through the channel, steam removing the reaction products of aluminum and halogen from the channel of the component of the equipment |
08/30/2005 | US6936108 Heat treatment device |
08/30/2005 | US6936102 SiC material, semiconductor processing equipment and method of preparing SiC material therefor |
08/30/2005 | US6936086 High conductivity particle filter |
08/30/2005 | US6935372 Semiconductor processing reactive precursor valve assembly |
08/30/2005 | US6935351 Method of cleaning CVD device and cleaning device therefor |
08/25/2005 | WO2005079117A1 Cylindrical microwave chamber |
08/25/2005 | WO2005078784A1 Method for producing silicon oxide film |
08/25/2005 | WO2005078782A1 Plasma processing apparatus and plasma processing method |
08/25/2005 | WO2005078781A1 Film-forming apparatus |
08/25/2005 | WO2005078155A1 Ultra low dielectric materials based on hybrid system of linear silicon precursor and organic porogen |
08/25/2005 | WO2005078154A1 Process for producing transparent conductive film and process for producing tandem thin-film photoelectric converter |
08/25/2005 | WO2005076918A2 Barrier layer process and arrangement |
08/25/2005 | WO2005044907A3 Flame resistant |
08/25/2005 | US20050187335 Substantially pure bulk pyrocarbon and methods of preparation |
08/25/2005 | US20050186789 Photo-assisted method for semiconductor fabrication |
08/25/2005 | US20050186767 Semiconductor device, apparatus and method for manufacturing the same |
08/25/2005 | US20050186731 Atomic layer deposition method of forming an oxide comprising layer on a substrate |
08/25/2005 | US20050186688 Chemical vapor deposition methods and physical vapor deposition methods |
08/25/2005 | US20050186346 Method for operating an in-line coating installation |
08/25/2005 | US20050186345 Conductive diamond electrode and process for producing the same |
08/25/2005 | US20050186344 Placing a pair of closely spaced electrodes, at least one of which is formed from a composite carbon material, producing a spark between the two electrodes, to cause the carbon to sublime and deposit; carbonization of polymer mixed with carbon powder |
08/25/2005 | US20050186343 Method of making a stick resistant multi-layer ceramic coating |
08/25/2005 | US20050186342 Formation of CIGS absorber layer materials using atomic layer deposition and high throughput surface treatment |
08/25/2005 | US20050186341 CVD of a ruthenium nucleation layer followed by CVD of a highly conductive ruthenium upper layer, both using low deposition rates |
08/25/2005 | US20050186340 Device and method for vaporizing temperature sensitive materials |
08/25/2005 | US20050186339 Methods and apparatuses promoting adhesion of dielectric barrier film to copper |
08/25/2005 | US20050186338 High throughput surface treatment on coiled flexible substrates |
08/25/2005 | US20050184670 Device for confinement of a plasma within a volume |
08/25/2005 | US20050184034 Method for using a microwave source for reactive atom-plasma processing |
08/25/2005 | US20050183961 Complex of silver with hydantoin or a substituted hydantoin; sulfamic, hydrofluoric, nitric, fluoboric, glycolic or lactic acid nonprecipitating electrolyte salts; pyridine, nicotinamide and dipyridyl for a mirror bright to brilliant deposit; surface active material is Hamposyl, Blancol, Rhodacal |
08/25/2005 | US20050183959 Automatic process control; using facility for automatically selecting and refining electrical parameters for processing a microelectronic workpiece |
08/25/2005 | US20050183944 Reducing stress in coatings produced by physical vapour deposition |
08/25/2005 | US20050183829 Low-mass susceptor improvements |
08/25/2005 | US20050183828 Plasma processing apparatus, semiconductor manufacturing apparatus and electrostatic chucking unit used thereof |
08/25/2005 | US20050183827 Showerhead mounting to accommodate thermal expansion |
08/25/2005 | US20050183825 Modular injector and exhaust assembly |
08/25/2005 | US20050183771 Apparatus and process for refilling a bubbler |
08/25/2005 | US20050183668 Plasma antenna |
08/25/2005 | US20050183667 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
08/25/2005 | US20050183666 Shower plate having projections and plasma CVD apparatus using same |
08/25/2005 | US20050183665 Apparatus for manufacturing flat-panel display |
08/25/2005 | US20050183664 Batch-type deposition apparatus having gland portion |
08/25/2005 | US20050183663 Systems and methods for manufacture of carbon nanotubes |
08/25/2005 | DE102004003761A1 Herstellungsverfahren für Siliziumsolarzellen umfassend µc-Siliziumschichten Manufacturing processes for silicon solar cells comprising .mu.c silicon layers |
08/25/2005 | CA2555032A1 Cylindrical microwave chamber |
08/24/2005 | EP1566835A1 Insulating film material containing organic silane or organic siloxane compound, method for producing same, and semiconductor device |
08/24/2005 | EP1566832A1 Method for producing semiconductor substrate and method for fabricating field effect transistor and semiconductor substrate and field effect transistor |
08/24/2005 | EP1566468A2 Method for fabrication of integrated circuits and corresponding device |
08/24/2005 | EP1566464A1 Apparatus and method for replenishing a bubbling device |
08/24/2005 | EP1566081A1 Method and device for microwave plasma deposition of a coating on a thermoplastic container surface |
08/24/2005 | EP1565930A2 Barrier coatings and methods in discharge lamps |
08/24/2005 | EP1565929A2 Method for the production of a substrate and unit for the same |
08/24/2005 | EP1565592A2 Method for cleaning a process chamber |
08/24/2005 | EP1565415A1 Substrate and method for the formation of continuous magnesium diboride and doped magnesium diboride wires |
08/24/2005 | EP1337700B1 Cvd reactor comprising a substrate holder rotatably mounted and driven by a gas flow |
08/24/2005 | EP1235257B1 Semiconductor-manufacturing apparatus |
08/24/2005 | EP1190111B1 Method of coating ceramics using ccvd |
08/24/2005 | CN1659711A Semiconductor device and method for fabricating the same |
08/24/2005 | CN1659685A An ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device |
08/24/2005 | CN1659309A Deposition methods utilizing phased array microwave excitation, and deposition apparatuses |
08/24/2005 | CN1659308A Gas distribution showerhead |
08/24/2005 | CN1659307A Method and device for cleaning raw material gas introduction tube used in CVD film forming apparatus |
08/24/2005 | CN1657650A High-temp. organic metal chemical vapor deposition device with connected multi-reaction chamerbers |
08/24/2005 | CN1657649A Auxiliary device for changing gas-filling pipe in furnace tube |
08/24/2005 | CN1657648A Chemical vapor deposition method for amorphous silicon and resulting thin film |
08/24/2005 | CN1657647A Method for operating an in-line coating installation |
08/24/2005 | CN1216415C Method of depositing metal film and metal deposition cluster including supercritical drying/cleaning module |
08/24/2005 | CN1216404C Manufacturing method of semiconductor device |
08/23/2005 | US6934312 System and method for fabricating efficient semiconductor lasers via use of precursors having a direct bond between a group III atom and a nitrogen atom |
08/23/2005 | US6934142 Device and method for charge removal from dielectric surfaces |
08/23/2005 | US6933568 Deposition method of insulating layers having low dielectric constant of semiconductor device, a thin film transistor substrate using the same and a method of manufacturing the same |
08/23/2005 | US6933538 Plasma encapsulation for electronic and microelectronic components such as organic light emitting diodes |
08/23/2005 | US6933508 Method of surface texturizing |
08/23/2005 | US6933254 Plasma-resistant articles and production method thereof |
08/23/2005 | US6933250 Process for manufacturing a semiconductor device |
08/23/2005 | US6933249 Method of fabricating semiconductor device |
08/23/2005 | US6933245 Method of forming a thin film with a low hydrogen content on a semiconductor device |
08/23/2005 | US6933225 Graded thin films |
08/23/2005 | US6933190 Semiconductor device having a capacitor with rare metal electrode |
08/23/2005 | US6933066 Thermal barrier coating protected by tantalum oxide and method for preparing same |
08/23/2005 | US6933060 Thermal barrier coating resistant to sintering |
08/23/2005 | US6933025 Chamber having components with textured surfaces and method of manufacture |
08/23/2005 | US6933021 Diffusion barrier; protective coatings; reacting titanium nitride with organosilicon compound |
08/23/2005 | US6933019 Method of applying a uniform polymer coating |
08/23/2005 | US6933011 alternatively reacting a surface of the substrate with a non-fluorine containing copper precursor and an oxygen containing gas, reducing the copper oxide layer by contacting the oxide layer with a hydrogen containing gas to form a copper |
08/23/2005 | US6933010 Mixer, and device and method for manufacturing thin-film |
08/23/2005 | US6933009 Thin-film deposition method |