| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/29/2005 | WO2005091687A1 Micro plasma jet generator |
| 09/29/2005 | WO2005091385A1 Semiconductor light-emitting device and illuminating device |
| 09/29/2005 | WO2005091348A1 Plasma treatment to improve adhesion of low k dielectrics |
| 09/29/2005 | WO2005090638A2 Remote chamber methods for removing surface deposits |
| 09/29/2005 | WO2005090635A1 Alumina coating, coated product and method of making the same |
| 09/29/2005 | WO2005090634A1 Substrate covered with an adhesion promoting layer and a hard carbon coating |
| 09/29/2005 | WO2005089960A1 Coating method |
| 09/29/2005 | US20050215686 Process of masking cooling holes of a gas turbine component |
| 09/29/2005 | US20050215066 High density plasma process for the formation of silicon dioxide on silicon carbide substrates |
| 09/29/2005 | US20050215065 Low dielectric constant porous films |
| 09/29/2005 | US20050215059 Process for producing semi-conductor coated substrate |
| 09/29/2005 | US20050214579 Surface-coated cermet cutting tool with a hard coating layer exhibiting excellent chipping resistance |
| 09/29/2005 | US20050214540 Low friction, high durability ringless piston and piston sleeve |
| 09/29/2005 | US20050214478 Chemical vapor deposition plasma process using plural ion shower grids |
| 09/29/2005 | US20050214477 Chemical vapor deposition plasma process using an ion shower grid |
| 09/29/2005 | US20050214460 Method of depositing copper on a support |
| 09/29/2005 | US20050214459 Diamond and aggregated carbon fiber and production methods |
| 09/29/2005 | US20050214458 Low zirconium hafnium halide compositions |
| 09/29/2005 | US20050214457 Deposition of low dielectric constant films by N2O addition |
| 09/29/2005 | US20050214456 Enhanced dielectric layers using sequential deposition |
| 09/29/2005 | US20050214455 Cleaning chamber using a chlorine containing etchant to remove silicon residues from chamber; providing a seasoning film comprises silicon carbide on interior surfaces chamber by introducing precursor gases comprising trimethylsilane and carbon dioxide |
| 09/29/2005 | US20050214454 Chamber cleaning method |
| 09/29/2005 | US20050214445 Method and processing system for determining coating status of a ceramic substrate heater |
| 09/29/2005 | US20050214102 Loading and unloading apparatus for a coating device |
| 09/29/2005 | US20050213950 Cooling device, and apparatus and method for manufacturing image display panel using cooling device |
| 09/29/2005 | US20050213949 Heating configuration for use in thermal processing chambers |
| 09/29/2005 | US20050212119 Incorporation of nitrogen into high k dielectric film |
| 09/29/2005 | US20050212093 Semiconductor device and apparatus for fabricating the same |
| 09/29/2005 | US20050212031 Semiconductor device and method for manufacturing same |
| 09/29/2005 | US20050212029 Semiconductor device and method for manufacturing same |
| 09/29/2005 | US20050211910 Morphology and Spectroscopy of Nanoscale Regions using X-Rays Generated by Laser Produced Plasma |
| 09/29/2005 | US20050211666 Method of processing a workpiece |
| 09/29/2005 | US20050211547 Reactive sputter deposition plasma reactor and process using plural ion shower grids |
| 09/29/2005 | US20050211546 applying a radio frequency power source to generate plasma gases from deposition precursor species sputtered from semiconductor targets, creating a flux of ions and providing gases into chemcial reactors for combining with semiconductor atoms to form molecules that deposit on the workpiece surfaces |
| 09/29/2005 | US20050211386 Processing system and method for chemically treating a substrate |
| 09/29/2005 | US20050211341 High strength alloys and methods for making same |
| 09/29/2005 | US20050211279 supplying cleaning gases into the enclosure through nozzles at the sidewalls of the enclosure, to fill the space between an upper and lower electrodes, then projecting and controlling gas amount, in response to the thickness of polymer deposits on the walls |
| 09/29/2005 | US20050211265 Method for cleaning a process chamber |
| 09/29/2005 | US20050211264 Method and processing system for plasma-enhanced cleaning of system components |
| 09/29/2005 | US20050211171 Chemical vapor deposition plasma reactor having an ion shower grid |
| 09/29/2005 | US20050211170 Chemical vapor deposition plasma reactor having plural ion shower grids |
| 09/29/2005 | US20050211169 Apparatus for manufacturing substrate |
| 09/29/2005 | US20050211168 Mixing box, and apparatus and method for producing films |
| 09/29/2005 | US20050211167 Processing device and processing method |
| 09/29/2005 | US20050211162 Nozzle device, film forming apparatus and method using the same, inorganic electroluminescence device, inkjet head, and ultrasonic transducer array |
| 09/29/2005 | DE102004012044A1 Carbon layer formation, comprises precipitating a layer by introducing a carbon containing gas to a hydrogen atmosphere at high pressure and temperature |
| 09/29/2005 | DE10027427B4 Verfahren zur Herstellung eines Substrats mit einer an dessen Oberfläche fest anhaftenden polykristallinen Diamantschicht und beschichtetes Substrat A process for producing a substrate having on its surface a firmly adhering layer of polycrystalline diamond coated substrate and |
| 09/28/2005 | EP1580479A1 Raw solution feeding system for vaporizer and method of cleaning the raw solution feeding system |
| 09/28/2005 | EP1580299A1 A transparent high-temperature resistant and protective coating for domestic appliances and method for its deposition |
| 09/28/2005 | EP1580292A1 Method of producing a substrate |
| 09/28/2005 | EP1579908A1 The combinatorial synthesis of novel materials |
| 09/28/2005 | EP1579027A1 Plasma-enhanced film deposition |
| 09/28/2005 | EP1579026A1 High rate deposition of titanium dioxide |
| 09/28/2005 | EP1573780A3 Bubbler for substrate processing |
| 09/28/2005 | EP1216106A4 Improved apparatus and method for growth of a thin film |
| 09/28/2005 | CN1675742A Transfer chamber for vacuum processing system |
| 09/28/2005 | CN1675737A Plasma processor with electrode simultaneously responsive to plural frequencies |
| 09/28/2005 | CN1675732A Accessory member for dispensers of alkali metals |
| 09/28/2005 | CN1675405A Method of forming a coating on a plastic glazing |
| 09/28/2005 | CN1675404A Method for preparation of aluminum oxide thin film |
| 09/28/2005 | CN1675403A Titania coatings by CVD at atmospheric pressure |
| 09/28/2005 | CN1675402A Vapor deposition of tungsten nitride |
| 09/28/2005 | CN1675058A Laminating product including adhesion layer and laminate product including protective film |
| 09/28/2005 | CN1674729A Method and apparatus for measuring thickness of deposited film and method and apparatus for forming material layer |
| 09/28/2005 | CN1674237A Semiconductor device and apparatus for fabricating the same |
| 09/28/2005 | CN1674220A Apparatus for manufacturing substrate |
| 09/28/2005 | CN1673411A Cooling device, and apparatus and method for manufacturing image display panel using cooling device |
| 09/28/2005 | CN1673410A Showerhead mounting to accommodate thermal expansion |
| 09/28/2005 | CN1673147A Composite film glass with infrared reflection and self-cleaning function |
| 09/28/2005 | CN1673145A Vacuum treatment installation with a variable pump arrangement |
| 09/28/2005 | CN1672771A Filtering unit |
| 09/28/2005 | CN1221017C Improved flourine deped silicon dioxide film |
| 09/28/2005 | CN1221013C Gasification supplying method |
| 09/28/2005 | CN1220800C Susceptor designs for silicon carbide thin films |
| 09/28/2005 | CN1220558C Multi-component container assembly for washing super-purity solvent and washing method thereof |
| 09/27/2005 | US6949830 Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device |
| 09/27/2005 | US6949827 Electrical and elelctronic apparatus having thin films on the substrates formed by atomic layer deposition |
| 09/27/2005 | US6949716 Process for treating with an atmospheric plasma electrically conductive materials and a device therefor |
| 09/27/2005 | US6949480 Method for depositing silicon nitride layer of semiconductor device |
| 09/27/2005 | US6949478 Oxide film forming method |
| 09/27/2005 | US6949474 Method of manufacturing a semiconductor device and a semiconductor manufacture system |
| 09/27/2005 | US6949463 Method of making iron silicide and method of making photoelectric transducer |
| 09/27/2005 | US6949450 Method for integrated in-situ cleaning and subsequent atomic layer deposition within a single processing chamber |
| 09/27/2005 | US6949425 Semiconductor device includes gate insulating film having a high dielectric constant |
| 09/27/2005 | US6949301 Magnetic recording medium having a magnetic film on a non-magnetic substrate by intercalating an under layer, the proportion of functional groups/100 carbon atoms in a diamond like carbon protective coating composed of carbon exceeds 20% |
| 09/27/2005 | US6949273 Methods of forming coatings on gas-dispersion fixtures in chemical-vapor-deposition systems |
| 09/27/2005 | US6949269 starter layer having leaving groups is produced by deposition of a reactive component, after which tris(tert-butoxy)silanol is added to selectively grow SiO2 |
| 09/27/2005 | US6949253 ultra-nanocrystalline diamond coated microchip drug delivery substrate that is impermeably sealed and inert for implantation in a living body |
| 09/27/2005 | US6949165 Plasma processing apparatus |
| 09/27/2005 | US6949143 Dual substrate loadlock process equipment |
| 09/27/2005 | US6948448 Apparatus and method for depositing large area coatings on planar surfaces |
| 09/27/2005 | CA2283222C Photocatalytically-activated self-cleaning article and method of making same |
| 09/22/2005 | WO2005088692A1 Substrate processing apparatus and method for manufacturing semiconductor device |
| 09/22/2005 | WO2005088688A1 Substrate processing apparatus and method for manufacturing semiconductor device |
| 09/22/2005 | WO2005088666A1 Process for producing layered member and layered member |
| 09/22/2005 | WO2005087978A1 Plasma coating system for non-planar substrates |
| 09/22/2005 | WO2005087977A1 Expanding thermal plasma deposition system |
| 09/22/2005 | WO2005087976A1 Hardware development to reduce bevel deposition |
| 09/22/2005 | WO2005087975A1 Material carburetor for organic metal chemical vapor phase deposition equipment |
| 09/22/2005 | WO2005087974A2 Cvd processes for the deposition of amorphous carbon films |