| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/15/2005 | US20050202167 Adding to a reactor a fluorine-containing cleaning agent, a chlorine-containing cleaning agent; reacting the TiO2 with the reactive gas to form a volatile product; and removing it from the reactor |
| 09/15/2005 | US20050202162 Reactive metal sources and deposition method for thioaluminate phosphors |
| 09/15/2005 | US20050201921 Coating has high hardness, low friction coefficient, high ductility and simultaneously excellent strength against flaking-off and shows remarkably reduced residual stress, even at high temperatures; cutting, drilling tools; comprises aluminium, additional metal, carbon, other element |
| 09/15/2005 | US20050201894 Conveying plurality of substrates in holder into reaction container; heating a plurality of zones of thermal process atmosphere in the reaction container by means of a plurality of heating units; forming uniform thin films; oxidation, chemical vapor deposition; semiconductors |
| 09/15/2005 | US20050200260 Electrically conductive polycrystalline diamond and particulate metal based electrodes |
| 09/15/2005 | US20050199886 Nitride semiconductor device and method of manufacturing the same |
| 09/15/2005 | US20050199187 Heat treatment apparatus and substrate processing apparatus |
| 09/15/2005 | US20050199186 Inductively coupled plasma apparatus using magnetic field |
| 09/15/2005 | US20050199184 Gas distributor having directed gas flow and cleaning method |
| 09/15/2005 | US20050199183 Plasma processing apparatus |
| 09/15/2005 | US20050199182 Apparatus for the preparation of film |
| 09/15/2005 | DE102004009772A1 CVD-Reaktor mit Prozesskammerhöhenstabilisierung CVD reactor process chamber height stabilization |
| 09/15/2005 | DE102004009130A1 Einlasssystem für einen MOCVD-Reaktor An intake system for an MOCVD reactor |
| 09/15/2005 | DE102004008598A1 Verfahren für den Betrieb einer Inline-Beschichtungsanlage A method of operating an in-line coating line |
| 09/15/2005 | DE102004008442A1 Siliciumverbindungen für die Erzeugung von SIO2-haltigen Isolierschichten auf Chips Silicon compounds for the production of SiO2-containing insulating layers on chips |
| 09/15/2005 | DE10195251B4 Plasmaverarbeitungssystem und Verfahren Plasma processing system and method |
| 09/15/2005 | DE10046973B4 Verfahren zur Herstellung eines CVD-Diamantwerkzeugs und Verwendung A method for producing a CVD diamond tool and using |
| 09/15/2005 | CA2554756A1 Reactive metal sources and deposition method for thioaluminate phosphors |
| 09/14/2005 | EP1574597A1 Apparatus and process for producing thin films and devices |
| 09/14/2005 | EP1574594A1 A carbon containing hard coating and a method for depositing a hard coating onto a substrate |
| 09/14/2005 | EP1573868A2 Optical uses of diamondoid-containing materials |
| 09/14/2005 | EP1573795A1 A system and method for controlling plasma with an adjustable coupling to ground circuit |
| 09/14/2005 | EP1573780A2 Bubbler for substrate processing |
| 09/14/2005 | EP1573091A1 Plating solutions for electrochemical or chemical deposition of copper interconnects and methods therefor |
| 09/14/2005 | EP1573086A2 Additives to prevent degradation of alkyl-hydrogen siloxanes |
| 09/14/2005 | EP1572786A2 Process and apparatus for depositing plasma coating onto a container |
| 09/14/2005 | EP1044458B1 Dual face shower head magnetron, plasma generating apparatus and method of coating a substrate |
| 09/14/2005 | CN1669127A Heat treatment method and heat treatment apparatus |
| 09/14/2005 | CN1669126A Surface treating method for substrate |
| 09/14/2005 | CN1668776A Zirconium complex useful in a CVD method and a thin film preparation method using the complex |
| 09/14/2005 | CN1668545A Article having nano-scaled structures and a process for making such article |
| 09/14/2005 | CN1667459A Vacuum pumping system, driving method thereof, apparatus having the same, and method of transferring substrate using the same |
| 09/14/2005 | CN1666688A Method for making aluminium zipper with colorful galvanized coating |
| 09/14/2005 | CN1219419C Substrate electrode material processing apparatus and method |
| 09/14/2005 | CN1219315C Gallium nitride base film epitaxial growth apparatus by metallorganics chemical gas phase deposition |
| 09/14/2005 | CN1219109C Hard alloy matix complex shape cutter diamond coating preparation method |
| 09/13/2005 | US6943366 Substrate for semiconductor light-emitting element, semiconductor light-emitting element and semiconductor light-emitting element fabrication method |
| 09/13/2005 | US6943127 CVD plasma assisted lower dielectric constant SICOH film |
| 09/13/2005 | US6943109 Method of manufacturing a semiconductor element |
| 09/13/2005 | US6943089 Semiconductor device manufacturing method and semiconductor manufacturing apparatus |
| 09/13/2005 | US6943073 Process for low temperature atomic layer deposition of RH |
| 09/13/2005 | US6943053 System, method and medium for modeling, monitoring and/or controlling plasma based semiconductor manufacturing processes |
| 09/13/2005 | US6942929 Process chamber having component with yttrium-aluminum coating |
| 09/13/2005 | US6942893 Part of the flow of reactive gas admitted into the enclosure is guided to the inside of the volume defined by a concave inside face of the hollow shaped substrate at pressure equilibrium |
| 09/13/2005 | US6942892 Hot element CVD apparatus and a method for removing a deposited film |
| 09/13/2005 | US6942891 analyzing the gas components of various types exhausted during a semiconductor manufacturing process |
| 09/13/2005 | US6942753 Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition |
| 09/09/2005 | WO2005083777A1 Methods and apparatuses promoting adhesion of dielectric barrier film to copper |
| 09/09/2005 | WO2005083766A1 Substrate processing device |
| 09/09/2005 | WO2005083760A1 Substrate processing equipment and semiconductor device manufacturing method |
| 09/09/2005 | WO2005083753A1 Semiconductor treating device |
| 09/09/2005 | WO2005083156A1 Non-cyanide silver plating bath composition |
| 09/09/2005 | WO2005083154A2 Cleaning of chamber components |
| 09/09/2005 | WO2005083153A1 Cvd-reactor with stabilized process chamber height |
| 09/09/2005 | WO2005083152A1 Method for forming copper film |
| 09/09/2005 | WO2005083151A2 Pressure gradient cvi/cvd apparatus and method |
| 09/09/2005 | WO2005083146A2 Vaporizing temperature sensitive materials for oled |
| 09/09/2005 | WO2005081940A2 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
| 09/09/2005 | WO2005081933A2 Chemical vapor deposition of high conductivity, adherent thin films of ruthenium |
| 09/09/2005 | WO2005081788A2 High throughput surface treatment on coiled flexible substrates |
| 09/09/2005 | WO2005081658A2 Metalorganic chemical vapor deposition (mocvd) process and apparatus to produce multi-layer high-temperature superconducting (hts) coated tape |
| 09/09/2005 | WO2005066386A3 A method and apparatus for forming a high quality low temperature silicon nitride layer |
| 09/09/2005 | CA2529373A1 Metalorganic chemical vapor deposition (mocvd) process and apparatus to produce multi-layer high-temperature superconducting (hts) coated tape |
| 09/08/2005 | US20050196976 Methods of filling gaps using high density plasma chemical vapor deposition |
| 09/08/2005 | US20050196972 Semiconductor component having at least one organic semiconductor layer and method for fabricating the same |
| 09/08/2005 | US20050196971 Hardware development to reduce bevel deposition |
| 09/08/2005 | US20050196970 Novel deposition of high-k MSiON dielectric films |
| 09/08/2005 | US20050196920 Semiconductor device with rare metal electrode |
| 09/08/2005 | US20050196549 Microwave enhanced CVD method and apparatus |
| 09/08/2005 | US20050196548 Corrosion resistance effect of the surface layer achieved without the structure of the applied layer having to be subsequently densified by mechanical means; plasma-based vapor deposition that forms a dense, fine-grained, largely pore-free structure; coatings of aluminum and its alloys |
| 09/08/2005 | US20050196534 Chemical vapor deposition (CVD); bad influence by a decomposed gas, e.g., CO which is produced by a decomposition of the metal carbonyl gas is prevented and a metal film having a low electrical resistance is formed on a substrate |
| 09/08/2005 | US20050196533 Method and apparatus for forming silicon oxide film |
| 09/08/2005 | US20050196254 transfer unit under atmospheric condition having a robot; process chamber connected to one side of the transfer unit with a slot valve; alternately under vacuum and atmospheric conditions; manufacture substrates for a semiconductor device, liquid crystal display; reduced footprint and decrease costs |
| 09/08/2005 | US20050194475 Inductively coupled plasma chemical vapor deposition apparatus |
| 09/08/2005 | US20050194100 Reduced friction lift pin |
| 09/08/2005 | US20050194097 Plasma processing apparatus and method of designing the same |
| 09/08/2005 | US20050194094 Window type probe, plasma monitoring device, and plasma processing device |
| 09/08/2005 | US20050194023 Method of processing selected surfaces in a semiconductor process chamber based on a temperature differential between surfaces |
| 09/08/2005 | US20050193953 Plasma processing apparatus |
| 09/08/2005 | US20050193952 Substrate support system for reduced autodoping and backside deposition |
| 09/08/2005 | US20050193951 Plasma processing apparatus |
| 09/08/2005 | US20050193950 Supporting module and alignment apparatus for a substrate |
| 09/08/2005 | US20050193949 Method for manufacturing integrated circuits and corresponding device |
| 09/08/2005 | US20050193948 Vacuum processing apparatus |
| 09/08/2005 | US20050193947 Deposition reactors and systems |
| 09/08/2005 | US20050193946 Apparatus and method for preventing corrosion of a vacuum gauge |
| 09/08/2005 | DE10015729B4 Verfahren zum Herstellen eines Elementes aus polykristallinem Diamant sowie danach hergestelltes Element A method of manufacturing a polycrystalline diamond element, and thereafter produced element |
| 09/07/2005 | EP1571234A2 Method for using an in line coating apparatus |
| 09/07/2005 | EP1570525A1 Method for forming a dielectric stack |
| 09/07/2005 | EP1570108A1 Susceptor system |
| 09/07/2005 | EP1570107A1 Susceptor system |
| 09/07/2005 | EP1570106A2 Method and device for the cvd coating of workpieces |
| 09/07/2005 | EP1570105A1 Method for chemical vapour deposition (cvd) of zrb sb x /sb c sb y /sb n sb z /sb (or x+y+z=1) layers and a cutting tool coated with said layer |
| 09/07/2005 | EP1570104A1 MOCVD FORMATION OF CU sb 2 /sb S |
| 09/07/2005 | EP1570096A1 Composite metal product and method for the manufacturing of such a product |
| 09/07/2005 | EP1071833B1 Method and apparatus for modifying the profile of high-aspect-ratio gaps using differential plasma power |
| 09/07/2005 | EP0890185B1 Solid state temperature controlled substrate holder |
| 09/07/2005 | CN1666319A Group III nitride semiconductor substrate and its manufacturing method |
| 09/07/2005 | CN1666315A Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters |
| 09/07/2005 | CN1665969A Porous substrate and its manufacturing method, and GaN semiconductor multilayer substrate and its manufacturing method |