| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/07/2005 | CN1665775A Novel alkaline earth metal complexes and use thereof |
| 09/07/2005 | CN1664996A Plasma processing apparatus and method of designing the same |
| 09/07/2005 | CN1664165A Spray nozzle for growth of compound semiconductor materials and method for feeding raw materials |
| 09/07/2005 | CN1664164A Hafnium-containing material for film formation, method for producing the same, and method for producing hafnium-containing thin film using the same |
| 09/07/2005 | CN1218372C Method of depositing vapor phase organic matter and apparatus of depositing vapor phase organic matter using same |
| 09/07/2005 | CN1218370C Heat treatment apparatus |
| 09/07/2005 | CN1218065C A process for the purification of organometallic compounds or heteroatomic organic compounds with hudrogenated getter alloys |
| 09/07/2005 | CN1217773C Plate display producing apparatus |
| 09/06/2005 | US6940172 Chemical vapor deposition of titanium |
| 09/06/2005 | US6940143 Semiconductor thin-film manufacturing method, semiconductor device manufacturing method, semiconductor device, integrated circuit, electro-optical device, and electronic appliance |
| 09/06/2005 | US6940112 Integrated capacitors fabricated with conductive metal oxides |
| 09/06/2005 | US6940103 Nitride semiconductor growth method, nitride semiconductor substrate and nitride semiconductor device |
| 09/06/2005 | US6939821 Low resistivity silicon carbide |
| 09/06/2005 | US6939817 Removal of carbon from an insulative layer using ozone |
| 09/06/2005 | US6939813 Apparatus for improved low pressure inductively coupled high density plasma reactor |
| 09/06/2005 | US6939804 Formation of composite tungsten films |
| 09/06/2005 | US6939801 Selective deposition of a barrier layer on a dielectric material |
| 09/06/2005 | US6939760 Method for semiconductor device manufacturing to include multistage chemical vapor deposition of material oxide film |
| 09/06/2005 | US6939731 Production method for light emitting element |
| 09/06/2005 | US6939725 Method of fabricating semiconductor device with capacitor covered by a TEOS-03 film |
| 09/06/2005 | US6939723 Method of forming haze-free BST films |
| 09/06/2005 | US6939607 Cutting tool |
| 09/06/2005 | US6939579 ALD reactor and method with controlled wall temperature |
| 09/06/2005 | US6939578 Volatile copper(II) complexes for deposition of copper films by atomic layer deposition |
| 09/01/2005 | WO2005081302A1 Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning |
| 09/01/2005 | WO2005081298A1 Epitaxially growing equipment |
| 09/01/2005 | WO2005081283A2 Substrate support system for reduced autodoping and backside deposition |
| 09/01/2005 | WO2005081269A1 Method and equipment for forming transparent conductive film |
| 09/01/2005 | WO2005080632A1 Cvd reactor comprising a photodiode array |
| 09/01/2005 | WO2005080631A1 Inlet system for an mocvd reactor |
| 09/01/2005 | WO2005080630A1 Semiconductor processing system and bubble trap |
| 09/01/2005 | WO2005080629A2 SILICON COMPOUNDS FOR PRODUCING SiO2-CONTAINING INSULATING LAYERS ON CHIPS |
| 09/01/2005 | WO2005080628A2 Method for producing silicon nitride films and silicon oxynitride films by chemical vapor deposition |
| 09/01/2005 | WO2005080627A1 Formation of photoconductive and photovoltaic films |
| 09/01/2005 | WO2005080254A1 Process for producing nanostructured manganese oxide having dendritic structure and oxygen reduction electrode containing nanostructured transition metal oxide having dendritic structure |
| 09/01/2005 | WO2005079958A1 Method and apparatus for treating a fluorocompound-containing gas stream |
| 09/01/2005 | WO2005079233A2 Films for optical use and methods of making such films |
| 09/01/2005 | WO2005031841A3 Methods of filling gaps and methods of depositing materials using high density plasma chemical vapor deposition |
| 09/01/2005 | WO2005006398A3 Apparatus and method for controlled application of reactive vapors to produce thin films and coatings |
| 09/01/2005 | WO2004077515A3 Apparatus and method for delivery of reactive chemical precursors to the surface to be treated |
| 09/01/2005 | US20050191866 Semiconductor devices and methods for depositing a dielectric film |
| 09/01/2005 | US20050191863 Semiconductor device contamination reduction in a fluorinated oxide deposition process |
| 09/01/2005 | US20050191846 Plasma processes for depositing low dielectric constant films |
| 09/01/2005 | US20050191811 Film forming ring and method of manufacturing semiconductor device |
| 09/01/2005 | US20050191766 Constructions comprising perovskite-type dielectric |
| 09/01/2005 | US20050191514 Amorphous dielectric thin film and manufacturing method thereof |
| 09/01/2005 | US20050191437 Method of forming a catalytic surface comprising at least one of Pt, Pd, Co and Au in at least one of elemental and alloy forms |
| 09/01/2005 | US20050191422 Applying mask material to cooling holes so that holes are at partially filled with mask material in portion closest to external surface and up to the level of the external surface, thickening portion of mask material within cooling holes, coating, removing thickened mask material |
| 09/01/2005 | US20050191421 Method for coating a component |
| 09/01/2005 | US20050191417 microstructure or nanostructure elongated tubes or wires of carbon, boron nitride, gallium nitride or zinc oxide, formed by gas discharge, laser ablation or chemical vapor deposition; electronics having high aspect ratios |
| 09/01/2005 | US20050191416 Methods of gas delivery for deposition processes and methods of depositing material on a substrate |
| 09/01/2005 | US20050191409 Ion beam monitoring arrangement |
| 09/01/2005 | US20050191408 prosthetics comprising a biocompatible alloy of cobalt and chromium, coated with a high bonding strength layer of titanium carbonitride and a high hardness ceramic layer of alumina; wear resistance |
| 09/01/2005 | US20050190450 Ultra high transmission phase shift mask blanks |
| 09/01/2005 | US20050189073 Gas delivery device for improved deposition of dielectric material |
| 09/01/2005 | US20050189072 Method and apparatus of generating PDMAT precursor |
| 09/01/2005 | US20050189071 Processing apparatus and method for removing particles therefrom |
| 09/01/2005 | US20050188923 Substrate carrier for parallel wafer processing reactor |
| 09/01/2005 | US20050188922 Plasma processing unit |
| 09/01/2005 | DE10393222T5 Nadelförmiger Siliziumkristall und Verfahren für seine Erzeugung Needle-shaped crystal silicon and method for its production |
| 09/01/2005 | DE102005001168A1 Erzeugen einer Mehrzahl von Dünnfilmvorrichtungen Generating a plurality of thin-film devices |
| 09/01/2005 | DE102004007984A1 CVD-Reaktor mit Fotodioden-Array CVD reactor with photodiode array |
| 09/01/2005 | DE102004005313A1 Verfahren zur Herstellung eines Ultrabarriere-Schichtsystems A process for producing an ultra barrier layer system |
| 09/01/2005 | DE102004004177A1 Producing controlled hardness diamond-like carbon layers on substrates, e.g. machine parts or implants, by ion-supported deposition from mixture of carbon-containing gas and carrier gas |
| 09/01/2005 | CA2556066A1 Vapor phase growth apparatus |
| 08/31/2005 | EP1569264A1 Method for producing silicon epitaxial wafer |
| 08/31/2005 | EP1568798A2 Conductive diamond electrode and process for producing the same |
| 08/31/2005 | EP1568797A2 In-situ dry clean chamber for front end of line fabrication |
| 08/31/2005 | EP1568751A1 Method of preparing storage phosphors from dedicated precursors |
| 08/31/2005 | EP1568068A1 Backside heating chamber for emissivity independent thermal processes |
| 08/31/2005 | EP1567688A2 Method and apparatus for processing substrates |
| 08/31/2005 | EP1567531A2 Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride |
| 08/31/2005 | EP1381707B1 Method for producing a coating on a machining tool and a machining tool |
| 08/31/2005 | EP1228522B1 Vacuum circuit for a device for treating a receptacle with low pressure plasma |
| 08/31/2005 | EP1061155B1 Vacuum processing apparatus |
| 08/31/2005 | EP1036863B1 Method for synthesizing n-type diamond having low resistance |
| 08/31/2005 | CN1663031A Fabrication process of a semiconductor device |
| 08/31/2005 | CN1663029A Magnetron plasma processing apparatus |
| 08/31/2005 | CN1663017A Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
| 08/31/2005 | CN1663016A Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a mutli-part electrode |
| 08/31/2005 | CN1663015A Showerhead electrode design for semiconductor processing reactor |
| 08/31/2005 | CN1662676A Method for forming ultra low k films using electron beam |
| 08/31/2005 | CN1662675A Rotary type CVD film forming apparatus for mass production and method of forming a CVD film on the internal surface of a plastic container |
| 08/31/2005 | CN1662674A System for depositing a film onto a substrate using a low vapor pressure gas precursor |
| 08/31/2005 | CN1662545A Dicopper(I)oxalate complexes for use as precursor substancesin metallic copper deposition |
| 08/31/2005 | CN1662448A Process for manufacturing a gallium rich gallium nitride film |
| 08/31/2005 | CN1662298A Method for carrying out homogeneous and heterogeneous chemical reactions using plasma |
| 08/31/2005 | CN1662114A Plasma antenna |
| 08/31/2005 | CN1661781A Amorphous dielectric thin film and manufacturing method thereof |
| 08/31/2005 | CN1661647A Apparatus for manufacturing flat-panel display |
| 08/31/2005 | CN1661433A Processing apparatus and method for removing particles therefrom |
| 08/31/2005 | CN1661130A Plasma processing apparatus, semiconductor manufacturing apparatus and electrostatic chucking unit used thereof |
| 08/31/2005 | CN1660962A InAIGaN emitting light in ultraviolet short-wavelength region and process for preparing the same as well as ultraviolet light-emitting device using the same |
| 08/31/2005 | CN1660531A Coated cement cutting tool with a chipping resistant, hard coating layer |
| 08/31/2005 | CN1217390C Device and method for plasma processing and slow-wave plate |
| 08/31/2005 | CN1217388C Plasma processing device and exhaust ring |
| 08/31/2005 | CN1217382C Method for fabricating polysilicon thin films |
| 08/31/2005 | CN1216798C Technique for preparing silicon nitride powders with high alpha phase by using plasma chemical vapor phase process |
| 08/31/2005 | CN1216680C Excimer UV photo reactor |
| 08/30/2005 | US6937963 Method for avoiding irregular shutoff of production equipment and system for avoiding irregular shutoff |