| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/22/2005 | WO2005087971A1 Method for gettering oxygen and water during vacuum deposition of sulfide films |
| 09/22/2005 | WO2005087968A1 Al COMPOSITE MATERIAL BEING CRUMBLED WITH WATER, Al FILM AND Al POWDER COMPRISING THE MATERIAL AND METHODS FOR PREPARATION THEREOF, CONSTITUTIONAL MEMBER FOR FILM-FORMING CHAMBER METHOD FOR RECOVERING FILM-FORMING MATERIAL |
| 09/22/2005 | WO2005087697A1 METAL COMPLEX COMPRISING β-DIKETONATO AS LIGAND |
| 09/22/2005 | WO2005087678A1 Process for the deposition of aluminium oxide coatings |
| 09/22/2005 | WO2005087417A1 Coated cutting tool |
| 09/22/2005 | WO2005044749A3 Object with easily cleaned surfaces and method for production thereof |
| 09/22/2005 | WO2005021832A3 Method and appartus for depositing materials with tunable properties |
| 09/22/2005 | WO2005007283A3 Apparatus and method for downstream pressure control and sub-atmospheric reactive gas abatement |
| 09/22/2005 | WO2005003402A3 Hydrogen sulfide injection method for phosphor deposition |
| 09/22/2005 | WO2004063422A3 Method for curing low dielectric constant film using direct current bias |
| 09/22/2005 | US20050208763 Method and apparatus for depositing tungsten after surface treatment to improve film characteristics |
| 09/22/2005 | US20050208759 Method of modifying interlayer adhesion |
| 09/22/2005 | US20050208754 Method of growing electrical conductors |
| 09/22/2005 | US20050208741 Methods for forming rough ruthenium-containing layers and structures/methods using same |
| 09/22/2005 | US20050208740 Process for deposition of semiconductor films |
| 09/22/2005 | US20050208219 Composite oxide dielectric; sputtering using various pressure; overcoating semiconductor substrate |
| 09/22/2005 | US20050208218 Method for depositing boron-rich coatings |
| 09/22/2005 | US20050208217 Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms |
| 09/22/2005 | US20050208215 TetramethoxySilane is emitted without charging into the plasma, the discharge processed O2 is separately emitted; TMOS and O2 are joined at the surface of a substrate forming an oxide film; excellent in membranous and coverage property at a fast film forming speed; electronic circuits |
| 09/22/2005 | US20050208205 For making organic light emitting full color display panel by angled evaporation; comprises ribs defining slots in which individual pixels are built, overcoating substrate; red, blue, green dopes; shadow masking |
| 09/22/2005 | US20050208204 Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers |
| 09/22/2005 | US20050206018 gas driers, rotating coaters, vacuum treatment apparatus, heat treatment apparatus, charged particle flow irradiating apparatus, plasma treatment apparatus, electrostatic absorbers, interatomic force microscope, X-ray irradiating apparatus and cleaners |
| 09/22/2005 | US20050205210 Advanced multi-pressure workpiece processing |
| 09/22/2005 | US20050205208 Plasma processing apparatus and control method thereof |
| 09/22/2005 | US20050205110 Removing native oxides from a substrate surface (semiconductor) in a vacuum chamber by generating reactive species from a gas mixture(NH3 + NF3), cooling surface and reacting with gas to form a film (ammonium hexafluorosilicate), and annealing to vaporize film; dry etching |
| 09/22/2005 | US20050205016 Plasma treatment apparatus and plasma treatment method |
| 09/22/2005 | US20050205015 Insulating film forming method, insulating film forming apparatus, and plasma film forming apparatus |
| 09/22/2005 | US20050205013 Plasma processing apparatus and plasma processing method |
| 09/22/2005 | US20050205011 Process and apparatus for forming discrete microcavities in a filament wire using a polymer etching mask |
| 09/22/2005 | US20050205010 In situ growth of oxide and silicon layers |
| 09/22/2005 | CA2554817A1 Method for gettering oxygen and water during vacuum deposition of sulfide films |
| 09/21/2005 | EP1577425A1 LOW-RESISTANCE n TYPE SEMICONDUCTOR DIAMOND AND PROCESS FOR PRODUCING THE SAME |
| 09/21/2005 | EP1577420A1 Vacuum processing apparatus with showerhead |
| 09/21/2005 | EP1577419A1 System for coating hollow bodies such as plastic bottles with an high vacuum chamber and a lock |
| 09/21/2005 | EP1577415A1 Method for aluminide coating a hollow article |
| 09/21/2005 | EP1576330A2 Very low moisture o-ring and method for preparing the same |
| 09/21/2005 | EP1576202A2 Methods for producing coated metal wire |
| 09/21/2005 | CN1672248A Oxide film forming method and oxide film forming apparatus |
| 09/21/2005 | CN1672247A Gas supply system and treatment system |
| 09/21/2005 | CN1672244A Hafnium-aluminum oxide dielectric films |
| 09/21/2005 | CN1672236A Evaluation of chamber components having textured coatings |
| 09/21/2005 | CN1671884A Reduced volume, high conductance process chamber |
| 09/21/2005 | CN1671883A Deposition of copper films |
| 09/21/2005 | CN1671882A 原子层沉积方法 Atomic layer deposition method |
| 09/21/2005 | CN1671544A Honeycomb-shaped carbon element |
| 09/21/2005 | CN1671466A Vaporizer delivery ampoule |
| 09/21/2005 | CN1670997A Plasma resonant cavity tunable waveguide device |
| 09/21/2005 | CN1670920A Vacuum processing apparatus |
| 09/21/2005 | CN1670913A Insulating film forming method, insulating film forming apparatus, and plasma film forming apparatus |
| 09/21/2005 | CN1670912A Plasma treatment apparatus and plasma treatment method |
| 09/21/2005 | CN1670245A Die with superhard filming |
| 09/21/2005 | CN1670244A Gas preparing system and gas preparing method |
| 09/21/2005 | CN1669796A Device for manufacturing display basic board and blow head combination assemblaging therein |
| 09/21/2005 | CN1219912C Plasma polymerization system and method for plasma polymerization |
| 09/21/2005 | CN1219911C Method for preparing diamond and silicon carbide nano mix phase composite film |
| 09/20/2005 | US6946780 Carbon body, process for producing the carbon body, and electric field emission electron source using the carbon body |
| 09/20/2005 | US6946625 Ceramic susceptor |
| 09/20/2005 | US6946409 Method of manufacturing semiconductor device having nitride film with improved insulating properties |
| 09/20/2005 | US6946404 Method for passivating a semiconductor substrate |
| 09/20/2005 | US6946401 Plasma treatment for copper oxide reduction |
| 09/20/2005 | US6946395 Devices containing zirconium-platinum-containing materials and methods for preparing such materials and devices |
| 09/20/2005 | US6946369 Method for forming, by CVD, nanostructures of semi-conductor material of homogenous and controlled size on dielectric material |
| 09/20/2005 | US6946304 Apparatus for and method of manufacturing a semiconductor device, and cleaning method for use in the apparatus for manufacturing a semiconductor device |
| 09/20/2005 | US6946167 Deposited film forming apparatus and deposited film forming method |
| 09/20/2005 | US6946162 Method for providing a semitransparent metallic aspect to cosmetic case or compact components and resulting components |
| 09/20/2005 | US6946158 Enhancing the deposition of titanium containing materials on a substrate from a titanium containing precursor by the addition of organic amines to the titanium containing precursor |
| 09/20/2005 | US6946033 Heated gas distribution plate for a processing chamber |
| 09/20/2005 | CA2205576C An apparatus for generation of a linear arc discharge for plasma processing |
| 09/15/2005 | WO2005086210A1 Self-cleaning catalyst chemical vapor deposition device and cleaning method therefor |
| 09/15/2005 | WO2005085495A1 Film forming method |
| 09/15/2005 | WO2005085494A1 Low zirconium hafnium halide compositions |
| 09/15/2005 | WO2005085493A1 Reactive metal sources and deposition method for thioaluminate phosphors |
| 09/15/2005 | WO2005085175A1 Alkoxide compound, raw material for thin film formation and process for producing thin film |
| 09/15/2005 | WO2005068681A3 Cleaning tantalum-containing deposits from process chamber components |
| 09/15/2005 | WO2005067634A3 Advanced multi-pressure worpiece processing |
| 09/15/2005 | WO2005064651A3 Improved gap-fill techniques |
| 09/15/2005 | WO2005047564A3 Method of improving post-develop photoresist profile on a deposited dielectric film |
| 09/15/2005 | WO2005021842A3 High-purity crystal growth |
| 09/15/2005 | WO2005010948A3 Cleaning process and apparatus for silicate materials |
| 09/15/2005 | WO2005002979A3 Canister guard |
| 09/15/2005 | WO2004112092A3 Adjustable gas distribution system |
| 09/15/2005 | WO2004075609A3 Pulsed electric field system for decontamination of biological agents on a dielectric sheet material |
| 09/15/2005 | US20050202685 Adhesion improvement for low k dielectrics |
| 09/15/2005 | US20050202684 Method of manufacturing inorganic nanotube |
| 09/15/2005 | US20050202682 Nitride semiconductor growth method, nitride semiconductor substrate, and nitride semiconductor device |
| 09/15/2005 | US20050202653 High density plasma process for silicon thin films |
| 09/15/2005 | US20050202652 High-density plasma hydrogenation |
| 09/15/2005 | US20050202627 Method for forming a dielectric layer in a semiconductor device |
| 09/15/2005 | US20050202283 Alumina coating, coated product and method of making the same |
| 09/15/2005 | US20050202259 abrasion resistant coatings with a uniform thickness; plasma polymerized polysiloxane or silicons layer with oxygen content, UV absorbency; haze-free, wear resistance, weatherproofing; protective coatings for automobiles |
| 09/15/2005 | US20050202250 High rate deposition of titanium dioxide |
| 09/15/2005 | US20050202222 High dielectric constant composition and method of making same |
| 09/15/2005 | US20050202185 Electromagnetic control of chemical catalysis |
| 09/15/2005 | US20050202184 Expanding thermal plasma deposition system |
| 09/15/2005 | US20050202183 Plasma processing system, plasma processing method, plasma film deposition system, and plasma film deposition method |
| 09/15/2005 | US20050202173 Diamond synthesis |
| 09/15/2005 | US20050202171 Precursor compounds for deposition of ceramic and metal films and preparation methods thereof |
| 09/15/2005 | US20050202170 Method for depositing gallium oxide coatings on flat glass |
| 09/15/2005 | US20050202169 Method for depositing aluminum oxide coatings on flat glass |
| 09/15/2005 | US20050202168 Thermally-stabilized thermal barrier coating and process therefor |